JP2021064661A - Holding device - Google Patents

Abstract

To prevent damage to a first power feeding terminal and other members caused by force in a second direction applied to the first power feeding terminal and so forth due to displacement of a base member.SOLUTION: A holding device comprises: a first member which has a first surface substantially perpendicular to a first direction; a second member, provided with a through-hole, which has a heat expansion coefficient different from that of the first member; a power feeding pad; a first power feeding terminal which is bonded to the power feeding pad; a second power feeding terminal; a third power feeding terminal which is disposed at a location, inside the through-hole, between the first power feeding terminal and the second power feeding terminal; a first spring; and a second spring. The third power feeding terminal is disposed so that a gap is formed between itself and a wall surface of the second member defining the through-hole. Also, the third power feeding terminal is provided in a manner movable in a direction substantially perpendicular to the first direction.SELECTED DRAWING: Figure 3

Description

The techniques disclosed herein relate to holding devices that hold objects.

For example, an electrostatic chuck is used as a holding device for holding a wafer when manufacturing a semiconductor. The electrostatic chuck is a plate-like member made of, for example, ceramics and having a substantially planar surface (hereinafter, referred to as “adsorption surface”) substantially orthogonal to a predetermined direction (hereinafter, referred to as “first direction”). And a surface (hereinafter referred to as "first surface") which is composed of, for example, metal and is composed of a chuck electrode arranged inside the plate-shaped member and is opposite to the suction surface of the plate-shaped member. Hereinafter, it is provided with a base member having a "second surface"). The electrostatic chuck uses the electrostatic attraction generated by applying a voltage to the chuck electrode to suck and hold the wafer on the suction surface of the plate-shaped member.

If the temperature of the wafer held on the suction surface of the electrostatic chuck does not reach the desired temperature, the accuracy of each process (deposition, etching, etc.) on the wafer may decrease. Therefore, the temperature of the wafer is applied to the electrostatic chuck. Performance to control the distribution is required. Therefore, when the electrostatic chuck is used, the temperature distribution of the adsorption surface of the plate-shaped member is caused by heating by the heater electrodes arranged on the plate-shaped member and cooling by supplying the refrigerant to the refrigerant flow path formed in the base member. (By extension, control of the temperature distribution of the wafer held on the suction surface) is performed.

The electrostatic chuck is provided with a configuration for supplying power to the heater electrode (see, for example, Patent Document 1). Specifically, the electrostatic chuck of Patent Document 1 includes a power feeding pad arranged on the side of the first surface (the surface opposite to the suction surface) of the plate-shaped member and the second surface of the base member (the surface opposite to the suction surface). It is provided with a power supply terminal arranged in a through hole penetrating from a surface of the plate-shaped member facing the first surface) to a surface opposite to the second surface (hereinafter, referred to as a "third surface"). The power supply terminal includes a first power supply terminal joined to the power supply pad, a second power supply terminal arranged on the side of the third surface of the base member, a first power supply terminal, and a second power supply terminal. It is composed of a third power supply terminal arranged between the two. The third power feeding terminal is fixed to the base member by a screw. The tip of the first power feeding terminal forms a first spring that expands and contracts in a direction substantially orthogonal to the first direction, and the first spring is in contact with the third power feeding terminal. The tip of the second power feeding terminal forms a second spring that expands and contracts in a direction substantially orthogonal to the first direction, and the second spring is in contact with the third power feeding terminal. In such a configuration, power is supplied from the power source to the heater electrode via the second power supply terminal, the third power supply terminal, the first power supply terminal, the power supply pad, and the like.

Patent No. 4522517

In the conventional electrostatic chuck having the above configuration, since the coefficient of thermal expansion differs between the plate-shaped member and the base member, the base member becomes a plate due to the difference in thermal expansion between the plate-shaped member and the base member. It may be relatively displaced in a direction substantially orthogonal to the first direction (hereinafter, referred to as "second direction") with respect to the shaped member. As a result, a force is applied to the first power supply terminal or the like in the second direction, and for example, a crack is generated at the joint portion between the first power supply terminal and the power supply pad, and the first power supply terminal and other members are damaged. There is a risk of doing so. In the conventional electrostatic chuck having the above configuration, due to the presence of the first spring and the second spring that expand and contract in the second direction, the first power supply terminal and the like are connected due to the relative displacement of the base member. It is possible to suppress the application of the force in the two directions to some extent. However, since the third power supply terminal is fixed to the base member by a screw, a force due to the relative displacement of the base member is likely to be applied to the third power supply terminal (and thus to the first power supply terminal or the like). Therefore, a force in the second direction is applied to the first power feeding terminal or the like due to the displacement of the base member, and damage to the first power feeding terminal or other members can be sufficiently suppressed. Can not.

It should be noted that such a problem is not limited to the electrostatic chuck in which power is supplied to the heater electrode via the second power supply terminal, the third power supply terminal, the first power supply terminal, the power supply pad, and the like, and the second power supply terminal. To a holding device in which power is supplied to a specific member (including another member other than the heater electrode, for example, a chuck electrode) via a power supply terminal, a third power supply terminal, a first power supply terminal, a power supply pad, or the like. This is a common issue.

This specification discloses a technique capable of solving the above-mentioned problems.

The techniques disclosed herein can be realized, for example, in the following forms.

(1) The holding device disclosed in the present specification is a first member having a first surface substantially orthogonal to the first direction and a second member joined to the first member. A second surface facing the first surface and a third surface opposite to the second surface, penetrating from the second surface to the third surface. A second member in which holes are formed and whose coefficient of thermal expansion is different from the coefficient of thermal expansion of the first member, a power supply pad arranged on the side of the first surface of the first member, and the power supply. A first power feeding terminal joined to a pad and at least partly located inside the through hole and at least partly arranged on the side of the third surface of the second member, at least part of the through hole. A holding having a second power supply terminal located inside the through hole and a third power supply terminal arranged between the first power supply terminal and the second power supply terminal inside the through hole. In the device, at least one of the first power feeding terminal and the third power feeding terminal is capable of electrically conducting between the first power feeding terminal and the third power feeding terminal, and the first power feeding terminal can be electrically conducted. It has a first spring that expands and contracts in a direction substantially orthogonal to the direction, and at least one of the second power supply terminal and the third power supply terminal is a second power supply terminal and the third power supply terminal. The third feeding terminal has a second spring that expands and contracts in a direction substantially orthogonal to the first direction, and the third feeding terminal defines the through hole. It is arranged so as to form a gap between the wall surface and the wall surface, and is provided so as to be movable in a direction substantially orthogonal to the first direction.

