JP2021075750A5 - Vapor deposition device and display device manufacturing method - Google Patents

Vapor deposition device and display device manufacturing method Download PDF

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JP2021075750A5
JP2021075750A5 JP2019202642A JP2019202642A JP2021075750A5 JP 2021075750 A5 JP2021075750 A5 JP 2021075750A5 JP 2019202642 A JP2019202642 A JP 2019202642A JP 2019202642 A JP2019202642 A JP 2019202642A JP 2021075750 A5 JP2021075750 A5 JP 2021075750A5
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蒸着マスクを用いて基板に有機材料を蒸着する表示装置の作製方法であって、
前記基板の表面側に対向して前記蒸着マスクを配置し、
前記基板の裏面側に、前記基板から離間されるようにマグネットを配置し、
第１位置における前記基板と前記蒸着マスクとの間の第１ギャップ（ｌ１）を検出し、
第２位置における前記基板と前記蒸着マスクとの間の第２ギャップ（ｌ２）を検出し、
式３を満たすように、前記第１ギャップ（ｌ１）および前記第２ギャップ（ｌ２）を調整し、
前記マグネットを前記基板に近づけることにより前記蒸着マスクを前記基板の前記表面側に引き寄せ、前記基板の一部と接した状態で前記有機材料を前記基板に蒸着する表示装置の作製方法。
Figure 2021075750000001
 （Ｌ１２：前記第１位置と前記第２位置との間の距離） A method for manufacturing a display device by evaporating an organic material onto a substrate using an evaporation mask, comprising:
arranging the vapor deposition mask facing the surface side of the substrate;
placing a magnet on the back side of the substrate so as to be spaced apart from the substrate;
detecting a first gap (l 1 ) between the substrate and the deposition mask at a first position;
detecting a second gap (l 2 ) between the substrate and the deposition mask at a second position;
adjusting the first gap (l 1 ) and the second gap (l 2 ) to satisfy Equation 3 ;
A method of manufacturing a display device , wherein the deposition mask is attracted to the surface side of the substrate by bringing the magnet close to the substrate, and the organic material is deposited on the substrate while being in contact with a part of the substrate .
Figure 2021075750000001
 (L 12 : distance between the first position and the second position) 式４を満たす請求項１に記載の表示装置の作製方法。
Figure 2021075750000002
 2. The method of manufacturing a display device according to claim 1, wherein Formula 4 is satisfied.
Figure 2021075750000002
 さらに、第３位置における前記基板と前記蒸着マスクとの間の第３ギャップ（ｌ３）を検出し、
式５を満たすように、前記第１ギャップ（ｌ１）および前記第３ギャップ（ｌ３）を調整する請求項１または請求項２に記載の表示装置の作製方法。
Figure 2021075750000003
 （Ｌ１３：前記第１位置と前記第３位置との間の距離） Further, detecting a third gap (l 3 ) between the substrate and the deposition mask at a third position;
3. The method of manufacturing a display device according to claim 1, wherein the first gap (l 1 ) and the third gap (l 3 ) are adjusted so as to satisfy Equation (5).
Figure 2021075750000003
 (L 13 : distance between the first position and the third position) 式６を満たす請求項３に記載の表示装置の作製方法。
