JP2019531120A5 - - Google Patents

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Publication number
JP2019531120A5
JP2019531120A5 JP2019512893A JP2019512893A JP2019531120A5 JP 2019531120 A5 JP2019531120 A5 JP 2019531120A5 JP 2019512893 A JP2019512893 A JP 2019512893A JP 2019512893 A JP2019512893 A JP 2019512893A JP 2019531120 A5 JP2019531120 A5 JP 2019531120A5
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JP
Japan
Prior art keywords
lattice structure
proximal
ray
edge
imaging system
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JP2019512893A
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English (en)
Japanese (ja)
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JP2019531120A (ja
JP7044764B6 (ja
JP7044764B2 (ja
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Priority claimed from PCT/EP2017/071806 external-priority patent/WO2018046377A1/en
Publication of JP2019531120A publication Critical patent/JP2019531120A/ja
Publication of JP2019531120A5 publication Critical patent/JP2019531120A5/ja
Application granted granted Critical
Publication of JP7044764B2 publication Critical patent/JP7044764B2/ja
Publication of JP7044764B6 publication Critical patent/JP7044764B6/ja
Expired - Fee Related legal-status Critical Current
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JP2019512893A 2016-09-08 2017-08-30 X線撮像のための線源格子 Expired - Fee Related JP7044764B6 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP16187753 2016-09-08
EP16187753.5 2016-09-08
PCT/EP2017/071806 WO2018046377A1 (en) 2016-09-08 2017-08-30 Source grating for x-ray imaging

Publications (4)

Publication Number Publication Date
JP2019531120A JP2019531120A (ja) 2019-10-31
JP2019531120A5 true JP2019531120A5 (OSRAM) 2020-10-08
JP7044764B2 JP7044764B2 (ja) 2022-03-30
JP7044764B6 JP7044764B6 (ja) 2022-05-31

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Family Applications (1)

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JP2019512893A Expired - Fee Related JP7044764B6 (ja) 2016-09-08 2017-08-30 X線撮像のための線源格子

Country Status (5)

Country Link
US (1) US10835193B2 (OSRAM)
EP (1) EP3509492B1 (OSRAM)
JP (1) JP7044764B6 (OSRAM)
CN (1) CN109688930A (OSRAM)
WO (1) WO2018046377A1 (OSRAM)

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EP3603515A1 (en) * 2018-08-01 2020-02-05 Koninklijke Philips N.V. Apparatus for generating x-ray imaging data
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CN112638261B (zh) 2018-09-04 2025-06-27 斯格瑞公司 利用滤波的x射线荧光的系统和方法
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
JP7182749B2 (ja) 2019-09-03 2022-12-02 シグレイ、インコーポレイテッド コンピュータ断層撮影蛍光x線撮像のためのシステムおよび方法
US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
US11217357B2 (en) 2020-02-10 2022-01-04 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles
WO2021237237A1 (en) 2020-05-18 2021-11-25 Sigray, Inc. System and method for x-ray absorption spectroscopy using a crystal analyzer and a plurality of detector elements
CN111839579B (zh) * 2020-09-02 2025-06-27 上海联影医疗科技股份有限公司 一种x射线成像设备的限束器及x射线成像设备
WO2022061347A1 (en) 2020-09-17 2022-03-24 Sigray, Inc. System and method using x-rays for depth-resolving metrology and analysis
KR20260030946A (ko) 2020-12-07 2026-03-06 시그레이, 아이엔씨. 투과 x-선 소스를 이용한 고처리량 3D x-선 이미징 시스템
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US11992350B2 (en) 2022-03-15 2024-05-28 Sigray, Inc. System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector
WO2023215204A1 (en) 2022-05-02 2023-11-09 Sigray, Inc. X-ray sequential array wavelength dispersive spectrometer
DE112024000873T5 (de) 2023-02-16 2026-01-15 Sigray, Inc. Röntgen-detektorsystem mit mindestens zwei gestapelten flachen bragg-diffraktoren
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources
US12429437B2 (en) 2023-11-07 2025-09-30 Sigray, Inc. System and method for x-ray absorption spectroscopy using spectral information from two orthogonal planes
WO2025151383A1 (en) 2024-01-08 2025-07-17 Sigray, Inc. X-ray analysis system with focused x-ray beam and non-x-ray microscope
WO2025155719A1 (en) 2024-01-18 2025-07-24 Sigray, Inc. Sequential array of x-ray imaging detectors
WO2025174966A1 (en) 2024-02-15 2025-08-21 Sigray, Inc. System and method for generating a focused x‑ray beam

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