JP2021062591A - Resin molding method and resin molding equipment - Google Patents

Resin molding method and resin molding equipment Download PDF

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JP2021062591A
JP2021062591A JP2019190215A JP2019190215A JP2021062591A JP 2021062591 A JP2021062591 A JP 2021062591A JP 2019190215 A JP2019190215 A JP 2019190215A JP 2019190215 A JP2019190215 A JP 2019190215A JP 2021062591 A JP2021062591 A JP 2021062591A
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cavity
mold
flow path
resin
gate
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JP6837530B1 (en
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直毅 高田
Naoki Takada
直毅 高田
義和 平野
Yoshikazu Hirano
義和 平野
秀行 坂井
Hideyuki Sakai
秀行 坂井
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Towa Corp
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Priority to CN202011103652.XA priority patent/CN112677422B/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/02Transfer moulding, i.e. transferring the required volume of moulding material by a plunger from a "shot" cavity into a mould cavity
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/56Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
    • B29C33/68Release sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C37/0067Using separating agents during or after moulding; Applying separating agents on preforms or articles, e.g. to prevent sticking to each other
    • B29C37/0075Using separating agents during or after moulding; Applying separating agents on preforms or articles, e.g. to prevent sticking to each other using release sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/14Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
    • B29C45/14639Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles for obtaining an insulating effect, e.g. for electrical components
    • B29C45/14655Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles for obtaining an insulating effect, e.g. for electrical components connected to or mounted on a carrier, e.g. lead frame
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/26Moulds
    • B29C45/27Sprue channels ; Runner channels or runner nozzles
    • B29C45/2701Details not specific to hot or cold runner channels
    • B29C45/2708Gates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/14Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
    • B29C45/14639Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles for obtaining an insulating effect, e.g. for electrical components
    • B29C45/14655Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles for obtaining an insulating effect, e.g. for electrical components connected to or mounted on a carrier, e.g. lead frame
    • B29C2045/14663Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles for obtaining an insulating effect, e.g. for electrical components connected to or mounted on a carrier, e.g. lead frame the mould cavity walls being lined with a film, e.g. release film
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/14Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
    • B29C45/14639Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles for obtaining an insulating effect, e.g. for electrical components
    • B29C45/14655Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles for obtaining an insulating effect, e.g. for electrical components connected to or mounted on a carrier, e.g. lead frame
    • B29C2045/14672Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles for obtaining an insulating effect, e.g. for electrical components connected to or mounted on a carrier, e.g. lead frame moulding with different depths of the upper and lower mould cavity
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29LINDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2017/00Carriers for sound or information
    • B29L2017/006Memory cards, chip cards

Abstract

To prevent problems such as peeling and lifting of a release film, which can occur when the release film is applied to the pin gate method of transfer resin molding, without significantly increasing the complexity of the process and configuration.SOLUTION: A resin molding method in which resin is injected through a gate GT opening at the bottom of a cavity 3 formed between a first mold 1 and a second mold 2 at the mold tightening position, a mold release film 5 having an insertion hole 5a penetrating in the thickness direction is placed on the inner surface including the bottom of the cavity 3 so that the insertion hole 5a overlaps the gate GT, and a pressure surface 61 is provided that presses some or all of the area around the insertion hole 5a in the mold release film 5 at the mold tightening position to be adhered to the cavity bottom during mold tightening, and furthermore a pressure flow member 6 is arranged to form a connecting flow path 7 between the insertion hole 5a and the cavity 3 when the mold is tightened.SELECTED DRAWING: Figure 2

Description

本発明は、キャビティの底面にゲートを設け、このゲートから樹脂を注入するピンゲート方式の樹脂成形方法及びそれに用いられる樹脂成形装置に関するものである。 The present invention relates to a pin gate type resin molding method in which a gate is provided on the bottom surface of the cavity and resin is injected from the gate, and a resin molding apparatus used therein.

トランスファー樹脂成形において、例えば特許文献1にあるように、成形品の側面ではなく表面に対応する位置、すなわち、成形型におけるキャビティの底面にゲートを設け、このゲートから樹脂を注入するピンゲート方式(あるいはピンポイントゲート方式)が提案されている。 In transfer resin molding, for example, as in Patent Document 1, a pin gate method (or a pin gate method) in which a gate is provided at a position corresponding to the surface of the molded product rather than the side surface, that is, the bottom surface of the cavity in the molding mold, and resin is injected from this gate. Pinpoint gate method) has been proposed.

ピンゲート方式の一般的な利点としては、ゲート跡が小さく目立ちにくい、多点化・多数個取りが容易、均等な圧力分布が得られやすい、などを挙げることができる。特にICチップ等の樹脂封止成形においては、ゲート残りが回路基板上に形成されないという利点も得られる。 The general advantages of the pin gate method are that the gate mark is small and inconspicuous, it is easy to increase the number of points and take a large number of pieces, and it is easy to obtain an even pressure distribution. In particular, in resin-sealed molding of IC chips and the like, there is also an advantage that the gate residue is not formed on the circuit board.

他方、該トランスファー樹脂成形において、キャビティの底面を含む内面に離型フィルムを配置し、該離型フィルムを樹脂とキャビティとの間に介在させることによって、キャビティから成形品を外れやすくして、離型の際の成形品の損傷を防止する技術が知られている。 On the other hand, in the transfer resin molding, a release film is placed on the inner surface including the bottom surface of the cavity, and the release film is interposed between the resin and the cavity to facilitate the release of the molded product from the cavity. A technique for preventing damage to a molded product during molding is known.

しかしながら、当該ピンゲート方式において、離型フィルムを用いた例は、いまだに見られない。 However, no example using a release film in the pin gate method has been found yet.

というのも、ピンゲート方式において、キャビティの内面に離型フィルムを配置すると、離型フィルムがゲートを覆ってしまうため、該離型フィルムにおけるゲートに対応する部分に孔を設ける必要が生じ、それによる不具合が発生し得るからと考えられる。 This is because, in the pin gate method, when the release film is placed on the inner surface of the cavity, the release film covers the gate, so that it is necessary to provide a hole in the portion of the release film corresponding to the gate. This is thought to be because a problem may occur.

具体的にいえば、離型フィルムは負圧吸引によってキャビティ内面に吸着しているため、前述のように離型フィルムに孔を開けると、その孔からエアーが漏れてゲート周りの離型フィルムの吸着力が弱くなる。そうすると、樹脂注入充填時の圧力によって孔の周囲における離型フィルムがキャビティ内面から剥がれ、その隙間から樹脂が入り込んで成形不良を惹起するという不具合が発生し得る。 Specifically, since the release film is adsorbed on the inner surface of the cavity by negative pressure suction, when a hole is made in the release film as described above, air leaks from the hole and the release film around the gate Adsorption power becomes weak. Then, the release film around the hole may be peeled off from the inner surface of the cavity due to the pressure at the time of resin injection and filling, and the resin may enter through the gap to cause a molding defect.

特開2019−111692号公報Japanese Unexamined Patent Publication No. 2019-111692

本発明は、かかる課題に鑑みてなされたものであって、ピンゲート方式のトランスファー樹脂成形方法に離型フィルムを適用してその双方の利点を活かしつつ、樹脂注入の際に生じ得る離型フィルムの剥離や浮き上がりといった不具合を防止できるように図ったものである。 The present invention has been made in view of the above problems, and a release film that can occur during resin injection while applying a release film to a pingate type transfer resin molding method and taking advantage of both of them. This is intended to prevent problems such as peeling and lifting.

