JP2021182601A5 - - Google Patents

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Publication number
JP2021182601A5
JP2021182601A5 JP2020088016A JP2020088016A JP2021182601A5 JP 2021182601 A5 JP2021182601 A5 JP 2021182601A5 JP 2020088016 A JP2020088016 A JP 2020088016A JP 2020088016 A JP2020088016 A JP 2020088016A JP 2021182601 A5 JP2021182601 A5 JP 2021182601A5
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JP
Japan
Prior art keywords
pattern
cad
measurement
cad pattern
edge
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JP2020088016A
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English (en)
Japanese (ja)
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JP2021182601A (ja
JP7303155B2 (ja
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Priority claimed from JP2020088016A external-priority patent/JP7303155B2/ja
Priority to JP2020088016A priority Critical patent/JP7303155B2/ja
Priority to US17/925,810 priority patent/US20230186459A1/en
Priority to CN202180035695.5A priority patent/CN115699278A/zh
Priority to PCT/JP2021/017356 priority patent/WO2021235227A1/ja
Priority to KR1020227043907A priority patent/KR20230012016A/ko
Priority to TW110117504A priority patent/TW202201590A/zh
Publication of JP2021182601A publication Critical patent/JP2021182601A/ja
Publication of JP2021182601A5 publication Critical patent/JP2021182601A5/ja
Publication of JP7303155B2 publication Critical patent/JP7303155B2/ja
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JP2020088016A 2020-05-20 2020-05-20 パターン測定方法 Active JP7303155B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2020088016A JP7303155B2 (ja) 2020-05-20 2020-05-20 パターン測定方法
KR1020227043907A KR20230012016A (ko) 2020-05-20 2021-05-06 패턴 측정 방법
CN202180035695.5A CN115699278A (zh) 2020-05-20 2021-05-06 图案测量方法
PCT/JP2021/017356 WO2021235227A1 (ja) 2020-05-20 2021-05-06 パターン測定方法
US17/925,810 US20230186459A1 (en) 2020-05-20 2021-05-06 Pattern measuring method
TW110117504A TW202201590A (zh) 2020-05-20 2021-05-14 圖案測量方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020088016A JP7303155B2 (ja) 2020-05-20 2020-05-20 パターン測定方法

Publications (3)

Publication Number Publication Date
JP2021182601A JP2021182601A (ja) 2021-11-25
JP2021182601A5 true JP2021182601A5 (enExample) 2022-07-29
JP7303155B2 JP7303155B2 (ja) 2023-07-04

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ID=78606786

Family Applications (1)

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JP2020088016A Active JP7303155B2 (ja) 2020-05-20 2020-05-20 パターン測定方法

Country Status (6)

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US (1) US20230186459A1 (enExample)
JP (1) JP7303155B2 (enExample)
KR (1) KR20230012016A (enExample)
CN (1) CN115699278A (enExample)
TW (1) TW202201590A (enExample)
WO (1) WO2021235227A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7574157B2 (ja) * 2021-08-27 2024-10-28 株式会社ニューフレアテクノロジー 検査装置及び参照画像生成方法
JP2025144774A (ja) * 2024-03-21 2025-10-03 東レエンジニアリング先端半導体Ｍｉテクノロジー株式会社 パターン測定方法およびパターン測定装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4787673B2 (ja) 2005-05-19 2011-10-05 株式会社Ｎｇｒ パターン検査装置および方法
JP2008235575A (ja) 2007-03-20 2008-10-02 Toshiba Corp パターン測定方法、パターン測定装置およびプログラム
JP5530601B2 (ja) 2008-03-31 2014-06-25 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡を用いた回路パターンの寸法計測装置およびその方法
JP2011137901A (ja) * 2009-12-28 2011-07-14 Hitachi High-Technologies Corp パターン計測条件設定装置
JP2011191296A (ja) * 2010-03-16 2011-09-29 Ngr Inc パターン検査装置および方法
JP5438741B2 (ja) 2011-10-26 2014-03-12 株式会社アドバンテスト パターン測定装置及びパターン測定方法
JP6001945B2 (ja) 2012-07-24 2016-10-05 株式会社日立ハイテクノロジーズ パターン計測装置及び方法

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