JP2019139943A5 - - Google Patents

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JP2019139943A5
JP2019139943A5 JP2018021802A JP2018021802A JP2019139943A5 JP 2019139943 A5 JP2019139943 A5 JP 2019139943A5 JP 2018021802 A JP2018021802 A JP 2018021802A JP 2018021802 A JP2018021802 A JP 2018021802A JP 2019139943 A5 JP2019139943 A5 JP 2019139943A5
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gas
ion
chamber
source device
ion source
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JP2018021802A
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JP6942347B2 (ja
JP2019139943A (ja
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Priority to EP19154594.6A priority patent/EP3524320A1/en
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JP2018021802A 2018-02-09 2018-02-09 イオン源装置、粒子線発生装置、およびイオンビーム生成方法 Active JP6942347B2 (ja)

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Application Number Priority Date Filing Date Title
JP2018021802A JP6942347B2 (ja) 2018-02-09 2018-02-09 イオン源装置、粒子線発生装置、およびイオンビーム生成方法
EP19154594.6A EP3524320A1 (en) 2018-02-09 2019-01-30 Ion source device, particle beam generation, and ion beam generation method

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JP2018021802A JP6942347B2 (ja) 2018-02-09 2018-02-09 イオン源装置、粒子線発生装置、およびイオンビーム生成方法

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JP2019139943A JP2019139943A (ja) 2019-08-22
JP2019139943A5 true JP2019139943A5 (https=) 2020-04-23
JP6942347B2 JP6942347B2 (ja) 2021-09-29

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JP (1) JP6942347B2 (https=)

Families Citing this family (8)

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Publication number Priority date Publication date Assignee Title
JP7225010B2 (ja) * 2019-04-10 2023-02-20 株式会社東芝 イオン生成装置、方法及びプログラム
JP7378326B2 (ja) * 2020-03-18 2023-11-13 住友重機械工業株式会社 粒子線装置
CN111897245B (zh) * 2020-07-24 2021-08-31 中国科学院空间应用工程与技术中心 一种控制驱动电路和电子系统
US12094681B2 (en) 2022-05-10 2024-09-17 Applied Materials, Inc. Hybrid ion source for aluminum ion generation using a target holder and a solid target
US12040154B2 (en) 2022-05-10 2024-07-16 Applied Materials, Inc. Hybrid ion source for aluminum ion generation using organoaluminium compounds and a solid target
US12154766B2 (en) 2022-06-07 2024-11-26 Applied Materials, Inc. Ion source having different modes of operation
US12224149B2 (en) 2023-01-20 2025-02-11 Applied Materials, Inc. Ion source for controlling decomposition buildup using chlorine co-gas
JPWO2024210104A1 (https=) * 2023-04-03 2024-10-10

Family Cites Families (10)

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JPS62213043A (ja) * 1986-03-14 1987-09-18 Sumitomo Heavy Ind Ltd イオン源装置
US5438205A (en) * 1994-04-08 1995-08-01 National Electrostatics Corp. Ion source gaseous discharge initiation impulse valve
AUPR179500A0 (en) * 2000-11-30 2000-12-21 Saintech Pty Limited Ion source
US7060196B2 (en) * 2003-10-03 2006-06-13 Credence Systems Corporation FIB milling of copper over organic dielectrics
JP5371142B2 (ja) * 2006-07-14 2013-12-18 エフ・イ−・アイ・カンパニー マルチソース型のプラズマ集束イオン・ビーム・システム
US20120167962A1 (en) * 2009-09-11 2012-07-05 Ramot At Tel-Aviv University Ltd. System and method for generating a beam of particles
JP5650234B2 (ja) * 2009-11-16 2015-01-07 エフ・イ−・アイ・カンパニー ビーム処理システムに対するガス送達
US9275823B2 (en) * 2012-03-21 2016-03-01 Fei Company Multiple gas injection system
JP6256974B2 (ja) 2013-10-29 2018-01-10 株式会社日立製作所 荷電粒子ビームシステム
CN107333381A (zh) * 2017-06-19 2017-11-07 中国原子能科学研究院 一种同轴传输的多离子束加速器装置

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