すなわち本発明に係る樹脂成形方法は、第1型と第2型との間に形成されたキャビティの底面に開口するゲートから、該キャビティに樹脂を注入して成形する樹脂成形方法であって、
厚み方向に貫通する挿通孔を有した離型フィルムを、該挿通孔が前記ゲートに重なるように、前記キャビティの底面を含む内面に配置する一方、
前記離型フィルムにおける前記挿通孔の周囲の一部または全部を型締め時に押圧してキャビティ底面に密着させる押圧面を有し、かつ、前記挿通孔とキャビティとを連通する連通流路を型締め時に形成する押圧流路部材を配置しておき、
前記第1型と第2型とを型締めし、
前記ゲートから、前記挿通孔及び連通流路を介して前記キャビティに樹脂を注入し、硬化させることを特徴とするものである。
That is, the resin molding method according to the present invention is a resin molding method in which resin is injected into the cavity through a gate opened at the bottom surface of the cavity formed between the first mold and the second mold.
A release film having an insertion hole penetrating in the thickness direction is arranged on the inner surface including the bottom surface of the cavity so that the insertion hole overlaps the gate.
A part or all of the periphery of the insertion hole in the release film has a pressing surface that is pressed at the time of molding to bring it into close contact with the bottom surface of the cavity, and the communication flow path that communicates the insertion hole and the cavity is molded. Place the pressing flow path member that is sometimes formed,
Molding the first mold and the second mold,
It is characterized in that a resin is injected into the cavity from the gate through the insertion hole and the communication flow path and cured.

また、本発明は、第1型と第2型との間に形成されるキャビティの底面にゲートが設けられており、該ゲートから前記キャビティに樹脂を注入して成形するものであって、
前記キャビティの底面を含む内面に配置されるとともに、該配置状態における前記ゲートに重なる位置に、該ゲートから流入する樹脂を通すための挿通孔が設けられている離型フィルムと、
前記離型フィルムにおける前記挿通孔の周囲の一部または全部を押圧して、その押圧箇所をキャビティの底面に密着させる押圧面を有するとともに、前記挿通孔とキャビティとを連通する連通流路を形成する押圧流路部材とを備えている樹脂成形装置でもよい。
Further, in the present invention, a gate is provided on the bottom surface of the cavity formed between the first mold and the second mold, and resin is injected into the cavity from the gate for molding.
A release film that is arranged on the inner surface including the bottom surface of the cavity and is provided with an insertion hole for passing the resin flowing in from the gate at a position overlapping the gate in the arranged state.
It has a pressing surface that presses a part or all of the periphery of the insertion hole in the release film so that the pressed portion is brought into close contact with the bottom surface of the cavity, and forms a communication flow path that communicates the insertion hole and the cavity. It may be a resin molding apparatus provided with a pressing flow path member.

以上に述べた本発明によれば、例えばピンゲート方式のトランスファー樹脂成形法に離型フィルムを用いても、離型フィルムが剥離してキャビティ内面との隙間に溶融樹脂が侵入するといった不具合を防止できる。 According to the present invention described above, even if a release film is used in, for example, a pingate type transfer resin molding method, it is possible to prevent a problem that the release film is peeled off and the molten resin invades the gap with the inner surface of the cavity. ..

本発明の一実施形態における基板を示す平面図である。It is a top view which shows the substrate in one Embodiment of this invention. 同実施形態での型開き位置にある樹脂成形装置を示す模式的断面図である。It is a schematic cross-sectional view which shows the resin molding apparatus in the mold opening position in the same embodiment. 同実施形態での型締め位置にある樹脂成形装置を示す模式的断面図である。It is a schematic cross-sectional view which shows the resin molding apparatus at the mold clamping position in the same embodiment. 同実施形態での押圧流路部材を裏面から視た平面図及び斜視図である。It is a plan view and the perspective view which looked at the pressing flow path member in the same embodiment from the back surface. 図1における部分拡大図である。It is a partially enlarged view in FIG. 図5におけるA−A線断面図である。FIG. 5 is a cross-sectional view taken along the line AA in FIG. 同実施形態での樹脂成形装置を用いた樹脂成形方法を説明するための模式的断面図である。It is a schematic cross-sectional view for demonstrating the resin molding method using the resin molding apparatus in the same embodiment. 同実施形態での樹脂成形装置を用いた樹脂成形方法を説明するための模式的断面図である。It is a schematic cross-sectional view for demonstrating the resin molding method using the resin molding apparatus in the same embodiment. 同実施形態での樹脂成形装置を用いた樹脂成形方法を説明するための模式的断面図である。It is a schematic cross-sectional view for demonstrating the resin molding method using the resin molding apparatus in the same embodiment. 同実施形態での樹脂成形装置を用いた樹脂成形方法を説明するための模式的断面図である。It is a schematic cross-sectional view for demonstrating the resin molding method using the resin molding apparatus in the same embodiment. 同実施形態での樹脂成形装置を用いた樹脂成形方法を説明するための模式的断面図である。It is a schematic cross-sectional view for demonstrating the resin molding method using the resin molding apparatus in the same embodiment. 本発明の他の実施形態での押圧流路部材を示す斜視図である。It is a perspective view which shows the pressing flow path member in another embodiment of this invention.

以下、本発明の実施形態について説明する。なお、本発明が以下の実施形態に限定されないことは無論である。 Hereinafter, embodiments of the present invention will be described. It goes without saying that the present invention is not limited to the following embodiments.

<実施形態の概要>
本実施形態に係る樹脂成形方法は、型締め位置において前記第1型と第2型との間に形成されたキャビティの底面に開口するゲートから、該キャビティに樹脂を注入して成形する樹脂成形方法であって、
厚み方向に貫通する挿通孔を有した離型フィルムを、該挿通孔が前記ゲートに重なるように、前記キャビティの底面を含む内面に配置する一方、
前記離型フィルムにおける前記挿通孔の周囲の一部または全部を型締め時に押圧してキャビティ底面に密着させる押圧面を有し、かつ、型締め時に前記挿通孔とキャビティとを連通する連通流路を型締め時に形成する押圧流路部材を設けておき、
前記第1型と第2型とを型締めし、
前記ゲートから、前記挿通孔及び連通流路を介して前記キャビティに樹脂を注入し、硬化させることを特徴とするものである。
<Outline of Embodiment>
The resin molding method according to the present embodiment is resin molding in which resin is injected into the cavity from a gate that opens at the bottom surface of the cavity formed between the first mold and the second mold at the mold clamping position. It ’s a method,
A release film having an insertion hole penetrating in the thickness direction is arranged on the inner surface including the bottom surface of the cavity so that the insertion hole overlaps the gate.
A communication flow path that has a pressing surface that presses a part or all of the periphery of the insertion hole in the release film during mold clamping to bring it into close contact with the bottom surface of the cavity, and that communicates the insertion hole and the cavity during mold clamping. Is provided with a pressing flow path member to be formed at the time of mold clamping.
Molding the first mold and the second mold,
It is characterized in that a resin is injected into the cavity from the gate through the insertion hole and the communication flow path and cured.

このような方法であれば、型締め時に押圧流路部材が離型フィルムにおける前記挿通孔の周囲をキャビティ内面に密着させるので、離型フィルムとキャビティ内面との隙間に溶融樹脂が侵入することを防止できる。また、押圧流路部材には、ゲートをキャビティに連通させる連通流路が形成されているので、溶融樹脂のキャビティ内への注入が阻害されることもない。 In such a method, the pressing flow path member brings the periphery of the insertion hole in the release film into close contact with the inner surface of the cavity at the time of mold clamping, so that the molten resin does not enter the gap between the release film and the inner surface of the cavity. Can be prevented. Further, since the pressing flow path member is formed with a communication flow path for communicating the gate with the cavity, injection of the molten resin into the cavity is not hindered.

このようにして、ピンゲート方式のトランスファー樹脂成形法に離型フィルムを用いることが初めて可能になる。しかも離型フィルムに挿通孔を穿孔し、押圧流路部材を設けるだけなので、工程や構造の大幅な複雑化を招くこともない。 In this way, it becomes possible for the first time to use a release film in a pingate type transfer resin molding method. Moreover, since the release film is simply perforated with an insertion hole and a pressing flow path member is provided, the process and structure are not significantly complicated.

上述した効果がより顕著に奏される具体的態様としては、前記離型フィルムを前記キャビティの内面に吸着させることを挙げることができる。 As a specific embodiment in which the above-mentioned effect is more prominently exhibited, the release film may be adsorbed on the inner surface of the cavity.

