JP2019502803A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2019502803A5 JP2019502803A5 JP2018533247A JP2018533247A JP2019502803A5 JP 2019502803 A5 JP2019502803 A5 JP 2019502803A5 JP 2018533247 A JP2018533247 A JP 2018533247A JP 2018533247 A JP2018533247 A JP 2018533247A JP 2019502803 A5 JP2019502803 A5 JP 2019502803A5
- Authority
- JP
- Japan
- Prior art keywords
- range
- acid
- composition
- peg
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15201910 | 2015-12-22 | ||
| EP15201910.5 | 2015-12-22 | ||
| PCT/EP2016/081847 WO2017108743A1 (en) | 2015-12-22 | 2016-12-20 | Composition for post chemical-mechanical-polishing cleaning |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019502803A JP2019502803A (ja) | 2019-01-31 |
| JP2019502803A5 true JP2019502803A5 (OSRAM) | 2020-01-16 |
| JP6949846B2 JP6949846B2 (ja) | 2021-10-13 |
Family
ID=55023982
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018533247A Active JP6949846B2 (ja) | 2015-12-22 | 2016-12-20 | 化学機械研磨後の洗浄組成物 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10844325B2 (OSRAM) |
| EP (1) | EP3394234B1 (OSRAM) |
| JP (1) | JP6949846B2 (OSRAM) |
| KR (1) | KR102870073B1 (OSRAM) |
| CN (1) | CN108473918B (OSRAM) |
| SG (1) | SG11201804637UA (OSRAM) |
| TW (1) | TWI794152B (OSRAM) |
| WO (1) | WO2017108743A1 (OSRAM) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG11201804636YA (en) * | 2015-12-22 | 2018-07-30 | Basf Se | Composition for post chemical-mechanical-polishing cleaning |
| WO2019105777A1 (en) * | 2017-11-29 | 2019-06-06 | Basf Se | A process for styling human hair |
| CN109576090A (zh) * | 2018-12-13 | 2019-04-05 | 中国科学院上海光学精密机械研究所 | 氧化物光学元件化学机械抛光后残留物清洗剂及其制备方法 |
| CN119776089A (zh) * | 2020-03-19 | 2025-04-08 | 富士胶片电子材料美国有限公司 | 清洁组合物及其使用方法 |
| JP2022144640A (ja) * | 2021-03-19 | 2022-10-03 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 基板処理液、これを用いる基板の製造方法およびデバイスの製造方法 |
| CA3213769A1 (en) | 2021-04-01 | 2022-10-06 | Sterilex, Llc | Quat-free powdered disinfectant/sanitizer |
| CN119325501A (zh) | 2022-05-31 | 2025-01-17 | 巴斯夫欧洲公司 | 用于清洁包含钴和铜的衬底的组合物、其用途及方法 |
| CN121399239A (zh) | 2023-06-20 | 2026-01-23 | 巴斯夫欧洲公司 | 用于清洁包含钴和铜的衬底的碱性组合物、其用途及方法 |
| CN121548628A (zh) | 2023-06-20 | 2026-02-17 | 巴斯夫欧洲公司 | 用于清洁包含钴和铜的衬底的碱性组合物、其用途及方法 |
| WO2026057376A1 (en) | 2024-09-11 | 2026-03-19 | Basf Se | Alkaline composition, its use and a process for cleaning substrates comprising cobalt and copper |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3907985A (en) * | 1973-07-27 | 1975-09-23 | Burton Parsons And Company Inc | Polystyrene sulfonate containing opthalmic solutions |
| WO1995016767A1 (en) * | 1993-12-14 | 1995-06-22 | The Procter & Gamble Company | Liquid laundry detergents containing polyamino acid and polyalkylene glycol |
| KR20020027571A (ko) | 1999-08-24 | 2002-04-13 | 갤반 마틴 | 절연체와 금속의 ｃｍｐ용 조성물 및 이에 관련된 방법 |
| WO2008023215A1 (en) * | 2006-08-23 | 2008-02-28 | Freescale Semiconductor, Inc. | Post chemical mechanical polishing rinse formulation |
| JP4777197B2 (ja) | 2006-09-11 | 2011-09-21 | 富士フイルム株式会社 | 洗浄液及びそれを用いた洗浄方法 |
