JP2019518594A5 - - Google Patents

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Publication number
JP2019518594A5
JP2019518594A5 JP2018560940A JP2018560940A JP2019518594A5 JP 2019518594 A5 JP2019518594 A5 JP 2019518594A5 JP 2018560940 A JP2018560940 A JP 2018560940A JP 2018560940 A JP2018560940 A JP 2018560940A JP 2019518594 A5 JP2019518594 A5 JP 2019518594A5
Authority
JP
Japan
Prior art keywords
lenses
substrate
region
processing chamber
support assembly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018560940A
Other languages
English (en)
Japanese (ja)
Other versions
JP6902053B2 (ja
JP2019518594A (ja
Filing date
Publication date
Priority claimed from US15/165,930 external-priority patent/US10541159B2/en
Application filed filed Critical
Publication of JP2019518594A publication Critical patent/JP2019518594A/ja
Publication of JP2019518594A5 publication Critical patent/JP2019518594A5/ja
Application granted granted Critical
Publication of JP6902053B2 publication Critical patent/JP6902053B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2018560940A 2016-05-26 2017-05-26 照射硬化レンズを備える処理チャンバ Expired - Fee Related JP6902053B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15/165,930 US10541159B2 (en) 2016-05-26 2016-05-26 Processing chamber with irradiance curing lens
US15/165,930 2016-05-26
PCT/US2017/034622 WO2017205714A1 (en) 2016-05-26 2017-05-26 Processing chamber with irradiance curing lens

Publications (3)

Publication Number Publication Date
JP2019518594A JP2019518594A (ja) 2019-07-04
JP2019518594A5 true JP2019518594A5 (enExample) 2020-07-09
JP6902053B2 JP6902053B2 (ja) 2021-07-14

Family

ID=60411566

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018560940A Expired - Fee Related JP6902053B2 (ja) 2016-05-26 2017-05-26 照射硬化レンズを備える処理チャンバ

Country Status (5)

Country Link
US (1) US10541159B2 (enExample)
JP (1) JP6902053B2 (enExample)
KR (1) KR102171712B1 (enExample)
CN (1) CN109155234B (enExample)
WO (1) WO2017205714A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024516397A (ja) * 2021-04-29 2024-04-15 アプライド マテリアルズ インコーポレイテッド 急速熱処理チャンバのためのウィンドウ

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4755654A (en) * 1987-03-26 1988-07-05 Crowley John L Semiconductor wafer heating chamber
JPH03277774A (ja) * 1990-03-27 1991-12-09 Semiconductor Energy Lab Co Ltd 光気相反応装置
JP3115822B2 (ja) * 1996-06-04 2000-12-11 松下電子工業株式会社 紫外線照射装置およびその照射方法
US6809012B2 (en) * 2001-01-18 2004-10-26 Semiconductor Energy Laboratory Co., Ltd. Method of making a thin film transistor using laser annealing
US6547422B2 (en) * 2001-08-08 2003-04-15 Prokia Technology Co., Ltd. Illuminating module for a display apparatus
US6879777B2 (en) 2002-10-03 2005-04-12 Asm America, Inc. Localized heating of substrates using optics
US6862404B1 (en) * 2003-09-08 2005-03-01 Wafermasters Focused photon energy heating chamber
US8137465B1 (en) * 2005-04-26 2012-03-20 Novellus Systems, Inc. Single-chamber sequential curing of semiconductor wafers
US8980769B1 (en) * 2005-04-26 2015-03-17 Novellus Systems, Inc. Multi-station sequential curing of dielectric films
JP2007229682A (ja) 2006-03-03 2007-09-13 Harison Toshiba Lighting Corp 紫外線照射装置
SG136078A1 (en) * 2006-03-17 2007-10-29 Applied Materials Inc Uv cure system
JP2007317991A (ja) * 2006-05-29 2007-12-06 Advanced Lcd Technologies Development Center Co Ltd 半導体装置の製造方法並びに薄膜トランジスタ
US7851232B2 (en) * 2006-10-30 2010-12-14 Novellus Systems, Inc. UV treatment for carbon-containing low-k dielectric repair in semiconductor processing
JP5282669B2 (ja) * 2009-06-12 2013-09-04 ウシオ電機株式会社 光照射装置
US8309421B2 (en) * 2010-11-24 2012-11-13 Applied Materials, Inc. Dual-bulb lamphead control methodology
KR20140090631A (ko) 2011-10-14 2014-07-17 크루서블 인텔렉츄얼 프라퍼티 엘엘씨. 일렬식 온도 제어 용융을 위한 봉쇄 게이트
KR20130112549A (ko) 2012-04-04 2013-10-14 박흥균 자외선 경화장치용 광학모듈
US9905444B2 (en) 2012-04-25 2018-02-27 Applied Materials, Inc. Optics for controlling light transmitted through a conical quartz dome
US9287154B2 (en) * 2012-06-01 2016-03-15 Taiwan Semiconductor Manufacturing Co., Ltd. UV curing system for semiconductors
JP6197641B2 (ja) * 2013-12-26 2017-09-20 ウシオ電機株式会社 真空紫外光照射処理装置

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