比較的簡単に製造できる押圧流路部材の具体的構成としては、該押圧流路部材が、中央に貫通孔を有するとともに、該貫通孔から外側に延伸して外側周面に開口する1又は複数の流路要素とを具備し、該貫通孔と流路要素とによって前記連通流路が形成されるものを挙げることができる。 As a specific configuration of the pressing flow path member that can be manufactured relatively easily, one or a plurality of the pressing flow path member having a through hole in the center and extending outward from the through hole to open to the outer peripheral surface. The communication flow path is formed by the through hole and the flow path element.

前記押圧流路部材の一端面が前記押圧面であり、前記流路要素が前記一端面から貫通孔の延伸方向に離隔して形成されていれば、押圧面が離型フィルムにおける前記挿通孔の全周囲をキャビティ内面に密着させるので、離型フィルムとキャビティ内面との隙間に樹脂が侵入することをより確実に防止できる。 If one end surface of the pressing flow path member is the pressing surface and the flow path element is formed so as to be separated from the one end surface in the extending direction of the through hole, the pressing surface is the insertion hole in the release film. Since the entire circumference is brought into close contact with the inner surface of the cavity, it is possible to more reliably prevent the resin from entering the gap between the release film and the inner surface of the cavity.

半導体基板などの基板上に樹脂を成形する具体的実施態様としては、前記第1型には基板が保持されているとともに、前記第2型には、第1型を向く面が開口するキャビティが設けられており、型締め位置において、前記キャビティの開口部に前記基板が配置され、前記キャビティに樹脂が注入されることにより、前記基板上に樹脂が成形されるものを挙げることができる。 As a specific embodiment of molding a resin on a substrate such as a semiconductor substrate, the first mold holds the substrate, and the second mold has a cavity in which a surface facing the first mold opens. Examples thereof include those in which the substrate is arranged in the opening of the cavity at the mold clamping position, and the resin is formed on the substrate by injecting the resin into the cavity.

前記基板上に予め設定した複数の所定位置に半導体チップがそれぞれ形成されるように構成してあり、いずれか1以上の前記所定位置に、半導体チップの代わりに、前記押圧流路部材を配置しておけば、押圧流路部材の配置位置の選択自由度が高くなり、例えば、樹脂注入に好適な位置に押圧流路部材を配置することができるようになる。 The semiconductor chips are formed so as to be formed at a plurality of predetermined positions set in advance on the substrate, and the pressing flow path member is arranged in place of the semiconductor chips at any one or more of the predetermined positions. If this is done, the degree of freedom in selecting the arrangement position of the pressing flow path member is increased, and for example, the pressing flow path member can be arranged at a position suitable for resin injection.

さらに、押圧流路部材を予め基板に一体に作りこむことが可能になり、そうすれば、押圧流路部材を単独部材とした場合に比べ、押圧流路部材の位置決め等の工程が不要になる。 Further, the pressing flow path member can be integrally built with the substrate in advance, so that a step such as positioning of the pressing flow path member becomes unnecessary as compared with the case where the pressing flow path member is a single member. ..

また、本発明は下記のような樹脂成形装置でも同様の効果を奏し得る。
すなわち、第1型と第2型との間に形成されるキャビティの底面にゲートが設けられており、該ゲートから前記キャビティに樹脂を注入して成形する樹脂成形装置であって、
前記キャビティの底面を含む内面に配置されるとともに、該配置状態における前記ゲートに重なる位置に、該ゲートから流入する樹脂を通すための挿通孔が設けられている離型フィルムと、
型締め位置において、前記離型フィルムにおける前記挿通孔の周囲の一部または全部を押圧して、その押圧箇所をキャビティの底面に密着させる押圧面を有するとともに、前記挿通孔とキャビティとを連通する連通流路を形成する押圧流路部材とを備えている樹脂成形装置である
Further, the present invention can also exert the same effect with the following resin molding apparatus.
That is, it is a resin molding apparatus in which a gate is provided on the bottom surface of a cavity formed between the first mold and the second mold, and resin is injected into the cavity from the gate to mold the cavity.
A release film that is arranged on the inner surface including the bottom surface of the cavity and is provided with an insertion hole for passing the resin flowing in from the gate at a position overlapping the gate in the arranged state.
At the mold clamping position, it has a pressing surface that presses a part or all of the periphery of the insertion hole in the release film so that the pressed portion is brought into close contact with the bottom surface of the cavity, and communicates the insertion hole with the cavity. It is a resin molding apparatus provided with a pressing flow path member that forms a communication flow path.

<詳細な実施形態>
以下、詳細な実施形態を図面を参照して説明する。
本実施形態は、基板の表面に配置された半導体チップの所要箇所を樹脂によって封止・被覆するための樹脂成形方法に係るものである。
<Detailed Embodiment>
Hereinafter, detailed embodiments will be described with reference to the drawings.
The present embodiment relates to a resin molding method for sealing and covering a required portion of a semiconductor chip arranged on the surface of a substrate with a resin.

この樹脂成形方法を説明するに先立ち、まずは、樹脂による封止の対象となる基板W及び半導体チップCと、当該樹脂成形方法に用いられる樹脂成形装置100とについて説明する。 Prior to explaining this resin molding method, first, the substrate W and the semiconductor chip C to be sealed with the resin and the resin molding apparatus 100 used in the resin molding method will be described.

<基板Wの説明>
基板Wとしては、シリコンウェーハ等の半導体基板、リードフレーム、プリント配線基板、金属製基板、樹脂製基板、ガラス製基板、セラミック製基板等を挙げることができる。また、基板Wは、FOWLP(Fan Out Wsfer Level Packaging)、FOPLP(Fan Out Panel Level Packaging)に用いられるキャリアであってもよい。さらにいえば、配線がすでに施されているものでもよいし、未配線のものでも構わない。
この実施形態では、基板Wは、図1、図2に示すように、平面視で、例えば矩形状をなすものであり、その表面Waには、縦横にそれぞれ等ピッチで、平面視矩形状をなす複数の同一半導体チップCが突出するように配置されている。該基板Wは、成形後、半導体チップCごとに切断され個片化されるが、例えば、FOWLP又はFOPLP等に用いられるのであれば、基板Wは、成形後、個片化されることなく封止樹脂から分離されてもよい。
<Explanation of board W>
Examples of the substrate W include semiconductor substrates such as silicon wafers, lead frames, printed wiring boards, metal substrates, resin substrates, glass substrates, ceramic substrates, and the like. Further, the substrate W may be a carrier used for FOWLP (Fan Out Wsfer Level Packaging) and FOPLP (Fan Out Panel Level Packaging). Furthermore, it may be the one that has already been wired or the one that has not been wired.
In this embodiment, as shown in FIGS. 1 and 2, the substrate W has a rectangular shape in a plan view, for example, and the surface Wa has a rectangular shape in a plan view at equal pitches in the vertical and horizontal directions. A plurality of identical semiconductor chips C are arranged so as to project. The substrate W is cut and individualized for each semiconductor chip C after molding. For example, if it is used for FOWLP or FOPLP, the substrate W is sealed without being individualized after molding. It may be separated from the stop resin.

<樹脂成形装置100の説明>
樹脂成形装置100は、図2等に示すように、第1型である上型1及び第2型である下型2と、これら上型1及び下型2を保持するとともに、図2に示す型開き位置と図3に示す型締め位置との間でこれらを近付けたり遠ざけたりするように進退駆動する型締め機構(図示しない)と、前記型締め位置において上型1と下型2との間に形成されるキャビティ3に樹脂Rを注入する樹脂注入機構4とを備えている。
<Explanation of resin molding apparatus 100>
As shown in FIG. 2 and the like, the resin molding apparatus 100 holds the upper mold 1 which is the first mold and the lower mold 2 which is the second mold, and the upper mold 1 and the lower mold 2 and is shown in FIG. A mold clamping mechanism (not shown) that drives the mold to move forward and backward between the mold opening position and the mold clamping position shown in FIG. 3 and the upper mold 1 and the lower mold 2 at the mold clamping position. It is provided with a resin injection mechanism 4 for injecting the resin R into the cavity 3 formed between them.