In the present holding device, as described above, the third power feeding terminal is arranged so as to form a gap between the third power feeding terminal and the wall surface of the second member defining the through hole, and is arranged in the first direction. It is provided so that it can move in directions that are approximately orthogonal to each other. Therefore, when the second member is displaced relative to the first member due to the difference in thermal expansion between the first member and the second member, the conventional static electricity is used. It is possible to suppress the application of force to the first power feeding terminal or the like as compared with the electric chuck, and as a result, damage to the first power feeding terminal or other members is suppressed as compared with the conventional electrostatic chuck. can do.

(2) In the holding device, the first feeding terminal has a fourth surface facing the third feeding terminal, and the first feeding terminal projects from the fourth surface in the first direction. A second convex portion having a convex portion, the second feeding terminal has a fifth surface facing the third feeding terminal, and protrudes from the fifth surface in the first direction. At the end of the third power feeding terminal on the side of the first power feeding terminal, a first recess recessed in the first direction is formed, and the first recess is formed with the first recess. At least a part of the convex portion of 1 is inserted, and a second concave portion recessed in the first direction is formed at an end portion of the third power supply terminal on the side of the second power supply terminal. At least a part of the second convex portion is inserted into the second concave portion, and the first spring forms at least a part of at least one of the first convex portion and the first concave portion. The second spring may be configured to form at least a part of at least one of the second convex portion and the second concave portion. In this holding device, it is possible to more effectively suppress the application of force to the first power supply terminal or the like, and as a result, more effectively damage to the first power supply terminal or other members. Can be suppressed.

(3) In the holding device, each of the fourth surface and the fifth surface includes the third power feeding terminal in the first directional view, and the depth of the first recess is increased. The configuration may be such that the height of the first convex portion is larger than the height of the first convex portion and the depth of the second concave portion is larger than the height of the second convex portion. In this holding device, the first power feeding terminal is positioned at a position where the first convex portion does not come into contact with the bottom surface of the first concave portion (positioning in the first direction; the same applies hereinafter). The power feeding terminal 2 is positioned at a position where the second convex portion does not contact the bottom surface of the second concave portion. Therefore, in the present holding device, the first convex portion contacts (or collides with) the bottom surface of the first concave portion, or the second convex portion contacts (or collides with) the bottom surface of the second concave portion. ), It is possible to prevent the first convex portion and the second convex portion from being damaged.

(4) The holding device may be configured to be arranged on at least one of the first member and the second member and provided with a temperature adjusting means for heating or cooling. Therefore, in the present holding device, by heating or cooling by the temperature adjusting means, the second member becomes the second member due to the difference in thermal expansion between the first member and the second member. There is a high possibility that it will be displaced relative to the first member. Therefore, it is particularly effective to apply the present invention in such a configuration.

The technique disclosed in the present specification can be realized in various forms, for example, in the form of a holding device and a method for manufacturing the same.

It is a perspective view which shows schematic appearance structure of the electrostatic chuck 100 in this embodiment. It is explanatory drawing which shows typically the XZ cross-sectional structure of the electrostatic chuck 100 in this embodiment. It is explanatory drawing which enlarges and shows the XZ cross-sectional structure of the structure (Px part of FIG. 2) for power feeding to a chuck electrode 40 and a heater electrode 50 in this embodiment.

A. This embodiment:
A-1. Configuration of electrostatic chuck 100:
FIG. 1 is a perspective view schematically showing an external configuration of the electrostatic chuck 100 in the present embodiment, and FIG. 2 is an explanatory view schematically showing an XZ cross-sectional configuration of the electrostatic chuck 100 in the present embodiment. FIG. 3 is an enlarged explanatory view showing the XZ cross-sectional configuration of the configuration for supplying power to the chuck electrode 40 and the heater electrode 50 (Px portion in FIG. 2) in the present embodiment. Each figure shows XYZ axes that are orthogonal to each other to identify the direction. In the present specification, for convenience, the Z-axis positive direction is referred to as an upward direction, and the Z-axis negative direction is referred to as a downward direction, but the electrostatic chuck 100 is actually installed in a direction different from such a direction. May be done.

The electrostatic chuck 100 is a device that attracts and holds an object (for example, a semiconductor wafer W; hereinafter, simply referred to as “wafer W”) by electrostatic attraction. For example, the wafer W is held in a vacuum chamber of a semiconductor manufacturing apparatus. Used to fix. The electrostatic chuck 100 includes a plate-shaped member 10 and a base member 20 arranged side by side in a predetermined arrangement direction (in the present embodiment, the vertical direction (Z-axis direction)). The electrostatic chuck 100 corresponds to a holding device in the claims, the Z-axis direction corresponds to the first direction in the claims, and the plate-shaped member 10 corresponds to the first direction in the claims. Corresponds to the member of.

The plate-shaped member 10 has a substantially circular planar upper surface (hereinafter referred to as “adsorption surface”) S1 and a lower surface (surface opposite to the adsorption surface S1) S2 substantially orthogonal to the above-mentioned arrangement direction (Z-axis direction). It is a member to have, and is formed of, for example, ceramics (for example, alumina, aluminum nitride, etc.). The diameter of the plate-shaped member 10 is, for example, about 50 mm to 500 mm (usually about 200 mm to 350 mm), and the thickness of the plate-shaped member 10 is, for example, about 1 mm to 10 mm. The lower surface S2 of the plate-shaped member 10 corresponds to the first surface in the claims.

As shown in FIG. 2, a chuck electrode 40 formed of a conductive material (for example, tungsten, molybdenum, platinum, etc.) is arranged inside the plate-shaped member 10. The shape of the chuck electrode 40 in the Z-axis direction is, for example, substantially circular. When a voltage is applied to the chuck electrode 40 from a power source (not shown), an electrostatic attraction is generated, and the wafer W is attracted and fixed to the suction surface S1 of the plate-shaped member 10 by this electrostatic attraction.

Inside the plate-shaped member 10, a heater electrode 50 composed of a resistance heating element containing a conductive material (for example, tungsten, molybdenum, platinum, etc.) is arranged. When a voltage is applied to the heater electrode 50 from a power source (not shown), the heater electrode 50 generates heat to heat (heat) the plate-shaped member 10 and hold it on the suction surface S1 of the plate-shaped member 10. The wafer W is heated (heated). As a result, the temperature distribution of the wafer W can be controlled. The heater electrode 50 corresponds to the temperature adjusting means in the claims.

