JP2019206761A - Mask constitution for masking substrate in treatment chamber - Google Patents

Abstract

To provide a mask constitution capable of reducing or avoiding deformation or bent of the mask constitution when the mask constitution is oriented in a vertical direction.SOLUTION: In this mask constitution, an actuator 230 includes a first actuator and a second actuator. The first actuator can be connected to a first frame element 112 and is configured to apply a first force to the first frame element 112, and the second actuator can be connected to a second frame element 114 and is configure to apply a second force to the second frame element 114. The first actuator and the second actuator are provided, so that the force can be independently applied to the first frame element 112 and the second element 114. Deformation of a mask frame 110 can be strictly compensated or corrected.SELECTED DRAWING: Figure 4

Description

  [0001] Embodiments of the present disclosure align a mask configuration for masking a substrate in a processing chamber, an apparatus for depositing a layer on the substrate, and a mask configuration for masking a substrate in the processing chamber Regarding the method. Embodiments of the present disclosure particularly include a mask configuration for masking a substrate in a processing chamber in a substantially vertical orientation, an apparatus for depositing a layer on the substrate in a substantially vertical orientation, and substantially The present invention relates to a method for aligning a mask configuration for masking a substrate in a processing chamber with an orientation perpendicular to the substrate.

  [0002] Several methods for depositing material on a substrate are known. As an example, the substrate can be coated by using a vapor deposition process such as a physical vapor deposition (PVD) process, a chemical vapor deposition (CVD) process, a sputtering process, a spray process, and the like. The process can be performed in a processing chamber of a deposition apparatus in which a substrate to be coated is placed. The deposition material is supplied into the apparatus. Multiple materials such as small molecules, metals, oxides, nitrides, and carbides can be used for deposition on the substrate. In addition, other processes such as etching, structuring, annealing, etc. can be performed in the processing chamber.

  [0003] Coated substrates can be used in several applications and in several technical fields. For example, there are applications in the field of organic light emitting diode (OLED) panels. Further applications include insulation panels, microelectronics such as semiconductor devices, substrates with TFTs, color filters, and the like.

  [0004] An OLED is a solid state device composed of a thin film of (organic) molecules that emit light when applied with electricity. OLEDs provide a bright display of electronic devices and can use less power than, for example, light emitting diodes (LEDs) or liquid crystal displays (LCDs). Within the processing chamber, the organic molecules are generated (eg, deposited, sputtered, sprayed, etc.) and the particles that are allowed to aggregate as a thin film on the substrate have a specific pattern. Pass the mask and form an OLED pattern on the substrate

  [0005] Deposition devices exist that allow the masked substrate to be processed in a vertical orientation to reduce the footprint of the deposition device. In other words, the substrate and mask configuration are arranged vertically in the processing chamber. When the mask configuration is oriented vertically, gravity can cause deformation or bending of the mask configuration, resulting in a degradation of the quality of the processed substrate, particularly the deposited film or layer.

  [0006] In view of the above, a new mask configuration for masking a substrate in a processing chamber, apparatus for depositing a layer on the substrate, and process that overcomes at least some of the problems in the art There is a need for a method for aligning a mask configuration for masking a substrate in a chamber. In particular, a mask arrangement, an apparatus for depositing a layer on a substrate, which makes it possible to reduce or even avoid deformation or bending of the mask arrangement, especially when the mask arrangement is vertically oriented. There is a need for a method for aligning the mask configuration.

  [0007] In view of the above, a mask configuration for masking a substrate in a processing chamber, an apparatus for depositing a layer on the substrate, and a method for aligning a mask configuration for masking a substrate in a processing chamber Provided. Further aspects, advantages, and features of the present disclosure will become apparent from the claims, specification, and accompanying drawings.

  [0008] According to one aspect of the present disclosure, a mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements, the mask frame configured to support a mask device connectable thereto, and at least one of the one or more frame elements. At least one actuator connectable to the frame element, wherein the at least one actuator is configured to apply a force to the at least one frame element.

  [0009] According to one aspect of the present disclosure, a mask arrangement for masking a substrate in a processing chamber is provided. The mask arrangement includes a mask frame having one or more frame elements, the mask frame configured to support a mask device connectable thereto, and at least one of the one or more frame elements. At least one actuator connectable to the frame element, the at least one actuator configured to apply a force to the at least one frame element, the at least one frame element comprising: a first frame element; And at least one actuator is connectable to the first frame element and the second frame element. The at least one actuator includes a first actuator and a second actuator, the first actuator is connectable to the first frame element, and the first actuator is configured to apply a first force to the first frame element. The second actuator is connectable to the second frame element, and the second actuator is configured to apply a second force to the second frame element, in particular, the first force and the second force. However, it is oriented in the opposite direction.

  [0010] According to yet another aspect of the present disclosure, an apparatus for depositing a layer on a substrate is provided. The apparatus includes a processing chamber adapted to deposit a layer therein, a mask configuration described herein in the processing chamber, and a deposition source for depositing the material forming the layer. .

  [0011] According to yet another aspect of the present disclosure, a method of aligning a mask configuration for masking a substrate in a processing chamber is provided. The method includes applying a force to at least one frame element of a mask frame that supports a mask device.

