JP2021517353A5 - - Google Patents

Download PDF

Info

Publication number
JP2021517353A5
JP2021517353A5 JP2020545695A JP2020545695A JP2021517353A5 JP 2021517353 A5 JP2021517353 A5 JP 2021517353A5 JP 2020545695 A JP2020545695 A JP 2020545695A JP 2020545695 A JP2020545695 A JP 2020545695A JP 2021517353 A5 JP2021517353 A5 JP 2021517353A5
Authority
JP
Japan
Prior art keywords
spectral characteristic
pulse
light beam
discrete
characteristic adjuster
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020545695A
Other languages
English (en)
Japanese (ja)
Other versions
JP2021517353A (ja
JP7044894B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2019/020415 external-priority patent/WO2019190700A1/en
Publication of JP2021517353A publication Critical patent/JP2021517353A/ja
Publication of JP2021517353A5 publication Critical patent/JP2021517353A5/ja
Application granted granted Critical
Publication of JP7044894B2 publication Critical patent/JP7044894B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2020545695A 2018-03-30 2019-03-01 パルス光ビームのスペクトル特性選択及びパルスタイミング制御 Active JP7044894B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862650896P 2018-03-30 2018-03-30
US62/650,896 2018-03-30
US201862663308P 2018-04-27 2018-04-27
US62/663,308 2018-04-27
PCT/US2019/020415 WO2019190700A1 (en) 2018-03-30 2019-03-01 Spectral feature selection and pulse timing control of a pulsed light beam

Publications (3)

Publication Number Publication Date
JP2021517353A JP2021517353A (ja) 2021-07-15
JP2021517353A5 true JP2021517353A5 (https=) 2021-08-26
JP7044894B2 JP7044894B2 (ja) 2022-03-30

Family

ID=68058412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020545695A Active JP7044894B2 (ja) 2018-03-30 2019-03-01 パルス光ビームのスペクトル特性選択及びパルスタイミング制御

Country Status (6)

Country Link
US (2) US11526083B2 (https=)
JP (1) JP7044894B2 (https=)
KR (2) KR102462465B1 (https=)
CN (2) CN111937256B (https=)
TW (1) TWI703411B (https=)
WO (1) WO2019190700A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2022609A (en) 2018-03-12 2019-09-18 Asml Netherlands Bv Control System and Method
WO2019190700A1 (en) * 2018-03-30 2019-10-03 Cymer, Llc Spectral feature selection and pulse timing control of a pulsed light beam
TWI749546B (zh) 2019-05-14 2021-12-11 美商希瑪有限責任公司 用於調變光源波長的裝置及方法
KR102562520B1 (ko) 2019-05-22 2023-08-01 사이머 엘엘씨 다수의 레이저 빔을 생성하는 장치 및 방법
US12374853B2 (en) 2019-05-22 2025-07-29 Cymer, Llc Control system for a plurality of deep ultraviolet optical oscillators
CN114144731B (zh) 2019-07-23 2024-04-09 西默有限公司 补偿由重复率偏差引起的波长误差的方法
US12130558B2 (en) 2019-11-08 2024-10-29 Cymer, Llc Radiation system for controlling bursts of pulses of radiation
US12597754B2 (en) 2020-03-23 2026-04-07 Cymer, Llc Predictive control of a pulsed light beam
JP7515001B2 (ja) * 2020-08-18 2024-07-11 サイマー リミテッド ライアビリティ カンパニー 予測的に較正をスケジュール設定する装置及び方法
US20240006838A1 (en) * 2020-12-16 2024-01-04 Cymer, Llc Apparatus for and method of modulating a wavelength of an excimer laser as a function of its repetition frequency