各部について説明する。
上型1は、図示しない固定プラテンの下方に交換可能に取り付けられたものである。この上型1の下面(下型2に対向する対向面)には複数の吸着孔(図示しない)が設けてあり、これら吸着孔を、図示しない真空ポンプなどによって負圧にすることにより、前記基板Wの裏面を吸着して固定できるように構成してある。
Each part will be described.
The upper mold 1 is replaceably attached below a fixed platen (not shown). A plurality of suction holes (not shown) are provided on the lower surface of the upper mold 1 (opposing surface facing the lower mold 2), and these suction holes are made negative pressure by a vacuum pump or the like (not shown). It is configured so that the back surface of the substrate W can be adsorbed and fixed.

下型2は、図示しない可動プラテンの上方に交換可能に取り付けられたものであり、下プレート21と、該下プレート21の上面に離接可能に取り付けられた中間プレート22とを備えている。そして、該中間プレート22の上面(上型に対向する対向面)には、前記基板Wよりも一回り小さな輪郭の前記キャビティ3が形成されている。 The lower mold 2 is replaceably attached above a movable platen (not shown), and includes a lower plate 21 and an intermediate plate 22 detachably attached to the upper surface of the lower plate 21. The cavity 3 having a contour slightly smaller than that of the substrate W is formed on the upper surface (opposing surface facing the upper mold) of the intermediate plate 22.

そして、型締め位置においては、中間プレート22の上面のうちのキャビティ3の周辺部が、基板表面Waの周縁部に密着し、キャビティ3の上部開口が基板Wによって閉じられるとともに、基板Wに配置(形成)されている半導体チップCがキャビティ3内に収容されるように構成してある。 Then, at the mold clamping position, the peripheral portion of the cavity 3 on the upper surface of the intermediate plate 22 is in close contact with the peripheral edge portion of the substrate surface Wa, the upper opening of the cavity 3 is closed by the substrate W, and the cavity 3 is arranged on the substrate W. The semiconductor chip C (formed) is configured to be housed in the cavity 3.

なお、この実施形態では、キャビティ3の深さ寸法を、半導体チップCの厚み寸法と略等しくし、型締め位置において、キャビティ3の底面に半導体チップCの頂面が密接するように設定してある。このことにより、半導体チップCの頂面には樹脂Rが回らず、半導体チップCの側周面のみが樹脂Rで被覆される。したがって、樹脂成形後、半導体チップCの頂面は露出する。なお、ここで、半導体チップCの「頂面」とは、基板Wとは反対側の面であって、樹脂成形動作時の離型フィルム5側の面のことである。 In this embodiment, the depth dimension of the cavity 3 is substantially equal to the thickness dimension of the semiconductor chip C, and the top surface of the semiconductor chip C is set to be in close contact with the bottom surface of the cavity 3 at the mold clamping position. is there. As a result, the resin R does not rotate on the top surface of the semiconductor chip C, and only the side peripheral surface of the semiconductor chip C is covered with the resin R. Therefore, the top surface of the semiconductor chip C is exposed after resin molding. Here, the "top surface" of the semiconductor chip C is a surface opposite to the substrate W and is a surface on the release film 5 side during the resin molding operation.

また、前記中間プレート22は、図示しないリフトアップ機構により、前記下プレート21の上面から持ち上げられるようにも構成してある。 Further, the intermediate plate 22 is also configured to be lifted from the upper surface of the lower plate 21 by a lift-up mechanism (not shown).

前記型締め機構は、図示しないが、前記上型1及び下型2を保持する保持構造体と、該保持構造体に保持された下型2を昇降させる型昇降機構とを備えたものである。 Although not shown, the mold clamping mechanism includes a holding structure for holding the upper mold 1 and the lower mold 2, and a mold raising / lowering mechanism for raising and lowering the lower mold 2 held by the holding structure. ..

保持構造体(図示しない)は、例えば、ベース盤と、該ベース盤から起立する複数の案内ポストと、これら案内ポストの上端部に固定された前記固定プラテンと、該案内ポストの中間部に昇降可能に保持された前記可動プラテンとを備えたものである。そして、前述したように前記固定プラテンの下方に前記上型1が取り付けられている。上型1は、図示しない上型ホルダーを介して、固定プラテンの下面に取り付けられてもよい。上型ホルダーには、上型1を加熱するヒーターを設けてもよく、さらにこのヒーターの固定プラテン側に断熱材を設けてもよい。
また、前述したように、前記可動プラテンの上方に前記下型2が取り付けられている。下型1は、図示しない下型ホルダーを介して、可動プラテンの下面に取り付けられてもよい。下型ホルダーには、下型2を加熱するヒーターを設けてもよく、さらにこのヒーターの可動プラテン側に断熱材を設けてもよい。
型昇降機構は、前記可動プラテンを介して下型2を昇降駆動するボールねじ機構、油圧シリンダ、トグル機構などからなるものである。
The holding structure (not shown) can be raised and lowered to, for example, a base plate, a plurality of guide posts rising from the base plate, the fixed platen fixed to the upper end of the guide posts, and an intermediate portion of the guide posts. It is provided with the movable platen that can be held. Then, as described above, the upper mold 1 is attached below the fixed platen. The upper mold 1 may be attached to the lower surface of the fixed platen via an upper mold holder (not shown). The upper mold holder may be provided with a heater for heating the upper mold 1, and may be further provided with a heat insulating material on the fixed platen side of the heater.
Further, as described above, the lower mold 2 is attached above the movable platen. The lower mold 1 may be attached to the lower surface of the movable platen via a lower mold holder (not shown). The lower mold holder may be provided with a heater for heating the lower mold 2, and may be further provided with a heat insulating material on the movable platen side of the heater.
The mold elevating mechanism includes a ball screw mechanism that elevates and drives the lower mold 2 via the movable platen, a hydraulic cylinder, a toggle mechanism, and the like.

前記樹脂注入機構4は、図2等に示すように、下型2を厚み方向に貫通する樹脂注入孔41とこの樹脂注入孔41内に充填された溶融樹脂Rを押圧して前記キャビティ3に注入するプランジャ機構42とを備えたものである。 As shown in FIG. 2 and the like, the resin injection mechanism 4 presses the resin injection hole 41 penetrating the lower mold 2 in the thickness direction and the molten resin R filled in the resin injection hole 41 into the cavity 3. It is provided with a plunger mechanism 42 for injecting.

各部を説明する。
前記樹脂注入孔41は、前記中間プレート22を厚み方向に貫通する第1孔411と、前記下プレート21を厚み方向に貫通する第2孔412とからなるものであり、前記第1孔411と第2孔412とが連続するように配置してある。
Each part will be described.
The resin injection hole 41 includes a first hole 411 penetrating the intermediate plate 22 in the thickness direction and a second hole 412 penetrating the lower plate 21 in the thickness direction. It is arranged so as to be continuous with the second hole 412.

第1孔411は、キャビティ3の底面に向かって先細りとなる断面円形状のものであり、キャビティ3の底面に開口する一端部がゲートGTとしての機能を担い、その他の部分がスプルーSPとしての機能を担う。 The first hole 411 has a circular cross-section that tapers toward the bottom surface of the cavity 3, one end of which opens to the bottom surface of the cavity 3 functions as a gate GT, and the other portion serves as a sprue SP. Take on the function.

第2孔412は、貫通方向に亘って断面が同一径の円形状をなすものであり、溶融樹脂Rを収容するポットとしての機能を担う。 The second hole 412 has a circular shape having the same cross section in the penetrating direction, and functions as a pot for accommodating the molten resin R.

前記プランジャ機構42は、前記第2孔412に下端部から挿入されたプランジャ421と、該プランジャ421を昇降進退させるボールねじやモータなどの進退アクチュエータ422とからなるものである。 The plunger mechanism 42 includes a plunger 421 inserted into the second hole 412 from the lower end portion, and an advancing / retreating actuator 422 such as a ball screw or a motor for moving the plunger 421 up / down.