  [0012] Embodiments are also directed to apparatus for performing the disclosed methods and include apparatus portions for performing each described method aspect. These method aspects may be implemented using hardware components, using a computer programmed with appropriate software, in any combination of the two, or in any other manner. Furthermore, embodiments according to the present disclosure are also directed to methods for operating the described apparatus. This includes method aspects for performing all functions of the device.

  [0013] To provide a thorough understanding of the above features of the present disclosure, a more detailed description of the present disclosure, briefly summarized above, may be obtained by reference to embodiments. The accompanying drawings relate to embodiments of the disclosure and are described below.

FIG. 3 shows a schematic diagram of a deposition process using a mask device for manufacturing an OLED on a substrate. 2A and 2B show schematic diagrams of horizontal and vertical alignment mask configurations, respectively. FIG. 2 shows a schematic diagram of a mask configuration for masking a substrate in a processing chamber, according to embodiments described herein. FIG. 4A shows a schematic diagram of a mask configuration for masking a substrate in a processing chamber according to further embodiments described herein, and FIG. 4B illustrates an actuator of the mask configuration of FIG. 4A according to embodiments described herein. FIG. 5A and 5B show schematic views of a mask frame of a mask configuration for masking a substrate in a processing chamber, according to still further embodiments described herein. FIG. 6 shows a schematic view of a mask frame of a mask configuration for masking a substrate in a processing chamber, according to still further embodiments described herein. 7A-7C show schematic views of a portion of the mask frame of FIG. 6 having one or more protrusions. 7B and 7C show the same part of the mask frame, with a force applied to at least one frame element. FIG. 2 shows a schematic diagram of an apparatus for depositing a layer on a substrate having a mask configuration, according to embodiments described herein. FIG. 4 shows a flow diagram of a method for aligning a mask configuration for masking a substrate in a processing chamber, according to embodiments described herein.

  [0014] Reference will now be made in detail to various embodiments of the disclosure. One or more examples of these embodiments are shown in the figures. Within the following description of the drawings, the same reference numbers refer to the same components. Generally, only the differences with respect to the individual embodiments are described. Each example is provided throughout the description of the present disclosure, but each example is not intended to limit the present disclosure. Moreover, features illustrated or described as part of one embodiment can be used in other embodiments or in combination with other embodiments to provide further embodiments. . This specification is intended to cover such modifications and variations.

  [0015] FIG. 1 shows a schematic diagram of a deposition process for manufacturing an OLED on a substrate 10. FIG.

  [0016] To produce an OLED, organic molecules are generated by the deposition source 30 (eg, evaporated, sputtered, sprayed, etc.) and deposited on the substrate 10. A mask arrangement 20 including a mask 22 is positioned between the substrate 10 and the deposition source 30. The mask 22 has a particular pattern, for example provided by a plurality of openings or holes 21, whereby organic molecules pass through the openings or holes 21 (eg, along the path 32) and the substrate 10. A layer or film of organic compound is deposited thereon. For example, multiple layers or films may be deposited on the substrate 10 using different masks or different positions of the mask 22 relative to the substrate 10 to produce pixels having different color characteristics. As an example, a first layer or film can be deposited to produce a red pixel 34, a second layer or film can be deposited to produce a green pixel 36, and A third layer or film can be deposited to produce the blue pixel 38. The layer (s) or membrane (s), for example an organic semiconductor, can be disposed between two electrodes (not shown) such as an anode and a cathode. At least one of the two electrodes may be transparent.

  [0017] The substrate 10 and mask 22 may be disposed in a vertical orientation during the deposition process. In FIG. 1, the arrows indicate the vertical direction 40 and the horizontal direction 50.

  [0018] Throughout this disclosure, the term "vertical direction" or "vertical orientation" is distinguished from "horizontal direction" or "horizontal orientation". To be understood. That is, “vertical direction” or “vertical orientation” refers to a substantially vertical orientation, eg, mask configuration / mask and substrate, for example, a few degrees (eg, up to 10 ° or 15 ° from the vertical orientation). Is still considered “substantially vertical direction” or “substantially vertical orientation”. The vertical direction can be substantially parallel to gravity.

  [0019] FIG. 2A shows a schematic diagram of a horizontally oriented mask arrangement 20. FIG. 2B shows a schematic diagram of the mask configuration of FIG.

  [0020] In some implementations, the mask arrangement 20 is assembled by connecting the mask device 22 to the mask frame 23. The mask frame 23 may have one or more frame elements such as a first frame element 24, a second frame element 25, a third frame element 26, and a fourth frame element 27. As an example, connecting the mask device 22 to the mask frame 23 may include a welding process, specifically spot welding. The assembly of the mask structure 20 can be performed in a horizontal orientation using a mask device 22, a mask frame 23, and optionally a substrate, as shown in FIG. 2A.

  [0021] Before, during, and after assembly of the mask configuration 20, the substrate can be positioned and secured relative to the mask configuration 20 or the mask device 22. Additional devices may be provided and used to position and secure the substrate, such as at least one of a carrier, a substrate frame, and a substrate holding configuration.

  [0022] The mask device 22 may be connected to the mask frame 23 by welding, for example spot welding. As indicated by reference numeral 60, there may be tension. Tension can be provided, for example, to address the thermal expansion of the mask during the deposition process. With sufficient tension, increasing the temperature will only change the mask tension, not the pixel position.

