JP2021528572A - 無電解金属のパターニング - Google Patents
無電解金属のパターニング Download PDFInfo
- Publication number
- JP2021528572A JP2021528572A JP2021520285A JP2021520285A JP2021528572A JP 2021528572 A JP2021528572 A JP 2021528572A JP 2021520285 A JP2021520285 A JP 2021520285A JP 2021520285 A JP2021520285 A JP 2021520285A JP 2021528572 A JP2021528572 A JP 2021528572A
- Authority
- JP
- Japan
- Prior art keywords
- patterning method
- resin
- catalyst
- metal
- electroless
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 126
- 239000002184 metal Substances 0.000 title claims abstract description 126
- 238000000059 patterning Methods 0.000 title claims description 47
- 238000000034 method Methods 0.000 claims abstract description 96
- 239000003054 catalyst Substances 0.000 claims abstract description 82
- 239000003989 dielectric material Substances 0.000 claims abstract description 58
- 150000002739 metals Chemical class 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims description 59
- 229920005989 resin Polymers 0.000 claims description 45
- 239000011347 resin Substances 0.000 claims description 45
- 239000010408 film Substances 0.000 claims description 40
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 38
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 30
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 30
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 29
- 229910052802 copper Inorganic materials 0.000 claims description 28
- 239000010949 copper Substances 0.000 claims description 28
- 230000008569 process Effects 0.000 claims description 28
- -1 polyphenylene Polymers 0.000 claims description 22
- 229910052763 palladium Inorganic materials 0.000 claims description 19
- 229910052709 silver Inorganic materials 0.000 claims description 16
- 239000004332 silver Substances 0.000 claims description 16
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 15
- 229910052759 nickel Inorganic materials 0.000 claims description 15
- 229910052697 platinum Inorganic materials 0.000 claims description 15
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 14
- 229910052737 gold Inorganic materials 0.000 claims description 14
- 239000010931 gold Substances 0.000 claims description 14
- 229920001721 polyimide Polymers 0.000 claims description 11
- 230000001376 precipitating effect Effects 0.000 claims description 11
- 239000010941 cobalt Substances 0.000 claims description 10
- 229910017052 cobalt Inorganic materials 0.000 claims description 10
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 10
- 238000007772 electroless plating Methods 0.000 claims description 10
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 10
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 10
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 9
- 239000012018 catalyst precursor Substances 0.000 claims description 9
- 238000000206 photolithography Methods 0.000 claims description 9
- 229910052718 tin Inorganic materials 0.000 claims description 9
- 238000002679 ablation Methods 0.000 claims description 8
- 239000000956 alloy Substances 0.000 claims description 8
