JP2021004986A - ワイヤグリッド構造を有する偏光素子およびその製造方法 - Google Patents
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
Abstract
Description
先の図5に示した製造方法によりグラディエーション偏光素子を形成した。
11 基板
11a 基板部分
12,22,32 偏光部
13,23,33 金属部分
Claims (10)
- 所定の波長領域において所定の光透過率を有する基板と、
前記基板の主面にワイヤグリッド構造を有する複数の偏光部と、を備え、
前記複数の偏光部は、前記基板の主面において所定の方向に光透過率および偏光度の少なくとも一方が次第に変化するように、該所定の方向に沿って該主面の所定の面積当たりに占める割合が次第に変化するように配置してなる、偏光素子。 - 前記複数の偏光部は、前記所定の方向に沿って該複数の偏光部の各々の大きさを異ならせて前記所定の面積当たりに占める割合を変化させてなる、請求項1記載の偏光素子。
- 前記複数の偏光部は、前記所定の方向に沿って該複数の偏光部の各々の数を異ならせて前記所定の面積当たりに占める割合を変化させてなる、請求項1記載の偏光素子。
- 前記複数の偏光部は、前記所定の方向に沿って互いに離間して配置されてなる、請求項1〜3のうちいずれか一項記載の偏光素子。
- 前記複数の偏光部は、前記所定の方向に対して垂直方向に沿って所定の間隔に、かつ互いに離間して配置されてなる、請求項1〜4のうちいずれか一項記載の偏光素子。
- 前記複数の偏光部は、前記所定の方向に対して垂直方向に沿って規則的に配置されてなる、請求項1〜5のうちいずれか一項記載の偏光素子。
- 前記複数の偏光部は、各々、所定の形状で形成されてなる、請求項1〜6のうちいずれか一項記載の偏光素子。
- 前記複数の偏光部のワイヤグリッド構造は、スリット状に配列した導電体線から構成され、
前記複数の領域は、前記導電体線が所定の方向に配列してなる、請求項1〜7のうちいずれか一項記載の偏光素子。 - 前記複数の偏光部の代わりに、前記基板の主面に亘る前記ワイヤグリッド構造を有する他の偏光部と、
前記他の偏光部の一部に前記ワイヤグリッド構造を有していない複数の非偏光部と、を備え、
前記複数の非偏光部は、前記基板の主面において前記所定の方向に沿って該主面の所定の面積当たりに占める割合が次第に変化するように配置してなる、請求項1記載の偏光素子。 - 所定の方向に光透過率および偏光度の少なくとも一方が次第に変化する偏光素子の製造方法であって、
ワイヤグリッド構造を有する複数の偏光部が基板の主面の所定の面積当たりに占める割合が前記所定の方向に沿って次第に変化するように配置する設計データを作成するステップと、
前記設計データに基づいて、前記基板の主面に前記複数の偏光部を形成するステップと、
を含む、前記製造方法。
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JP2019118749A JP7333943B2 (ja) | 2019-06-26 | 2019-06-26 | ワイヤグリッド構造を有する偏光素子およびその製造方法 |
EP20831441.9A EP3992677A4 (en) | 2019-06-26 | 2020-05-27 | POLARIZING ELEMENT WITH WIRE GRID STRUCTURE AND METHOD OF PRODUCTION THEREOF |
PCT/JP2020/020986 WO2020261856A1 (ja) | 2019-06-26 | 2020-05-27 | ワイヤグリッド構造を有する偏光素子およびその製造方法 |
US17/535,748 US20220082751A1 (en) | 2019-06-26 | 2021-11-26 | Polarization element having wire-grid structure and manufacturing method thereof |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008522221A (ja) * | 2004-11-24 | 2008-06-26 | モックステック・インコーポレーテッド | ワイヤグリッド偏光子を使用して可視光ビームを補正するための方法及び装置 |
JP2012013806A (ja) * | 2010-06-29 | 2012-01-19 | Univ Of Tokyo | 偏光板 |
JP2012168531A (ja) * | 2011-02-14 | 2012-09-06 | Samsung Electronics Co Ltd | ディスプレイパネル |
US20130201557A1 (en) * | 2011-05-17 | 2013-08-08 | Mark Alan Davis | Wire grid polarizer with bordered sections |
JP2015075746A (ja) * | 2013-10-11 | 2015-04-20 | 旭化成イーマテリアルズ株式会社 | 偏光部材、眼鏡レンズ、偏光サングラス、ならびにコンバイナ |
US20160299380A1 (en) * | 2015-04-10 | 2016-10-13 | Samsung Display Co., Ltd. | Liquid crystal display and method for manufacturing the same |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102405436B (zh) * | 2009-02-05 | 2015-09-16 | 旭硝子株式会社 | 带偏振片的层叠体、带支承体的显示装置用面板、显示装置用面板、显示装置及它们的制造方法 |
JP2013024982A (ja) | 2011-07-19 | 2013-02-04 | Isuzu Seiko Glass Kk | ワイヤーグリッド偏光子およびその製造方法 |
KR102082783B1 (ko) * | 2013-07-23 | 2020-03-02 | 삼성디스플레이 주식회사 | 와이어 그리드 편광판 및 이를 구비하는 유기 발광 디스플레이 장치 |
US20160341859A1 (en) * | 2015-05-22 | 2016-11-24 | Board Of Regents, The University Of Texas System | Tag with a non-metallic metasurface that converts incident light into elliptically or circularly polarized light regardless of polarization state of the incident light |
JP6794645B2 (ja) | 2016-03-25 | 2020-12-02 | 大日本印刷株式会社 | 偏光子及び画像表示装置 |
JP6679366B2 (ja) * | 2016-03-25 | 2020-04-15 | キヤノン株式会社 | 光学装置および撮像装置 |
US10048413B2 (en) * | 2016-06-07 | 2018-08-14 | Goodrich Corporation | Imaging systems and methods |
KR102646213B1 (ko) * | 2016-06-30 | 2024-03-08 | 엘지디스플레이 주식회사 | 휘도 향상을 위한 광학부재 및 이를 구비한 유기전계발광 표시장치 |
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008522221A (ja) * | 2004-11-24 | 2008-06-26 | モックステック・インコーポレーテッド | ワイヤグリッド偏光子を使用して可視光ビームを補正するための方法及び装置 |
JP2012013806A (ja) * | 2010-06-29 | 2012-01-19 | Univ Of Tokyo | 偏光板 |
JP2012168531A (ja) * | 2011-02-14 | 2012-09-06 | Samsung Electronics Co Ltd | ディスプレイパネル |
US20130201557A1 (en) * | 2011-05-17 | 2013-08-08 | Mark Alan Davis | Wire grid polarizer with bordered sections |
JP2015075746A (ja) * | 2013-10-11 | 2015-04-20 | 旭化成イーマテリアルズ株式会社 | 偏光部材、眼鏡レンズ、偏光サングラス、ならびにコンバイナ |
US20160299380A1 (en) * | 2015-04-10 | 2016-10-13 | Samsung Display Co., Ltd. | Liquid crystal display and method for manufacturing the same |
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EP3992677A4 (en) | 2022-10-12 |
US20220082751A1 (en) | 2022-03-17 |
EP3992677A1 (en) | 2022-05-04 |
JP7333943B2 (ja) | 2023-08-28 |
WO2020261856A1 (ja) | 2020-12-30 |
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