  [0023] After assembling the mask structure 20, for example by connecting the mask device 22 and the mask frame 23, the mask structure 20 may be brought into an upright position, ie, a vertical orientation, for the deposition process.

  [0024] FIG. 2B shows a vertically oriented mask configuration 20. Here, gravity acts on the mask arrangement 20 (indicated by reference numeral 62) in a substantially vertical direction, causing deformation or bending of at least a portion of the mask frame 23 and / or the mask device 22. Gravity can in particular cause deformation or bending of frame elements such as first frame element 24 and second frame element 25 (shown as solid lines) oriented horizontally. As an example, if the mask thickness is about 50 micrometers, the vertical deformation can be at least 2.5 micrometers (mask positioning accuracy can be about 2 micrometers). In particular, the mask device 22 can be deformed by connecting it to the mask frame. This deformation then causes misalignment of the mask device 22 with respect to the substrate, reducing the quality and / or alignment of the deposited layer (s).

  [0025] FIG. 3 shows a schematic diagram of a mask arrangement 100 for masking a substrate in a processing chamber, in particular a vacuum processing chamber or a vacuum deposition chamber, according to embodiments described herein.

  [0026] According to one aspect of the present disclosure, the mask structure 100 is a mask frame 110 having one or more frame elements, configured to support a mask device 120 connectable thereto, and At least one actuator 130 connectable to at least one frame element of the one or more frame elements, wherein the at least one actuator is configured to apply a force 64 to the at least one frame element 130. In some implementations, the mask frame 110 may be configured as a carrier for moving the mask.

  [0027] According to some embodiments that may be combined with other embodiments described herein, the mask frame 110 is configured to support the mask device 120 in a substantially vertical orientation. At least one actuator 130 may be connected to at least one frame element using a connection device 132 such as a clamp.

  [0028] According to some embodiments that may be combined with other embodiments described herein, at least one actuator 130 applies a force in a substantially vertical direction 40 when the mask arrangement 100 is in a vertical orientation. Configured to do. As an example, the at least one actuator 130 is configured to apply a force in a direction substantially parallel to gravity, specifically in a direction opposite to gravity. In some embodiments, applying a force to the at least one frame element can include pushing or pulling the at least one frame element, eg, in a vertical direction. According to some embodiments, the at least one actuator 130 is configured to apply a force to the at least one frame element to move or displace the at least one frame element. As an example, the at least one actuator 130 is configured to apply a force having a constant strength (“constant force”) to the at least one frame element and / or cause a certain amount of displacement or deformation. Can be done.

  [0029] The mask configuration 100 of the present disclosure allows for correcting or compensating for deformation or bending of the mask frame 110 by applying a force to at least one frame element. In particular, this force makes it possible to correct or compensate for deformation or bending of the mask frame 110 due to gravity, for example when the mask arrangement 100 is in an upright or vertical orientation. In some implementations, force 64 may also be referred to as “compensation force” or “gravity compensation force”. By applying force and correcting or compensating for deformation or bending of the mask frame 110, the alignment of the mask 120 with respect to the substrate can be adjusted, and the quality and / or position of the deposited layer (s). Matching can be improved.

  [0030] According to some embodiments that may be combined with other embodiments described herein, the one or more frame elements may define an aperture configured to receive the mask device 120. One or more frame elements may provide a mask support surface configured to support the mask device 120. In some implementations, the one or more frame elements can be separate elements that can be connected to form the mask frame 110 or can be integrally formed. In some embodiments, the mask frame 110 may have a substantially rectangular shape.

  [0031] In some implementations, the one or more frame elements include a first frame element 112, a second frame element 114, a third frame element 116, and a fourth frame element 118. As an example, the first frame element 112 and the second frame element 114 may be referred to as a top bar and a bottom bar, respectively. The first frame element 112 and the second frame element 114 may also be referred to as horizontal frame elements. The third frame element 116 and the fourth frame element 118 may be referred to as side bars or vertical frame elements. In some embodiments, the first frame element 112 and the second frame element 114 are arranged in parallel and / or the third frame element 116 and the fourth frame element 118 are arranged in parallel.

  [0032] According to some embodiments, when the mask frame 110 is in a substantially vertical orientation, the at least one frame element may be a horizontal frame element. This at least one frame element may in particular be a first frame element 112 (eg a top bar) and / or a second frame element 114 (eg a bottom bar).

  [0033] According to some embodiments that may be combined with other embodiments described herein, the at least one frame element includes a first frame element 112 and a second frame element 114, and the at least one actuator 130 is a first frame element. The frame element 112 and the second frame element 114 can be connected. At least one actuator 130 is configured to apply a force to the first frame element 112 and the second frame element 114, particularly simultaneously. In other words, one actuator can be connected to both the first frame element 112 and the second frame element 114.

  [0034] In some implementations, the one or more frame elements can define a plane, and the at least one actuator 130 is configured to apply a force in a direction substantially parallel to the plane; Specifically, if the mask frame 110 is in a substantially vertical orientation, this plane is a vertical plane. The plane can be substantially parallel to the substrate surface configured to deposit the deposition material thereon. The plane can be substantially parallel to the surface of the mask device 120 having openings or holes (eg, represented by reference numeral 21 in FIG. 1) configured to pass the deposition material.