- 229910045601 alloy Inorganic materials 0.000 claims description 8
- 239000011135 tin Substances 0.000 claims description 8
- 239000013032 Hydrocarbon resin Substances 0.000 claims description 7
- 229920000265 Polyparaphenylene Polymers 0.000 claims description 7
- 239000004643 cyanate ester Substances 0.000 claims description 7
- 239000003822 epoxy resin Substances 0.000 claims description 7
- 150000002148 esters Chemical class 0.000 claims description 7
- 229920006270 hydrocarbon resin Polymers 0.000 claims description 7
- 229910052741 iridium Inorganic materials 0.000 claims description 7
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 7
- 229920000647 polyepoxide Polymers 0.000 claims description 7
- 239000009719 polyimide resin Substances 0.000 claims description 7
- 229910052703 rhodium Inorganic materials 0.000 claims description 7
- 239000010948 rhodium Substances 0.000 claims description 7
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 7
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 6
- 239000004033 plastic Substances 0.000 claims description 6
- 229920003023 plastic Polymers 0.000 claims description 6
- 229920003192 poly(bis maleimide) Polymers 0.000 claims description 6
- 230000003197 catalytic effect Effects 0.000 claims description 4
- 239000004642 Polyimide Substances 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 239000004744 fabric Substances 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 239000011133 lead Substances 0.000 claims description 3
- 229920001169 thermoplastic Polymers 0.000 claims description 3
- 239000004416 thermosoftening plastic Substances 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000011701 zinc Substances 0.000 claims description 3
- 150000007942 carboxylates Chemical class 0.000 claims description 2
- 230000000873 masking effect Effects 0.000 claims 7
- 230000003213 activating effect Effects 0.000 claims 1
- 239000004020 conductor Substances 0.000 abstract description 8
- 238000001556 precipitation Methods 0.000 abstract description 8
- 230000008021 deposition Effects 0.000 abstract description 2
- 239000002585 base Substances 0.000 description 32
- 238000007747 plating Methods 0.000 description 17
- 238000009713 electroplating Methods 0.000 description 7
- 238000000576 coating method Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000000608 laser ablation Methods 0.000 description 3
- 238000007639 printing Methods 0.000 description 3
- 239000005995 Aluminium silicate Substances 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- 239000012696 Pd precursors Substances 0.000 description 2
- 235000012211 aluminium silicate Nutrition 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000004679 hydroxides Chemical class 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000010445 mica Substances 0.000 description 2