Family Cites Families (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4601036A (en) 1982-09-30 1986-07-15 Honeywell Inc. Rapidly tunable laser
JP2631554B2 (ja) * 1989-05-23 1997-07-16 株式会社小松製作所 レーザの波長制御装置
US6671294B2 (en) 1997-07-22 2003-12-30 Cymer, Inc. Laser spectral engineering for lithographic process
US6853653B2 (en) 1997-07-22 2005-02-08 Cymer, Inc. Laser spectral engineering for lithographic process
US20030178583A1 (en) 2000-09-18 2003-09-25 Kampherbeek Bert Jan Field emission photo-cathode array for lithography system and lithography system provided with such an array
US7039086B2 (en) * 2001-04-09 2006-05-02 Cymer, Inc. Control system for a two chamber gas discharge laser
US6735225B2 (en) * 2001-06-07 2004-05-11 Lambda Physik Ag Chirp compensation method and apparatus
US7088758B2 (en) * 2001-07-27 2006-08-08 Cymer, Inc. Relax gas discharge laser lithography light source
US7154928B2 (en) * 2004-06-23 2006-12-26 Cymer Inc. Laser output beam wavefront splitter for bandwidth spectrum control
US6963595B2 (en) 2001-08-29 2005-11-08 Cymer, Inc. Automatic gas control system for a gas discharge laser
US7158553B2 (en) * 2003-02-14 2007-01-02 Lambda Physik Ag Master oscillator/power amplifier excimer laser system with pulse energy and pointing control
GB2402230B (en) 2003-05-30 2006-05-03 Xsil Technology Ltd Focusing an optical beam to two foci
EP1517183A1 (en) 2003-08-29 2005-03-23 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6829040B1 (en) 2003-11-07 2004-12-07 Advanced Micro Devices, Inc. Lithography contrast enhancement technique by varying focus with wavelength modulation
TWI396225B (zh) 2004-07-23 2013-05-11 尼康股份有限公司 成像面測量方法、曝光方法、元件製造方法以及曝光裝置
US20060114956A1 (en) * 2004-11-30 2006-06-01 Sandstrom Richard L High power high pulse repetition rate gas discharge laser system bandwidth management
US7534552B2 (en) 2004-12-23 2009-05-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7256870B2 (en) 2005-02-01 2007-08-14 Asml Netherlands B.V. Method and apparatus for controlling iso-dense bias in lithography
US7525638B2 (en) 2005-03-23 2009-04-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7286207B2 (en) 2005-04-28 2007-10-23 Infineon Technologies, Ag Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration
US20070013889A1 (en) 2005-07-12 2007-01-18 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby having an increase in depth of focus
WO2008052153A2 (en) 2006-10-26 2008-05-02 Cornell Research Foundation, Inc. Production of optical pulses at a desired wavelength using soliton self-frequency shift
JP2009010231A (ja) 2007-06-28 2009-01-15 Canon Inc 露光装置およびデバイス製造方法
JP5638389B2 (ja) 2007-08-09 2014-12-10 ヴィルヌーヴ, アランVILLENEUVE, Alain チューナブルモードロックレーザ
US7703069B1 (en) 2007-08-14 2010-04-20 Brion Technologies, Inc. Three-dimensional mask model for photolithography simulation
US8309885B2 (en) * 2009-01-15 2012-11-13 Electro Scientific Industries, Inc. Pulse temporal programmable ultrafast burst mode laser for micromachining
NL2005424A (en) 2009-10-30 2011-05-02 Asml Netherlands Bv Lithographic method and apparatus.
JP5755068B2 (ja) 2011-07-27 2015-07-29 株式会社小松製作所 狭帯域化レーザのスペクトル幅調整装置
JP2013062484A (ja) 2011-08-24 2013-04-04 Gigaphoton Inc レーザ装置
US9207119B2 (en) 2012-04-27 2015-12-08 Cymer, Llc Active spectral control during spectrum synthesis
DE102012211256A1 (de) 2012-06-29 2014-01-02 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Projektionslithographie
WO2014089120A1 (en) 2012-12-07 2014-06-12 Integrated Plasmonics Corporation Plasmonic spectroscopic sensor and cuvette therefor
JP6151054B2 (ja) * 2013-03-22 2017-06-21 ギガフォトン株式会社 レーザ装置及び極端紫外光生成装置
US9599510B2 (en) 2014-06-04 2017-03-21 Cymer, Llc Estimation of spectral feature of pulsed light beam
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
JP6585174B2 (ja) 2015-08-07 2019-10-02 ギガフォトン株式会社 狭帯域化レーザ装置
WO2017098625A1 (ja) 2015-12-10 2017-06-15 ギガフォトン株式会社 狭帯域化レーザ装置及びスペクトル線幅計測装置
WO2017102406A1 (en) 2015-12-18 2017-06-22 Stichting Vu Inspection apparatus and method
US9837784B2 (en) * 2015-12-28 2017-12-05 Nlight, Inc. Fully controllable burst shaping individual pulses from picosecond fiber lasers
US9989866B2 (en) 2016-10-17 2018-06-05 Cymer, Llc Wafer-based light source parameter control
US9997888B2 (en) 2016-10-17 2018-06-12 Cymer, Llc Control of a spectral feature of a pulsed light beam
US11526082B2 (en) 2017-10-19 2022-12-13 Cymer, Llc Forming multiple aerial images in a single lithography exposure pass
WO2019190700A1 (en) * 2018-03-30 2019-10-03 Cymer, Llc Spectral feature selection and pulse timing control of a pulsed light beam

Similar Documents

Publication Publication Date Title
JP2021517353A5 (https=)
JP2005501399A5 (https=)
CN102355874B (zh) 用于非侵入性地对利用治疗射线进行治疗的生物组织进行温度测定的方法和装置
JP7044894B2 (ja) パルス光ビームのスペクトル特性選択及びパルスタイミング制御
TW201330432A (zh) 以脈衝雷射源發射預定輸出脈衝輪廓之方法及系統
JP3633904B2 (ja) Ｘ線発生方法およびｘ線発生装置
JP2010515577A (ja) マルチパルス・レーザー加工のためのシステム及び方法
TWI778205B (zh) 雷射功率控制裝置、雷射加工裝置及雷射功率控制方法
KR102019414B1 (ko) 피부 치료용 레이저 장치
KR102520485B1 (ko) 선량 제어 기능이 있는 euv lpp 소스 및 가변폭 레이저 펄스를 사용한 레이저 안정화 기술
JP2011014685A (ja) レーザ照射装置、及びレーザ照射方法
JP2011003630A (ja) レーザ照射装置、及びレーザ照射方法
TWI877320B (zh) 雷射消隱脈衝電平控制
JP2008153645A5 (https=)
JPH11505067A (ja) タイムシェアリングレーザ
TWI698677B (zh) 用於隔離雷射系統中之增益元件之系統與方法
CN101849332B (zh) Q开关的固体激光器的脉冲稳定
TW202242567A (zh) 氣體放電雷射系統、在微影裝置中組合脈衝式雷射光束之方法及光束組合器
JP2010238684A (ja) レーザ装置、光源装置、これらの調整方法、光照射装置、露光装置、並びにデバイス製造方法
JP2008515230A5 (https=)
CN113678330A (zh) 具有脉冲时间重叠的激光系统
CN110612482B (zh) 激光产生的等离子体源
TW202036174A (zh) 用於極紫外線光學微影系統的劑量控制
WO2020099776A3 (fr) Source et procede de generation de rayons x par interaction laser avec une cible
US20250309606A1 (en) Pulsed lasers and methods of operation