  [0035] According to some embodiments that may be combined with other embodiments described herein, at least one frame element has a longitudinal extension. The direction of the longitudinal extension may be substantially parallel to the horizontal direction when the mask frame 110 is in a substantially vertical orientation. In some implementations, the at least one actuator 130 is configured to apply a force in a direction substantially perpendicular to the direction of the longitudinal extension.

  [0036] The term "substantially perpendicular" refers to, for example, a force and a substantially perpendicular orientation of at least one frame element, a few degrees from an exact perpendicular orientation (eg, up to 10 °, or Deviations of up to 15 ° are still considered “substantially perpendicular”. The term “substantially parallel” refers to a deviation of a few degrees (eg up to 10 ° or even up to 15 °) from the exact parallel orientation, for example with respect to the substantially parallel orientation of the frame elements. Are still considered “substantially parallel”.

  [0037] The mask configuration 100 of the present disclosure allows compensation for the effects of gravity acting on the mask configuration 100 disposed in a substantially vertical orientation. Deformation or bending of the mask frame 110 and / or the mask device 120 due to gravity can be compensated or corrected, resulting in improved quality and alignment of the layer deposited on the substrate.

  [0038] FIG. 4A shows a schematic diagram of a mask arrangement 200 for masking a substrate in a processing chamber (not shown), according to further embodiments described herein. FIG. 4B shows a schematic diagram of an actuator of the mask configuration 200 of FIG. 4A, according to embodiments described herein.

  [0039] According to some embodiments that may be combined with other embodiments described herein, the at least one actuator 230 includes a first actuator and a second actuator, the first actuator being attached to the first frame element 112. The first actuator is configured to apply a first force to the first frame element 112, the second actuator is connectable to the second frame element 114, and the second actuator is connected to the second frame. A second force is configured to be applied to the element 114. By providing the first and second actuators, forces can be applied separately to the first frame element 112 and the second frame element 114, and the deformation of the mask frame 110 is strictly compensated or corrected. Can be done. In the example of FIG. 4A, the first actuator is connected to the upper bar of the mask frame 110 and the second actuator is connected to the bottom bar of the mask frame 110. In some implementations, the first actuator is configured to pull the first frame element 112 (eg, the upper bar). The second actuator can be configured to push the second frame element 114 (eg, the bottom bar). By pulling and pushing the top bar and the bottom bar respectively, the initial mask frame conditions can be restored.

  [0040] In some implementations, the mask configuration 200 includes a mask frame support 240 configured to support the mask frame 110. The mask frame support 240 may be a plate, for example. According to some embodiments, the third frame element 116 and / or the fourth frame element 118 of the mask frame 110 may be connected to the mask frame support 240 by, for example, screws and / or clamps. As an example, the first frame element 112 and / or the second frame element 114 cannot be connected to the mask frame support 240. In other words, the first frame element 112 and / or the second frame element 114 are not connected or fixed, so that the force applied to the first frame element 112 and / or the second frame element 114 is the first The frame element 112 and / or the second frame element 114 may be moved or displaced to compensate or correct for deformation. In particular, the mask frame 110 may be removably connected to the mask frame support 240. Additionally or alternatively, the mask frame 110 can be connected to or attached to the mask frame support 240 using, for example, one or more holding devices. The one or more holding devices 113 may include at least one of screws, clamps, and the like.

  [0041] According to some embodiments that may be combined with other embodiments described herein, the at least one actuator 230 includes a motor, a stepping motor, a linear motor, a linear actuator, a piezoelectric actuator, an adjustment screw, an elastic element, and At least one of the springs may be included. Specifically, the at least one actuator 230 may be a manual actuator or an automatic actuator. According to some embodiments that may be combined with other embodiments described herein, at least one actuator 230 is mounted to the mask frame support 240.

  [0042] The at least one actuator will be described below with reference to at least one actuator connected to the first frame element 112 (eg, the upper bar). The same description is not repeated because it applies to at least one actuator connected to the second frame element 114 (eg, the bottom bar).

  [0043] According to some embodiments that may be combined with other embodiments described herein, the at least one actuator 230 includes a linear actuator 233 and an adjustment device 236. In the example shown in FIG. 4B, at least one actuator 230 includes a first fixation device 232 and a second fixation device 234. The first securing device 232 may be configured to secure at least one actuator 230 to the mask frame support 240. The second securing device 234 may be configured to secure at least one actuator 230 to at least one frame element, such as the first frame element 112 or top bar of the mask frame 110. The second fixation device 234 can include at least one of a screw, a clamp, or a combination thereof.

  [0044] The linear actuator 233 may be configured to apply a force to at least one frame element. The at least one adjustment device 236 can be configured to adjust the force applied to the at least one frame element. As an example, the at least one adjustment device 236 can be configured to change or vary the extended length of the linear actuator 233. By varying or changing the extended length of the linear actuator 233, the force applied to the at least one frame element can vary or can vary. In some implementations, the extension length of the linear actuator 233 extends in a direction substantially perpendicular to the direction of the longitudinal extension of the at least one frame element. Specifically, the extended length of the linear actuator 233 extends in a substantially vertical direction when the mask frame 110 and the mask device 120 are in a substantially vertical orientation.

