JP2022023872A5 - - Google Patents
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- JP2022023872A5 JP2022023872A5 JP2021169470A JP2021169470A JP2022023872A5 JP 2022023872 A5 JP2022023872 A5 JP 2022023872A5 JP 2021169470 A JP2021169470 A JP 2021169470A JP 2021169470 A JP2021169470 A JP 2021169470A JP 2022023872 A5 JP2022023872 A5 JP 2022023872A5
- Authority
- JP
- Japan
- Prior art keywords
- formula
- carbon atoms
- cobalt
- alkyl groups
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 125000000217 alkyl group Chemical group 0.000 claims 25
- 125000004432 carbon atom Chemical group C* 0.000 claims 24
- 229910017052 cobalt Inorganic materials 0.000 claims 12
- 239000010941 cobalt Substances 0.000 claims 12
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 10
- 150000001869 cobalt compounds Chemical class 0.000 claims 9
- 229910052751 metal Inorganic materials 0.000 claims 9
- 239000002184 metal Substances 0.000 claims 9
- 239000000758 substrate Substances 0.000 claims 9
- 239000002243 precursor Substances 0.000 claims 6
- 150000003973 alkyl amines Chemical class 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 3
- -1 diketone compound Chemical class 0.000 claims 3
- 239000000203 mixture Substances 0.000 claims 3
- 239000007795 chemical reaction product Substances 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 229940104869 fluorosilicate Drugs 0.000 claims 2
- 239000011521 glass Substances 0.000 claims 2
- 239000003446 ligand Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 229910044991 metal oxide Inorganic materials 0.000 claims 2
- 150000004706 metal oxides Chemical class 0.000 claims 2
- 150000004767 nitrides Chemical class 0.000 claims 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims 2
- 239000005368 silicate glass Substances 0.000 claims 2
- 229910000531 Co alloy Inorganic materials 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 229910000881 Cu alloy Inorganic materials 0.000 claims 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims 1
- 229910000929 Ru alloy Inorganic materials 0.000 claims 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 1
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 239000003153 chemical reaction reagent Substances 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 229910000428 cobalt oxide Inorganic materials 0.000 claims 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 229910052914 metal silicate Inorganic materials 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 229910052814 silicon oxide Inorganic materials 0.000 claims 1
- 230000002194 synthesizing effect Effects 0.000 claims 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862686899P | 2018-06-19 | 2018-06-19 | |
| US62/686,899 | 2018-06-19 | ||
| US16/429,343 | 2019-06-03 | ||
| US16/429,343 US11440929B2 (en) | 2018-06-19 | 2019-06-03 | Bis(diazadiene)cobalt compounds, method of making and method of use thereof |
| JP2019113554A JP7393136B2 (ja) | 2018-06-19 | 2019-06-19 | ビス（ジアザジエン）コバルト化合物、合成方法、コバルト含有膜の堆積方法、コバルトの選択的堆積方法、コバルト含有膜および容器 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019113554A Division JP7393136B2 (ja) | 2018-06-19 | 2019-06-19 | ビス（ジアザジエン）コバルト化合物、合成方法、コバルト含有膜の堆積方法、コバルトの選択的堆積方法、コバルト含有膜および容器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2022023872A JP2022023872A (ja) | 2022-02-08 |
| JP2022023872A5 true JP2022023872A5 (enExample) | 2022-06-28 |
Family
ID=66998308
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019113554A Active JP7393136B2 (ja) | 2018-06-19 | 2019-06-19 | ビス（ジアザジエン）コバルト化合物、合成方法、コバルト含有膜の堆積方法、コバルトの選択的堆積方法、コバルト含有膜および容器 |
