JP2021534210A - 安定性のアルケニル又はアルキニル含有有機ケイ素前駆体組成物 - Google Patents
安定性のアルケニル又はアルキニル含有有機ケイ素前駆体組成物 Download PDFInfo
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- JP2021534210A JP2021534210A JP2021510031A JP2021510031A JP2021534210A JP 2021534210 A JP2021534210 A JP 2021534210A JP 2021510031 A JP2021510031 A JP 2021510031A JP 2021510031 A JP2021510031 A JP 2021510031A JP 2021534210 A JP2021534210 A JP 2021534210A
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- JP
- Japan
- Prior art keywords
- alkynyl
- container
- alkenyl
- tert
- butyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000003342 alkenyl group Chemical group 0.000 title claims abstract description 56
- 125000000304 alkynyl group Chemical group 0.000 title claims abstract description 55
- 239000002243 precursor Substances 0.000 title claims abstract description 37
- 239000000203 mixture Substances 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 claims abstract description 34
- 150000003961 organosilicon compounds Chemical class 0.000 claims abstract description 21
- 125000006165 cyclic alkyl group Chemical group 0.000 claims abstract description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 7
- 238000004821 distillation Methods 0.000 claims abstract description 6
- 239000001257 hydrogen Substances 0.000 claims abstract description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 6
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims abstract description 5
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims abstract description 5
- 238000004519 manufacturing process Methods 0.000 claims abstract description 5
- UFHILTCGAOPTOV-UHFFFAOYSA-N tetrakis(ethenyl)silane Chemical compound C=C[Si](C=C)(C=C)C=C UFHILTCGAOPTOV-UHFFFAOYSA-N 0.000 claims description 40
- 239000012535 impurity Substances 0.000 claims description 26
- 150000001875 compounds Chemical class 0.000 claims description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 230000005540 biological transmission Effects 0.000 claims description 16
- 125000003118 aryl group Chemical group 0.000 claims description 11
- 238000005227 gel permeation chromatography Methods 0.000 claims description 8
- 239000003381 stabilizer Substances 0.000 claims description 8
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 claims description 7
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 6
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 claims description 6
- 235000010354 butylated hydroxytoluene Nutrition 0.000 claims description 6
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 claims description 6
- 150000004820 halides Chemical class 0.000 claims description 5
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 claims description 3
- PZRWFKGUFWPFID-UHFFFAOYSA-N 3,9-dioctadecoxy-2,4,8,10-tetraoxa-3,9-diphosphaspiro[5.5]undecane Chemical compound C1OP(OCCCCCCCCCCCCCCCCCC)OCC21COP(OCCCCCCCCCCCCCCCCCC)OC2 PZRWFKGUFWPFID-UHFFFAOYSA-N 0.000 claims description 3