  [0045] According to some embodiments, the at least one adjustment device 235 may be a manual adjustment device or an automatic adjustment device. The at least one adjustment device may include at least one of a motor, a stepping motor, and an adjustment screw.

  [0046] While at least one actuator 230 is shown mounted to the mask frame support 230, it should be understood that the present disclosure is not so limited. The at least one actuator 230 may be provided elsewhere in the mask configuration. As an example, at least one actuator 230 may be in a hidden position (ie, at least one actuator 230 may not be visible from the outside) and embedded in the mask frame support 230; And / or may be embedded within the mask frame.

  [0047] FIGS. 5A and 5B show schematic views of a mask frame 310 and a mask 120 in a mask configuration for masking a substrate in a processing chamber, according to further embodiments described herein.

  [0048] According to some embodiments that may be combined with other embodiments described herein, one or more frame elements of the mask frame 310 include a first surface 321 configured to support the mask device 120; A second surface 322 configured to face a mask frame support (not shown), the mask frame 310 being connectable to the mask frame support. The first surface 321 may be referred to as a “front side” of the mask frame 310, and the second surface 322 may be referred to as a “back side” of the mask frame 310. In some implementations, the first surface 321 provides a mask support surface configured to support the mask device 120, particularly the edge portion of the mask device 120.

  [0049] According to some embodiments that may be combined with other embodiments described herein, the mask arrangement includes one or more recesses. One or more recesses may be provided in the mask frame 310 and / or the mask frame support (not shown). One or more recesses may be provided where the mask frame 310 and the mask frame support face each other. In other words, the mask frame 310 and the mask frame support do not contact each other in a place where one or a plurality of recesses are provided. As an example, one or more recesses are provided in at least one frame element or in a region of the mask frame support corresponding to (ie facing) at least one frame element.

  [0050] In some embodiments, the surface of the second surface 322 includes one or more recesses. As an example, one or more recesses are provided in at least one frame element. As shown in FIG. 5A, one or more first recesses 313 are provided in the first frame element 312 and one or more second recesses 315 are provided in the second frame element 314. The one or more recesses may extend over at least a portion of the surface area of the surface of the second surface 322, specifically over at least 50 percent of the surface area, more specifically over 70-90 percent of the surface area. In some embodiments, the one or more recesses may extend over substantially the entire surface area of the surface of the second surface 322. One or more recesses may be formed by removing material from the corresponding frame element, in particular from the frame element (s) to which at least one actuator is connected. The depth of the one or more recesses may be 10 to 1000 micrometers, specifically 50 to 500 micrometers. As an example, the material can be removed as thin as possible.

  [0051] By providing one or more recesses, contact and / or scratching between surfaces, in particular, between the mask frame 310 (the rear surface of the frame) and the mask frame support (the front support surface) ( Scratching) is reduced or even avoided. Injuries can be particularly avoided when the actuator applies a force to at least one frame element to move or displace the at least one frame element. By reducing, as well as avoiding, contact and / or scratching between surfaces, particle generation can be minimized or even prevented, resulting in improved quality of the deposited layer. The In other words, contamination of the deposited layer by particles generated by scratching the surface can be minimized or even avoided.

  [0052] FIG. 6 shows a schematic diagram of a mask frame 410 of a mask configuration for masking a substrate in a processing chamber, according to still further embodiments described herein. 7A to 7C show schematic views of the mask frame 410 of FIG. Specifically, FIG. 7A shows a plan view of a portion of the second frame element 414 of the mask frame 410 (upper portion of FIG. 7A) and a cross-sectional view along the line 419 (lower portion of FIG. 7A). Show. FIGS. 7B and 7C show the same portion of the second frame element 414 with a force applied to the second frame element 414. The embodiment of FIGS. 6 and 7 is similar to the embodiment of FIG. 5, and description of similar or identical features and elements will not be repeated.

  [0053] According to some embodiments that may be combined with other embodiments described herein, one or more frame elements of the mask frame 410 include a first surface configured to support the mask device 120, a mask A second surface 422 configured to face the frame support, and the mask frame 410 is connectable to a mask frame support (not shown).

  [0054] According to some embodiments, which may be combined with other embodiments described herein, the mask configuration includes one or more protrusions or spacers 420. The one or more protrusions or spacers 420 may be provided on at least one of the mask frame 410 and the mask frame support, and may be provided as a separation spacer that can be positioned between the mask frame 410 and the mask frame support. One or more protrusions or spacers 420 may be provided where the mask frame 410 and the mask frame support face each other. In some embodiments, the mask frame 410 and the mask frame support contact each other only where one or more protrusions or spacers 420 are provided. As an example, the one or more protrusions or spacers 420 correspond to (ie, face) at least one frame element or one region or position of at least one frame element of the mask frame support. Provided in the area. According to some embodiments, at least three protrusions or spacers are provided, and more specifically, six protrusions or spacers are provided. As an example, three protrusions or spacers may be provided on the first frame element 412 and / or three protrusions or spacers may be provided on the second frame element 414.

