JP2021181900A5 - - Google Patents

Download PDF

Info

Publication number
JP2021181900A5
JP2021181900A5 JP2020086669A JP2020086669A JP2021181900A5 JP 2021181900 A5 JP2021181900 A5 JP 2021181900A5 JP 2020086669 A JP2020086669 A JP 2020086669A JP 2020086669 A JP2020086669 A JP 2020086669A JP 2021181900 A5 JP2021181900 A5 JP 2021181900A5
Authority
JP
Japan
Prior art keywords
light
wavefront
beam width
light receiving
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020086669A
Other languages
English (en)
Japanese (ja)
Other versions
JP7446911B2 (ja
JP2021181900A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2020086669A priority Critical patent/JP7446911B2/ja
Priority claimed from JP2020086669A external-priority patent/JP7446911B2/ja
Publication of JP2021181900A publication Critical patent/JP2021181900A/ja
Publication of JP2021181900A5 publication Critical patent/JP2021181900A5/ja
Priority to JP2024027096A priority patent/JP7721711B2/ja
Application granted granted Critical
Publication of JP7446911B2 publication Critical patent/JP7446911B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2020086669A 2020-05-18 2020-05-18 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法 Active JP7446911B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2020086669A JP7446911B2 (ja) 2020-05-18 2020-05-18 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法
JP2024027096A JP7721711B2 (ja) 2020-05-18 2024-02-27 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020086669A JP7446911B2 (ja) 2020-05-18 2020-05-18 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2024027096A Division JP7721711B2 (ja) 2020-05-18 2024-02-27 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法

Publications (3)

Publication Number Publication Date
JP2021181900A JP2021181900A (ja) 2021-11-25
JP2021181900A5 true JP2021181900A5 (https=) 2023-05-11
JP7446911B2 JP7446911B2 (ja) 2024-03-11

Family

ID=78606450

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2020086669A Active JP7446911B2 (ja) 2020-05-18 2020-05-18 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法
JP2024027096A Active JP7721711B2 (ja) 2020-05-18 2024-02-27 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2024027096A Active JP7721711B2 (ja) 2020-05-18 2024-02-27 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法

Country Status (1)

Country Link
JP (2) JP7446911B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023120604A1 (ja) * 2021-12-23 2023-06-29 京セラ株式会社 計測装置、調整装置及び計測方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002195913A (ja) * 2000-12-27 2002-07-10 Nikon Corp 収差測定装置及び方法、露光装置、並びにマイクロデバイスの製造方法
JP4464726B2 (ja) * 2004-03-30 2010-05-19 株式会社トプコン 眼科装置
JP5672517B2 (ja) * 2009-10-20 2015-02-18 株式会社ニコン 波面収差測定方法及び波面収差測定機
CN102607719B (zh) 2011-06-24 2013-07-17 北京理工大学 基于横向剪切干涉的扩束准直系统波面像差检测装置
US10527518B2 (en) * 2016-08-22 2020-01-07 Mitsubishi Electric Corporation Wavefront measurement device and optical system assembly device
JP2019191121A (ja) * 2018-04-27 2019-10-31 キヤノン株式会社 計測方法、調整方法及び光学系の製造方法

Similar Documents

Publication Publication Date Title
US9574967B2 (en) Wavefront measurement method, shape measurement method, optical element manufacturing method, optical apparatus manufacturing method, program, and wavefront measurement apparatus
US7619191B1 (en) Increase spatial sampling for wave front mid-spatial frequency error recovery
US9270948B2 (en) Image pick-up device, method, and system utilizing a lens having plural regions each with different focal characteristics
US8836928B2 (en) Method for measuring wavefront aberration and wavefront aberration measuring apparatus
JP6622515B2 (ja) レンズアレイ、波面センサ、波面計測装置、形状計測装置、収差計測装置、光学素子の製造方法及び光学機器の製造方法
US20190361226A1 (en) Wavefront sensor, wavefront measurement apparatus, method of manufacturing optical element, and method of manufacturing optical system
CN110836634B (zh) 可适应多种光束的四象限探测器标定方法
US7525076B1 (en) Differential shack-hartmann curvature sensor
JP2021181900A5 (https=)
CN106705888B (zh) 干涉检测中的ccd坐标系与镜面坐标系非线性关系标定方法
US9170171B2 (en) Method and device of measuring wavefront aberration, method of manufacturing optical system, and recording medium
CN101285735B (zh) 一种通过分离波面整体倾斜扩大动态范围的哈特曼传感器
CN110044482B (zh) 一种基于反射式随机衍射片的光谱测试方法
US9759671B2 (en) Device and method for measuring panes, in particular windscreens of vehicles
JP7721711B2 (ja) 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法
US20250334699A1 (en) Lidar light-receiving device, lidar, and meteorological observation lidar
CN103234629A (zh) 两个光束在同一入射面的位置与角度同时测量装置
CN112611450B (zh) 一种光束质量分析仪和激光发射器振镜校准方法
JP2022161124A5 (https=)
CN115979593A (zh) 一种提高大口径望远镜波前误差检测精度的方法
CN108731808A (zh) Ims型快照式成像光谱仪子孔径中心位置定标方法及装置
CN119087665B (zh) 一种高分辨率相机视轴变化实时监测系统杂散光分析方法
JP7241986B2 (ja) 波面測定装置、および波面測定方法
JP2022161124A (ja) 波面計測装置、波面計測方法、並びに、光学系および光学素子の製造方法
CN114777933B (zh) 一种无网格大动态范围哈特曼波前测量装置及测量方法