JP2022020088A - 冷却装置、半導体製造装置および半導体製造方法 - Google Patents
冷却装置、半導体製造装置および半導体製造方法 Download PDFInfo
- Publication number
- JP2022020088A JP2022020088A JP2020110821A JP2020110821A JP2022020088A JP 2022020088 A JP2022020088 A JP 2022020088A JP 2020110821 A JP2020110821 A JP 2020110821A JP 2020110821 A JP2020110821 A JP 2020110821A JP 2022020088 A JP2022020088 A JP 2022020088A
- Authority
- JP
- Japan
- Prior art keywords
- refrigerant
- cooling device
- condenser
- heat exchanger
- heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001816 cooling Methods 0.000 title claims abstract description 89
- 238000004519 manufacturing process Methods 0.000 title claims description 25
- 239000004065 semiconductor Substances 0.000 title claims description 25
- 239000003507 refrigerant Substances 0.000 claims abstract description 117
- 239000006200 vaporizer Substances 0.000 claims abstract description 23
- 239000007788 liquid Substances 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims description 44
- 238000009835 boiling Methods 0.000 claims description 13
- 230000001105 regulatory effect Effects 0.000 claims description 10
- 230000008016 vaporization Effects 0.000 claims description 10
- 238000009834 vaporization Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 21
- 230000007246 mechanism Effects 0.000 description 19
- 239000012530 fluid Substances 0.000 description 16
- 239000000463 material Substances 0.000 description 11
- 239000007791 liquid phase Substances 0.000 description 9
- 239000012071 phase Substances 0.000 description 9
- 229920006395 saturated elastomer Polymers 0.000 description 9
- 230000001276 controlling effect Effects 0.000 description 7
- 238000005530 etching Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 238000009833 condensation Methods 0.000 description 6
- 230000005494 condensation Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 4
- 230000020169 heat generation Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000005057 refrigeration Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000011555 saturated liquid Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000013529 heat transfer fluid Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B41/00—Fluid-circulation arrangements
- F25B41/40—Fluid line arrangements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B6/00—Compression machines, plants or systems, with several condenser circuits
- F25B6/04—Compression machines, plants or systems, with several condenser circuits arranged in series
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B23/00—Machines, plants or systems, with a single mode of operation not covered by groups F25B1/00 - F25B21/00, e.g. using selective radiation effect
- F25B23/006—Machines, plants or systems, with a single mode of operation not covered by groups F25B1/00 - F25B21/00, e.g. using selective radiation effect boiling cooling systems
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B25/00—Machines, plants or systems, using a combination of modes of operation covered by two or more of the groups F25B1/00 - F25B23/00
- F25B25/005—Machines, plants or systems, using a combination of modes of operation covered by two or more of the groups F25B1/00 - F25B23/00 using primary and secondary systems
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B39/00—Evaporators; Condensers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B39/00—Evaporators; Condensers
- F25B39/04—Condensers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B41/00—Fluid-circulation arrangements
- F25B41/20—Disposition of valves, e.g. of on-off valves or flow control valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B41/00—Fluid-circulation arrangements
- F25B41/30—Expansion means; Dispositions thereof
