JP2019533306A5 - - Google Patents
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- Publication number
- JP2019533306A5 JP2019533306A5 JP2019515489A JP2019515489A JP2019533306A5 JP 2019533306 A5 JP2019533306 A5 JP 2019533306A5 JP 2019515489 A JP2019515489 A JP 2019515489A JP 2019515489 A JP2019515489 A JP 2019515489A JP 2019533306 A5 JP2019533306 A5 JP 2019533306A5
- Authority
- JP
- Japan
- Prior art keywords
- pedestal assembly
- hollow core
- heat shield
- assembly according
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662398310P | 2016-09-22 | 2016-09-22 | |
| US62/398,310 | 2016-09-22 | ||
| PCT/US2017/051373 WO2018057369A1 (en) | 2016-09-22 | 2017-09-13 | Heater pedestal assembly for wide range temperature control |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019533306A JP2019533306A (ja) | 2019-11-14 |
| JP2019533306A5 true JP2019533306A5 (enExample) | 2020-10-22 |
| JP7073349B2 JP7073349B2 (ja) | 2022-05-23 |
Family
ID=61621254
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019515489A Active JP7073349B2 (ja) | 2016-09-22 | 2017-09-13 | 広範囲にわたる温度制御のためのヒータペデスタルアセンブリ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10910238B2 (enExample) |
| JP (1) | JP7073349B2 (enExample) |
| KR (1) | KR102236934B1 (enExample) |
| CN (1) | CN109716497B (enExample) |
| TW (2) | TWI671851B (enExample) |
| WO (1) | WO2018057369A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106607320B (zh) * | 2016-12-22 | 2019-10-01 | 武汉华星光电技术有限公司 | 适用于柔性基板的热真空干燥装置 |
| KR102460313B1 (ko) * | 2018-12-13 | 2022-10-28 | 주식회사 원익아이피에스 | 기판 처리 장치의 서셉터 및 기판 처리 장치 |
| TWI811307B (zh) * | 2019-03-12 | 2023-08-11 | 鴻創應用科技有限公司 | 陶瓷電路複合結構及其製造方法 |
| US12420314B2 (en) * | 2019-10-18 | 2025-09-23 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor cleaning apparatus and method |
| US11515176B2 (en) * | 2020-04-14 | 2022-11-29 | Applied Materials, Inc. | Thermally controlled lid stack components |
| US20220028710A1 (en) * | 2020-07-21 | 2022-01-27 | Applied Materials, Inc. | Distribution components for semiconductor processing systems |
| US12020957B2 (en) * | 2020-08-31 | 2024-06-25 | Applied Materials, Inc. | Heater assembly with process gap control for batch processing chambers |
| JP7490508B2 (ja) * | 2020-09-09 | 2024-05-27 | 日本電子株式会社 | 三次元積層造形装置 |
| US20230069317A1 (en) * | 2021-08-25 | 2023-03-02 | Applied Materials, Inc. | Thermal choke plate |
| TWI890199B (zh) * | 2022-12-02 | 2025-07-11 | 日商鎧俠股份有限公司 | 半導體裝置冷卻裝置 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4256503B2 (ja) * | 1997-10-30 | 2009-04-22 | 東京エレクトロン株式会社 | 真空処理装置 |
| WO2000026960A1 (fr) * | 1998-10-29 | 2000-05-11 | Tokyo Electron Limited | Dispositif de traitement sous vide |
| JP2003060973A (ja) * | 2001-08-21 | 2003-02-28 | Mitsubishi Heavy Ind Ltd | 監視カメラ誘導用送信器、監視カメラ、及び、監視システム |
| JP4574987B2 (ja) * | 2002-01-10 | 2010-11-04 | 東京エレクトロン株式会社 | 処理装置 |
| WO2004090960A1 (ja) * | 2003-04-07 | 2004-10-21 | Tokyo Electron Limited | 載置台構造及びこの載置台構造を有する熱処理装置 |
| JP4761774B2 (ja) * | 2005-01-12 | 2011-08-31 | 東京エレクトロン株式会社 | 温度／厚さ測定装置，温度／厚さ測定方法，温度／厚さ測定システム，制御システム，制御方法 |
| CN100358098C (zh) | 2005-08-05 | 2007-12-26 | 中微半导体设备(上海)有限公司 | 半导体工艺件处理装置 |
| US20070169703A1 (en) * | 2006-01-23 | 2007-07-26 | Brent Elliot | Advanced ceramic heater for substrate processing |
| US7705238B2 (en) * | 2006-05-22 | 2010-04-27 | Andrew Llc | Coaxial RF device thermally conductive polymer insulator and method of manufacture |
| KR101560138B1 (ko) | 2008-06-24 | 2015-10-14 | 어플라이드 머티어리얼스, 인코포레이티드 | 저온 ｐｅｃｖｄ 애플리케이션을 위한 받침대 히터 |
| US8274017B2 (en) * | 2009-12-18 | 2012-09-25 | Applied Materials, Inc. | Multifunctional heater/chiller pedestal for wide range wafer temperature control |
| US8733280B2 (en) | 2010-12-20 | 2014-05-27 | Intermolecular, Inc. | Showerhead for processing chamber |
| JP6005946B2 (ja) * | 2012-02-07 | 2016-10-12 | 株式会社Ｓｃｒｅｅｎホールディングス | 熱処理装置 |
| US9089007B2 (en) | 2012-04-27 | 2015-07-21 | Applied Materials, Inc. | Method and apparatus for substrate support with multi-zone heating |
| US10177014B2 (en) * | 2012-12-14 | 2019-01-08 | Applied Materials, Inc. | Thermal radiation barrier for substrate processing chamber components |
| WO2014116392A1 (en) * | 2013-01-25 | 2014-07-31 | Applied Materials, Inc. | Electrostatic chuck with concentric cooling base |
| US9698074B2 (en) | 2013-09-16 | 2017-07-04 | Applied Materials, Inc. | Heated substrate support with temperature profile control |
| US20150194326A1 (en) * | 2014-01-07 | 2015-07-09 | Applied Materials, Inc. | Pecvd ceramic heater with wide range of operating temperatures |
| CN204793612U (zh) * | 2015-04-17 | 2015-11-18 | 李后杰 | 用于激光二极管的封装结构 |
| CN104990175A (zh) * | 2015-07-28 | 2015-10-21 | 珠海格力电器股份有限公司 | 一种辐射换热板组件 |
-
2017
- 2017-08-28 TW TW106129088A patent/TWI671851B/zh active
- 2017-08-28 TW TW108127817A patent/TWI729447B/zh active
- 2017-09-13 KR KR1020197011339A patent/KR102236934B1/ko active Active
- 2017-09-13 US US15/703,666 patent/US10910238B2/en active Active
- 2017-09-13 WO PCT/US2017/051373 patent/WO2018057369A1/en not_active Ceased
- 2017-09-13 JP JP2019515489A patent/JP7073349B2/ja active Active
- 2017-09-13 CN CN201780057399.9A patent/CN109716497B/zh active Active
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