前記プランジャ421は、その外径が前記第2孔412の内径と等しくなるように設定した円柱状をなすものであり、該第2孔412に摺動可能にガタなく嵌合する。 The plunger 421 has a columnar shape whose outer diameter is set to be equal to the inner diameter of the second hole 412, and is slidably fitted into the second hole 412 without play.

前記進退アクチュエータ422は、前記プランジャ421を、その先端面が第2孔412の上面よりも下方にある待機位置と、この待機位置よりも所定距離だけ上方に設定された注入完了位置との間で進退駆動するものである。前記待機位置においては、固形状態にある所定量のタブレット状樹脂Rが、第2孔412に上方から投入され、下プレート21に設けられた図示しない加熱機構によって溶融されるようにしてある。また、その状態から該進退アクチュエータ422が、プランジャ421を前記注入完了位置にまで上昇させると、溶融樹脂Rが前記スプルーSP及びゲートGTを介して前記キャビティ3内に注入されるようにしてある。この実施形態では、タブレット状樹脂として熱硬化性樹脂を用いる。 The advance / retreat actuator 422 moves the plunger 421 between a standby position whose tip surface is below the upper surface of the second hole 412 and an injection completion position set above the standby position by a predetermined distance. It drives forward and backward. At the standby position, a predetermined amount of tablet-shaped resin R in a solid state is put into the second hole 412 from above and melted by a heating mechanism (not shown) provided on the lower plate 21. Further, when the advance / retreat actuator 422 raises the plunger 421 to the injection completion position from that state, the molten resin R is injected into the cavity 3 via the sprue SP and the gate GT. In this embodiment, a thermosetting resin is used as the tablet-like resin.

さらにこの樹脂成形装置100は、離型フィルム5と、この離型フィルム5を中間プレート22の上面に供給するフィルム供給機構(図示しない)と、前記キャビティ3の内面及び前記該キャビティ3の周囲における中間プレート22の上面に密着させるフィルム密着機構とを備えている。 Further, the resin molding apparatus 100 includes a release film 5, a film supply mechanism (not shown) for supplying the release film 5 to the upper surface of the intermediate plate 22, and an inner surface of the cavity 3 and a periphery of the cavity 3. It is provided with a film adhesion mechanism that adheres to the upper surface of the intermediate plate 22.

離型フィルム5は、前記キャビティ3の底面を含む内面に密着して配置されることにより、キャビティ3の内面と注入された樹脂との間に介在して該キャビティ3内で固化した成形後の樹脂Rを、キャビティ3から剥がれやすくさせるためのものでる。その素材等についての説明は既知のため省略する。 The release film 5 is arranged in close contact with the inner surface including the bottom surface of the cavity 3, so that the release film 5 is interposed between the inner surface of the cavity 3 and the injected resin and solidified in the cavity 3 after molding. The resin R is used to make it easy to peel off from the cavity 3. The description of the material and the like is omitted because it is known.

ところで、この実施形態では、前記ゲートGTがキャビティ3の底面に開口しているため、該ゲートGTを塞がないように、該離型フィルム5における前記ゲートGTに対応する位置には、該ゲートGTの開口径と同一又はそれよりもやや大きい径の挿通孔5aが形成されている。 By the way, in this embodiment, since the gate GT is open to the bottom surface of the cavity 3, the gate is located at a position corresponding to the gate GT in the release film 5 so as not to block the gate GT. An insertion hole 5a having a diameter equal to or slightly larger than the opening diameter of the GT is formed.

前記フィルム密着機構は、図示しないが、前記キャビティ3の内面及び/又は前記該キャビティ3の外側の周囲上面に設けられた複数の吸着孔と、これら吸着孔を負圧にする図示しない真空ポンプなどから構成されたもので、各吸着孔の負圧によって前記離型フィルム5を吸着する。 Although not shown, the film adhesion mechanism includes a plurality of suction holes provided on the inner surface of the cavity 3 and / or the outer peripheral upper surface of the cavity 3, and a vacuum pump (not shown) for making these suction holes negative pressure. The release film 5 is adsorbed by the negative pressure of each adsorption hole.

しかして、この実施形態の樹脂成形装置100は、離型フィルム5における前記挿通孔5aの周囲を、型締め位置において基板Wを介して押圧し、キャビティ3の内面に密着させる押圧流路部材6をさらに備えている。 Thus, the resin molding apparatus 100 of this embodiment presses the periphery of the insertion hole 5a in the release film 5 through the substrate W at the mold clamping position, and brings the pressing flow path member 6 into close contact with the inner surface of the cavity 3. Is further equipped.

次に、この押圧流路部材6について詳述する。 Next, the pressing flow path member 6 will be described in detail.

この実施形態における押圧流路部材6は、その裏面側から視た様子を示す図4に示すように、中央に貫通孔6aが設けられた薄い円盤状をなすものである。その表面61は平坦にしてあり、該表面61が請求項でいう押圧面となる。その一方、裏面62には、放射状に延びる複数本(ここでは4本)の有底溝6bが均等に形成してある。これら各有底溝6bは、該押圧流路部材6の外側周面と内側周面との間に亘って設けてある。言い換えると、各有底溝6bの外側の端面が押圧流路部材6の外側周面に開口し、内側の端面が押圧流路部材6の内側周面(すなわち前記貫通孔6a)に開口するようにしてあって、これら各有底溝6bによって、押圧流路部材6の径方向外側と、径方向内側である前記貫通孔6aとが連通するように構成してある。 The pressing flow path member 6 in this embodiment has a thin disk shape having a through hole 6a provided in the center, as shown in FIG. 4 showing a state viewed from the back surface side thereof. The surface 61 is flattened, and the surface 61 serves as a pressing surface according to a claim. On the other hand, a plurality of (here, four) bottomed grooves 6b extending radially are uniformly formed on the back surface 62. Each of these bottomed grooves 6b is provided between the outer peripheral surface and the inner peripheral surface of the pressing flow path member 6. In other words, the outer end surface of each bottomed groove 6b opens to the outer peripheral surface of the pressing flow path member 6, and the inner end surface opens to the inner peripheral surface of the pressing flow path member 6 (that is, the through hole 6a). The bottomed grooves 6b are configured so that the radial outer side of the pressing flow path member 6 and the through hole 6a which is the radial inner side communicate with each other.

かかる押圧流路部材6は、基板Wとは別体の単独部材として、エッチングや機械加工等により製作される。そして、図6に示すように、該押圧流路部材6の裏面62が基板表面Waに接合されて、基板Wと一体化される。このようにして、該押圧流路部材6の有底溝6bと基板表面Waとによって、押圧部材の押圧面(表面)61から貫通孔6aの貫通方向に離隔した流路要素71が形成されるようにしてある。これら貫通孔6a及び流路要素71が、請求項でいう連通流路7を構成する。なお、この実施形態では、図5に示すように、流路要素71が半導体チップCの配列方向とは異なって、斜め45°方向に延伸するようにしてある。樹脂のキャビティ内への吐出を容易にするためである。 The pressing flow path member 6 is manufactured by etching, machining, or the like as a single member separate from the substrate W. Then, as shown in FIG. 6, the back surface 62 of the pressing flow path member 6 is joined to the substrate surface Wa and integrated with the substrate W. In this way, the bottomed groove 6b of the pressing flow path member 6 and the substrate surface Wa form a flow path element 71 separated from the pressing surface (surface) 61 of the pressing member 6 in the penetrating direction of the through hole 6a. It is done like this. The through hole 6a and the flow path element 71 form the communication flow path 7 according to the claim. In this embodiment, as shown in FIG. 5, the flow path element 71 extends in the oblique 45 ° direction, which is different from the arrangement direction of the semiconductor chips C. This is to facilitate the discharge of the resin into the cavity.