Figure 2021075750000004
 4. The method of manufacturing a display device according to claim 3, wherein the expression (6) is satisfied.
Figure 2021075750000004
 鉛直方向において、前記第１位置は、前記第２位置の上方に位置する請求項１乃至請求項４のいずれか一項に記載の表示装置の作製方法。 5. The method of manufacturing a display device according to claim 1, wherein the first position is positioned above the second position in the vertical direction. 前記第１位置および前記第２位置の各々は、前記基板の四隅近傍のいずれか１つである請求項１乃至請求項５のいずれか一項に記載の表示装置の作製方法。 6. The method of manufacturing a display device according to claim 1, wherein each of the first position and the second position is one of four corners of the substrate. 前記第１ギャップ（ｌ１）および前記第２ギャップ（ｌ２）の各々は、同期して調整される請求項１乃至請求項６のいずれか一項に記載の表示装置の作製方法。 7. The method of manufacturing a display device according to any one of claims 1 to 6, wherein each of said first gap (l1) and said second gap (l2) is adjusted synchronously. 前記基板および前記蒸着マスクは、前記基板の前記表面が重力方向と交差する方向を向くように配置される請求項１に記載の表示装置の作製方法。 2. The method of manufacturing a display device according to claim 1, wherein the substrate and the vapor deposition mask are arranged such that the surface of the substrate faces a direction intersecting with the direction of gravity. 蒸着マスクを用いて基板に有機材料を蒸着する表示装置の作製方法であって、
前記基板を縦方向に立てて配置し、
前記基板の表面側に対向して前記蒸着マスクを配置し、
前記基板の裏面側に、前記基板から離間されるようにマグネットを配置し、
第１位置における前記基板と前記蒸着マスクとの間の第１ギャップを検出し、
第２位置における前記基板と前記蒸着マスクとの間の第２ギャップを検出し、
前記第１ギャップと前記第２ギャップの差が小さくなるように、前記第１位置および前記第２位置を同時に調整する表示装置の作製方法。 A method for manufacturing a display device by evaporating an organic material onto a substrate using an evaporation mask, comprising:
arranging the substrate vertically,
arranging the vapor deposition mask facing the surface side of the substrate;
placing a magnet on the back side of the substrate so as to be spaced apart from the substrate;
detecting a first gap between the substrate and the deposition mask at a first position;
detecting a second gap between the substrate and the deposition mask at a second position;
A method of manufacturing a display device, wherein the first position and the second position are simultaneously adjusted so that the difference between the first gap and the second gap is reduced. 前記第１位置および前記第２位置を含むｎ個（ｎは３以上の自然数）の検出位置を有し、前記第１位置から第ｎ位置における前記基板と前記蒸着マスクとの各ギャップを検出し、
前記各ギャップのうちの最大値と最小値の差が小さくなるように、前記第１位置から前記第ｎ位置を同時に調整し、
前記マグネットを前記基板に近づけることにより前記蒸着マスクを前記基板の前記表面側に引き寄せ、前記基板の一部と接した状態で前記有機材料を前記基板に蒸着する請求項９に記載の表示装置の作製方法。 having n (n is a natural number of 3 or more) detection positions including the first position and the second position, and detecting each gap between the substrate and the vapor deposition mask at the first position to the n-th position; ,
simultaneously adjusting the first position to the n-th position so that the difference between the maximum value and the minimum value of each gap is small ;
10. The display device according to claim 9 , wherein the vapor deposition mask is attracted to the surface side of the substrate by bringing the magnet close to the substrate, and the organic material is vapor-deposited on the substrate while being in contact with a part of the substrate . How to make. 前記第１位置から前記第ｎ位置は、前記基板の端部近傍に設けられる請求項１０に記載の表示装置の作製方法。 11. The method of manufacturing a display device according to claim 10 , wherein the first position to the n-th position are provided near the edge of the substrate. 前記基板は矩形であり、前記第１位置から前記第ｎ位置の全部または一部は、前記基板の四隅に設けられている請求項１１に記載の表示装置の作製方法。 12. The method of manufacturing a display device according to claim 11 , wherein the substrate is rectangular, and all or part of the first position to the n-th position are provided at four corners of the substrate. 基板の表面側に対向して蒸着マスクを配置する手段と、