The base member 20 has an upper surface S3 facing the lower surface S2 of the plate-shaped member 10 and a lower surface S4 on the opposite side of the upper surface S3. The plate-shaped member 10 and the base member 20 are arranged so that the lower surface S2 of the plate-shaped member 10 and the upper surface S3 of the base member 20 face each other in the arrangement direction (Z-axis direction) with the joint portion 30 described later interposed therebetween. Will be done. The base member 20 is, for example, a plate-shaped member having the same diameter as the plate-shaped member 10 or a substantially circular flat plate having a diameter larger than that of the plate-shaped member 10, and is formed of, for example, a metal (aluminum, an aluminum alloy, or the like). Therefore, the coefficient of thermal expansion of the base member 20 is different from the coefficient of thermal expansion of the plate-shaped member 10. More specifically, in the present embodiment, the coefficient of thermal expansion of the base member 20 is larger than the coefficient of thermal expansion of the plate-shaped member 10. The diameter of the base member 20 is, for example, about 220 mm to 550 mm (usually 220 mm to 350 mm), and the thickness of the base member 20 is, for example, about 20 mm to 40 mm. The upper surface S3 of the base member 20 corresponds to the second surface in the claims, and the lower surface S4 of the base member 20 corresponds to the third surface in the claims.

The base member 20 is joined to the plate-shaped member 10 by a joint portion 30 arranged between the lower surface S2 of the plate-shaped member 10 and the upper surface S3 of the base member 20. The thickness of the joint portion 30 is, for example, about 0.1 mm to 1.5 mm. The joint portion 30 is formed of, for example, a resin material (adhesive material). As the resin material forming the joint portion 30, various resin materials such as silicone resin, fluororesin, acrylic resin, and epoxy resin can be used.

A refrigerant flow path 21 is formed inside the base member 20. When a refrigerant (for example, a fluorine-based inert liquid, water, etc.) is flowed through the refrigerant flow path 21, the base member 20 is cooled, and heat is transferred between the base member 20 and the plate-shaped member 10 via the joint portion 30. The plate-shaped member 10 is cooled by (heat transfer), and the wafer W held on the suction surface S1 of the plate-shaped member 10 is cooled. As a result, the temperature distribution of the wafer W can be controlled. The refrigerant flow path 21 corresponds to the temperature adjusting means in the claims.

A-2. Configuration for feeding power to the chuck electrode 40 and the heater electrode 50:
Next, the configuration for supplying power to the chuck electrode 40 and the heater electrode 50 will be described with reference to FIGS. 2 and 3. The electrostatic chuck 100 has a configuration for supplying power to the heater electrode 50. That is, as shown in FIG. 3, the electrostatic chuck 100 is formed with a hole 150 for a terminal for a heater electrode extending from the lower surface S4 of the base member 20 to the inside of the plate-shaped member 10. The heater electrode terminal hole 150 includes a through hole 25 that penetrates the base member 20 in the vertical direction, a through hole 35 that penetrates the joint portion 30 in the vertical direction, and a recess formed on the lower surface S2 side of the plate-shaped member 10. Reference numeral 15 denotes an integral hole formed by communicating with each other. In the present embodiment, the through holes 25 and 35 constituting the heater electrode terminal hole 150 are holes having a substantially circular cross section (cross section parallel to the direction orthogonal to the Z-axis direction).

A heater electrode feeding pad 52 electrically connected to the heater electrode 50 via the heater electrode via 51 is arranged on the bottom surface of the recess 15 forming the heater electrode terminal hole 150 in the plate-shaped member 10. There is. Therefore, the power supply pad 52 for the heater electrode is arranged on the lower surface S2 side of the plate-shaped member 10. The power feeding pad 52 for the heater electrode and the via 51 for the heater electrode are formed of a conductive material (for example, tungsten, molybdenum, platinum, etc.). The entire thickness direction (Z-axis direction) of the heater electrode feeding pad 52 is exposed from the plate-shaped member 10. However, as long as the lower surface of the heater electrode feeding pad 52 is exposed from the plate-shaped member 10, a part or the whole of the heater electrode feeding pad 52 in the thickness direction may be embedded in the plate-shaped member 10. ..

In the heater electrode terminal hole 150 of the base member 20, a heater electrode insulating tube (insulator) 22 formed of an insulating material (for example, a resin such as polyetherimide) is arranged. The coefficient of thermal expansion of the insulating tube 22 for the heater electrode is different from the coefficient of thermal expansion of the plate-shaped member 10. More specifically, in the present embodiment, the coefficient of thermal expansion of the heater electrode insulating tube 22 is larger than the coefficient of thermal expansion of the plate-shaped member 10. Hereinafter, the complex composed of the base member 20 and the insulating tube 22 for the heater electrode is referred to as “base complex 200”. Further, the "upper surface S3 of the base member 20" may be referred to as the "upper surface S3 of the base complex 200", and the "lower surface S4 of the base member 20" may be referred to as the "lower surface S4 of the base complex 200". Here, as described above, both the coefficient of thermal expansion of the base member 20 and the coefficient of thermal expansion of the insulating tube 22 for the heater electrode are larger than the coefficient of thermal expansion of the plate-shaped member 10. Therefore, the coefficient of thermal expansion of the base complex 200 is different from the coefficient of thermal expansion of the plate-shaped member 10.

The heater electrode insulating tube 22 has an internal space extending from the upper surface S3 of the base member 20 (more accurately, slightly above the upper surface S3) to the lower surface S4 (hereinafter referred to as “through hole of the base complex 200”). .) A tubular member having 22a. In other words, the through hole 22a of the base complex 200 penetrates from the upper surface S3 to the lower surface S4 of the base complex 200. In the present embodiment, the shape of the through hole 22a of the base complex 200 in the Z-axis direction is substantially circular (excluding the wide portion 22b described later). The presence of the heater electrode insulating tube 22 prevents a short circuit between the power supply terminal 44 for the heater electrode and the base member 20, which will be described later. In this embodiment, the base complex 200 corresponds to the second member in the claims.