次に、この押圧流路部材6の配置位置であるが、基板表面Waには前述したように、樹脂Rによる封止対象物である半導体チップCが、縦横に等ピッチで設けられている。したがって、そのままでは、押圧流路部材6を配置する余地のないところ、この実施形態では、図1、図5に示すように、半導体チップCが本来設けられるべき所定位置のうちの1箇所又は複数箇所(ここでは2箇所)に半導体チップCを設けず、その部位に、該押圧流路部材6を予め配している。 Next, regarding the arrangement position of the pressing flow path member 6, as described above, the semiconductor chips C, which are the objects to be sealed by the resin R, are provided on the substrate surface Wa at equal pitches in the vertical and horizontal directions. Therefore, as it is, there is no room for arranging the pressing flow path member 6, but in this embodiment, as shown in FIGS. 1 and 5, one or more of the predetermined positions where the semiconductor chip C should be originally provided. The semiconductor chip C is not provided at the location (here, two locations), and the pressing flow path member 6 is arranged in advance at that location.

また、この押圧流路部材6の厚み寸法は、基板表面Waとキャビティ3の底面との距離寸法と実質的に等しい寸法にしてある。これは、前述したように、型締め位置において、押圧流路部材6の表面61(請求項でいう押圧面61)が、基板Wを介して離型フィルム5を押圧し、これをキャビティ3の内面(底面)に密着させるためである。なお、押圧流路部材6の厚み寸法とは、その表面61と裏面62との間の寸法のことであり、この実施形態では半導体チップCの厚み寸法とも等しい。 Further, the thickness dimension of the pressing flow path member 6 is substantially equal to the distance dimension between the substrate surface Wa and the bottom surface of the cavity 3. This is because, as described above, at the mold clamping position, the surface 61 of the pressing flow path member 6 (pressing surface 61 in the claim) presses the release film 5 via the substrate W, and this is pressed by the cavity 3. This is to make it adhere to the inner surface (bottom surface). The thickness dimension of the pressing flow path member 6 is the dimension between the front surface 61 and the back surface 62, and is equal to the thickness dimension of the semiconductor chip C in this embodiment.

<樹脂成形方法の説明>
次に、このように構成した樹脂成形装置100を用いて、前記基板Wの半導体チップCを封止・成形する樹脂成形方法の一例について図2、図3、図7〜図11を参照して説明する。なおこれら図2、図3及び図7〜図11において、基板Wを含む各部は、理解の容易のため、模式化してある。
<Explanation of resin molding method>
Next, refer to FIGS. 2, 3, 7 to 11 for an example of a resin molding method for sealing and molding the semiconductor chip C of the substrate W using the resin molding apparatus 100 configured as described above. explain. In FIGS. 2, 3 and 7 to 11, each part including the substrate W is modeled for easy understanding.

まず、図2に示すように、上型1と下型2とを離隔させた型開き位置とする。 First, as shown in FIG. 2, the mold opening position is set so that the upper mold 1 and the lower mold 2 are separated from each other.

次に、図7に示すように、離型フィルム5を下プレート21上にある中間プレート22上に載置して吸着させる一方、基板Wを、半導体チップCがキャビティ3を向く姿勢にして、上型1の下面に吸着させて保持する。 Next, as shown in FIG. 7, the release film 5 is placed on the intermediate plate 22 on the lower plate 21 and adsorbed, while the substrate W is placed in a posture in which the semiconductor chip C faces the cavity 3. It is attracted to and held on the lower surface of the upper mold 1.

次に、図8に示すように、中間プレート22を図示しないリフトアップ機構によって下プレート21から持ち上げて離隔させる。このとき、プランジャ421を、その先端面が、下プレート21に設けられた第2孔412の上面開口よりも下方にある待機位置としておく。 Next, as shown in FIG. 8, the intermediate plate 22 is lifted from and separated from the lower plate 21 by a lift-up mechanism (not shown). At this time, the plunger 421 is set in a standby position whose tip surface is below the upper surface opening of the second hole 412 provided in the lower plate 21.

そして、固形状態にあるタブレット樹脂Rを、前記第2孔412の上面から投入した後、下プレート21に設けられた図示しない加熱機構によって該タブレット状樹脂Rを溶融する。 Then, the tablet resin R in a solid state is charged from the upper surface of the second hole 412, and then the tablet resin R is melted by a heating mechanism (not shown) provided on the lower plate 21.

次に、型締めする。すなわち、図3に示すように、前記型昇降機構によって下プレート21を上昇させ、中間プレート22と一体化するとともに、中間プレート22の上面と基板表面Waの周縁部との間で離型フィルム5を挟む。この位置が型締め位置である。このとき、前述したように、離型フィルム5における挿通孔5aの周囲を押圧流路部材6の押圧面61が押圧してキャビティ3の底面に密着させる。 Next, the mold is fastened. That is, as shown in FIG. 3, the lower plate 21 is raised by the mold elevating mechanism to be integrated with the intermediate plate 22, and the release film 5 is formed between the upper surface of the intermediate plate 22 and the peripheral edge of the substrate surface Wa. Sandwich. This position is the mold clamping position. At this time, as described above, the pressing surface 61 of the pressing flow path member 6 presses the periphery of the insertion hole 5a in the release film 5 to bring it into close contact with the bottom surface of the cavity 3.

次に、図9に示すように、プランジャ421を、前記注入完了位置まで上昇させる。このことにより、溶融樹脂Rが、キャビティ3内に注入・充填される。 Next, as shown in FIG. 9, the plunger 421 is raised to the injection completion position. As a result, the molten resin R is injected and filled into the cavity 3.

より詳細に説明する。溶融樹脂Rは、プランジャ421が待機位置から上昇することによって、スプルーSP、ゲートGT及び離型フィルム5の挿通孔5aを通って、図6等に示す押圧流路部材6の貫通孔6aに流入し、さらに、該押圧流路部材6の有底溝6bと基板表面Waとによって形成される流路要素71を通って、キャビティ3内に流入する。 This will be described in more detail. When the plunger 421 rises from the standby position, the molten resin R flows into the through hole 6a of the pressing flow path member 6 shown in FIG. 6 or the like through the insertion hole 5a of the sprue SP, the gate GT, and the release film 5. Further, it flows into the cavity 3 through the flow path element 71 formed by the bottomed groove 6b of the pressing flow path member 6 and the substrate surface Wa.

このようにして、キャビティ3内に溶融樹脂Rが充填された後、加熱された状態で一定時間待つことにより、樹脂Rが硬化して固形化する。 In this way, after the molten resin R is filled in the cavity 3, the resin R is cured and solidified by waiting for a certain period of time in a heated state.

その後、図10に示すように、前記型昇降機構によって下型2(下プレート21及び中間プレート22)を下降させ、型開き位置とする。このとき、スプルーSP、ゲートGT及び第2孔412の上部に残った残存樹脂R(カル)は、基板Wからもぎ取られ、樹脂成形後の基板Wは、上型1から取り外される。他方、カルRは、図11に示すように、中間プレート22をリフトアップ機構により下プレート21から離隔させることによって取り出され、廃棄される。 After that, as shown in FIG. 10, the lower mold 2 (lower plate 21 and intermediate plate 22) is lowered by the mold elevating mechanism to set the mold opening position. At this time, the residual resin R (cal) remaining on the sprue SP, the gate GT, and the upper part of the second hole 412 is peeled off from the substrate W, and the substrate W after resin molding is removed from the upper mold 1. On the other hand, as shown in FIG. 11, the cal R is taken out by separating the intermediate plate 22 from the lower plate 21 by a lift-up mechanism and discarded.

<効果>
以上のような本実施形態によれば、型締め位置あるいは型締め時において、押圧流路部材6の押圧面61が閉じた環状(ここでは円環状)をなし、該押圧面61が離型フィルム5における前記挿通孔5aの全周囲をキャビティ3の底面に密着させるので、それらの間に隙間が生じず、溶融樹脂Rが離型フィルム5とキャビティ内面に侵入することを確実に防止できる。また、押圧流路部材6には、連通流路7が形成されているので、溶融樹脂Rのキャビティ3内への注入を阻害することもない。
<Effect>
According to the present embodiment as described above, at the mold clamping position or at the time of mold clamping, the pressing surface 61 of the pressing flow path member 6 forms a closed annular shape (here, an annular shape), and the pressing surface 61 is a release film. Since the entire circumference of the insertion hole 5a in No. 5 is brought into close contact with the bottom surface of the cavity 3, no gap is formed between them, and the molten resin R can be reliably prevented from entering the release film 5 and the inner surface of the cavity. Further, since the communication flow path 7 is formed in the pressing flow path member 6, the injection of the molten resin R into the cavity 3 is not hindered.