  [0055] In some implementations, the surface 423 of at least one frame element, in particular a horizontal frame element, such as the first frame element 412 and / or the second frame element 414, has one or more protrusions or spacers 420. including. The one or more protrusions or spacers 420 may include a contact region or contact area 421 configured to contact the mask frame support. In some embodiments, one or more protrusions or spacers 420 are provided on at least one frame element, such as a first frame element (eg, top bar) and / or a second frame element 414 (eg, bottom bar). . In some implementations, the first frame element 412 includes two or more protrusions or spacers 420, more specifically three protrusions or spacers 420. The second frame element 414 may include two or more protrusions or spacers 420, more specifically three protrusions or spacers 420.

  [0056] According to some embodiments that may be combined with other embodiments described herein, the one or more protrusions or spacers 420 may include at least one through-hole 418. The at least one through-hole 418 can be used to secure the mask frame 410 to the mask frame support, such as by using screws. By providing at least one through-hole 418, at least one frame element (and / or mask frame) can be kept flat, for example in a mask frame support, and at the same time remain movable by at least one actuator. . In some implementations, each protrusion or spacer of one or more protrusions or spacers 420 includes one through-hole 418. In some embodiments, a protrusion or spacer 420 surrounds at least one through hole 418. As an example, the protrusions or spacers 420 can have a cylindrical shape, for example with a cylindrical axis corresponding to the axis of at least one through-hole 418.

  [0057] According to some embodiments, the mask arrangement includes at least one securing hole, such as at least one threaded securing hole. The at least one fixing hole may be provided at a position corresponding to the at least one through hole 418. The at least one securing hole may be configured to engage a screw through a corresponding through hole in the at least one through hole 418 to secure the mask frame 410 to the mask frame support. As an example, if at least one through-hole 418 (and projection or spacer 420) is provided in the mask frame, the at least one fixing hole is in the mask frame support, and more particularly in the mask frame support. , And can be provided at a position corresponding to the position of at least one through hole 418. In another example, if at least one through hole 418 (and protrusion or spacer 420) is provided in the mask frame support, the at least one fixing hole is in the mask frame, in particular, in the mask frame, The at least one through hole 418 may be provided at a position corresponding to the position. The at least one fixing hole may be a through hole or a hole closed at one end.

  [0058] According to some embodiments that may be combined with other embodiments described herein, the mask configuration includes one or more notches 423. As an example, one or more notches 423 are provided in at least one frame element and / or mask frame support. The one or more notches 423 can be configured as an opening and / or as a through hole. As an example, one or more notches 423 can at least partially surround one or more protrusions or spacers 420. In the example of FIGS. 7A-7C, two notches surround the protrusion or spacer 420. The protrusion or spacer 420 may be connected to at least one frame element by one or more elastic elements such as a bridge 424 or a horizontal arm. In some implementations, the one or more protrusions or spacers 420 and the one or more notches 423 may be referred to as a “flexible ear”.

  [0059] By providing one or more notches 423, at least one frame element is movable relative to one or more protrusions or spacers 420, as shown in FIGS. 7B and 7C. As an example, the at least one frame element can remain fixed while being fixed or attached to the mask frame support, for example by using screws and at least one through hole 418. In other words, the force applied to the at least one frame element can move or displace the at least one frame element, for example as shown in FIGS. 7B and 7C. In FIG. 7B, the force is pushing at least one mask frame element as indicated by the arrow. In FIG. 7C, the force is pulling at least one mask frame element as indicated by the arrow. This allows a force applied to the at least one frame element to displace or move the at least one frame element to compensate or correct for the deformation.

  [0060] By providing at least one protrusion or spacer, contact and / or scratching between surfaces, in particular, between the mask frame 410 (frame rear surface) and the mask frame support (front support surface) is provided. Decrease to a minimum. This is because only a small portion, specifically, for example, only the side of the projection surface close to the through hole, contacts the mask frame support. By reducing contact and / or scratching between surfaces, particle generation can be minimized or even prevented, resulting in improved quality of the deposited layer. In other words, contamination of the deposited layer by particles generated by scratching the surface can be minimized or even avoided.

  [0061] FIG. 8 shows a schematic diagram of an apparatus 600 for depositing a layer on a substrate 10 according to embodiments described herein.

  [0062] The apparatus 600 includes a processing chamber 612 adapted to deposit a layer therein, a mask arrangement 610 in the processing chamber 612, and a deposition source 630 for depositing the material forming the layer. The processing chamber can be a vacuum processing chamber. Mask configuration 610 may be configured according to the embodiments described herein.

  [0063] The processing chamber 600 is compatible with deposition processes such as thermal evaporation processes, PVD processes, CVD processes, sputter processes, and the like. Illustrated is a substrate 10 disposed in or within a holding mechanism or carrier 605 on a substrate transport device 620. A deposition source 630 is provided in the processing chamber 612 and faces the surface of the substrate 10 to be coated. The deposition source 630 provides a deposition material to be deposited on the substrate 10.

  [0064] The deposition source 630 can be a target having deposited material thereon or any other mechanism that allows the material to be released for deposition on the substrate 10. In some embodiments, the material source 630 can be a rotatable target. According to some embodiments, the deposition source 630 may be movable to position and / or replace the deposition source 630. According to other embodiments, the material source 630 can be a planar target. Dashed line 665 illustratively shows the path of the deposited material during operation of processing chamber 612.