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B49/00—Arrangement or mounting of control or safety devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B49/00—Arrangement or mounting of control or safety devices
- F25B49/02—Arrangement or mounting of control or safety devices for compression type machines, plants or systems
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B49/00—Arrangement or mounting of control or safety devices
- F25B49/02—Arrangement or mounting of control or safety devices for compression type machines, plants or systems
- F25B49/022—Compressor control arrangements
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B6/00—Compression machines, plants or systems, with several condenser circuits
- F25B6/02—Compression machines, plants or systems, with several condenser circuits arranged in parallel
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D15/00—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
- F28D15/02—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
- F28D15/0266—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with separate evaporating and condensing chambers connected by at least one conduit; Loop-type heat pipes; with multiple or common evaporating or condensing chambers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2400/00—General features or devices for refrigeration machines, plants or systems, combined heating and refrigeration systems or heat-pump systems, i.e. not limited to a particular subgroup of F25B
- F25B2400/04—Refrigeration circuit bypassing means
- F25B2400/0403—Refrigeration circuit bypassing means for the condenser
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2600/00—Control issues
- F25B2600/02—Compressor control
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2600/00—Control issues
- F25B2600/02—Compressor control
- F25B2600/025—Compressor control by controlling speed
- F25B2600/0253—Compressor control by controlling speed with variable speed
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2600/00—Control issues
- F25B2600/13—Pump speed control
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2600/00—Control issues
- F25B2600/25—Control of valves
- F25B2600/2501—Bypass valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2600/00—Control issues
- F25B2600/25—Control of valves
- F25B2600/2513—Expansion valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2600/00—Control issues
- F25B2600/25—Control of valves
- F25B2600/2515—Flow valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2700/00—Sensing or detecting of parameters; Sensors therefor
- F25B2700/19—Pressures
- F25B2700/195—Pressures of the condenser
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B2700/00—Sensing or detecting of parameters; Sensors therefor
- F25B2700/21—Temperatures
- F25B2700/2116—Temperatures of a condenser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/002—Cooling arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B30/00—Energy efficient heating, ventilation or air conditioning [HVAC]
- Y02B30/70—Efficient control or regulation technologies, e.g. for control of refrigerant flow, motor or heating
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Thermal Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Epidemiology (AREA)
- Toxicology (AREA)
- Environmental & Geological Engineering (AREA)
- Atmospheric Sciences (AREA)
- Public Health (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Sustainable Development (AREA)
- Drying Of Semiconductors (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
前記凝縮器の中に配置された熱交換器を含む冷却系と、を備え、前記凝縮器は、前記冷媒が液体状態で存在する第1部分と、前記冷媒が気体状態で存在する第2部分とを有し、前記熱交換器の少なくとも一部は、前記第2部分に配置されている。
ここで、dTは温度変化、Tは状態温度、ΔVは蒸発に伴う体積変化、dPは圧力変化、Lは潜熱を示す。
Claims (18)
- 凝縮器の中の冷媒をポンプ、加熱器、絞り弁、気化器を介して前記凝縮器に戻すように前記冷媒を循環させる循環系と、
前記凝縮器の中に配置された熱交換器を含む冷却系と、を備え、
前記凝縮器は、前記冷媒が液体状態で存在する第1部分と、前記冷媒が気体状態で存在する第2部分とを有し、前記熱交換器の少なくとも一部は、前記第2部分に配置されている、