前記基板の裏面側に、前記基板から離間されるように配置されるマグネットと、
第１位置における前記基板と前記蒸着マスクとの間の第１ギャップ（ｌ１）を検出する第１検出部と、
第２位置における前記基板と前記蒸着マスクとの間の第２ギャップ（ｌ２）を検出する第２検出部と、
前記第１ギャップ（ｌ１）を調整する第１調整部と、
前記第２ギャップ（ｌ２）を調整する第２調整部と、を含み、
前記第１調整部および前記第２調整部は、式９を満たすように、前記第１ギャップ（ｌ１）および前記第２ギャップ（ｌ２）を調整し、
前記マグネットを前記基板に近づけることにより前記蒸着マスクを前記基板の前記表面側に引き寄せ、前記基板の一部と接した状態で有機材料を前記基板に蒸着する蒸着装置。
Figure 2021075750000005
 （Ｌ１２：前記第１位置と前記第２位置との間の距離） means for arranging a vapor deposition mask facing the surface side of the substrate;
a magnet arranged on the rear surface side of the substrate so as to be spaced apart from the substrate;
a first detection unit that detects a first gap (l 1 ) between the substrate and the vapor deposition mask at a first position;
a second detector that detects a second gap (l 2 ) between the substrate and the vapor deposition mask at a second position;
a first adjuster that adjusts the first gap (l 1 );
a second adjustment unit that adjusts the second gap (l 2 );
The first adjustment unit and the second adjustment unit adjust the first gap (l 1 ) and the second gap (l 2 ) so as to satisfy Equation 9 ;
A vapor deposition apparatus that attracts the vapor deposition mask to the surface side of the substrate by bringing the magnet closer to the substrate, and vapor deposits an organic material onto the substrate while being in contact with a portion of the substrate .
Figure 2021075750000005
 (L 12 : distance between the first position and the second position) 式１０を満たす請求項１３に記載の蒸着装置。
Figure 2021075750000006
 14. The vapor deposition apparatus of claim 13 , which satisfies Equation 10.
Figure 2021075750000006
 さらに、
第３位置における前記基板と前記蒸着マスクとの間の第３ギャップ（ｌ３）を検出する第３検出部と、
前記第３ギャップ（ｌ３）を調整する第３調整部と、を含み、
前記第１調整部および前記第３調整部は、式１１を満たすように、前記第１ギャップ（ｌ１）および前記第３ギャップ（ｌ３）を調整する請求項１３または請求項１４に記載の蒸着装置。
Figure 2021075750000007
 （Ｌ１３：前記第１位置と前記第３位置との間の距離） moreover,
a third detector that detects a third gap (l 3 ) between the substrate and the vapor deposition mask at a third position;
a third adjustment unit that adjusts the third gap (l 3 );
15. The first adjustment unit and the third adjustment unit according to claim 13 or 14 , wherein the first gap (l 1 ) and the third gap (l 3 ) are adjusted so as to satisfy Equation 11. Evaporation equipment.
Figure 2021075750000007
 (L 13 : distance between the first position and the third position) 式１２を満たす請求項１５に記載の蒸着装置。
Figure 2021075750000008
 16. The vapor deposition apparatus of claim 15 , which satisfies Equation 12.
Figure 2021075750000008
 鉛直方向において、前記第１調整部は、前記第２調整部の上方に位置する請求項１３乃至請求項１６のいずれか一項に記載の蒸着装置。 The vapor deposition apparatus according to any one of claims 13 to 16 , wherein the first adjusting section is positioned above the second adjusting section in the vertical direction. 前記第１位置および前記第２位置の各々は、前記基板の四隅近傍のいずれか１つである請求項１３乃至請求項１７のいずれか一項に記載の蒸着装置。 18. The vapor deposition apparatus according to any one of claims 13 to 17 , wherein each of said first position and said second position is one of the vicinity of four corners of said substrate. 前記第１調整部および前記第２調整部が同期している請求項１３乃至請求項１８のいずれか一項に記載の蒸着装置。 19. The vapor deposition apparatus according to any one of claims 13 to 18 , wherein said first adjustment section and said second adjustment section are synchronized. 前記基板および前記蒸着マスクは、前記基板の前記表面が重力方向と交差する方向を向くように配置される請求項１３に記載の蒸着装置。 14. The vapor deposition apparatus according to claim 13, wherein the substrate and the vapor deposition mask are arranged such that the surface of the substrate faces a direction intersecting with the direction of gravity. 縦方向に配置された基板の表面側に対向して蒸着マスクを配置する手段と、