このようにして、ピンゲート方式のトランスファー樹脂成形法に離型フィルム5を用いることが初めて可能になる。しかも離型フィルム5に挿通孔5aを穿孔することと、押圧流路部材6を設けるだけなので、工程や構造の大幅な複雑化を招くこともない。 In this way, it becomes possible for the first time to use the release film 5 in the pin gate type transfer resin molding method. Moreover, since the release film 5 is only provided with the insertion hole 5a and the pressing flow path member 6, the process and structure are not significantly complicated.

特に本実施形態では、半導体チップCが配設されるべき複数の所定位置のいずれかに、半導体チップCの代わりに、前記押圧流路部材6を配置できるようにしているので、押圧流路部材6の配置位置の選択自由度が高くなり、樹脂注入に好適な位置に押圧流路部材6を配置することができる。この実施形態では、例えば、図1に示すように、矩形基板Wにおける長手方向(左右方向)に延びる中心線上であって、左右対称な2ヶ所に樹脂注入口となる押圧流路部材6を配置しているので、キャビティ3内に、可及的均等にかつ速やかに樹脂を注入することができる。 In particular, in the present embodiment, the pressing flow path member 6 can be arranged instead of the semiconductor chip C at any of a plurality of predetermined positions where the semiconductor chip C should be arranged, so that the pressing flow path member 6 can be arranged. The degree of freedom in selecting the arrangement position of 6 is increased, and the pressing flow path member 6 can be arranged at a position suitable for resin injection. In this embodiment, for example, as shown in FIG. 1, the pressing flow path members 6 serving as resin injection ports are arranged at two symmetrical locations on the center line extending in the longitudinal direction (left-right direction) of the rectangular substrate W. Therefore, the resin can be injected into the cavity 3 as evenly and promptly as possible.

さらに、押圧流路部材6を予め基板Wに接合して一体化しているので、成形型の位置で押圧流路部材6の位置決め等の工程が不要になるという効果も得られる。 Further, since the pressing flow path member 6 is previously joined to the substrate W and integrated, there is an effect that a step such as positioning of the pressing flow path member 6 is not required at the position of the molding die.

<他の実施形態>
なお、本発明は前記実施形態に限られるものではない。
<Other Embodiments>
The present invention is not limited to the above embodiment.

例えば、前記実施形態において、押圧流路部材6を基板Wとは別体の単独部材として基板Wに接合させていたが、押圧流路部材6を基板Wに一体に形成してもよい。
また、予め押圧流路部材6が貼り付けられた離型フィルム5を成形型に供給してもよい。この場合、押圧流路部材6、離型フィルム5、基板W及び半導体チップCの型締め時における互いの位置関係は、上述の実施形態と同様にすることができる。
For example, in the above-described embodiment, the pressing flow path member 6 is joined to the substrate W as a single member separate from the substrate W, but the pressing flow path member 6 may be integrally formed with the substrate W.
Further, the release film 5 to which the pressing flow path member 6 is attached in advance may be supplied to the molding die. In this case, the positional relationship between the pressing flow path member 6, the release film 5, the substrate W, and the semiconductor chip C at the time of molding can be the same as in the above-described embodiment.

また、図12に示すように、有底溝6bではなく、押圧流路部材6の外側周面と貫通孔6aとを連通する孔6b’を設けるなどしてもよい。 Further, as shown in FIG. 12, instead of the bottomed groove 6b, a hole 6b'that communicates the outer peripheral surface of the pressing flow path member 6 with the through hole 6a may be provided.

さらに、前記押圧流路部材6を、上下逆に配置してもよい。この場合、有底溝6bが離型フィルム5側を向くことになり、有底溝6bに対応する部分においては、離型フィルム5における挿通孔5aの周囲全部を押さえることはできないが、離型フィルム5の剥離防止には寄与し得る。 Further, the pressing flow path member 6 may be arranged upside down. In this case, the bottomed groove 6b faces the release film 5 side, and the entire periphery of the insertion hole 5a in the release film 5 cannot be pressed in the portion corresponding to the bottomed groove 6b, but the mold release film 5 is removed. It can contribute to the prevention of peeling of the film 5.

押圧流路部材6を円盤状ではなく、矩形盤や多角形盤状にしてもよい。 The pressing flow path member 6 may have a rectangular or polygonal disc shape instead of a disc shape.

押圧流路部材6を単体ではなく、例えば、挿通孔5aの周りに互いに離隔させて配置した複数の押圧要素からなるものとしてもよい。この場合、押圧要素間の隙間が連通流路を形成する。 The pressing flow path member 6 may be composed of, for example, a plurality of pressing elements arranged around the insertion hole 5a so as to be separated from each other, instead of a single unit. In this case, the gap between the pressing elements forms a communication flow path.

離型フィルム5についていえば、前記実施形態のように挿通孔5aを予め穿孔しておいてもよいし、離型フィルム5を中間プレート22に載置して吸着させた後、ゲートGTの位置に合わせて穿孔してもよい。 Regarding the release film 5, the insertion hole 5a may be pre-drilled as in the above embodiment, or the release film 5 may be placed on the intermediate plate 22 and adsorbed, and then the position of the gate GT. It may be perforated according to the above.

樹脂成形方法についても、前記実施形態に限られず、手順を前後してもよい。また、例えば、離型フィルム5を吸着せず、単に押圧流路部材6で挿通孔5aの周辺を押さえるだけにしてもよい。このようにしても、樹脂Rの充填圧力で離型フィルム5がキャビティ3の内面に密着し得る。 The resin molding method is not limited to the above-described embodiment, and the procedure may be changed back and forth. Further, for example, the release film 5 may not be adsorbed, and the pressing flow path member 6 may simply press the periphery of the insertion hole 5a. Even in this way, the release film 5 can be brought into close contact with the inner surface of the cavity 3 due to the filling pressure of the resin R.

キャビティ3は、前記実施形態では下型2にのみ設けられていたが、上型にも設け、基板の表裏面双方に樹脂を注入して成形しても構わない。 Although the cavity 3 is provided only in the lower mold 2 in the above embodiment, it may be provided in the upper mold and molded by injecting resin into both the front and back surfaces of the substrate.

成形対象物は半導体チップCが設けられた基板Wに限られず、樹脂Rのみをキャビティ3によって成形する場合にも本樹脂成形方法は適用できる。
成形型は、上下に昇降するもののみならず、水平方向やその他の方向に対向して進退するものでも本発明を適用可能である。
The object to be molded is not limited to the substrate W on which the semiconductor chip C is provided, and this resin molding method can also be applied when only the resin R is molded by the cavity 3.
The present invention can be applied not only to a molding die that moves up and down, but also to a molding die that moves forward and backward in a horizontal direction or in another direction.

その他、本発明は前記実施形態に限られず、その趣旨を逸脱しない範囲で種々の変形が可能であるのは言うまでもない。 In addition, the present invention is not limited to the above-described embodiment, and it goes without saying that various modifications can be made without departing from the spirit of the present invention.