ことを特徴とする冷却装置。 - 前記冷却系は、前記第2部分の圧力または温度を所定値に維持する、
ことを特徴とする請求項1に記載の冷却装置。 - 前記凝縮器の中に、前記冷媒より沸点が低い気体が封入されている、
ことを特徴とする請求項1又は2に記載の冷却装置。 - 前記冷却系は、前記熱交換器を通して第2冷媒を循環させる第2循環系を含む、
ことを特徴とする請求項1乃至3のいずれか1項に記載の冷却装置。 - 前記第2部分の圧力または温度を検出するセンサと、
前記センサの出力に基づいて前記第2冷媒を制御する制御部と、を更に備える、
ことを特徴とする請求項4に記載の冷却装置。 - 前記第2循環系は、第2ポンプと、第2加熱器と、流量調整弁と、排熱器と、タンクとを更に含み、
前記タンクから前記第2ポンプおよび前記第2加熱器を介して前記熱交換器に前記第2冷媒が送られ、前記熱交換器から前記排熱器を介して前記タンクに前記第2冷媒が戻される、
ことを特徴とする請求項5に記載の冷却装置。 - 前記制御部は、前記センサの出力に基づいて前記第2冷媒の温度、流量および圧力の少なくとも一方を制御する、
ことを特徴とする請求項6に記載の冷却装置。 - 前記制御部は、前記センサの出力に基づいて前記第2ポンプおよび前記流量調整弁の少なくとも一方を制御する、
ことを特徴とする請求項6に記載の冷却装置。 - 前記第2循環系は、圧縮機と、第2凝縮器と、膨張弁とを更に含み、
前記圧縮機から前記第2凝縮器および前記膨張弁を介して前記熱交換器に前記第2冷媒が送られ、前記熱交換器から前記圧縮機に前記第2冷媒が戻される、
ことを特徴とする請求項5に記載の冷却装置。 - 前記制御部は、前記熱交換器における前記第2冷媒の気化潜熱を制御する、
ことを特徴とする請求項9に記載の冷却装置。 - 前記制御部は、前記センサの出力に基づいて前記第2冷媒の温度、流量および圧力の少なくとも1つを制御する、
ことを特徴とする請求項9又は10に記載の冷却装置。 - 前記制御部は、前記センサの出力に基づいて前記圧縮機および前記膨張弁の少なくとも一方を制御する、
ことを特徴とする請求項9又は10に記載の冷却装置。 - 前記第2循環系は、前記圧縮機から第2凝縮器および前記膨張弁を介して前記熱交換器に至る主経路をバイパスするバイパス経路を更に含み、
前記バイパス経路に調整弁が設けられている、
ことを特徴とする請求項9乃至11のいずれか1項に記載の冷却装置。 - 前記制御部は、前記センサの出力に基づいて前記圧縮機、前記膨張弁および前記調整弁の少なくとも一方を制御する、
ことを特徴とする請求項13に記載の冷却装置。 - 前記加熱器は、第2熱交換器を含み、
前記圧縮機と前記第2凝縮器との間の経路から分岐され、前記第2熱交換器を介して前記圧縮機に戻る第3循環経路が構成され、
前記第3循環経路に第2調整弁が設けられている、
ことを特徴とする請求項13又は14に記載の冷却装置。 - 発熱部を有する半導体製造装置であって、
請求項1乃至15のいずれか1項に記載の冷却装置を備え、
前記冷却装置は、前記発熱部からの熱によって前記気化器の中の前記冷媒を気化させることによって前記発熱部を冷却するように構成されている、
ことを特徴とする半導体製造装置。 - パターンを形成するパターン形成装置として構成されている、
ことを特徴とする請求項16に記載の半導体製造装置。 - 請求項16又は17に記載の半導体製造装置によって基板を処理する工程と、
前記工程で処理された基板を加工する工程と、
を含むことを特徴とする半導体製造方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020110821A JP2022020088A (ja) | 2020-06-26 | 2020-06-26 | 冷却装置、半導体製造装置および半導体製造方法 |
EP21177371.8A EP3933298A1 (en) | 2020-06-26 | 2021-06-02 | Cooling device, semiconductor manufacturing apparatus, and semiconductor manufacturing method |
TW110120348A TWI839616B (zh) | 2020-06-26 | 2021-06-04 | 冷卻裝置、半導體製造裝置和半導體製造方法 |
KR1020210073833A KR20220001461A (ko) | 2020-06-26 | 2021-06-08 | 냉각장치, 반도체 제조장치 및 반도체 제조방법 |
US17/355,345 US20210404711A1 (en) | 2020-06-26 | 2021-06-23 | Cooling device, semiconductor manufacturing apparatus, and semiconductor manufacturing method |
CN202110695168.9A CN113847759A (zh) | 2020-06-26 | 2021-06-23 | 冷却装置、半导体制造装置和半导体制造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020110821A JP2022020088A (ja) | 2020-06-26 | 2020-06-26 | 冷却装置、半導体製造装置および半導体製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022020088A true JP2022020088A (ja) | 2022-02-01 |
JP2022020088A5 JP2022020088A5 (ja) | 2023-06-23 |
Family
ID=76250193
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020110821A Pending JP2022020088A (ja) | 2020-06-26 | 2020-06-26 | 冷却装置、半導体製造装置および半導体製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20210404711A1 (ja) |
EP (1) | EP3933298A1 (ja) |
JP (1) | JP2022020088A (ja) |
KR (1) | KR20220001461A (ja) |
CN (1) | CN113847759A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH718262A1 (de) * | 2022-04-01 | 2022-07-15 | V Zug Ag | Kühlgerät mit einem Kühlkreislauf zum Kühlen des Kondensators. |
WO2023243184A1 (ja) * | 2022-06-13 | 2023-12-21 | キヤノン株式会社 | 冷却装置、半導体製造装置及び半導体製造方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6053907B2 (ja) * | 1978-01-27 | 1985-11-27 | 日本電気株式会社 | 二項ベクトル乗算回路 |
JP3576938B2 (ja) * | 2000-07-31 | 2004-10-13 | 共立冷熱株式会社 | ヒートポンプ |
TWI300953B (en) * | 2002-03-15 | 2008-09-11 | Nikon Corp | Exposure system and device manufacturing process |
WO2008139528A1 (ja) * | 2007-04-27 | 2008-11-20 | Hitachi, Ltd. | 冷却サイクル系統、天然ガス液化設備、冷却サイクル系統の運転方法及び改造方法 |
JP2011196607A (ja) * | 2010-03-19 | 2011-10-06 | Toyo Eng Works Ltd | 冷却システム |
EP2515170B1 (en) | 2011-04-20 | 2020-02-19 | ASML Netherlands BV | Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method |
CN104321598B (zh) * | 2012-08-20 | 2016-05-18 | 三菱电机株式会社 | 冷冻装置 |
US9253863B2 (en) * | 2013-03-14 | 2016-02-02 | Southern Linac, Llc | Systems and methods for changing coolant in a linear accelerator |
