JP2019506006A5 - - Google Patents

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Publication number
JP2019506006A5
JP2019506006A5 JP2018544531A JP2018544531A JP2019506006A5 JP 2019506006 A5 JP2019506006 A5 JP 2019506006A5 JP 2018544531 A JP2018544531 A JP 2018544531A JP 2018544531 A JP2018544531 A JP 2018544531A JP 2019506006 A5 JP2019506006 A5 JP 2019506006A5
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Japan
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value
time base
module
synchronization
time
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JP2018544531A
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Japanese (ja)
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JP2019506006A (ja
JP6555703B2 (ja
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Priority claimed from US14/979,583 external-priority patent/US10096450B2/en
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JP2018544531A 2015-12-28 2016-12-23 リソグラフィ装置のための制御システムおよび方法 Active JP6555703B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/979,583 2015-12-28
US14/979,583 US10096450B2 (en) 2015-12-28 2015-12-28 Control system and method for lithography apparatus
PCT/EP2016/082618 WO2017114794A1 (en) 2015-12-28 2016-12-23 Control system and method for lithography apparatus

Publications (3)

Publication Number Publication Date
JP2019506006A JP2019506006A (ja) 2019-02-28
JP2019506006A5 true JP2019506006A5 (cg-RX-API-DMAC10.html) 2019-06-20
JP6555703B2 JP6555703B2 (ja) 2019-08-07

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JP2018544531A Active JP6555703B2 (ja) 2015-12-28 2016-12-23 リソグラフィ装置のための制御システムおよび方法

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US (1) US10096450B2 (cg-RX-API-DMAC10.html)
EP (1) EP3398271B1 (cg-RX-API-DMAC10.html)
JP (1) JP6555703B2 (cg-RX-API-DMAC10.html)
KR (1) KR102022434B1 (cg-RX-API-DMAC10.html)
CN (1) CN108702229B (cg-RX-API-DMAC10.html)
WO (1) WO2017114794A1 (cg-RX-API-DMAC10.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
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US10483080B1 (en) * 2018-07-17 2019-11-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
US10593509B2 (en) 2018-07-17 2020-03-17 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
CN108919612B (zh) * 2018-07-27 2021-08-31 中国电子科技集团公司第十三研究所 电子束曝光方法、电子束光刻方法及金属线条制备方法
DE102018133703B4 (de) * 2018-12-29 2020-08-06 Carl Zeiss Multisem Gmbh Vorrichtung zur Erzeugung einer Vielzahl von Teilchenstrahlen und Vielstrahl-Teilchenstrahlsysteme
CN113032015B (zh) * 2019-12-24 2022-02-18 中国科学院沈阳自动化研究所 一种用于精密运动控制的通信方法
DE102020107738B3 (de) * 2020-03-20 2021-01-14 Carl Zeiss Multisem Gmbh Teilchenstrahl-System mit einer Multipol-Linsen-Sequenz zur unabhängigen Fokussierung einer Vielzahl von Einzel-Teilchenstrahlen, seine Verwendung und zugehöriges Verfahren

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US5661700A (en) * 1994-07-18 1997-08-26 Allen-Bradley Company, Inc. Synchronizable local clock for industrial controller system
DE19626287A1 (de) 1996-07-01 1997-02-13 Abb Management Ag Verfahren zum Betrieb eines Antriebssystems und Vorrichtung zur Durchführung des Verfahrens
US6535528B1 (en) 1999-03-15 2003-03-18 Nortel Networks Limited DS256 synchronous digital interface
DE10145218A1 (de) * 2001-09-13 2003-04-03 Bosch Gmbh Robert Verfahren und Vorrichtung zur Zeitbestimmung in einem Bussystem und Bussystem
KR101368027B1 (ko) 2002-10-25 2014-02-26 마퍼 리쏘그라피 아이피 비.브이. 리소그라피 장치
EP3671804A1 (en) * 2002-10-30 2020-06-24 ASML Netherlands B.V. Electron beam exposure system
WO2004081910A2 (en) 2003-03-10 2004-09-23 Mapper Lithography Ip B.V. Apparatus for generating a plurality of beamlets
EP1830384B1 (en) 2003-05-28 2011-09-14 Mapper Lithography Ip B.V. Charged particle beamlet exposure system
WO2005010618A2 (en) 2003-07-30 2005-02-03 Mapper Lithography Ip B.V. Modulator circuitry
ATE426312T1 (de) 2004-01-13 2009-04-15 Nxp Bv Synchronisation von zeitbasiseinheiten
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