- 229910052618 mica group Inorganic materials 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- ZVSLRJWQDNRUDU-UHFFFAOYSA-L palladium(2+);propanoate Chemical compound [Pd+2].CCC([O-])=O.CCC([O-])=O ZVSLRJWQDNRUDU-UHFFFAOYSA-L 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 238000006479 redox reaction Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- JKLYMAFKWXBAGI-UHFFFAOYSA-N C1(CCCC1)N.C(CC)(=O)O Chemical compound C1(CCCC1)N.C(CC)(=O)O JKLYMAFKWXBAGI-UHFFFAOYSA-N 0.000 description 1
- 241000036313 Cupressus torulosa Species 0.000 description 1
- 239000002879 Lewis base Substances 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000012217 deletion Methods 0.000 description 1
- 230000037430 deletion Effects 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000007527 lewis bases Chemical class 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1605—Process or apparatus coating on selected surface areas by masking
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4661—Adding a circuit layer by direct wet plating, e.g. electroless plating; insulating materials adapted therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1655—Process features
- C23C18/1657—Electroless forming, i.e. substrate removed or destroyed at the end of the process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2053—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment only one step pretreatment
- C23C18/206—Use of metal other than noble metals and tin, e.g. activation, sensitisation with metals
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/003—3D structures, e.g. superposed patterned layers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/422—Plated through-holes or plated via connections characterised by electroless plating method; pretreatment therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/465—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits by applying an insulating layer having channels for the next circuit layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/09563—Metal filled via
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0716—Metallic plating catalysts, e.g. for direct electroplating of through holes; Sensitising or activating metallic plating catalysts
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0733—Method for plating stud vias, i.e. massive vias formed by plating the bottom of a hole without plating on the walls
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- H—ELECTRICITY
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
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Abstract
Description
本発明の分野は、基板上に無電解金属をパターニングするためのシステムおよび方法である。
本発明の課題は、無電解金属をパターニングするためのシステムおよび方法を提供する。本発明の一態様は、無電解金属のパターニング方法を含む。この方法の一実施例は、基板を活性化するために基板上に触媒層を配置する工程を含む。次に、誘電体層がネガ回路パターンに塗布され、活性触媒層をマスクする。次に、無電解金属組成物を露出した活性触媒層に塗布して、前記基板上に無電解金属めっきのパターンを形成する。前記無電解金属めっきは、オプション的に、追加の電解金属めっきによって更にめっきアップされる(例えば、深さの増加、体積の増加など)。したがって、本発明は、導電層を選択的に露光することにより、そして、金属が無電解又は無電解及び電解メッキの層上に選択的に析出される、プリント回路を製造する方法を記載する。本明細書中での使用において、「金属」は、無電解または電解めっきのいずれかによってめっきされる金属を意味する。
本発明は、基板上に金属をパターニングするための方法、システム、および装置に関する。本発明の一態様は、無電解めっきを使用して無電解金属をパターニングする方法を含む。無電解めっきは、酸化還元反応を利用して、外部電力を使用せずに物体に金属を析出させる。無電解めっきの主な利点の1つは、電解めっきを使用して金属イオンの均一な析出を達成することが困難な、エッジ、穴の内側、不規則な形状の物体など、物体のすべての部分に金属イオンを均一に析出できることである。