100・・・樹脂成形装置
1・・・上型(第1型)
2・・・下型(第2型)
3・・・キャビティ
GT・・・ゲート
R・・・樹脂
5・・・離型フィルム
5a・・・挿通孔
6・・押圧流路部材
61・・・押圧面
6a・・・貫通孔
7・・・連通流路
71・・・流路要素
W・・・基板
C・・・半導体チップ
100 ... Resin molding device 1 ... Upper mold (1st mold)
2 ... Lower type (2nd type)
3 ... Cavity GT ... Gate R ... Resin 5 ... Release film 5a ... Insertion hole 6 ... Pressing flow path member 61 ... Pressing surface 6a ... Through hole 7 ...・ Communication flow path 71 ・ ・ ・ Flow path element W ・ ・ ・ Substrate C ・ ・ ・ Semiconductor chip

Claims (7)

第1型と第2型との間に形成されるキャビティの底面にゲートを設け、このゲートから該キャビティに樹脂を注入して成形する樹脂成形方法であって、
厚み方向に貫通する挿通孔を有した離型フィルムを、該挿通孔が前記ゲートに重なるように、前記キャビティの底面を含む内面に配置する一方、
前記離型フィルムにおける前記挿通孔の周囲の一部または全部を型締め時に押圧してキャビティ底面に密着させるとともに、前記挿通孔とキャビティとを連通する連通流路を型締め時に形成する押圧流路部材を配置しておき、
前記第1型と第2型とを型締めし、
前記ゲートから、前記挿通孔及び連通流路を介して前記キャビティに樹脂を注入し、硬化させることを特徴とする樹脂成形方法。
A resin molding method in which a gate is provided on the bottom surface of a cavity formed between the first mold and the second mold, and resin is injected into the cavity through the gate.
A release film having an insertion hole penetrating in the thickness direction is arranged on the inner surface including the bottom surface of the cavity so that the insertion hole overlaps the gate.
A part or all of the periphery of the insertion hole in the release film is pressed at the time of molding to bring it into close contact with the bottom surface of the cavity, and a communication flow path for communicating the insertion hole and the cavity is formed at the time of molding. Place the members and
Molding the first mold and the second mold,
A resin molding method characterized by injecting a resin from the gate into the cavity through the insertion hole and the communication flow path and curing the resin.
前記離型フィルムを前記キャビティの内面に吸着させることを特徴とする請求項1記載の樹脂成形方法。 The resin molding method according to claim 1, wherein the release film is adsorbed on the inner surface of the cavity. 前記押圧流路部材が、中央に貫通孔を有するとともに、該貫通孔から外側に延伸して外側周面に開口する1又は複数の流路要素とを具備し、該貫通孔と流路要素とによって前記連通流路が形成されることを特徴とする請求項1又は2記載の樹脂成形方法。 The pressing flow path member has a through hole in the center, and also includes one or a plurality of flow path elements that extend outward from the through hole and open to the outer peripheral surface, and the through hole and the flow path element. The resin molding method according to claim 1 or 2, wherein the communication flow path is formed by the above method. 前記押圧流路部材の一端面に押圧面が設定されており、前記流路要素が、前記一端面から貫通孔の延伸方向に離隔して形成されている請求項3記載の樹脂成形方法。 The resin molding method according to claim 3, wherein a pressing surface is set on one end surface of the pressing flow path member, and the flow path element is formed so as to be separated from the one end surface in the extending direction of the through hole. 前記第1型には基板が保持されているとともに、前記第2型には第1型を向く面が開口するキャビティが設けられており、
型締め位置において、前記キャビティの開口が前記基板によって閉じられ、そのキャビティに樹脂が注入されて、該基板上に樹脂が成形されることを特徴とする請求項1乃至4いずれか記載の樹脂成形方法。
The first mold holds a substrate, and the second mold is provided with a cavity in which a surface facing the first mold opens.
The resin molding according to any one of claims 1 to 4, wherein at the mold clamping position, the opening of the cavity is closed by the substrate, the resin is injected into the cavity, and the resin is molded on the substrate. Method.
前記基板上の各所定位置に半導体チップが配置されており、それら所定位置のいずれかに、半導体チップの代わりに前記押圧流路部材を配置することを特徴とする請求項5記載の樹脂成形方法。 The resin molding method according to claim 5, wherein the semiconductor chip is arranged at each predetermined position on the substrate, and the pressing flow path member is arranged instead of the semiconductor chip at any of the predetermined positions. .. 第1型と第2型との間に形成されるキャビティの底面にゲートが設けられており、該ゲートから前記キャビティに樹脂を注入して成形する樹脂成形装置であって、
前記キャビティの底面を含む内面に配置されるとともに、該配置状態における前記ゲートに重なる位置に、該ゲートから流入する樹脂を通すための挿通孔が設けられている離型フィルムと、
前記離型フィルムにおける前記挿通孔の周囲の一部または全部を押圧して、その押圧箇所をキャビティの底面に密着させる押圧面を有するとともに、前記挿通孔とキャビティとを連通する連通流路を形成する押圧流路部材とを備えていることを特徴とする樹脂成形装置。

A resin molding device in which a gate is provided on the bottom surface of a cavity formed between the first mold and the second mold, and resin is injected into the cavity from the gate for molding.
A release film that is arranged on the inner surface including the bottom surface of the cavity and is provided with an insertion hole for passing the resin flowing in from the gate at a position overlapping the gate in the arranged state.
It has a pressing surface that presses a part or all of the periphery of the insertion hole in the release film so that the pressed portion is brought into close contact with the bottom surface of the cavity, and forms a communication flow path that communicates the insertion hole and the cavity. A resin molding apparatus including a pressing flow path member.

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Publication number Priority date Publication date Assignee Title
JP7203926B1 (en) * 2021-10-19 2023-01-13 Towa株式会社 Mold for resin molding, resin molding apparatus, and method for manufacturing resin molded product
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Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07290503A (en) * 1994-04-21 1995-11-07 Hoei Kasei:Kk Injection molding method of photo-polymerization resin original material
JP3631308B2 (en) * 1995-10-25 2005-03-23 Towa株式会社 Resin sealing molding method for electronic parts
JPH10296778A (en) * 1997-04-23 1998-11-10 Apic Yamada Kk Method and device for resin molding using release film
JP2000036507A (en) * 1998-07-17 2000-02-02 Towa Corp Method for pouring resin by flip chip and metallic mold for pouring resin
JP2001145924A (en) * 1999-11-18 2001-05-29 Apic Yamada Corp Mold device for molding resin using release film
JP2001310357A (en) * 2000-04-27 2001-11-06 Apic Yamada Corp Mold apparatus for molding resin using release film, resin injection method, and resin curing method
US6439869B1 (en) * 2000-08-16 2002-08-27 Micron Technology, Inc. Apparatus for molding semiconductor components
JP2002160269A (en) * 2000-11-27 2002-06-04 Apic Yamada Corp Mold apparatus for molding resin using release film
JP3844195B2 (en) * 2001-05-25 2006-11-08 有限会社 テクノクリエイト Wafer resin sealing device
US6863850B2 (en) * 2002-10-16 2005-03-08 Lear Corporation Method and apparatus for injection foam molding
JP4314136B2 (en) * 2004-03-19 2009-08-12 アピックヤマダ株式会社 Resin sealing device
JP2009172770A (en) * 2008-01-21 2009-08-06 Bridgestone Corp Molding equipment and method for molding resin molding
JP2012148554A (en) * 2010-12-28 2012-08-09 Toray Ind Inc Method of manufacturing ic tag-integrated molding
CN102886848A (en) * 2012-09-27 2013-01-23 常州华阳光伏检测技术有限公司 Improved ice hockey manufacturing mould and manufacturing method thereof
JP5934139B2 (en) * 2013-04-19 2016-06-15 Towa株式会社 Resin sealing device and resin sealing method
JP6560498B2 (en) * 2015-01-27 2019-08-14 Towa株式会社 Resin sealing method and resin molded product manufacturing method
JP6397808B2 (en) * 2015-11-04 2018-09-26 アピックヤマダ株式会社 Resin molding die and resin molding method
JP6491508B2 (en) * 2015-03-23 2019-03-27 Towa株式会社 Resin sealing device and method of manufacturing resin molded product
JP6525805B2 (en) * 2015-08-10 2019-06-05 アピックヤマダ株式会社 Mold and mold device
JP7034702B2 (en) 2017-12-21 2022-03-14 Towa株式会社 Resin molding equipment and manufacturing method of resin molded products

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