The heater electrode insulating tube 22 has a width in a direction substantially orthogonal to the Z-axis direction (X-axis direction in the XZ cross section of FIG. 3) wider than the width of the other portion (hereinafter, referred to as “wide portion”) 22b. have. The wide portion 22b of the heater electrode insulating tube 22 is located on the lower surface S4 side of the base member 20 of the heater electrode insulating tube 22. The wide portion 22b of the heater electrode insulating tube 22 is formed in a part of the heater electrode insulating tube 22 in the circumferential direction around the Z axis. The wall surface 20a defining the heater electrode terminal hole 150 of the base member 20 is recessed in a direction substantially orthogonal to the Z-axis direction (X-axis direction in the XZ cross section of FIG. 3) (hereinafter, referred to as “base member recess”). .) 20b is formed over the entire circumference in the circumferential direction around the Z axis. By arranging the wide portion 22b of the heater electrode insulating tube 22 in the base member recess 20b, the heater electrode insulating tube 22 is positioned in the Z-axis direction. In addition, in the cross section parallel to the Z-axis direction and different from the XZ cross section of FIG. 3, the internal space larger than the width of the wide portion 22b of the heater electrode insulating tube 22 is the base member in the Z-axis direction. It is formed from the lower surface S4 of 20 to the upper end of the base member recess 20b. The internal space communicates with the base member recess 20b. When assembling the heater electrode insulating tube 22 to the base member 20, first, the wide portion 22b of the heater electrode insulating tube 22 is inserted into the base member recess 20b from the lower surface S4 side of the base member 20 to form the wide portion 22b. By arranging it at the position of the base member recess 20b in the Z-axis direction and then rotating the heater electrode insulating tube 22 around the Z axis, the wide portion 22b of the heater electrode insulating tube 22 is formed into the base member recess 20b. Place in. Further, an adhesive (not shown) is arranged between the recess 20b of the base member and the wide portion 22b of the insulating tube 22 for the heater electrode, and the adhesive is used in a direction substantially orthogonal to the Z-axis direction. The misalignment of the insulating tube 22 for the heater electrode and the misalignment of the insulating tube 22 for the heater electrode in the rotation direction about the Z axis are prevented. As the adhesive, for example, an epoxy adhesive having corrosion resistance can be used.

A power supply terminal 44 for the heater electrode is arranged inside the through hole 22a (internal space of the insulating tube 22 for the heater electrode) of the base complex 200. The power supply terminal 44 for the heater electrode includes an upper power supply terminal 441 for the heater electrode (hereinafter, also simply referred to as “upper power supply terminal 441”) and a lower power supply terminal 442 for the heater electrode (hereinafter, simply “lower power supply terminal 441”). It is also composed of a "terminal 442") and a central power supply terminal 443 for the heater electrode (hereinafter, also simply referred to as "central power supply terminal 443"). The upper power supply terminal 441, the lower power supply terminal 442, and the central power supply terminal 443 are all conductive power supply terminals. In the present embodiment, the contour line of the cross section of each heater electrode feeding terminal (upper feeding terminal 441, lower feeding terminal 442, central feeding terminal 443) substantially orthogonal to the Z-axis direction is substantially circular. The upper power supply terminal 441 for the heater electrode corresponds to the first power supply terminal in the claims, and the lower power supply terminal 442 for the heater electrode corresponds to the second power supply terminal in the claims. The central power supply terminal 443 for the heater electrode corresponds to the third power supply terminal in the claims.

The upper end of the upper power supply terminal 441 faces the heater electrode power supply pad 52 via a gap, and the upper power supply terminal 441 is joined to the heater electrode power supply pad 52 by the heater electrode brazing portion 78. The lower power supply terminal 442 is arranged on the lower surface S4 side of the base member 20. The central power supply terminal 443 is arranged between the upper power supply terminal 441 and the lower power supply terminal 442.

The upper power feeding terminal 441 has a conductive spring (in the present embodiment, a leaf spring; hereinafter referred to as "upper spring for heater electrode") 441a at its lower end. In the present embodiment, the upper spring 441a for the heater electrode is formed as a member integrated with the other portion of the upper power feeding terminal 441. The upper spring 441a for the heater electrode is in contact with the central feeding terminal 443. Therefore, electrical conduction between the upper power supply terminal 441 and the central power supply terminal 443 via the upper spring 441a for the heater electrode is possible. The upper spring 441a for the heater electrode corresponds to the first spring in the claims.

The lower power feeding terminal 442 has a conductive spring (in the present embodiment, a leaf spring; hereinafter referred to as a "lower spring for a heater electrode") 442a at its upper end. In the present embodiment, the lower spring 442a for the heater electrode is formed as an integral member with the other portion of the lower power feeding terminal 442. The lower spring 442a for the heater electrode is in contact with the central feeding terminal 443. Therefore, electrical conduction between the lower power supply terminal 442 and the central power supply terminal 443 via the lower spring 442a for the heater electrode is possible. The lower spring 442a for the heater electrode corresponds to the second spring in the claims.

The lower power supply terminal 442 has a portion (hereinafter, referred to as “wide portion”) 442b having a width substantially orthogonal to the Z-axis direction (X-axis direction in the XZ cross section of FIG. 3) wider than the width of the other portion. Have. The wide portion 442b of the lower power feeding terminal 442 is located on the lower surface S4 side of the base member 20 of the lower power feeding terminal 442. The wide portion 442b of the lower power feeding terminal 442 is formed in a part of the lower power feeding terminal 442 in the circumferential direction around the Z axis. The wall surface 22c of the heater electrode insulating tube 22 that defines the through hole 22a (internal space of the heater electrode insulating tube 22) of the base composite 200 is oriented substantially orthogonal to the Z-axis direction (X in the XZ cross section of FIG. 3). A recess (hereinafter, referred to as “heater electrode insulating tube recess”) 22d recessed in the axial direction) is formed over the entire circumference in the circumferential direction around the Z axis. By arranging the wide portion 442b of the lower power supply terminal 442 in the recess 22d of the insulating pipe for the heater electrode, the lower power supply terminal 442 is positioned in the Z-axis direction. In addition, in the cross section parallel to the Z-axis direction and different from the XZ cross section of FIG. 3, the internal space larger than the width of the wide portion 442b of the lower power feeding terminal 442 is the base member 20 in the Z-axis direction. It is formed from the lower surface S4 of the above to the upper end of the insulating tube recess 22d for the heater electrode. The internal space communicates with the heater electrode insulating tube recess 22d. When assembling the lower power supply terminal 442 to the heater electrode insulating tube 22, first, the wide portion 442b of the lower power supply terminal 442 is inserted into the heater electrode insulating tube recess 22d from the lower surface S4 side of the base member 20. The wide portion 442b is arranged at the position of the insulating pipe recess 22d for the heater electrode in the Z-axis direction, and then the lower power supply terminal 442 is rotated about the Z-axis to cause the wide portion 442b of the lower power supply terminal 442 b. Is arranged in the recess 22d of the insulating pipe for the heater electrode. Further, an adhesive (not shown) is arranged between the recess 22d of the insulating tube for the heater electrode and the wide portion 442b of the lower power supply terminal 442, and the adhesive is substantially orthogonal to the Z-axis direction. The misalignment of the lower power supply terminal 442 in the direction and the misalignment of the lower power supply terminal 442 in the rotation direction about the Z axis are prevented. As the adhesive, for example, an epoxy adhesive having corrosion resistance can be used.

