JP2019502803A5 - - Google Patents
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- JP2019502803A5 JP2019502803A5 JP2018533247A JP2018533247A JP2019502803A5 JP 2019502803 A5 JP2019502803 A5 JP 2019502803A5 JP 2018533247 A JP2018533247 A JP 2018533247A JP 2018533247 A JP2018533247 A JP 2018533247A JP 2019502803 A5 JP2019502803 A5 JP 2019502803A5
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- JP
- Japan
- Prior art keywords
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15201910 | 2015-12-22 | ||
| EP15201910.5 | 2015-12-22 | ||
| PCT/EP2016/081847 WO2017108743A1 (en) | 2015-12-22 | 2016-12-20 | Composition for post chemical-mechanical-polishing cleaning |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019502803A JP2019502803A (ja) | 2019-01-31 |
| JP2019502803A5 true JP2019502803A5 (https=) | 2020-01-16 |
| JP6949846B2 JP6949846B2 (ja) | 2021-10-13 |
Family
ID=55023982
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018533247A Active JP6949846B2 (ja) | 2015-12-22 | 2016-12-20 | 化学機械研磨後の洗浄組成物 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10844325B2 (https=) |
| EP (1) | EP3394234B1 (https=) |
| JP (1) | JP6949846B2 (https=) |
| KR (1) | KR102870073B1 (https=) |
| CN (1) | CN108473918B (https=) |
| SG (1) | SG11201804637UA (https=) |
| TW (1) | TWI794152B (https=) |
| WO (1) | WO2017108743A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3394879A2 (en) * | 2015-12-22 | 2018-10-31 | Basf Se | Composition for post chemical-mechanical-polishing cleaning |
| US20200345616A1 (en) * | 2017-11-29 | 2020-11-05 | Basf Se | Process for styling human hair |
| CN109576090A (zh) * | 2018-12-13 | 2019-04-05 | 中国科学院上海光学精密机械研究所 | 氧化物光学元件化学机械抛光后残留物清洗剂及其制备方法 |
| WO2021188766A1 (en) * | 2020-03-19 | 2021-09-23 | Fujifilm Electronic Materials U.S.A., Inc. | Cleaning compositions and methods of use thereof |
| JP2022144640A (ja) * | 2021-03-19 | 2022-10-03 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 基板処理液、これを用いる基板の製造方法およびデバイスの製造方法 |
| MX2023011631A (es) | 2021-04-01 | 2023-12-15 | Sterilex LLC | Desinfectante/higienizante en polvo sin compuesto de amonio cuaternario (quat). |
| WO2023232682A1 (en) | 2022-05-31 | 2023-12-07 | Basf Se | Composition, its use and a process for cleaning substrates comprising cobalt and copper |
| CN121399239A (zh) | 2023-06-20 | 2026-01-23 | 巴斯夫欧洲公司 | 用于清洁包含钴和铜的衬底的碱性组合物、其用途及方法 |
| WO2024260813A1 (en) | 2023-06-20 | 2024-12-26 | Basf Se | Alkaline composition, its use and a process for cleaning substrates comprising cobalt and copper |
| WO2026057376A1 (en) | 2024-09-11 | 2026-03-19 | Basf Se | Alkaline composition, its use and a process for cleaning substrates comprising cobalt and copper |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3907985A (en) * | 1973-07-27 | 1975-09-23 | Burton Parsons And Company Inc | Polystyrene sulfonate containing opthalmic solutions |
| WO1995016767A1 (en) * | 1993-12-14 | 1995-06-22 | The Procter & Gamble Company | Liquid laundry detergents containing polyamino acid and polyalkylene glycol |
| KR20020027571A (ko) | 1999-08-24 | 2002-04-13 | 갤반 마틴 | 절연체와 금속의 ｃｍｐ용 조성물 및 이에 관련된 방법 |
| WO2008023215A1 (en) | 2006-08-23 | 2008-02-28 | Freescale Semiconductor, Inc. | Post chemical mechanical polishing rinse formulation |
| JP4777197B2 (ja) | 2006-09-11 | 2011-09-21 | 富士フイルム株式会社 | 洗浄液及びそれを用いた洗浄方法 |
| US8685909B2 (en) * | 2006-09-21 | 2014-04-01 | Advanced Technology Materials, Inc. | Antioxidants for post-CMP cleaning formulations |
| KR101561708B1 (ko) * | 2007-05-17 | 2015-10-19 | 인티그리스, 인코포레이티드 | Ｃｍｐ후 세정 제제용 신규한 항산화제 |
| CA2692254C (en) | 2007-08-28 | 2013-12-31 | Ecolab Inc. | Paste-like detergent formulation comprising branched alkoxylated fatty alcohols as non-ionic surfactants |
| US20090056744A1 (en) | 2007-08-29 | 2009-03-05 | Micron Technology, Inc. | Wafer cleaning compositions and methods |
| JP2009069505A (ja) | 2007-09-13 | 2009-04-02 | Tosoh Corp | レジスト除去用洗浄液及び洗浄方法 |
| KR101846597B1 (ko) * | 2010-10-01 | 2018-04-06 | 미쯔비시 케미컬 주식회사 | 반도체 디바이스용 기판의 세정액 및 세정 방법 |
| SG11201404930SA (en) * | 2012-02-15 | 2014-09-26 | Advanced Tech Materials | Post-cmp removal using compositions and method of use |
| TWI573864B (zh) * | 2012-03-14 | 2017-03-11 | 卡博特微電子公司 | 具有高移除率及低缺陷率之對氧化物及氮化物有選擇性之ｃｍｐ組成物 |
| WO2015007347A1 (en) * | 2013-07-19 | 2015-01-22 | Ecolab Inc. | Mild alkaline solid instrument cleaner |
| KR102040050B1 (ko) * | 2013-08-02 | 2019-11-05 | 동우 화인켐 주식회사 | 웨이퍼 다이싱용 세정제 조성물 |
| JP2015181079A (ja) * | 2014-03-05 | 2015-10-15 | 三洋化成工業株式会社 | 磁気ディスク基板用洗浄剤組成物 |
-
2016
- 2016-12-20 SG SG11201804637UA patent/SG11201804637UA/en unknown
- 2016-12-20 WO PCT/EP2016/081847 patent/WO2017108743A1/en not_active Ceased
- 2016-12-20 KR KR1020187021141A patent/KR102870073B1/ko active Active
- 2016-12-20 EP EP16822665.2A patent/EP3394234B1/en active Active
- 2016-12-20 CN CN201680075224.6A patent/CN108473918B/zh active Active
- 2016-12-20 US US16/064,918 patent/US10844325B2/en active Active
- 2016-12-20 JP JP2018533247A patent/JP6949846B2/ja active Active
- 2016-12-21 TW TW105142442A patent/TWI794152B/zh active
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