| JP2021169470A Pending JP2022023872A (ja) | 2018-06-19 | 2021-10-15 | ビス（ジアザジエン）コバルト化合物、その製造方法及び使用方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019113554A Active JP7393136B2 (ja) | 2018-06-19 | 2019-06-19 | ビス（ジアザジエン）コバルト化合物、合成方法、コバルト含有膜の堆積方法、コバルトの選択的堆積方法、コバルト含有膜および容器 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11440929B2 (enExample) |
| EP (1) | EP3584250B1 (enExample) |
| JP (2) | JP7393136B2 (enExample) |
| KR (1) | KR102362602B1 (enExample) |
| CN (1) | CN110615746B (enExample) |
| SG (1) | SG10201905339YA (enExample) |
| TW (1) | TWI722456B (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090269507A1 (en) * | 2008-04-29 | 2009-10-29 | Sang-Ho Yu | Selective cobalt deposition on copper surfaces |
| US11476158B2 (en) * | 2014-09-14 | 2022-10-18 | Entegris, Inc. | Cobalt deposition selectivity on copper and dielectrics |
| US11440929B2 (en) * | 2018-06-19 | 2022-09-13 | Versum Materials Us, Llc | Bis(diazadiene)cobalt compounds, method of making and method of use thereof |
| JP7378267B2 (ja) * | 2018-11-12 | 2023-11-13 | 東ソー株式会社 | コバルト錯体、その製造方法、及びコバルト含有薄膜の製造方法 |
| US12014925B2 (en) * | 2021-05-25 | 2024-06-18 | Applied Materials, Inc. | Metal-doped carbon hardmasks |
| JP2025031683A (ja) * | 2023-08-24 | 2025-03-07 | ダイキン工業株式会社 | 薄膜の製造方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7572731B2 (en) | 2005-06-28 | 2009-08-11 | Micron Technology, Inc. | Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same |
| JP5706755B2 (ja) | 2010-06-10 | 2015-04-22 | 東ソー株式会社 | ヒドロシラン誘導体、その製造方法、ケイ素含有薄膜の製造法 |
| US9255327B2 (en) | 2010-08-24 | 2016-02-09 | Wayne State University | Thermally stable volatile precursors |
| US9822446B2 (en) | 2010-08-24 | 2017-11-21 | Wayne State University | Thermally stable volatile precursors |
| CN103298971B (zh) | 2010-11-17 | 2015-07-08 | Up化学株式会社 | 基于二氮杂二烯的金属化合物、其生产方法和使用其形成薄膜的方法 |
| EP2700646B1 (en) | 2011-04-20 | 2015-10-14 | Tanaka Kikinzoku Kogyo K.K. | Chemical vapor deposition method using organic platinum compound |
| US9067958B2 (en) | 2013-10-14 | 2015-06-30 | Intel Corporation | Scalable and high yield synthesis of transition metal bis-diazabutadienes |
| US11476158B2 (en) | 2014-09-14 | 2022-10-18 | Entegris, Inc. | Cobalt deposition selectivity on copper and dielectrics |
| JP6465699B2 (ja) | 2015-03-06 | 2019-02-06 | 株式会社Adeka | ジアザジエニル化合物、薄膜形成用原料、薄膜の製造方法及びジアザジエン化合物 |
| US10563305B2 (en) | 2015-05-13 | 2020-02-18 | Versum Materials Us, Llc | Container for chemical precursors in a deposition process |
| JP6675159B2 (ja) | 2015-06-17 | 2020-04-01 | 株式会社Adeka | 新規な化合物、薄膜形成用原料及び薄膜の製造方法 |
| US10480070B2 (en) | 2016-05-12 | 2019-11-19 | Versum Materials Us, Llc | Delivery container with flow distributor |
| TWI736631B (zh) | 2016-06-06 | 2021-08-21 | 韋恩州立大學 | 二氮雜二烯錯合物與胺類的反應 |
| JP6735163B2 (ja) | 2016-06-22 | 2020-08-05 | 株式会社Adeka | バナジウム化合物、薄膜形成用原料及び薄膜の製造方法 |
| US10752649B2 (en) * | 2017-04-07 | 2020-08-25 | Applied Materials, Inc. | Metal precursors with modified diazabutadiene ligands for CVD and ALD and methods of use |
| US11440929B2 (en) * | 2018-06-19 | 2022-09-13 | Versum Materials Us, Llc | Bis(diazadiene)cobalt compounds, method of making and method of use thereof |
-
2019
- 2019-06-03 US US16/429,343 patent/US11440929B2/en active Active
- 2019-06-12 SG SG10201905339YA patent/SG10201905339YA/en unknown
- 2019-06-18 CN CN201910528696.8A patent/CN110615746B/zh active Active
- 2019-06-18 KR KR1020190072119A patent/KR102362602B1/ko active Active
- 2019-06-18 TW TW108120976A patent/TWI722456B/zh active
- 2019-06-19 EP EP19181180.1A patent/EP3584250B1/en active Active
- 2019-06-19 JP JP2019113554A patent/JP7393136B2/ja active Active
-
2021
- 2021-10-15 JP JP2021169470A patent/JP2022023872A/ja active Pending
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