The configuration for feeding the heater electrode 50 is as described above (detailed configurations of the upper feeding terminal 441, the lower feeding terminal 442, and the central feeding terminal 443 will be described later). When the electrostatic chuck 100 is used, the heater electrode 50 is connected from a power source (not shown) via a lower power supply terminal 442, a central power supply terminal 443, an upper power supply terminal 441, a heater electrode power supply pad 52, and a heater electrode via 51. Electric power is supplied to the heater electrode 50 by applying a voltage to the heater electrode 50 through the conduction path leading to. As a result, the heater electrode 50 generates heat.

The configuration for supplying power to the chuck electrode 40 is the same as the configuration for supplying power to the heater electrode 50. Therefore, basically, in the configuration for supplying power to the heater electrode 50, the "heater electrode 50" is read as the "chuck electrode 40", and the "heater electrode terminal hole 150" is replaced with the "chuck electrode terminal". "Through hole 140" is read, "through hole 25" is read as "through hole 24", "through hole 35" is read as "through hole 34", "recess 15" is read as "recess 14", and "heater electrode". "Beer 51" should be read as "Beer 41 for chuck electrode", "Feeding pad 52 for heater electrode" should be read as "Electrode pad 42 for chuck electrode", and "Blade portion 78 for heater electrode" should be read as "Raw for chuck electrode". "Attachment" (not shown) is read, "base member recess 20b" is read as "base member recess 20c", "heater electrode insulating tube 22" is read as "chuck electrode insulating tube 23", and "base composite". The "through hole 22a" of the body 200 is read as "through hole 23a of the base composite 200", the "wide portion 22b" is read as "wide portion 22e", and the "heater electrode insulating tube recess 22d" is read as "heater electrode insulation". Replaced with "tube recess 22f", replaced "feeding terminal 44 for heater electrode" with "feeding terminal 54 for chuck electrode", and replaced "upper feeding terminal 441 for heater electrode" with "upper feeding terminal 541 for chuck electrode". "Lower power supply terminal 442 for heater electrode" is read as "Lower power supply terminal 542 for chuck electrode", and "Central power supply terminal 443 for heater electrode" is read as "Central power supply terminal 543 for chuck electrode". , "Upper spring 441a for heater electrode" may be read as "Upper spring 541a for chuck electrode", and "Lower spring 442a for heater electrode" may be read as "Lower spring 542a for chuck electrode". The upper power supply terminal 541 for the chuck electrode corresponds to the first power supply terminal in the claims, and the lower power supply terminal 542 for the chuck electrode corresponds to the second power supply terminal in the claims. The central power supply terminal 543 for the chuck electrode corresponds to the third power supply terminal in the claims, and the upper spring 541a for the chuck electrode corresponds to the first spring in the claims, and the lower spring for the chuck electrode. The side spring 542a corresponds to the second spring in the claims.

When using the electrostatic chuck 100, from the power supply (not shown), the lower power supply terminal 542 for the chuck electrode, the central power supply terminal 543 for the chuck electrode, the upper power supply terminal 541 for the chuck electrode, and the electrode pad 42 for the chuck electrode. A voltage is applied to the chuck electrode 40 via the conduction path leading to the chuck electrode 40 via the chuck electrode via 41. As a result, an electrostatic attractive force for sucking and fixing the wafer W to the suction surface S1 is generated.

Hereinafter, the upper power supply terminal 441 for the heater electrode and the upper power supply terminal 541 for the chuck electrode may be collectively referred to as "upper power supply terminal 441, 541", and the lower power supply terminal 442 for the heater electrode and the chuck electrode are used. The lower power supply terminal 542 may be collectively referred to as "lower power supply terminal 442, 542", and the central power supply terminal 443 for the heater electrode and the central power supply terminal 543 for the chuck electrode are collectively referred to as "central power supply terminal 443". 543 ".

A-3. Detailed configuration of the upper power supply terminal 441, 541, the lower power supply terminal 442, 542, and the central power supply terminal 443, 543:
Next, the detailed configuration of the upper power feeding terminal 441, 541, the lower power feeding terminal 442, 542, and the central power feeding terminal 443, 543 will be described with reference to FIG.

The upper power supply terminal 441 (upper power supply terminal 441 for the heater electrode) has a substantially flat plate portion 441c having a lower surface 441b facing the central power supply terminal 443 (central power supply terminal 443 for the heater electrode) and a lower surface 441b of the substantially flat plate portion 441c. It has a first convex portion 441d that protrudes downward (one of the Z-axis directions) from substantially the center of the above. The lower power supply terminal 442 (lower power supply terminal 442 for the heater electrode) has a portion 442d having an upper surface 442c facing the central power supply terminal 443 and an upward direction (the other in the Z-axis direction) from the upper surface 442c of the portion 442d. It has a protruding second convex portion 442e. The lower surface 441b of the upper power supply terminal 441 and the upper surface 442c of the lower power supply terminal 442 each include the central power supply terminal 443 in the vertical direction (Z-axis direction). The lower surface 441b of the upper power supply terminal 441 corresponds to the fourth surface in the claims, and the upper surface 442c of the lower power supply terminal 442 corresponds to the fifth surface in the claims.

At the end of the central power supply terminal 443 on the side of the upper power supply terminal 441, a first recess 443a that is recessed in the downward direction (one in the Z-axis direction) is formed. The depth d1 of the first concave portion 443a is larger than the height h1 of the first convex portion 441d of the upper power feeding terminal 441. Therefore, the upper power feeding terminal 441 is positioned (positioning in the Z-axis direction) at a position where the first convex portion 441d does not contact the bottom surface of the first concave portion 443a.

A part of the first convex portion 441d of the upper power feeding terminal 441 is inserted into the first concave portion 443a. Further, the above-mentioned upper spring 441a for a heater electrode (in this embodiment, a leaf spring) is formed by the tip of the part of the first convex portion 441d inserted into the first concave portion 443a.

A second recess 443b that is recessed in the upward direction (the other in the Z-axis direction) is formed at the end of the central power supply terminal 443 on the side of the lower power supply terminal 442. The depth d2 of the second concave portion 443b is larger than the height h2 of the second convex portion 442e of the lower power feeding terminal 442. Therefore, the lower power feeding terminal 442 is positioned (positioning in the Z-axis direction) at a position where the second convex portion 442e does not contact the bottom surface of the second concave portion 443b.

A part of the second convex portion 442e of the lower power feeding terminal 442 is inserted into the second concave portion 443b. Further, the lower spring 442a for the heater electrode (leaf spring in the present embodiment) described above is formed by the tip of the part of the second convex portion 442e inserted into the second concave portion 443b.

