JP2020088259A - 基板支持装置、基板搬送ロボットおよびアライナ装置 - Google Patents
基板支持装置、基板搬送ロボットおよびアライナ装置 Download PDFInfo
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- JP2020088259A JP2020088259A JP2018223225A JP2018223225A JP2020088259A JP 2020088259 A JP2020088259 A JP 2020088259A JP 2018223225 A JP2018223225 A JP 2018223225A JP 2018223225 A JP2018223225 A JP 2018223225A JP 2020088259 A JP2020088259 A JP 2020088259A
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- substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/74—Feeding, transfer, or discharging devices of particular kinds or types
- B65G47/90—Devices for picking-up and depositing articles or materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Abstract
Description
10 基板搬送ロボット(ロボット)
11 第1アーム
12 第2アーム
13 ロボットハンド(ハンド)
13a 基部
15 本体部
16 昇降部
41 基端部
42 フォーク部
100 パッド
110 第1固定部
111 支持部
112 フック部
112a 軸部
112b 傘部
120 第2固定部
121 支持部
122 フック部
130 ブリッジ部
140 ストッパ部
200 ブレード
211 第1孔部
212 第2孔部
221 第1凹部
222 第2凹部
500 基板
500C 中心線
510 外周部
510e エッジ部
600 アライナ装置
610 本体部
620 回転支持部
621 支持アーム
630 昇降支持部
631 支持アーム
640 センサ部
641 検出部
Claims (12)
- ブレードと、
前記ブレードに固定され、基板を支持するパッドと
を備え、
前記パッドは、
支持される前記基板の外周部よりも外側の位置に固定される第1固定部と、
前記外周部よりも内側の位置に固定される第2固定部と、
前記第1固定部および前記第2固定部を繋ぎ、前記外周部を支持するブリッジ部と
を備え、
前記ブリッジ部は、
可撓性部材で形成され、
前記基板を支持していない状態で前記第1固定部から前記第2固定部へ向かって上面が下り傾斜であること
を特徴とする基板支持装置。 - 前記ブリッジ部は、
前記基板を支持していない状態で下面が前記ブレードの表面から離れており、前記基板を支持した状態で該基板の自重により、該基板のエッジ部の形状に倣ってたわむこと
を特徴とする請求項1に記載の基板支持装置。 - 前記基板は、
円板状であり、
前記パッドは、
前記第1固定部および前記第2固定部が当該基板の径方向に沿うように前記ブレードに少なくとも3つ設けられること
を特徴とする請求項1または2に記載の基板支持装置。 - 前記ブレードは、
前記第1固定部を嵌め込む第1孔部と、
前記第2固定部を嵌め込む第2孔部と
を備えることを特徴とする請求項1〜3のいずれか一つに記載の基板支持装置。 - 前記第2孔部は、
前記ブレードの上面よりも低い底面を有する第2凹部に設けられ、
前記第2凹部は、
前記第1孔部へ向かって延伸し、前記ブリッジ部よりも幅広であること
を特徴とする請求項4に記載の基板支持装置。 - 前記第1孔部は、
前記ブレードの上面よりも低く、前記第2凹部の底面よりも高い底面を有する第1凹部に設けられ、
前記第1凹部は、
前記第2孔部へ向かって延伸し、前記ブリッジ部よりも幅広であること
を特徴とする請求項5に記載の基板支持装置。 - 前記第1固定部は、
前記ブリッジ部の上面よりも上端が高いストッパ部
を備えることを特徴とする請求項4〜6のいずれか一つに記載の基板支持装置。 - 前記ストッパ部は、
前記ブリッジ部によって支持される前記基板の上面よりも上端が高いこと
を特徴とする請求項7に記載の基板支持装置。 - 前記第1固定部および前記第2固定部は、
前記第1孔部あるいは前記第2孔部にそれぞれ挿入されて前記ブレードの下面側に引っ掛かるフック部と、
前記第1孔部あるいは前記第2孔部の上端よりも高い位置で前記ブリッジ部を支持する支持部と
をそれぞれ備えることを特徴とする請求項4〜8のいずれか一つに記載の基板支持装置。 - 前記第2固定部は、
前記ブリッジ部の上面と上端が面一であり、前記基板の自重によって前記ブリッジ部がたわむことにより、当該基板が当該上端に載ること
を特徴とする請求項4〜9のいずれか一つに記載の基板支持装置。 - 請求項1〜10のいずれか一つに記載の基板支持装置を有するハンド
を備えることを特徴とする基板搬送ロボット。 - 請求項1〜10のいずれか一つに記載の基板支持装置
を備えることを特徴とするアライナ装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018223225A JP7131334B2 (ja) | 2018-11-29 | 2018-11-29 | 基板支持装置、基板搬送ロボットおよびアライナ装置 |
KR1020190117139A KR102477733B1 (ko) | 2018-11-29 | 2019-09-24 | 기판 지지 장치, 기판 반송 로봇 및 얼라이너 장치 |
CN201911064736.4A CN111244019A (zh) | 2018-11-29 | 2019-11-04 | 基板支承装置、基板运送机器人以及对准装置 |
US16/689,089 US11295976B2 (en) | 2018-11-29 | 2019-11-20 | Substrate support device, substrate conveyance robot, and aligner device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018223225A JP7131334B2 (ja) | 2018-11-29 | 2018-11-29 | 基板支持装置、基板搬送ロボットおよびアライナ装置 |
Publications (2)
Publication Number | Publication Date |
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JP2020088259A true JP2020088259A (ja) | 2020-06-04 |
JP7131334B2 JP7131334B2 (ja) | 2022-09-06 |