Claims (28)
- 多層回路において無電解めっきによって析出された金属をパターニングする方法であって、
第1触媒材料を含む第1触媒層を析出することによって基材の表面を活性化する工程と、
第1誘電体材料を使用して前記第1触媒層上に第1ネガ回路パターンをマスキングする工程と、
前記第1触媒層のマスキングされていない部分に第1無電解金属を塗布する工程と、を有し、
前記第1触媒層は、50ナノメートル未満の平均厚みを有するパターニング方法。 - 前記基材は、ポリイミド、膜、布、プラスチック、金属、セラミックおよび樹脂から成るグループの少なくとも一つを含む請求項1に記載のパターニング方法。
- 前記基材は、プリント回路基板を含む請求項1または2に記載のパターニング方法。
- 前記第1触媒材料は、パラジウム、銀、金、ニッケル、銅、ロジウム、コバルト、イリジウム、および白金から成るグループの少なくとも一つを含む請求項1〜3の何れか一項に記載のパターニング方法。
- 前記第1触媒材料は、前記基板上に第1触媒前駆体として析出され、次いで、これは、ほぼゼロ価の金属に活性化される請求項1〜4の何れか一項に記載のパターニング方法。
- 前記第1触媒前駆体は、有機金属を含む請求項5に記載のパターニング方法。
- 前記有機金属は、金属カルボン酸塩を含む請求項6に記載のパターニング方法。
- 前記第1触媒層は、25ナノメートル未満の平均厚さを有する請求項1〜7の何れか一項に記載のパターニング方法。
- 前記第1触媒層は、前記触媒の15ナノメートル未満の平均厚さを有する請求項1〜8の何れか一項に記載のパターニング方法。
- 前記第1誘電体材料は、エポキシ樹脂、シアネートエステル樹脂、ポリフェニレンエステル樹脂、ポリイミド樹脂、ビスマレイミドトリアンジン樹脂、ポリエチレンテレフタレート樹脂、炭化水素樹脂、ポリフルオロカーボン、LCP樹脂、および無機樹脂から成るグループの少なくとも一つを含む請求項1〜9の何れか一項に記載のパターニング方法。
- 前記第1誘電体材料は感光性である請求項1〜10の何れか一項に記載のパターニング方法。
- 前記第1無電解金属は、銅、ニッケル、パラジウム、白金、スズ、銀、および金から成るグループの少なくとも一つを含む請求項1〜11の何れか一項に記載のパターニング方法。
- a)第2触媒材料を有する第2触媒層を、前記第1誘電体材料および前記第1無電解金属のそれぞれの上に析出させる工程と、
b)第2誘電体材料を、前記第2触媒材料の第2層の上に析出させる工程と、
c)第2誘電体材料を使用して前記第2触媒層上に、第2のネガパターン(オプションで、z−軸接続を含む)をマスキングする工程と、
d)前記第2触媒層の非マスキング部分上に第2の無電解金属を析出させる工程と、を有し、
e)オプションで、前記方法を工程(a)から工程(d)まで反復し、それによって多層回路を形成する、ここで、前記第1、第2及び任意の後続の触媒層のそれぞれは、独立的に、50ナノメートル未満の平均厚を有する請求項1〜12の何れか一項に記載のパターニング方法。 - 前記第2および後続の触媒材料のそれぞれは、独立的に、パラジウム、銀、金、ニッケル、銅、ロジウム、コバルト、イリジウム、および白金から成るグループの少なくとも一つを含む請求項1〜13の何れか一項に記載のパターニング方法。
- 前記第2及び後続の誘電体材料のそれぞれは、独立的に、エポキシ樹脂、シアネートエステル樹脂、ポリフェニレンエステル樹脂、ポリイミド樹脂、ビスマレイミドトリアンジン樹脂、ポリエチレンテレフタレート樹脂、炭化水素樹脂、ポリフルオロカーボン、LCP樹脂、および無機樹脂から成るグループから選択される少なくとも一つを含む請求項1〜14の何れか一項に記載のパターニング方法。
- 前記第2およびその後続の無電解金属のそれぞれは、銅、ニッケル、パラジウム、白金、および金から成るグループの少なくとも一つを含む請求項1〜15の何れか一項に記載のパターニング方法。
- ネガ正孔パターンは、フォトリソグラフィ又はアブレーションによって形成される請求項1〜16の何れか一項に記載のパターニング方法。
- 多層回路における金属のパターニングの方法であって、
薄金属膜をベース材料の表面に配置する工程と、
第1の誘電体材料を使用して、第1のネガ回路パターンを前記薄金属膜上にマスキングする工程と、
第1金属を前記薄金属膜の非マスキング部分上に析出させる工程と
前記ベース材料と前記薄金属膜との両方を除去する工程と、を有し、
前記第1金属は、第1誘電体材料および第1無電解材料からなる群のうちの少なくとも1つを含み、
前記薄金属膜は、20ナノメートル未満の平均厚さを有するパターニング方法。 - 前記薄金属膜は、銅、銀、ネッケル、鉄、スズ、亜鉛、コバルト、鉛、アルミニウム、および対応の合金から成るグループの少なくとも一つである請求項18に記載のパターニング方法。
- 前記ベース材料は、金属、プラスチック又はセラミックを有する請求項18または19に記載のパターニング方法。
- 前記薄金属膜は、前記ベース材料から機械的又は化学的に除去される請求項18〜20の何れか一項に記載のパターニング方法。
- 前記ベース材料は、前記薄金属膜と同じ金属を含む請求項18〜21の何れか一項に記載のパターニング方法。
- 前記ベース材料は、ポリエチレンテレフタレート又はサーモプラスチック膜を含む請求項18〜22の何れか一項に記載のパターニング方法。
- a)第1触媒材料の第1の触媒層を、前記第1誘電体材料および前記第1金属上に析出する工程と、
b)前記触媒材料の前記第1層上に第2誘電体材料を析出する工程と、
c)前記第2誘電体材料を使用して第1触媒層上にネガ正孔パターン(z軸接続)をマスキングする工程と、
d)前記第1触媒層の非マスキング部分上に第2の無電解材料を析出する工程と、を有し、
e)オプションで、前記方法を工程(a)から(d)まで反復し、それによって多層回路を形成する請求項18〜23の何れか一項に記載のパターニング方法。 - 前記第1およびその後続の触媒層のそれぞれは、パラジウム、銀、金、ニッケル、銅、ロジウム、コバルト、イリジウム、および白金から成るグループの少なくとも一つを含む請求項18〜24の何れか一項に記載のパターニング方法。
- 前記第1,第2およびその後続の誘電性材料は、エポキシ樹脂、シアネートエステル樹脂、ポリフェニレンエステル樹脂、ポリイミド樹脂、ビスマレイミドトリアンジン樹脂、ポリエチレンテレフタレート樹脂、炭化水素樹脂、ポリフルオロカーボン、LCP樹脂および無機樹脂から成るグループの少なくとも一つを含む請求項18〜25の何れか一項に記載のパターニング方法。
- 前記第1,第2およびその後続の無電解材料は、銅、ニッケル、パラジウム、白金、スズ、銀、および金から成るグループの少なくとも一つを含む請求項18〜26の何れか一項に記載のパターニング方法。
- ネガ正孔パターンは、フォトリソグラフィ又はアブレーションによって形成される請求項18〜27の何れか一項に記載のパターニング方法。
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