[0065] According to some embodiments, the deposition material may be selected according to the deposition process and the subsequent use of the coated substrate. As an example, the deposition material can be an organic material used in the manufacture of OLEDs. For example, the deposition material of the deposition source 630 can be a material that includes small molecules, polymers, and phosphors. As an example, the deposition material can be selected from the group comprising chelates (eg, Alq ₃ ), fluorescent and phosphorescent dyes (eg, derivatives of perylene, rubrene, quinacridone, etc.), and conjugated dendrimers.

[0066] Embodiments described herein may be utilized for vapor deposition on large area substrates. According to some embodiments, the large area substrate may have a size of at least 0.67 m ² . As an example, this size can be from about 0.67 m ² (0.73 × 0.92 m-Gen 4.5) to about 8 m ² , more specifically from about 2 m ² to about 9 m ² , or up to 12 m ^2. It can extend to.

  [0067] FIG. 9 shows a flow diagram of a method 700 for aligning a mask configuration for masking a substrate in a processing chamber, according to embodiments described herein.

  [0068] According to one aspect of the present disclosure, the method 700 includes applying a force to at least one frame element of a mask frame supporting a mask device. The method may also include additional processes described in the examples below.

  [0069] According to some implementations, the method includes assembling a mask configuration in a substantially horizontal orientation (block 710). Assembling can include connecting the mask to the mask frame, for example, by welding, such as spot welding. Assembling can also include positioning the mask configuration or mask device relative to the substrate and securing the substrate to the mask configuration.

  [0070] At block 720, the mask configuration and the substrate are oriented substantially vertically. At block 720, an alignment process is performed. In the alignment process, force is applied to at least one frame element of the mask frame to compensate for gravity. As an example, applying a force to at least one frame element includes pushing or pulling the at least one frame element. In some embodiments, applying the force may include displacing or bending at least one frame element. In some implementations, if the mask frame and mask device are in a substantially vertical orientation, the force is applied in a substantially vertical direction.

  [0071] At block 730, a deposition process is performed in the processing chamber after alignment is performed to compensate for the effects of gravity and restore the initial mask frame conditions. Note that the alignment process can be performed whether the mask configuration is located outside the processing chamber or the mask configuration is located in the processing chamber. As an example, the alignment process can be performed after the mask structure and substrate are placed in the processing chamber, and in particular, just before the deposition process begins.

  [0072] According to embodiments described herein, a method for aligning a mask configuration for masking a substrate in a vacuum processing chamber includes: a computer program, software, a computer software product, and a substrate such as a large area substrate. It can be implemented using an interrelated controller that can have a CPU, memory, user interface, and input / output means capable of communicating with corresponding components of the device for processing.

  [0073] Embodiments of the present disclosure make it possible to compensate for the effects of gravity acting on a substantially vertically oriented mask configuration. The deformation or bending of the mask due to gravity is corrected, and as a result, the quality and alignment of the layer deposited on the substrate can be improved.

  [0074] While the above description is directed to embodiments of the present disclosure, other and further embodiments of the present disclosure may be devised without departing from the basic scope of the present disclosure. The scope of the disclosure is determined by the following claims.