- MRBKEAMVRSLQPH-UHFFFAOYSA-N 3-tert-butyl-4-hydroxyanisole Chemical compound COC1=CC=C(O)C(C(C)(C)C)=C1 MRBKEAMVRSLQPH-UHFFFAOYSA-N 0.000 claims description 3
- JTTMYKSFKOOQLP-UHFFFAOYSA-N 4-hydroxydiphenylamine Chemical compound C1=CC(O)=CC=C1NC1=CC=CC=C1 JTTMYKSFKOOQLP-UHFFFAOYSA-N 0.000 claims description 3
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 claims description 3
- UTGQNNCQYDRXCH-UHFFFAOYSA-N N,N'-diphenyl-1,4-phenylenediamine Chemical compound C=1C=C(NC=2C=CC=CC=2)C=CC=1NC1=CC=CC=C1 UTGQNNCQYDRXCH-UHFFFAOYSA-N 0.000 claims description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 3
- QYTDEUPAUMOIOP-UHFFFAOYSA-N TEMPO Chemical group CC1(C)CCCC(C)(C)N1[O] QYTDEUPAUMOIOP-UHFFFAOYSA-N 0.000 claims description 3
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 claims description 3
- GVJHHUAWPYXKBD-UHFFFAOYSA-N d-alpha-tocopherol Natural products OC1=C(C)C(C)=C2OC(CCCC(C)CCCC(C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-UHFFFAOYSA-N 0.000 claims description 3
- 229920001971 elastomer Polymers 0.000 claims description 3
- ZTHYODDOHIVTJV-UHFFFAOYSA-N gallic acid propyl ester Natural products CCCOC(=O)C1=CC(O)=C(O)C(O)=C1 ZTHYODDOHIVTJV-UHFFFAOYSA-N 0.000 claims description 3
- GDOPTJXRTPNYNR-UHFFFAOYSA-N methyl-cyclopentane Natural products CC1CCCC1 GDOPTJXRTPNYNR-UHFFFAOYSA-N 0.000 claims description 3
- GTIBACHAUHDNPH-WHYMJUELSA-N n,n'-bis[(z)-benzylideneamino]oxamide Chemical compound C=1C=CC=CC=1\C=N/NC(=O)C(=O)N\N=C/C1=CC=CC=C1 GTIBACHAUHDNPH-WHYMJUELSA-N 0.000 claims description 3
- 229950000688 phenothiazine Drugs 0.000 claims description 3
- 239000005060 rubber Substances 0.000 claims description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 3
- 235000019281 tert-butylhydroquinone Nutrition 0.000 claims description 3
- 235000010384 tocopherol Nutrition 0.000 claims description 3
- 239000011732 tocopherol Substances 0.000 claims description 3
- 229960001295 tocopherol Drugs 0.000 claims description 3
- 229930003799 tocopherol Natural products 0.000 claims description 3
- 235000015112 vegetable and seed oil Nutrition 0.000 claims description 3
- 239000010497 wheat germ oil Substances 0.000 claims description 3
- GVJHHUAWPYXKBD-IEOSBIPESA-N α-tocopherol Chemical compound OC1=C(C)C(C)=C2O[C@@](CCC[C@H](C)CCC[C@H](C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-IEOSBIPESA-N 0.000 claims description 3
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 claims description 2
- ROHFBIREHKPELA-UHFFFAOYSA-N 2-[(3,5-ditert-butyl-4-hydroxyphenyl)methyl]prop-2-enoic acid;methane Chemical compound C.CC(C)(C)C1=CC(CC(=C)C(O)=O)=CC(C(C)(C)C)=C1O.CC(C)(C)C1=CC(CC(=C)C(O)=O)=CC(C(C)(C)C)=C1O.CC(C)(C)C1=CC(CC(=C)C(O)=O)=CC(C(C)(C)C)=C1O.CC(C)(C)C1=CC(CC(=C)C(O)=O)=CC(C(C)(C)C)=C1O ROHFBIREHKPELA-UHFFFAOYSA-N 0.000 claims description 2
- IMOYOUMVYICGCA-UHFFFAOYSA-N 2-tert-butyl-4-hydroxyanisole Chemical compound COC1=CC=C(O)C=C1C(C)(C)C IMOYOUMVYICGCA-UHFFFAOYSA-N 0.000 claims description 2
