JP2020534692A - 高アスペクト比堆積 - Google Patents

高アスペクト比堆積 Download PDF

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JP2020534692A
JP2020534692A JP2020515916A JP2020515916A JP2020534692A JP 2020534692 A JP2020534692 A JP 2020534692A JP 2020515916 A JP2020515916 A JP 2020515916A JP 2020515916 A JP2020515916 A JP 2020515916A JP 2020534692 A JP2020534692 A JP 2020534692A
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gas
plasma
volume chamber
pulse frequency
chamber
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JP2020534692A5 (enExample
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シャウナック ムケルジー，
シャウナック ムケルジー，
アブヒジット バス マリック，
アブヒジット バス マリック，
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Applied Materials Inc
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Applied Materials Inc
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    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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    • H10N70/8828—Tellurides, e.g. GeSbTe

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