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JP2018223225A Active JP7131334B2 (ja) | 2018-11-29 | 2018-11-29 | 基板支持装置、基板搬送ロボットおよびアライナ装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US11295976B2 (ja) |
JP (1) | JP7131334B2 (ja) |
KR (1) | KR102477733B1 (ja) |
CN (1) | CN111244019A (ja) |
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CN112542412A (zh) * | 2020-12-07 | 2021-03-23 | 长江存储科技有限责任公司 | 一种机械手臂及晶圆抓取装置 |
Citations (4)
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JP2003168717A (ja) * | 2001-12-03 | 2003-06-13 | Yaskawa Electric Corp | ウェハ搬送フォーク |
WO2011096208A1 (ja) * | 2010-02-05 | 2011-08-11 | 東京エレクトロン株式会社 | 基板保持具及び基板搬送装置及び基板処理装置 |
JP2017143179A (ja) * | 2016-02-10 | 2017-08-17 | 株式会社荏原製作所 | 基板搬送用ハンド |
JP2017208451A (ja) * | 2016-05-18 | 2017-11-24 | キヤノントッキ株式会社 | 基板搬送装置 |
Family Cites Families (13)
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JP2002170862A (ja) | 2000-12-01 | 2002-06-14 | Yaskawa Electric Corp | ウェハー把持装置 |
KR101018909B1 (ko) * | 2002-10-25 | 2011-03-02 | 도쿄엘렉트론가부시키가이샤 | 기판 얼라이먼트장치, 기판처리장치 및 기판반송장치 |
JP2006000748A (ja) * | 2004-06-17 | 2006-01-05 | Tokyo Ohka Kogyo Co Ltd | 基板端縁部被膜の除去装置 |
KR101534357B1 (ko) * | 2009-03-31 | 2015-07-06 | 도쿄엘렉트론가부시키가이샤 | 기판 지지 장치 및 기판 지지 방법 |
US9360772B2 (en) * | 2011-12-29 | 2016-06-07 | Nikon Corporation | Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method |
KR101973349B1 (ko) * | 2012-09-14 | 2019-04-26 | 가부시키가이샤 니콘 | 기판 처리 장치 및 디바이스 제조 방법 |
JP6222952B2 (ja) * | 2013-03-19 | 2017-11-01 | 三菱日立パワーシステムズ株式会社 | 回転軸支持構造 |
JP6226712B2 (ja) * | 2013-11-21 | 2017-11-08 | 光洋サーモシステム株式会社 | 基板支持構造 |
JP5929947B2 (ja) * | 2014-02-28 | 2016-06-08 | 株式会社安川電機 | 吸着パッド、ロボットハンドおよびロボット |
CN107408527A (zh) * | 2015-04-15 | 2017-11-28 | 川崎重工业株式会社 | 基板搬送机器人及其末端执行器 |
US20170040205A1 (en) * | 2015-08-05 | 2017-02-09 | Lam Research Corporation | High-hardness-material-powder infused elastomer for high friction and compliance for silicon wafer transfer |
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KR102397110B1 (ko) * | 2016-06-13 | 2022-05-12 | 도쿄엘렉트론가부시키가이샤 | 기판 반송 장치 및 기판 반송 방법 |
-
2018
- 2018-11-29 JP JP2018223225A patent/JP7131334B2/ja active Active
-
2019
- 2019-09-24 KR KR1020190117139A patent/KR102477733B1/ko active IP Right Grant
- 2019-11-04 CN CN201911064736.4A patent/CN111244019A/zh active Pending
- 2019-11-20 US US16/689,089 patent/US11295976B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003168717A (ja) * | 2001-12-03 | 2003-06-13 | Yaskawa Electric Corp | ウェハ搬送フォーク |
WO2011096208A1 (ja) * | 2010-02-05 | 2011-08-11 | 東京エレクトロン株式会社 | 基板保持具及び基板搬送装置及び基板処理装置 |
JP2017143179A (ja) * | 2016-02-10 | 2017-08-17 | 株式会社荏原製作所 | 基板搬送用ハンド |
JP2017208451A (ja) * | 2016-05-18 | 2017-11-24 | キヤノントッキ株式会社 | 基板搬送装置 |
Also Published As
Publication number | Publication date |
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KR102477733B1 (ko) | 2022-12-14 |
JP7131334B2 (ja) | 2022-09-06 |
US11295976B2 (en) | 2022-04-05 |
CN111244019A (zh) | 2020-06-05 |
KR20200064890A (ko) | 2020-06-08 |
US20200176299A1 (en) | 2020-06-04 |
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