JP2020033619A5 - - Google Patents

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Publication number
JP2020033619A5
JP2020033619A5 JP2018162190A JP2018162190A JP2020033619A5 JP 2020033619 A5 JP2020033619 A5 JP 2020033619A5 JP 2018162190 A JP2018162190 A JP 2018162190A JP 2018162190 A JP2018162190 A JP 2018162190A JP 2020033619 A5 JP2020033619 A5 JP 2020033619A5
Authority
JP
Japan
Prior art keywords
piping
electrode
exhaust
internal electrode
internal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2018162190A
Other languages
English (en)
Japanese (ja)
Other versions
JP2020033619A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2018162190A priority Critical patent/JP2020033619A/ja
Priority claimed from JP2018162190A external-priority patent/JP2020033619A/ja
Priority to US16/292,260 priority patent/US20200075297A1/en
Publication of JP2020033619A publication Critical patent/JP2020033619A/ja
Publication of JP2020033619A5 publication Critical patent/JP2020033619A5/ja
Abandoned legal-status Critical Current

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JP2018162190A 2018-08-30 2018-08-30 排気配管装置及びクリーニング装置 Abandoned JP2020033619A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2018162190A JP2020033619A (ja) 2018-08-30 2018-08-30 排気配管装置及びクリーニング装置
US16/292,260 US20200075297A1 (en) 2018-08-30 2019-03-04 Exhaust pipe device and cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018162190A JP2020033619A (ja) 2018-08-30 2018-08-30 排気配管装置及びクリーニング装置

Publications (2)

Publication Number Publication Date
JP2020033619A JP2020033619A (ja) 2020-03-05
JP2020033619A5 true JP2020033619A5 (https=) 2021-05-20

Family

ID=69642285

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018162190A Abandoned JP2020033619A (ja) 2018-08-30 2018-08-30 排気配管装置及びクリーニング装置

Country Status (2)

Country Link
US (1) US20200075297A1 (https=)
JP (1) JP2020033619A (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102477302B1 (ko) * 2015-10-05 2022-12-13 주성엔지니어링(주) 배기가스 분해기를 가지는 기판처리장치 및 그 배기가스 처리방법
US11533801B2 (en) * 2017-11-30 2022-12-20 Corning Incorporated Atmospheric pressure linear rf plasma source for surface modification and treatment
CN113169101B (zh) * 2019-01-08 2022-09-30 应用材料公司 用于基板处理腔室的泵送设备与方法
TWI783382B (zh) * 2020-03-18 2022-11-11 日商國際電氣股份有限公司 基板處理裝置，排氣裝置及半導體裝置的製造方法
KR102788559B1 (ko) * 2020-08-20 2025-04-01 삼성전자주식회사 베이크 유닛
JP7494059B2 (ja) * 2020-08-27 2024-06-03 キオクシア株式会社 排気配管装置
JP7107601B1 (ja) * 2021-01-27 2022-07-27 Ａｉメカテック株式会社 バンプ形成装置、バンプ形成方法、ハンダボールリペア装置、及び、ハンダボールリペア方法
CN112921304A (zh) * 2021-04-01 2021-06-08 无锡琨圣智能装备股份有限公司 一种多炉管的原子层沉积设备
KR20230025590A (ko) * 2021-08-13 2023-02-22 삼성디스플레이 주식회사 배출 방법, 배출 시스템 및 이를 포함하는 기판 처리 장치
JP7725346B2 (ja) * 2021-11-25 2025-08-19 キオクシア株式会社 排気配管装置
US12562358B2 (en) * 2022-04-28 2026-02-24 Horiba Stec Co., Ltd. System and method for detecting endpoint in plasma processing
KR102933889B1 (ko) * 2023-10-11 2026-03-05 한국기계연구원 전극 삽입형 배관 내면 처리장치 및 이를 이용한 배관 내면 처리방법

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