JP6527353B2 (ja) * | 2015-03-12 | 2019-06-05 | 株式会社前川製作所 | 超電導体の冷却装置 |
JP2016186998A (ja) * | 2015-03-27 | 2016-10-27 | 株式会社東芝 | 半導体製造装置および半導体製造方法 |
WO2017133773A1 (en) * | 2016-02-04 | 2017-08-10 | Franke Technology And Trademark Ltd | Refrigerating apparatus |
EP3420587B1 (en) * | 2016-02-25 | 2023-08-16 | ABB Schweiz AG | Heat exchanger assembly and method for operating a heat exchanger assembly |
JP6722860B2 (ja) * | 2017-02-07 | 2020-07-15 | パナソニックIpマネジメント株式会社 | 吸着冷凍機、吸着冷凍機を制御する方法および冷却システム |
US11566820B2 (en) * | 2018-11-07 | 2023-01-31 | Shinwa Controls Co., Ltd. | Fluid temperature control system |
US11911724B2 (en) * | 2018-12-03 | 2024-02-27 | Carrier Corporation | Enhanced refrigeration purge system |
WO2021065943A1 (ja) * | 2019-09-30 | 2021-04-08 | ダイキン工業株式会社 | 熱処理システム |
-
2020
- 2020-06-26 JP JP2020110821A patent/JP2022020088A/ja active Pending
-
2021
- 2021-06-02 EP EP21177371.8A patent/EP3933298A1/en active Pending
- 2021-06-08 KR KR1020210073833A patent/KR20220001461A/ko unknown
- 2021-06-23 CN CN202110695168.9A patent/CN113847759A/zh active Pending
- 2021-06-23 US US17/355,345 patent/US20210404711A1/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH718262A1 (de) * | 2022-04-01 | 2022-07-15 | V Zug Ag | Kühlgerät mit einem Kühlkreislauf zum Kühlen des Kondensators. |
WO2023243184A1 (ja) * | 2022-06-13 | 2023-12-21 | キヤノン株式会社 | 冷却装置、半導体製造装置及び半導体製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TW202205375A (zh) | 2022-02-01 |
US20210404711A1 (en) | 2021-12-30 |
KR20220001461A (ko) | 2022-01-05 |
EP3933298A1 (en) | 2022-01-05 |
CN113847759A (zh) | 2021-12-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2022020088A (ja) | 冷却装置、半導体製造装置および半導体製造方法 | |
US20200113085A1 (en) | System and method for recovering and upgrading waste heat while cooling devices | |
KR102427104B1 (ko) | 냉각장치, 반도체 제조장치 및 반도체 제조방법 | |
KR101460222B1 (ko) | 열적 제어 시스템 및 방법 | |
US8141362B2 (en) | Closed cycle heat transfer device and method | |
KR101372401B1 (ko) | 리소그래피 장치의 부분을 열 컨디셔닝하기 위한 열 컨디셔닝 시스템 및 열 컨디셔닝 방법 | |
JP5361915B2 (ja) | 流体の冷却装置及びこれを備える飛行体、ならびに流体の冷却方法 | |
JP6679728B2 (ja) | 熱源からの廃熱を機械的エネルギーに変換する有機ランキンサイクルおよびかかる有機ランキンサイクルを利用する圧縮機設備 | |
US10128141B2 (en) | Plasma processing apparatus and plasma processing method | |
JP5947023B2 (ja) | 温度制御装置、プラズマ処理装置、処理装置及び温度制御方法 | |
US20230137699A1 (en) | Method for the stabilisation and/or open-loop and/or closed-loop control of a working temperature, heat exchanger unit, device for transporting energy, refrigerating machine and heat pump | |
TWI839616B (zh) | 冷卻裝置、半導體製造裝置和半導體製造方法 | |
US10907864B2 (en) | Cooling system | |
CN117628834A (zh) | 电力产生装置 | |
WO2023243184A1 (ja) | 冷却装置、半導体製造装置及び半導体製造方法 | |
JPH02188605A (ja) | 複流体タービンプラント | |
CN110349905B (zh) | 温度调节方法 | |
JP2019000807A (ja) | 化学プラント、及び液体材料の蒸留方法 | |
JP2020161655A (ja) | 冷却システム | |
JP2024085167A (ja) | 空気冷却装置、環境制御装置、リソグラフィー装置、および、物品製造方法 | |
Pattanayak et al. | LNG Cold Energy Utilization in a Proposed Method for Performance Enhancement of Gas/Steam Turbine CCPP | |
JP2023547449A (ja) | エネルギ貯蔵の為のプラントおよびプロセスならびにプラントおよび/またはエネルギ貯蔵の為のプロセスにおける熱担体を制御する為の方法 | |
CN116518756A (zh) | 压缩气体储能的冷凝、蒸发用水自循环系统及其控制方法 | |
WO2023049231A1 (en) | Modular high-performance turbo-compression cooling | |
JP2021061293A (ja) | 熱サイクル装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD01 | Notification of change of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7421 Effective date: 20210103 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210113 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230614 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230614 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20240221 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20240401 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240527 |