JP2020520105A5 - - Google Patents

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Publication number
JP2020520105A5
JP2020520105A5 JP2019561307A JP2019561307A JP2020520105A5 JP 2020520105 A5 JP2020520105 A5 JP 2020520105A5 JP 2019561307 A JP2019561307 A JP 2019561307A JP 2019561307 A JP2019561307 A JP 2019561307A JP 2020520105 A5 JP2020520105 A5 JP 2020520105A5
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JP
Japan
Prior art keywords
chuck
edge
wafer
contact pad
grips
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2019561307A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020520105A (ja
JP7014817B2 (ja
Filing date
Publication date
Priority claimed from US15/652,659 external-priority patent/US10083852B1/en
Application filed filed Critical
Publication of JP2020520105A publication Critical patent/JP2020520105A/ja
Publication of JP2020520105A5 publication Critical patent/JP2020520105A5/ja
Application granted granted Critical
Publication of JP7014817B2 publication Critical patent/JP7014817B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2019561307A 2017-05-12 2018-05-11 浮遊式ウェハチャック Active JP7014817B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762505248P 2017-05-12 2017-05-12
US62/505,248 2017-05-12
US15/652,659 2017-07-18
US15/652,659 US10083852B1 (en) 2017-05-12 2017-07-18 Floating wafer chuck
PCT/US2018/032175 WO2018209160A1 (en) 2017-05-12 2018-05-11 Floating wafer chuck

Publications (3)

Publication Number Publication Date
JP2020520105A JP2020520105A (ja) 2020-07-02
JP2020520105A5 true JP2020520105A5 (enExample) 2021-07-26
JP7014817B2 JP7014817B2 (ja) 2022-02-01

Family

ID=63557076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019561307A Active JP7014817B2 (ja) 2017-05-12 2018-05-11 浮遊式ウェハチャック

Country Status (5)

Country Link
US (1) US10083852B1 (enExample)
JP (1) JP7014817B2 (enExample)
KR (1) KR102351354B1 (enExample)
CN (1) CN110612602B (enExample)
WO (1) WO2018209160A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111725129B (zh) * 2020-06-29 2023-02-14 北京北方华创微电子装备有限公司 晶圆承载装置及半导体工艺设备
WO2022057790A1 (zh) * 2020-09-15 2022-03-24 无锡华瑛微电子技术有限公司 半导体边缘处理装置和方法
EP4053634A1 (en) * 2021-03-02 2022-09-07 ASML Netherlands B.V. Substrate restraining system
US20240030006A1 (en) * 2022-07-25 2024-01-25 Micron Technology, Inc. Erosion rate monitoring for wafer fabrication equipment

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3217323B2 (ja) * 1999-03-03 2001-10-09 保 目崎 半導体材料の遠心処理装置
US20020066475A1 (en) * 2000-06-26 2002-06-06 Steven Verhaverbeke Chuck for holding wafer
JP4405048B2 (ja) * 2000-07-11 2010-01-27 Ｏｋｉセミコンダクタ株式会社 位置合せ用治具
JP4488646B2 (ja) * 2001-04-23 2010-06-23 株式会社トプコン ウェーハ保持装置
JP2004115872A (ja) * 2002-09-26 2004-04-15 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JP3890025B2 (ja) * 2003-03-10 2007-03-07 東京エレクトロン株式会社 塗布処理装置及び塗布処理方法
DE102004036435B4 (de) * 2003-08-07 2007-08-30 Nanophotonics Ag Haltevorrichtung für scheibenförmige Objekte
JP4189663B2 (ja) 2003-09-10 2008-12-03 株式会社安川電機 ウエハ把持装置
US7703823B2 (en) * 2004-07-12 2010-04-27 Rudolph Technologies, Inc. Wafer holding mechanism
KR20060074559A (ko) * 2004-12-27 2006-07-03 동부일렉트로닉스 주식회사 스핀 척의 웨이퍼 고정장치
JP4814731B2 (ja) * 2006-08-30 2011-11-16 株式会社日立ハイテクノロジーズ 基板保持装置、検査または処理の装置、基板保持方法、検査または処理の方法および検査装置
US7607647B2 (en) 2007-03-20 2009-10-27 Kla-Tencor Technologies Corporation Stabilizing a substrate using a vacuum preload air bearing chuck
KR20090029407A (ko) * 2007-09-18 2009-03-23 세메스 주식회사 지지부재 및 이를 구비하는 기판 처리 장치
US8714169B2 (en) * 2008-11-26 2014-05-06 Semes Co. Ltd. Spin head, apparatus for treating substrate, and method for treating substrate
JP5301505B2 (ja) 2009-08-27 2013-09-25 東京エレクトロン株式会社 液処理装置および液処理方法
JP5327144B2 (ja) 2010-06-16 2013-10-30 東京エレクトロン株式会社 処理装置及び処理方法
US8646767B2 (en) * 2010-07-23 2014-02-11 Lam Research Ag Device for holding wafer shaped articles
KR20120105669A (ko) * 2011-03-16 2012-09-26 주식회사 로보스타 에지 그립식 프리-얼라이너
US9421617B2 (en) * 2011-06-22 2016-08-23 Tel Nexx, Inc. Substrate holder
JP6019516B2 (ja) 2012-08-24 2016-11-02 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
US9653338B2 (en) * 2013-12-23 2017-05-16 Kla-Tencor Corporation System and method for non-contact wafer chucking
JP6562507B2 (ja) 2015-09-28 2019-08-21 株式会社Ｓｃｒｅｅｎホールディングス 基板保持装置およびこれを備える基板処理装置
US10283396B2 (en) * 2016-06-27 2019-05-07 Asm Nexx, Inc. Workpiece holder for a wet processing system

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