[0074] While the above description is directed to embodiments of the present disclosure, other and further embodiments of the present disclosure may be devised without departing from the basic scope of the present disclosure. The scope of the disclosure is determined by the following claims.
Moreover, this application contains the aspect described below.
(Aspect 1)
A mask configuration for masking a substrate in a processing chamber,
A mask frame having one or more frame elements, the mask frame configured to support a mask device connectable to the mask frame;
At least one actuator connectable to at least one frame element of the one or more frame elements, the at least one actuator configured to apply a force to the at least one frame element; A mask configuration.
(Aspect 2)
The mask configuration of aspect 1, wherein the mask frame is configured to support the mask device in a substantially vertical orientation.
(Aspect 3)
The one or more frame elements define a plane, and the at least one actuator is configured to apply the force in a direction substantially parallel to the plane, in particular, the mask frame is substantially The mask configuration according to aspect 1 or 2, wherein the plane is a plane perpendicular to the vertical plane.
(Aspect 4)
The at least one frame element has a longitudinal extension, and the at least one actuator is configured to apply the force in a direction substantially perpendicular to the direction of the longitudinal extension. The mask configuration according to any one of aspects 1 to 3.
(Aspect 5)
5. A mask arrangement according to any one of aspects 1 to 4, wherein when the mask frame is in the substantially vertical orientation, the at least one frame element is a horizontal frame element.
(Aspect 6)
The at least one frame element includes a first frame element and a second frame element, and the at least one actuator is connectable to the first frame element and the second frame element, and the at least one actuator Is configured to apply the force to the first frame element and the second frame element, and in particular, the first frame element and the second frame element are arranged in parallel. The mask configuration according to any one of 1 to 5.
(Aspect 7)
The at least one actuator includes a first actuator and a second actuator;
The first actuator is connectable to the first frame element, and the first actuator is configured to apply a first force to the first frame element;
The second actuator is connectable to the second frame element, and the second actuator is configured to apply a second force to the second frame element, specifically, the first force and the The mask configuration according to aspect 6, wherein the second force is directed in the opposite direction.
(Aspect 8)
Further comprising a mask frame support, wherein the one or more frame elements of the mask frame are configured to have a first surface configured to support the mask device and a second surface configured to face the mask frame support. A mask configuration according to any one of aspects 1 to 7, wherein a mask frame is provided and the mask frame is connectable to the mask frame support.
(Aspect 9)
The surface of the second surface includes one or more recesses and / or one or more protrusions or spacers, and / or
The mask configuration according to aspect 8, wherein the surface of the mask frame support includes one or more recesses and / or one or more protrusions or spacers.
(Aspect 10)
The one or more protrusions or spacers include at least one through hole and / or
One or more notches are provided in the at least one frame element and / or in the mask frame support, in particular, the one or more notches provide the one or more protrusions or spacers. 10. A mask configuration according to aspect 9, which at least partially surrounds.
(Aspect 11)
The one or more recesses and / or the one or more protrusions or spacers are provided on the at least one frame element and / or
The mask according to aspect 9 or 10, wherein the one or more recesses and / or the one or more protrusions or spacers are provided in a region of the mask frame support corresponding to the at least one frame element. Constitution.
(Aspect 12)
An apparatus for depositing a layer on a substrate,
A processing chamber adapted to deposit a layer therein;
A mask configuration according to any one of aspects 1 to 11 in the processing chamber;
A deposition source for depositing the material forming the layer.
(Aspect 13)
A method for aligning a mask configuration for masking a substrate in a processing chamber, comprising:
Applying a force to at least one frame element of a mask frame supporting a mask device.
(Aspect 14)
14. The method of aspect 13, wherein applying the force to the at least one frame element includes pushing or pulling the at least one frame element.
(Aspect 15)
15. A method according to aspect 13 or 14, wherein the force is applied in a substantially vertical direction when the mask frame and the mask device are in a substantially vertical orientation.

Claims (15)

A mask configuration for masking a substrate in a processing chamber,
A mask frame having one or more frame elements, the mask frame configured to support a mask device connectable to the mask frame;
At least one actuator connectable to at least one frame element of the one or more frame elements, the at least one actuator configured to apply a force to the at least one frame element; A mask configuration.   The mask configuration of claim 1, wherein the mask frame is configured to support the mask device in a substantially vertical orientation.   The one or more frame elements define a plane, and the at least one actuator is configured to apply the force in a direction substantially parallel to the plane, in particular, the mask frame is substantially The mask structure according to claim 1, wherein the plane is a plane perpendicular to the vertical plane.   The at least one frame element has a longitudinal extension, and the at least one actuator is configured to apply the force in a direction substantially perpendicular to the direction of the longitudinal extension. The mask configuration according to any one of claims 1 to 3.   5. A mask arrangement according to any one of the preceding claims, wherein the at least one frame element is a horizontal frame element when the mask frame is in the substantially vertical orientation.   The at least one frame element includes a first frame element and a second frame element, and the at least one actuator is connectable to the first frame element and the second frame element, and the at least one actuator Is configured to apply the force to the first frame element and the second frame element, and in particular, the first frame element and the second frame element are arranged in parallel. Item 6. The mask configuration according to any one of Items 1 to 5. The at least one actuator includes a first actuator and a second actuator;
The first actuator is connectable to the first frame element, and the first actuator is configured to apply a first force to the first frame element;
The second actuator is connectable to the second frame element, and the second actuator is configured to apply a second force to the second frame element, specifically, the first force and the The mask arrangement according to claim 6, wherein the second force is directed in the opposite direction.   Further comprising a mask frame support, wherein the one or more frame elements of the mask frame are configured to have a first surface configured to support the mask device and a second surface configured to face the mask frame support. A mask arrangement according to any one of the preceding claims, wherein a mask frame is connectable to the mask frame support. The surface of the second surface includes one or more recesses and / or one or more protrusions or spacers, and / or
9. A mask arrangement according to claim 8, wherein the surface of the mask frame support comprises one or more recesses and / or one or more protrusions or spacers. The one or more protrusions or spacers include at least one through hole and / or
One or more notches are provided in the at least one frame element and / or in the mask frame support, in particular, the one or more notches provide the one or more protrusions or spacers. The mask arrangement of claim 9, wherein the mask arrangement is at least partially enclosed. The one or more recesses and / or the one or more protrusions or spacers are provided on the at least one frame element and / or
11. The one or more recesses and / or the one or more protrusions or spacers are provided in a region of the mask frame support corresponding to the at least one frame element. Mask configuration. An apparatus for depositing a layer on a substrate,
A processing chamber adapted to deposit a layer therein;
A mask configuration according to any one of claims 1 to 11 in the processing chamber;
A deposition source for depositing the material forming the layer. A method for aligning a mask configuration for masking a substrate in a processing chamber, comprising:
Applying a force to at least one frame element of a mask frame supporting a mask device.   The method of claim 13, wherein applying the force to the at least one frame element comprises pushing or pulling the at least one frame element.   15. A method according to claim 13 or 14, wherein the force is applied in a substantially vertical direction when the mask frame and the mask device are in a substantially vertical orientation.

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