JP2019517023A5 - - Google Patents
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- Publication number
- JP2019517023A5 JP2019517023A5 JP2018556382A JP2018556382A JP2019517023A5 JP 2019517023 A5 JP2019517023 A5 JP 2019517023A5 JP 2018556382 A JP2018556382 A JP 2018556382A JP 2018556382 A JP2018556382 A JP 2018556382A JP 2019517023 A5 JP2019517023 A5 JP 2019517023A5
- Authority
- JP
- Japan
- Prior art keywords
- alkylene
- formula
- heterocycloalkylene
- heteroalkylene
- cycloalkylene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000002947 alkylene group Chemical group 0.000 claims description 3
- 125000006586 (C3-C10) cycloalkylene group Chemical group 0.000 claims description 2
- 125000006585 (C6-C10) arylene group Chemical group 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000004474 heteroalkylene group Chemical group 0.000 claims description 2
- 125000006588 heterocycloalkylene group Chemical group 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 239000004593 Epoxy Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000011342 resin composition Substances 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2016-0061371 | 2016-05-19 | ||
| KR20160061371 | 2016-05-19 | ||
| KR10-2017-0039208 | 2017-03-28 | ||
| KR1020170039208A KR102310794B1 (ko) | 2016-05-19 | 2017-03-28 | 감광성 수지 조성물 및 이로부터 제조된 경화막 |
| PCT/KR2017/003421 WO2017200201A1 (en) | 2016-05-19 | 2017-03-29 | Photosensitive resin composition and cured film prepared therefrom |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019517023A JP2019517023A (ja) | 2019-06-20 |
| JP2019517023A5 true JP2019517023A5 (enExample) | 2021-09-24 |
| JP6983812B2 JP6983812B2 (ja) | 2021-12-17 |
Family
ID=60812284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018556382A Active JP6983812B2 (ja) | 2016-05-19 | 2017-03-29 | 感光性樹脂組成物及びそれから調製される硬化膜 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US20190137877A1 (enExample) |
| JP (1) | JP6983812B2 (enExample) |
| KR (1) | KR102310794B1 (enExample) |
| CN (1) | CN109073971B (enExample) |
| TW (1) | TWI758290B (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102674721B1 (ko) * | 2018-11-29 | 2024-06-14 | 듀폰스페셜티머터리얼스코리아 유한회사 | 포지티브형 감광성 수지 조성물 및 이로부터 제조된 경화막 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1662322B1 (en) | 2004-11-26 | 2017-01-11 | Toray Industries, Inc. | Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film |
| JP2007193318A (ja) * | 2005-12-21 | 2007-08-02 | Toray Ind Inc | 感光性シロキサン組成物、それから形成された硬化膜および硬化膜を有する素子 |
| JP4849251B2 (ja) * | 2007-01-18 | 2012-01-11 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法 |
| JP4947300B2 (ja) * | 2007-06-14 | 2012-06-06 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズならびにそれらの形成方法 |
| JP5176768B2 (ja) * | 2008-08-06 | 2013-04-03 | Ｊｓｒ株式会社 | ポジ型感光性絶縁樹脂組成物 |
| US8828642B2 (en) * | 2009-09-29 | 2014-09-09 | Toray Industries, Inc. | Positive photosensitive resin composition, cured film obtained using same, and optical device |
| DE112011102793B4 (de) * | 2010-08-24 | 2023-01-12 | Merck Patent Gmbh | Positiv arbeitende lichtempfindliche Siloxanzusammensetzung, daraus gebildeter gehärteter Film und Element mit diesem |
| TWI398489B (zh) * | 2010-08-31 | 2013-06-11 | Chi Mei Corp | 光硬化性聚矽氧烷組成物及其所形成之基材保護膜 |
| TWI432895B (zh) * | 2010-12-01 | 2014-04-01 | Chi Mei Corp | 感光性聚矽氧烷組成物及其所形成之基材保護膜 |
| US8993214B2 (en) | 2011-05-20 | 2015-03-31 | Az Electronic Materials Usa Corp. | Positive photosensitive siloxane composition |
| KR101998447B1 (ko) * | 2012-03-09 | 2019-07-09 | 에이지씨 가부시키가이샤 | 포지티브형 감광성 수지 조성물, 격벽 및 광학 소자 |
| JP2013210558A (ja) * | 2012-03-30 | 2013-10-10 | Fujifilm Corp | 化学増幅型ポジ型感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置 |
| JP6065789B2 (ja) * | 2012-09-27 | 2017-01-25 | 信越化学工業株式会社 | 化学増幅ポジ型レジスト材料及びパターン形成方法 |
| JP6013150B2 (ja) * | 2012-11-22 | 2016-10-25 | メルクパフォーマンスマテリアルズマニュファクチャリング合同会社 | ポジ型感光性シロキサン組成物の製造方法 |
| TWI541610B (zh) * | 2013-07-25 | 2016-07-11 | Chi Mei Corp | Photosensitive polysiloxane compositions and their use |
| KR20150068899A (ko) * | 2013-12-12 | 2015-06-22 | 제이엔씨 주식회사 | 포지티브형 감광성 조성물 |
| JP6237279B2 (ja) | 2014-01-31 | 2017-11-29 | 国立大学法人 奈良先端科学技術大学院大学 | 保護膜を具備する薄膜トランジスタ基板およびその製造方法 |
| CN115016230A (zh) * | 2014-07-15 | 2022-09-06 | 日产化学工业株式会社 | 含硅抗蚀剂下层膜形成用组合物 |
| EP3203320B9 (en) * | 2014-09-30 | 2020-05-06 | Toray Industries, Inc. | Photosensitive resin composition, cured film, element provided with cured film, and method for manufacturing semiconductor device |
| KR101857145B1 (ko) * | 2015-11-05 | 2018-05-11 | 삼성에스디아이 주식회사 | 감광성 수지 조성물, 그로부터 형성된 경화막, 및 경화막을 갖는 소자 |
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2017
- 2017-03-28 KR KR1020170039208A patent/KR102310794B1/ko active Active
- 2017-03-29 CN CN201780025959.2A patent/CN109073971B/zh active Active
- 2017-03-29 JP JP2018556382A patent/JP6983812B2/ja active Active
- 2017-03-29 US US16/097,883 patent/US20190137877A1/en not_active Abandoned
- 2017-05-05 TW TW106115050A patent/TWI758290B/zh active
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2022
- 2022-12-14 US US18/065,798 patent/US20230109843A1/en not_active Abandoned