JP2021019130A5 - - Google Patents

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Publication number
JP2021019130A5
JP2021019130A5 JP2019134833A JP2019134833A JP2021019130A5 JP 2021019130 A5 JP2021019130 A5 JP 2021019130A5 JP 2019134833 A JP2019134833 A JP 2019134833A JP 2019134833 A JP2019134833 A JP 2019134833A JP 2021019130 A5 JP2021019130 A5 JP 2021019130A5
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JP
Japan
Prior art keywords
substrate
cleaning
cleaning tool
arm
cylinder
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Application number
JP2019134833A
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English (en)
Japanese (ja)
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JP7153616B2 (ja
JP2021019130A (ja
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Priority claimed from JP2019134833A external-priority patent/JP7153616B2/ja
Priority to JP2019134833A priority Critical patent/JP7153616B2/ja
Priority to KR1020200087448A priority patent/KR20210011332A/ko
Priority to TW109123989A priority patent/TWI848150B/zh
Priority to CN202010701619.0A priority patent/CN112289703B/zh
Priority to US16/934,378 priority patent/US11311918B2/en
Publication of JP2021019130A publication Critical patent/JP2021019130A/ja
Publication of JP2021019130A5 publication Critical patent/JP2021019130A5/ja
Publication of JP7153616B2 publication Critical patent/JP7153616B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2019134833A 2019-07-22 2019-07-22 基板洗浄装置および基板洗浄方法 Active JP7153616B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2019134833A JP7153616B2 (ja) 2019-07-22 2019-07-22 基板洗浄装置および基板洗浄方法
KR1020200087448A KR20210011332A (ko) 2019-07-22 2020-07-15 기판 세정 장치 및 기판 세정 방법
TW109123989A TWI848150B (zh) 2019-07-22 2020-07-16 基板清洗裝置及基板清洗方法
CN202010701619.0A CN112289703B (zh) 2019-07-22 2020-07-20 基板清洗装置、基板处理装置及基板清洗方法
US16/934,378 US11311918B2 (en) 2019-07-22 2020-07-21 Substrate cleaning apparatus and substrate cleaning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019134833A JP7153616B2 (ja) 2019-07-22 2019-07-22 基板洗浄装置および基板洗浄方法

Publications (3)

Publication Number Publication Date
JP2021019130A JP2021019130A (ja) 2021-02-15
JP2021019130A5 true JP2021019130A5 (enExample) 2022-06-23
JP7153616B2 JP7153616B2 (ja) 2022-10-14

Family

ID=74187664

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019134833A Active JP7153616B2 (ja) 2019-07-22 2019-07-22 基板洗浄装置および基板洗浄方法

Country Status (4)

Country Link
US (1) US11311918B2 (enExample)
JP (1) JP7153616B2 (enExample)
KR (1) KR20210011332A (enExample)
TW (1) TWI848150B (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3919192B1 (en) * 2020-06-04 2023-11-29 Sugino Machine Limited Cleaning apparatus
CN112967996B (zh) * 2021-03-01 2024-01-05 昆山基侑电子科技有限公司 一种晶圆清洗固定装置
DE102021207398A1 (de) * 2021-07-13 2023-01-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Vorrichtung und Verfahren zur Beschichtung eines Substrates
JP7667719B2 (ja) * 2021-09-24 2025-04-23 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN116116851A (zh) * 2023-02-28 2023-05-16 华海清科股份有限公司 晶圆刷洗装置
CN116140264B (zh) * 2023-04-19 2023-08-18 河北安国振宇药业有限公司 一种三叶青制备用洗药机
KR102837787B1 (ko) * 2025-01-24 2025-07-24 주식회사 디바이스 처리액 회수 유닛을 포함하는 기판 처리 장치 및 처리액 회수 유닛의 구동 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01107129U (enExample) * 1988-01-08 1989-07-19
JP2887197B2 (ja) * 1994-09-20 1999-04-26 大日本スクリーン製造株式会社 回転式基板洗浄装置
JP3788855B2 (ja) * 1997-09-11 2006-06-21 大日本スクリーン製造株式会社 基板処理ユニットおよびそれを用いた基板処理装置
JP2000188274A (ja) 1998-12-21 2000-07-04 Sony Corp 基板洗浄装置
JP2005228961A (ja) 2004-02-13 2005-08-25 Dainippon Screen Mfg Co Ltd 基板洗浄装置
US10141205B2 (en) * 2014-09-26 2018-11-27 Acm Research (Shanghai) Inc. Apparatus and method for cleaning semiconductor wafer
JP6941464B2 (ja) * 2017-04-07 2021-09-29 株式会社荏原製作所 基板洗浄装置及び基板処理装置

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