The diameter of the central power supply terminal 443 in the direction substantially orthogonal to the vertical direction (Z-axis direction) is smaller than the diameter of the through hole 22a (internal space of the heater electrode insulating tube 22) of the base composite 200. Therefore, a gap G1 is formed between the base composite 200 and the wall surface 22c of the heater electrode insulating tube 22 that defines the through hole 22a. Therefore, the central power feeding terminal 443 can move in a direction substantially orthogonal to the Z-axis direction (for example, the X-axis direction in the XZ cross section of FIG. 3).

The detailed configuration of the upper power supply terminal 441 for the heater electrode, the lower power supply terminal 442 for the heater electrode, and the central power supply terminal 443 for the heater electrode is as described above. The detailed configuration of the upper power supply terminal 541 for the chuck electrode, the lower power supply terminal 542 for the chuck electrode, and the central power supply terminal 543 for the chuck electrode also includes the upper power supply terminal 441 for the heater electrode and the lower side for the heater electrode. The detailed configuration is the same as that of the power supply terminal 442 and the central power supply terminal 443 for the heater electrode. Therefore, basically, in the detailed configuration of the upper power supply terminal 441 for the heater electrode, the lower power supply terminal 442 for the heater electrode, and the central power supply terminal 443 for the heater electrode, "the upper power supply terminal for the heater electrode" is basically used. "441" is read as "upper power supply terminal 541 for chuck electrode", "lower power supply terminal 442 for heater electrode" is read as "lower power supply terminal 542 for chuck electrode", and "central power supply terminal for heater electrode" is read. "443" is read as "central feeding terminal 543 for chuck electrode", "bottom surface 441b" is read as "bottom surface 541b", "substantially flat plate portion 441c" is read as "substantially flat plate portion 541c", and "first convex portion". "441d" is read as "third convex portion 541d", "upper surface 442c" is read as "upper surface 542c", "part 442d" is read as "part 542d", and "second convex portion 442e" is read as "fourth". "Convex portion 542e" is read, "first concave portion 443a" is read as "third concave portion 543a", "second concave portion 443b" is read as "fourth concave portion 543b", and "wall surface 22c" is read as "wall surface 22c". It may be read as "wall surface 23c" and "gap G1" as "gap G2". The third convex portion 541d corresponds to the first convex portion in the claims, the fourth convex portion 542e corresponds to the second convex portion in the claims, and the third concave portion. 543a corresponds to the first recess in the claims, the upper spring 541a for the chuck electrode corresponds to the first spring in the claims, and the fourth recess 543b corresponds to the first recess in the claims. Corresponds to the recess of 2.

A-4. Effect of this embodiment:
As described above, the electrostatic chuck 100 of the present embodiment includes a plate-shaped member 10, a base complex 200 joined to the plate-shaped member 10, a power supply pad 52 for a heater electrode, and an upper power supply terminal 441 (heater). It includes an upper power supply terminal 441) for the electrode, a lower power supply terminal 442 (lower power supply terminal 442 for the heater electrode), and a central power supply terminal 443 (central power supply terminal 443 for the heater electrode). The plate-shaped member 10 has a lower surface S2 that is substantially orthogonal to the Z-axis direction. The base complex 200 has an upper surface S3 facing the lower surface S2 of the plate-shaped member 10 and a lower surface S4 on the opposite side of the upper surface S3. The coefficient of thermal expansion of the base complex 200 is different from the coefficient of thermal expansion of the plate-shaped member 10. The base complex 200 is formed with a through hole 22a penetrating from the upper surface S3 to the lower surface S4. The power supply pad 52 for the heater electrode is arranged on the lower surface S2 side of the plate-shaped member 10. The upper power feeding terminal 441 is joined to the power feeding pad 52 for the heater electrode and is located inside the through hole 22a of the base complex 200. The lower power feeding terminal 442 is arranged on the side of the lower surface S4 of the base complex 200, and is located inside the through hole 22a of the base complex 200. The central power supply terminal 443 is arranged between the upper power supply terminal 441 and the lower power supply terminal 442 inside the through hole 22a of the base complex 200. The upper power supply terminal 441 can electrically conduct electricity between the upper power supply terminal 441 and the central power supply terminal 443, and expands and contracts in a direction substantially orthogonal to the Z-axis direction (for example, in the X-axis direction in the XZ cross section of FIG. 3). It has an upper spring 441a for a heater electrode. The lower power supply terminal 442 is capable of electrically conducting electrical conduction between the lower power supply terminal 442 and the central power supply terminal 443, and is in a direction substantially orthogonal to the Z-axis direction (for example, the X-axis direction in the XZ cross section of FIG. 3). It has a lower spring 442a for a heater electrode that expands and contracts. The central power feeding terminal 443 is arranged so that a gap G1 is formed between the central feeding terminal 443 and the wall surface 22c defining the through hole 22a of the base complex 200, and is arranged substantially orthogonal to the Z-axis direction (for example, the XZ cross section of FIG. 3). Is provided so that it can be moved in the X-axis direction).

In the conventional electrostatic chuck (Patent Document 1 above), since the coefficient of thermal expansion differs between the plate-shaped member and the base member, the base member is caused by the difference in thermal expansion between the plate-shaped member and the base member. May be displaced relative to the plate-like member. As a result, a force is applied to the upper power supply terminal or the like, and for example, a crack may occur at the joint portion between the upper power supply terminal and the power supply pad, and the upper power supply terminal or other members may be damaged. The conventional electrostatic chuck includes a first spring and a second spring that expand and contract in a direction substantially orthogonal to the vertical direction (Z-axis direction), so that the upper power feeding terminal is caused by the relative displacement of the base member. It is possible to suppress the application of force to the like to some extent. However, since the central feeding terminal is fixed to the base member by a screw (that is, it is impossible to move in a direction substantially orthogonal to the Z-axis direction like the electrostatic chuck 100 of the present embodiment). , It is not possible to sufficiently suppress the application of force to the upper power feeding terminal or the like due to the displacement of the base member.

