JP2020507678A5 - - Google Patents

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Publication number
JP2020507678A5
JP2020507678A5 JP2019542079A JP2019542079A JP2020507678A5 JP 2020507678 A5 JP2020507678 A5 JP 2020507678A5 JP 2019542079 A JP2019542079 A JP 2019542079A JP 2019542079 A JP2019542079 A JP 2019542079A JP 2020507678 A5 JP2020507678 A5 JP 2020507678A5
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JP
Japan
Prior art keywords
workpiece
pulse voltage
voltage source
coupled
plasma chamber
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JP2019542079A
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English (en)
Japanese (ja)
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JP2020507678A (ja
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Priority claimed from US15/424,405 external-priority patent/US10373804B2/en
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Publication of JP2020507678A publication Critical patent/JP2020507678A/ja
Publication of JP2020507678A5 publication Critical patent/JP2020507678A5/ja
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JP2019542079A 2017-02-03 2018-01-29 プラズマリアクタ内での調整可能なワークピースバイアス用システム Pending JP2020507678A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/424,405 2017-02-03
US15/424,405 US10373804B2 (en) 2017-02-03 2017-02-03 System for tunable workpiece biasing in a plasma reactor
PCT/US2018/015688 WO2018144374A1 (en) 2017-02-03 2018-01-29 System for tunable workpiece biasing in a plasma reactor

Publications (2)

Publication Number Publication Date
JP2020507678A JP2020507678A (ja) 2020-03-12
JP2020507678A5 true JP2020507678A5 (cg-RX-API-DMAC7.html) 2021-02-25

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JP2019542079A Pending JP2020507678A (ja) 2017-02-03 2018-01-29 プラズマリアクタ内での調整可能なワークピースバイアス用システム

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US (3) US10373804B2 (cg-RX-API-DMAC7.html)
JP (1) JP2020507678A (cg-RX-API-DMAC7.html)
KR (1) KR20190105243A (cg-RX-API-DMAC7.html)
CN (1) CN110249407A (cg-RX-API-DMAC7.html)
TW (1) TW201832620A (cg-RX-API-DMAC7.html)
WO (1) WO2018144374A1 (cg-RX-API-DMAC7.html)

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