前記基板の裏面側に、前記基板から離間されるように配置されるマグネットと、
第１位置における前記基板と前記蒸着マスクとの第１ギャップを検出する第１検出部と、
第２位置における前記基板と前記蒸着マスクとの第２ギャップを検出する第２検出部と、
前記第１ギャップを調整する第１調整部と、
前記第２ギャップを調整する第２調整部と、を含み、
前記第１調整部および前記第２調整部は、前記第１ギャップと前記第２ギャップの差が小さくなるように、前記第１位置および前記第２位置を同時に調整し、
前記マグネットを前記基板に近づけることにより前記蒸着マスクを前記基板の前記表面側に引き寄せ、前記基板の一部と接した状態で有機材料を前記基板に蒸着する蒸着装置。 means for arranging a vapor deposition mask facing the surface side of the substrate arranged in the vertical direction;
a magnet arranged on the rear surface side of the substrate so as to be spaced apart from the substrate;
a first detection unit that detects a first gap between the substrate and the vapor deposition mask at a first position;
a second detection unit that detects a second gap between the substrate and the vapor deposition mask at a second position;
a first adjuster that adjusts the first gap;
a second adjustment unit that adjusts the second gap,
The first adjustment section and the second adjustment section adjust the first position and the second position simultaneously so that the difference between the first gap and the second gap is reduced ,
A vapor deposition apparatus that attracts the vapor deposition mask to the surface side of the substrate by bringing the magnet closer to the substrate, and vapor deposits an organic material onto the substrate while being in contact with a portion of the substrate . 前記第１位置および前記第２位置を含むｎ個（ｎは３以上の自然数）の検出位置を有し、
前記第１位置の前記第１ギャップから第ｎ位置の第ｎギャップにおける前記基板と前記蒸着マスクとの各ギャップを検出する前記第１検出部から第ｎ検出部と、
前記第１調整部、前記第２調整部を含む、各ギャップのそれぞれを調整する前記第１調整部から第ｎ調整部と、を含み、
前記各ギャップのうちの最大値と最小値の差が小さくなるように、前記第１位置から前記第ｎ位置を同時に調整する請求項２１に記載の蒸着装置。 Having n (n is a natural number of 3 or more) detection positions including the first position and the second position,
the first detection unit to the nth detection unit for detecting each gap between the substrate and the vapor deposition mask in the first gap at the first position to the nth gap at the nth position;
including the first adjustment unit to the n-th adjustment unit that adjust each gap, including the first adjustment unit and the second adjustment unit;
22. The vapor deposition apparatus according to claim 21 , wherein the first position to the n-th position are simultaneously adjusted so that the difference between the maximum value and the minimum value of each gap becomes small. 前記第１位置から前記第ｎ位置は、前記基板の端部近傍に設けられる請求項２２に記載の蒸着装置。 23. The vapor deposition apparatus according to claim 22 , wherein the first position to the n-th position are provided near the edge of the substrate. 前記基板は矩形であり、前記第１位置から前記第ｎ位置の全部または一部は、前記基板の四隅に設けられている請求項２３に記載の蒸着装置。 24. The vapor deposition apparatus according to claim 23 , wherein the substrate is rectangular, and all or part of the first position to the n-th position are provided at four corners of the substrate. 前記第１調整部および前記第２調整部は、前記蒸着マスク側に設けられる請求項２１に記載の蒸着装置。 22. The vapor deposition apparatus according to claim 21 , wherein the first adjustment section and the second adjustment section are provided on the vapor deposition mask side. 前記基板の前記蒸着マスクとは反対側に、前記基板の位置を調整する基板側調整部をさらに有する請求項２５に記載の蒸着装置。 26. The vapor deposition apparatus according to claim 25 , further comprising a substrate-side adjustment unit for adjusting the position of the substrate on the opposite side of the substrate from the vapor deposition mask.
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