On the other hand, in the electrostatic chuck 100 of the present embodiment, as described above, the central power feeding terminal 443 has a gap G1 between the central feeding terminal 443 and the wall surface 22c of the insulating tube 22 for the heater electrode that defines the through hole 22a of the base composite 200. Are arranged so as to be formed, and are provided so as to be movable in a direction substantially orthogonal to the Z-axis direction. Therefore, when the base complex 200 is displaced relative to the plate-shaped member 10 due to the difference in thermal expansion between the plate-shaped member 10 and the base composite 200, the conventional electrostatic chuck is more than the above-mentioned conventional electrostatic chuck. It is possible to suppress the application of force to the upper power feeding terminal 441 and the like, and as a result, it is possible to suppress damage to the upper power feeding terminal 441 and other members as compared with the conventional electrostatic chuck. From the viewpoint of this effect, a direction substantially orthogonal to the Z-axis direction of the gap G1 between the central power feeding terminal 443 and the wall surface 22c defining the through hole 22a of the base complex 200 (for example, the XZ cross section of FIG. 3). The width in the X-axis direction) is preferably 0.1 mm or more (more preferably 0.3 mm or more, more preferably 0.5 mm or more). Further, from the viewpoint of electrical connectivity between the central power supply terminal 443 and the upper power supply terminal 441 and the lower power supply terminal 442, the Z axis of the gap G1 between the wall surface 22c defining the through hole 22a of the base complex 200 The width in the direction substantially orthogonal to the direction (for example, the X-axis direction in the XZ cross section of FIG. 3) is preferably 2 mm or less (more preferably 1 mm or more, more preferably 0.5 mm or less).

The gap (gap between the wall surface 22c of the insulating tube 22 for the heater electrode defining the through hole 22a of the base composite 200) G is temporarily eliminated during or after the use of the electrostatic chuck 100. In some cases, if the gap G1 is present at least before the use of the electrostatic chuck 100, it is possible to suppress the application of force to the upper power feeding terminal 441 or the like as described above, and as a result, the conventional static electricity is suppressed. Damage to the upper power supply terminal 441 and other members can be suppressed more than the electric chuck.

Further, in the electrostatic chuck 100 of the present embodiment, the upper power feeding terminal 441 has a lower surface 441b facing the central power feeding terminal 443, and has a first convex portion 441d protruding from the lower surface 441b in the Z-axis direction. There is. The lower power supply terminal 442 has an upper surface 442c facing the central power supply terminal 443, and has a second convex portion 442e protruding from the upper surface 442c in the Z-axis direction. A first recess 443a recessed in the Z-axis direction is formed at the end of the central power supply terminal 443 on the side of the upper power supply terminal 441. A part of the first convex portion 441d is inserted into the first concave portion 443a. A second recess 443b recessed in the Z-axis direction is formed at the end of the lower feed terminal 442 of the central power supply terminal 443. A part of the second convex portion 442e is inserted into the second concave portion 443b. The upper spring 441a for the heater electrode forms a part of the first convex portion 441d. The lower spring 442a for the heater electrode forms a part of the second convex portion 442e. Therefore, in the electrostatic chuck 100 of the present embodiment, it is possible to more effectively suppress the application of force to the upper power feeding terminal 441 and the like, and as a result, more effectively the upper power feeding terminal 441 and other power feeding terminals 441 and the like. Damage to members can be suppressed.

Further, in the electrostatic chuck 100 of the present embodiment, the lower surface 441b of the upper power supply terminal 441 and the upper surface 442c of the lower power supply terminal 442 each include the central power supply terminal 443 in the Z-axis direction. The depth d1 of the first concave portion 443a of the central feeding terminal 443 is larger than the height h1 of the first convex portion 441d of the upper feeding terminal 441. The depth d2 of the second concave portion 443b of the central feeding terminal 443 is larger than the height h2 of the second convex portion 442e of the lower feeding terminal 442. Therefore, in the electrostatic chuck 100 of the present embodiment, the upper power feeding terminal 441 is positioned at a position where the first convex portion 441d does not contact the bottom surface of the first concave portion 443a (positioning in the Z-axis direction; the same applies hereinafter). The lower power feeding terminal 442 is positioned at a position where the second convex portion 442e does not come into contact with the bottom surface of the second concave portion 443b. Therefore, in the electrostatic chuck 100 of the present embodiment, the first convex portion 441d comes into contact with (or collides with) the bottom surface of the first concave portion 443a, or the second convex portion 442e is the bottom surface of the second concave portion 443b. The first convex portion 441d and the second convex portion 442e are prevented from being damaged by contacting (or colliding with) the first convex portion 441d.

Further, the electrostatic chuck 100 of the present embodiment includes a heater electrode 50 arranged on the plate-shaped member 10 for heating and a refrigerant flow path 21 arranged on the base complex 200 for cooling. Therefore, in the electrostatic chuck 100 of the present embodiment, the difference in thermal expansion between the plate-shaped member 10 and the base composite 200 is caused by heating by the heater electrode 50 or cooling by the refrigerant flow path 21. There is a high possibility that the base composite 200 will be displaced relative to the plate-shaped member 10. Therefore, it is particularly effective to apply the present invention in such a configuration.

As described above, the detailed configurations of the upper power supply terminal 541 for the chuck electrode, the lower power supply terminal 542 for the chuck electrode, and the central power supply terminal 543 for the chuck electrode are also the upper power supply terminal 441 for the heater electrode and the heater electrode. This is the same as the detailed configuration of the lower power supply terminal 442 for the heater electrode and the central power supply terminal 443 for the heater electrode. Therefore, the upper power supply terminal 541 for the chuck electrode, the lower power supply terminal 542 for the chuck electrode, and the central power supply terminal 543 for the chuck electrode are also the upper power supply terminal 441 for the heater electrode and the lower power supply terminal for the heater electrode. It has the same effect as the above-mentioned effect in the 442 and the central feeding terminal 443 for the heater electrode.

B. Modification example:
The technique disclosed in the present specification is not limited to the above-described embodiment, and can be transformed into various forms without departing from the gist thereof, and for example, the following modifications are also possible.

In the above embodiment, the upper spring 441a for the heater electrode may be formed of a member separate from the upper power feeding terminal 441 for the heater electrode. The lower spring 442a for the heater electrode may be formed of a member separate from the lower power feeding terminal 442 for the heater electrode. The upper spring 541a for the chuck electrode may be formed of a member separate from the upper power feeding terminal 541 for the chuck electrode. The lower spring 542a for the chuck electrode may be formed of a member separate from the lower power feeding terminal 542 for the chuck electrode.

In the above embodiment (or the above modification; the same applies hereinafter), the upper spring 441a for the heater electrode and / or the lower spring 442a for the heater electrode is a part of the central feeding terminal 443 for the heater electrode (for example, the first one). It may be formed by the recess 443a, the second recess 443b) or the whole. The upper spring 541a for the chuck electrode and / or the lower spring 542a for the chuck electrode was formed by a part (for example, a third recess 543a, a fourth recess 543b) or the whole of the central feeding terminal 543 for the chuck electrode. It may be a thing.