- UDBVWWVWSXSLAX-UHFFFAOYSA-N 4-[2,3-bis(5-tert-butyl-4-hydroxy-2-methylphenyl)butyl]-2-tert-butyl-5-methylphenol Chemical compound C=1C(C(C)(C)C)=C(O)C=C(C)C=1C(C)C(C=1C(=CC(O)=C(C=1)C(C)(C)C)C)CC1=CC(C(C)(C)C)=C(O)C=C1C UDBVWWVWSXSLAX-UHFFFAOYSA-N 0.000 claims description 2
- SSDSCDGVMJFTEQ-UHFFFAOYSA-N octadecyl 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 SSDSCDGVMJFTEQ-UHFFFAOYSA-N 0.000 claims description 2
- HXIQYSLFEXIOAV-UHFFFAOYSA-N 2-tert-butyl-4-(5-tert-butyl-4-hydroxy-2-methylphenyl)sulfanyl-5-methylphenol Chemical compound CC1=CC(O)=C(C(C)(C)C)C=C1SC1=CC(C(C)(C)C)=C(O)C=C1C HXIQYSLFEXIOAV-UHFFFAOYSA-N 0.000 claims 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims 2
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 claims 1
- WPMYUUITDBHVQZ-UHFFFAOYSA-N 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoic acid Chemical compound CC(C)(C)C1=CC(CCC(O)=O)=CC(C(C)(C)C)=C1O WPMYUUITDBHVQZ-UHFFFAOYSA-N 0.000 claims 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims 1
- 239000007983 Tris buffer Substances 0.000 claims 1
- 235000010290 biphenyl Nutrition 0.000 claims 1
- 239000004305 biphenyl Substances 0.000 claims 1
- 125000006267 biphenyl group Chemical group 0.000 claims 1
- FQUNFJULCYSSOP-UHFFFAOYSA-N bisoctrizole Chemical compound N1=C2C=CC=CC2=NN1C1=CC(C(C)(C)CC(C)(C)C)=CC(CC=2C(=C(C=C(C=2)C(C)(C)CC(C)(C)C)N2N=C3C=CC=CC3=N2)O)=C1O FQUNFJULCYSSOP-UHFFFAOYSA-N 0.000 claims 1
- 239000001273 butane Substances 0.000 claims 1
- 229940125797 compound 12 Drugs 0.000 claims 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 claims 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 claims 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
- UIYCHXAGWOYNNA-UHFFFAOYSA-N vinyl sulfide Chemical group C=CSC=C UIYCHXAGWOYNNA-UHFFFAOYSA-N 0.000 claims 1
- 125000003601 C2-C6 alkynyl group Chemical group 0.000 abstract description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 24
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 20
- 239000007788 liquid Substances 0.000 description 20
- 239000000126 substance Substances 0.000 description 15
- 230000032683 aging Effects 0.000 description 14
- 238000012360 testing method Methods 0.000 description 14
- 229910001220 stainless steel Inorganic materials 0.000 description 12
- 239000010935 stainless steel Substances 0.000 description 12
- 125000000217 alkyl group Chemical group 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 125000000524 functional group Chemical group 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000012686 silicon precursor Substances 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 238000004817 gas chromatography Methods 0.000 description 5
- 238000004255 ion exchange chromatography Methods 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000001307 helium Substances 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- -1 methylcyclohexyl group Chemical group 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 3