| US8685909B2 (en) * | 2006-09-21 | 2014-04-01 | Advanced Technology Materials, Inc. | Antioxidants for post-CMP cleaning formulations |
| KR101622862B1 (ko) * | 2007-05-17 | 2016-05-19 | 엔테그리스, 아이엔씨. | Ｃｍｐ후 세정 제제용 신규한 항산화제 |
| US8114827B2 (en) | 2007-08-28 | 2012-02-14 | Ecolab Usa Inc. | Paste-like detergent formulation comprising branched alkoxylated fatty alcohols as non-ionic surfactants |
| US20090056744A1 (en) | 2007-08-29 | 2009-03-05 | Micron Technology, Inc. | Wafer cleaning compositions and methods |
| JP2009069505A (ja) | 2007-09-13 | 2009-04-02 | Tosoh Corp | レジスト除去用洗浄液及び洗浄方法 |
| WO2012043767A1 (ja) * | 2010-10-01 | 2012-04-05 | 三菱化学株式会社 | 半導体デバイス用基板の洗浄液及び洗浄方法 |
| SG11201404930SA (en) | 2012-02-15 | 2014-09-26 | Advanced Tech Materials | Post-cmp removal using compositions and method of use |
| TWI573864B (zh) * | 2012-03-14 | 2017-03-11 | 卡博特微電子公司 | 具有高移除率及低缺陷率之對氧化物及氮化物有選擇性之ｃｍｐ組成物 |
| PL3022280T3 (pl) * | 2013-07-19 | 2019-06-28 | Ecolab Usa Inc. | Łagodny, alkaliczny, stały środek do czyszczenia narzędzi |
| KR102040050B1 (ko) * | 2013-08-02 | 2019-11-05 | 동우 화인켐 주식회사 | 웨이퍼 다이싱용 세정제 조성물 |
| JP2015181079A (ja) * | 2014-03-05 | 2015-10-15 | 三洋化成工業株式会社 | 磁気ディスク基板用洗浄剤組成物 |
-
2016
- 2016-12-20 KR KR1020187021141A patent/KR102870073B1/ko active Active
- 2016-12-20 WO PCT/EP2016/081847 patent/WO2017108743A1/en not_active Ceased
- 2016-12-20 CN CN201680075224.6A patent/CN108473918B/zh active Active
- 2016-12-20 EP EP16822665.2A patent/EP3394234B1/en active Active
- 2016-12-20 US US16/064,918 patent/US10844325B2/en active Active
- 2016-12-20 JP JP2018533247A patent/JP6949846B2/ja active Active
- 2016-12-20 SG SG11201804637UA patent/SG11201804637UA/en unknown
- 2016-12-21 TW TW105142442A patent/TWI794152B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2010045351A5 (OSRAM) | ||
| JP2017186574A5 (OSRAM) | ||
| MX2010004654A (es) | Polialquileniminas alcoxiladas anfifilicas solubles en agua que tienen un bloque de oxido de polietileno interno y un bloque de oxido de polipropileno externo. | |
| RU2016136518A (ru) | Порошок и гранула, способ получения такого порошка и гранулы и их применение | |
| WO2012054923A3 (en) | Therapeutic nanoparticles with high molecular weight copolymers | |
| CA2379626A1 (en) | Antibacterial composition | |
| JP2012530832A5 (OSRAM) | ||
| JP2009158810A5 (OSRAM) | ||
| JP2015514849A5 (OSRAM) | ||
| CN107018667A (zh) | 通过低含量中和单体的低浓度反相乳液聚合获得的聚合物在洗涤剂组合物中的用途 | |
| EP2019120A4 (en) | BLOCK COPOLYMERS | |
| CN110177816B (zh) | 共聚物及其在洗涤剂组合物中的用途 | |
| JP2009544725A5 (OSRAM) | ||
| JP2013500377A5 (OSRAM) | ||
| JP2014501323A5 (OSRAM) | ||
| DE602005008589D1 (de) | Biologisch abbaubare pfropfcopolymere | |
| JP6866635B2 (ja) | 多孔質膜、及び多孔質膜の製造方法 | |
| WO2017108748A3 (en) | Composition for post chemical-mechanical-polishing cleaning | |
| JP2022093402A5 (OSRAM) | ||
| CA2863463A1 (en) | Polysiloxane based block copolymers | |
| SG11201804637UA (en) | Composition for post chemical-mechanical-polishing cleaning | |
| JP2014532796A5 (OSRAM) | ||
| WO2008140853A3 (en) | Water dispersible polymer compositions | |
| JP2016506928A5 (OSRAM) | ||
| JP2009155453A5 (OSRAM) |