In the above embodiment, the upper spring 441a for the heater electrode and / or the lower spring 442a for the heater electrode is composed of a member separate from the upper power feeding terminal 441 for the heater electrode and the central feeding terminal 443. May be good. The upper spring 541a for the chuck electrode and / or the lower spring 542a for the chuck electrode may be configured by a member separate from the lower feeding terminal 542 for the chuck electrode and the central feeding terminal 443.

In the above embodiment, the upper spring 441a for the heater electrode, the lower spring 442a for the heater electrode, the upper spring 541a for the chuck electrode, and the lower spring 542a for the chuck electrode have conductivity and are substantially orthogonal to each other in the Z-axis direction. The material and shape of the spring are not particularly limited as long as the spring expands and contracts in a direction (for example, in the X-axis direction in the XZ cross section of FIG. 3). For example, the upper spring 441a for the heater electrode, the lower spring 442a for the heater electrode, the upper spring 541a for the chuck electrode, and the lower spring 542a for the chuck electrode may be springs other than leaf springs (for example, coil springs). ..

In the above embodiment, the entire upper feeding terminals 441 and 541 may be located inside the through hole 22a of the base complex 200 (in the case of the upper feeding terminal 541 for the chuck electrode, the through hole 23a). The entire side feeding terminals 442 and 542 may be located inside the through hole 22a of the base complex 200 (in the case of the lower feeding terminal 542 for the chuck electrode, the through hole 23a).

In the above embodiment, the entire first convex portion 441d of the upper feeding terminals 441 and 541 (in the case of the upper feeding terminal 541 for the chuck electrode, the third convex portion 541d) is the first concave portion 443a (for the chuck electrode). In the case of the upper power feeding terminal 541, it may be inserted into the third recess 543a). Further, in the above embodiment, the entire second convex portion 442e of the lower feeding terminal 442,542 (in the case of the upper feeding terminal 541 for the chuck electrode, the fourth convex portion 542e) is the second convex portion 442e. (In the case of the upper power feeding terminal 541 for the chuck electrode, it may be inserted into the fourth recess 543b).

In the above embodiment, the device for cooling may be provided in the plate-shaped member 10, and the device for heating may be provided in the base complex 200.

Further, each member of the electrostatic chuck 100 of the above embodiment (plate-shaped member 10, base member 20, joint portion 30, upper feeding terminal 441, 541, lower feeding terminal 442, 542, central feeding terminal 443, 543, etc.). The forming material of is only an example and can be changed in various ways. For example, in the above embodiment, the plate-shaped member 10 is made of ceramics, but the plate-shaped member 10 may be made of a material other than ceramics (for example, a resin material).

Further, in the present invention, the second power supply terminal (upper power supply terminal 441, 541 in the above embodiment), the third power supply terminal (lower power supply terminal 442,542 in the above embodiment), the first power supply terminal. (In the above embodiment, the central power supply terminal 443,543), the second power supply terminal, the third power supply terminal, and the first power supply terminal are not limited to the electrostatic chuck in which power is supplied to the heater electrode via the power supply pad and the like. A heater device such as a CVD heater or a vacuum is supplied to a specific member (including another member other than the heater electrode. For example, a chuck electrode) via a power supply terminal, a power supply pad, or the like. It can also be applied to chucks, etc.).

10: Plate-shaped member 20: Base member 21: Refrigerant flow path 22: Insulated tube for heater electrode 30: Joint 40: Chuck electrode 41: Via for chuck electrode 42: Electrode pad for chuck electrode 44: Feeding terminal for heater electrode 50: Heater electrode 51: Via for heater electrode 52: Power supply pad for heater electrode 54: Power supply terminal for chuck electrode 78: Brazing part for heater electrode 100: Electrostatic chuck 200: Base composite 441: Upper side for heater electrode Power supply terminal 441a: Upper power supply terminal for heater electrode 442: Lower power supply terminal for heater electrode 442a: Lower spring for heater electrode 443: Central power supply terminal for heater electrode 541: Upper power supply terminal for chuck electrode 541a: For chuck electrode Upper spring 542: Lower feeding terminal for chuck electrode 542a: Lower spring for chuck electrode 543: Central feeding terminal for chuck electrode W: Wafer

Claims (4)

A first member having a first surface that is substantially orthogonal to the first direction,
A second member joined to the first member, which has a second surface facing the first surface and a third surface opposite to the second surface. A second member having a through hole penetrating from the second surface to the third surface and having a coefficient of thermal expansion different from that of the first member.
A power supply pad arranged on the side of the first surface of the first member,
A first power supply terminal joined to the power supply pad and at least partially located inside the through hole,
A second power feeding terminal arranged on the side of the third surface of the second member and at least partly located inside the through hole.
In a holding device including a third power supply terminal arranged between the first power supply terminal and the second power supply terminal inside the through hole.
At least one of the first power supply terminal and the third power supply terminal is capable of electrically conducting between the first power supply terminal and the third power supply terminal, and is substantially in the first direction. It has a first spring that expands and contracts in the orthogonal direction,
At least one of the second power supply terminal and the third power supply terminal is capable of electrically conducting between the second power supply terminal and the third power supply terminal, and is substantially in the first direction. It has a second spring that expands and contracts in the orthogonal direction,
The third power feeding terminal is arranged so as to form a gap between the third power feeding terminal and the wall surface of the second member defining the through hole, and is movable in a direction substantially orthogonal to the first direction. Be prepared for,
A holding device characterized by the fact that. In the holding device according to claim 1,
The first power feeding terminal has a fourth surface facing the third power feeding terminal, and has a first convex portion protruding from the fourth surface in the first direction.
The second power feeding terminal has a fifth surface facing the third power feeding terminal, and has a second convex portion protruding from the fifth surface in the first direction.
At the end of the third power supply terminal on the side of the first power supply terminal, a first recess recessed in the first direction is formed.
At least a part of the first convex portion is inserted into the first concave portion, and the first convex portion is inserted into the first concave portion.
A second recess recessed in the first direction is formed at the end of the third power feeding terminal on the side of the second feeding terminal.
At least a part of the second convex portion is inserted into the second concave portion, and the second convex portion is inserted into the second concave portion.
The first spring forms at least a part of at least one of the first convex portion and the first concave portion.
The second spring forms at least a part of at least one of the second convex portion and the second concave portion.
A holding device characterized by the fact that. In the holding device according to claim 2,
Each of the fourth surface and the fifth surface includes the third power feeding terminal in the first directional view.
The depth of the first concave portion is larger than the height of the first convex portion,
The depth of the second concave portion is larger than the height of the second convex portion.
A holding device characterized by the fact that. In the holding device according to any one of claims 1 to 3.
A temperature adjusting means which is arranged on at least one of the first member and the second member and performs heating or cooling is provided.
A holding device characterized by the fact that.

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