- 238000000231 atomic layer deposition Methods 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000011010 flushing procedure Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 150000003377 silicon compounds Chemical class 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000003556 assay Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- WCBPJVKVIMMEQC-UHFFFAOYSA-N 1,1-diphenyl-2-(2,4,6-trinitrophenyl)hydrazine Chemical group [O-][N+](=O)C1=CC([N+](=O)[O-])=CC([N+]([O-])=O)=C1NN(C=1C=CC=CC=1)C1=CC=CC=C1 WCBPJVKVIMMEQC-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 238000001159 Fisher's combined probability test Methods 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 229920003266 Leaf® Polymers 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000004847 absorption spectroscopy Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- NNKJLYMBVRDUEI-UHFFFAOYSA-N chloro-tris(ethenyl)silane Chemical compound C=C[Si](Cl)(C=C)C=C NNKJLYMBVRDUEI-UHFFFAOYSA-N 0.000 description 1
- 125000004803 chlorobenzyl group Chemical group 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000003278 mimic effect Effects 0.000 description 1
- 125000005244 neohexyl group Chemical group [H]C([H])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000006384 oligomerization reaction Methods 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical group [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/0825—Preparations of compounds not comprising Si-Si or Si-cyano linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
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Abstract
Description
本出願は、2018年8月23日に出願された米国仮出願第62/722090号、及び2019年8月21日に出願された米国特許出願第16/547468号明細書に基づく優先権を主張していて、それらの開示は参照によってそれらの全体が本明細書に組み込まれる。
テトラビニルシラン(TVS)の2つの異なる供給源に由来するサンプルを、ゲル浸透クロマトグラフィー(GPC)によって分析して、液体中に存在する、より高分子量(HMW)の種の濃度を決定した。下の表1は、>1wt%のHMW種(>1000原子質量単位(amu)、例えば1000〜20000amuの分子量を有する種又はオリゴマー)を含有するTVSと、0.1wt%(1000ppm)のより高分子量の種(>1000amu)を含有するTVSとを示す比較サンプルを示している。TVSの2つの供給源は、DLIシステムを通る、CVDプロセスチャンバー中へのTVSの連続的な輸送への影響に対する有意な違いを有する。
Claims (24)
- アルケニル又はアルキニル含有有機ケイ素前駆体組成物を製造するための方法であって、
式RnSiR1 4-nを有し、式中、Rが直鎖若しくは分岐鎖のC2〜C6アルケニル基、及び直鎖若しくは分岐鎖のC2〜C6アルキニル基からなる群から選択され、R1が水素、直鎖若しくは分岐鎖のC1〜C10アルキル基及びC3〜C10アリール基からなる群から選択され、nが1〜4である、少なくとも1つのアルケニル又はアルキニル含有有機ケイ素化合物を含む組成物を少なくとも一度蒸留する工程であって、蒸留の後に、蒸留されたアルケニル又はアルキニル含有有機ケイ素前駆体組成物が製造されている工程;並びに
前記蒸留されたアルケニル又はアルキニル含有有機ケイ素前駆体組成物を、コンテナ中への290nm〜450nmの波長を有する紫外光及び可視光の10%以下の透過を可能とするコンテナ中に収容する収容工程
を含む方法。 - 前記少なくとも1つのアルケニル又はアルキニル含有有機ケイ素化合物がテトラビニルシランを含む、請求項2に記載の方法。
- 前記収容工程の前に、前記蒸留されたアルケニル又はアルキニル含有有機ケイ素前駆体組成物に、安定剤化合物を添加する工程をさらに含む、請求項1に記載の方法。
- 前記安定剤化合物が、2,6−ジ−tert−ブチル−4−メチルフェノール、2,2,6,6−テトラメチル−1−ピペリジニルオキシ(TEMPO)、2−tert−ブチル−4−ヒドロキシアニソール、3−tert−ブチル−4−ヒドロキシアニソール、プロピルエステル3,4,5−トリヒドロキシ−安息香酸、2−(1,1−ジメチルエチル)−1,4−ベンゼンジオール、ジフェニルピクリルヒドラジル、4−tert−ブチルカテコール、N−メチルアニリン、p−メトキシジフェニルアミン、ジフェニルアミン、N,N’−ジフェニル−p−フェニレンジアミン、p−ヒドロキシジフェニルアミン、フェノール、オクタデシル−3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート、テトラキス(メチレン(3,5−ジ−tert−ブチル)−4−ヒドロキシ−ヒドロシンナメート)メタン、フェノチアジン、アルキルアミドノイソ尿素、チオジエチレンビス(3,5,−ジ−tert−ブチル−4−ヒドロキシ−ヒドロシンナメート、1,2,−ビス(3,5−ジ−tert−ブチル−4−ヒドロキシヒドロシンナモイル)ヒドラジン、トリス(2−メチル−4−ヒドロキシ−5−tert−ブチルフェニル)ブタン、環状ネオペンタンテトライルビス(オクタデシルホスファイト)、4,4’−チオビス(6−tert−ブチル−m−クレゾール)、2,2’−メチレンビス(6−tert−ブチル−p−クレゾール)、オキサリルビス(ベンジリデンヒドラジド)、原料種子油、小麦胚芽油、トコフェロール及びゴムからなる群から選択される、請求項4に記載の方法。
- 前記蒸留されたアルケニル又はアルキニル含有有機ケイ素前駆体組成物が、ゲル浸透クロマトグラフィー(GPC)によって決定した場合に、100ppm(0.01wt%)より少ない、>1000amuの不純物を含む、請求項1に記載の方法。
- 前記コンテナが、前記コンテナ中への290nm〜450nmの波長を有する紫外光及び可視光の7%以下の透過を可能とする、請求項1に記載の方法。
- 前記コンテナが、前記コンテナ中への290nm〜450nmの波長を有する紫外光及び可視光の1%以下の透過を可能とする、請求項7に記載の方法。
- 前記コンテナが、前記コンテナ中への290nm〜450nmの波長を有する紫外光及び可視光の0%の透過を可能とする、請求項8に記載の方法。
- 前記蒸留されたアルケニル又はアルキニル含有有機ケイ素前駆体組成物が、50ppmより少ない水不純物を含む、請求項1に記載の方法。
- 前記蒸留されたアルケニル又はアルキニル含有有機ケイ素前駆体組成物が、10ppmより少ないハロゲン化物不純物を含む、請求項1に記載の方法。
- アルケニル又はアルキニル含有有機ケイ素化合物を貯蔵するためのシステムであって、
コンテナ中への290nm〜450nmの波長を有する紫外光及び可視光の10%以下の透過を可能とするコンテナ;並びに
前記コンテナ中に含有されている、式RnSiR1 4-nを有し、式中、Rが直鎖若しくは分岐鎖のC2〜C6アルケニル基、及び直鎖若しくは分岐鎖のC2〜C6アルキニル基からなる群から選択され、R1が水素、直鎖若しくは分岐鎖のC1〜C10アルキル基、C3〜C10環状アルキル基及びC3〜C10アリール基からなる群から選択され、nが1〜4である、少なくとも1つの蒸留されたアルケニル又はアルキニル含有有機ケイ素化合物
を含むシステム。 - 前記少なくとも1つの蒸留されたアルケニル又はアルキニル含有有機ケイ素化合物がテトラビニルシランを含む、請求項13に記載のシステム。
- 前記コンテナ中に安定剤化合物がさらに含有されている、請求項12に記載のシステム。
- 前記安定剤化合物が、2,6−ジ−tert−ブチル−4−メチルフェノール(BHT)、2,2,6,6−テトラメチル−1−ピペリジニルオキシ(TEMPO)、2−tert−ブチル−4−ヒドロキシアニソール、3−tert−ブチル−4−ヒドロキシアニソール、プロピルエステル3,4,5−トリヒドロキシ−安息香酸、2−(1,1−ジメチルエチル)−1,4−ベンゼンジオール、ジフェニルピクリルヒドラジル、4−tert−ブチルカテコール、N−メチルアニリン、p−メトキシジフェニルアミン、ジフェニルアミン、N,N’−ジフェニル−p−フェニレンジアミン、p−ヒドロキシジフェニルアミン、フェノール、オクタデシル−3−(3,5−ジ−tert−ブチル−4−ヒドロキシフェニル)プロピオネート、テトラキス(メチレン(3,5−ジ−tert−ブチル)−4−ヒドロキシ−ヒドロシンナメート)メタン、フェノチアジン、アルキルアミドノイソ尿素、チオジエチレンビス(3,5,−ジ−tert−ブチル−4−ヒドロキシ−ヒドロシンナメート、1,2,−ビス(3,5−ジ−tert−ブチル−4−ヒドロキシヒドロシンナモイル)ヒドラジン、トリス(2−メチル−4−ヒドロキシ−5−tert−ブチルフェニル)ブタン、環状ネオペンタンテトライルビス(オクタデシルホスファイト)、4,4’−チオビス(6−tert−ブチル−m−クレゾール)、2,2’−メチレンビス(6−tert−ブチル−p−クレゾール)、オキサリルビス(ベンジリデンヒドラジド)、原料種子油、小麦胚芽油、トコフェロール及びゴムからなる群から選択される、請求項15に記載のシステム。
- 前記少なくとも1つの蒸留されたアルケニル又はアルキニル含有有機ケイ素化合物が、ゲル浸透クロマトグラフィー(GPC)によって決定した場合に、100ppm(0.01wt%)より少ない、>1000amuの不純物を有する、請求項12に記載のシステム。
- 前記コンテナが、前記コンテナ中への290nm〜450nmの波長を有する紫外光及び可視光の7%以下の透過を可能とする、請求項12に記載のシステム。
- 前記コンテナが、前記コンテナ中への290nm〜450nmの波長を有する紫外光及び可視光の5%以下の透過を可能とする、請求項18に記載のシステム。
- 前記コンテナが、前記コンテナ中への290nm〜450nmの波長を有する紫外光及び可視光の2%以下の透過を可能とする、請求項19に記載のシステム。
- 前記コンテナが、前記コンテナ中への290nm〜450nmの波長を有する紫外光及び可視光の1%以下の透過を可能とする、請求項20に記載のシステム。
- 前記コンテナが、前記コンテナ中への290nm〜450nmの波長を有する紫外光及び可視光の0%の透過を可能とする、請求項21に記載のシステム。
- 50ppmより少ない水不純物が前記コンテナ中に含有されている、請求項12に記載のシステム。
- 10ppmより少ないハロゲン化物不純物が前記コンテナ中に含有されている、請求項12に記載のシステム。
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JP2018052918A (ja) * | 2016-09-27 | 2018-04-05 | セントラル硝子株式会社 | 不飽和結合含有シラン化合物の精製方法及び製造方法 |
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EP3841104A4 (en) | 2022-05-04 |
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TWI723510B (zh) | 2021-04-01 |
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TW202009238A (zh) | 2020-03-01 |
KR20230167156A (ko) | 2023-12-07 |
EP3841104A1 (en) | 2021-06-30 |
SG11202100929WA (en) | 2021-02-25 |
US20230339986A1 (en) | 2023-10-26 |
CN112585146B (zh) | 2024-03-22 |
KR20210034111A (ko) | 2021-03-29 |
TW202122404A (zh) | 2021-06-16 |
US20200062787A1 (en) | 2020-02-27 |
JP7288500B2 (ja) | 2023-06-07 |
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