JP2019071382A5 - - Google Patents

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Publication number
JP2019071382A5
JP2019071382A5 JP2017197641A JP2017197641A JP2019071382A5 JP 2019071382 A5 JP2019071382 A5 JP 2019071382A5 JP 2017197641 A JP2017197641 A JP 2017197641A JP 2017197641 A JP2017197641 A JP 2017197641A JP 2019071382 A5 JP2019071382 A5 JP 2019071382A5
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JP
Japan
Prior art keywords
cleaning liquid
liquid supply
valve
tank
attached
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017197641A
Other languages
English (en)
Japanese (ja)
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JP6836980B2 (ja
JP2019071382A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2017197641A priority Critical patent/JP6836980B2/ja
Priority claimed from JP2017197641A external-priority patent/JP6836980B2/ja
Priority to KR1020180105323A priority patent/KR102565317B1/ko
Priority to TW107134111A priority patent/TWI746890B/zh
Priority to US16/152,428 priority patent/US20190105689A1/en
Publication of JP2019071382A publication Critical patent/JP2019071382A/ja
Publication of JP2019071382A5 publication Critical patent/JP2019071382A5/ja
Application granted granted Critical
Publication of JP6836980B2 publication Critical patent/JP6836980B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2017197641A 2017-10-11 2017-10-11 基板洗浄方法 Active JP6836980B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2017197641A JP6836980B2 (ja) 2017-10-11 2017-10-11 基板洗浄方法
KR1020180105323A KR102565317B1 (ko) 2017-10-11 2018-09-04 기판 세정 방법
TW107134111A TWI746890B (zh) 2017-10-11 2018-09-27 基板洗淨方法
US16/152,428 US20190105689A1 (en) 2017-10-11 2018-10-05 Substrate cleaning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017197641A JP6836980B2 (ja) 2017-10-11 2017-10-11 基板洗浄方法

Publications (3)

Publication Number Publication Date
JP2019071382A JP2019071382A (ja) 2019-05-09
JP2019071382A5 true JP2019071382A5 (enExample) 2020-05-14
JP6836980B2 JP6836980B2 (ja) 2021-03-03

Family

ID=65992947

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017197641A Active JP6836980B2 (ja) 2017-10-11 2017-10-11 基板洗浄方法

Country Status (4)

Country Link
US (1) US20190105689A1 (enExample)
JP (1) JP6836980B2 (enExample)
KR (1) KR102565317B1 (enExample)
TW (1) TWI746890B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102421298B1 (ko) * 2016-09-08 2022-07-15 가부시키가이샤 에바라 세이사꾸쇼 기판 홀더, 도금 장치, 기판 홀더의 제조 방법 및 기판을 유지하는 방법
US11658059B2 (en) * 2018-02-28 2023-05-23 Ii-Vi Delaware, Inc. Thin material handling carrier
KR102335472B1 (ko) * 2019-09-04 2021-12-07 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
WO2022180780A1 (ja) * 2021-02-26 2022-09-01 株式会社荏原製作所 基板ホルダの保管方法、めっき装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4361163A (en) * 1981-01-02 1982-11-30 Seiichiro Aigo Apparatus for washing semiconductor materials
DE19655219C2 (de) * 1996-04-24 2003-11-06 Steag Micro Tech Gmbh Vorrichtung zum Behandeln von Substraten in einem Fluid-Behälter
US5922138A (en) * 1996-08-12 1999-07-13 Tokyo Electron Limited Liquid treatment method and apparatus
US6799583B2 (en) * 1999-05-13 2004-10-05 Suraj Puri Methods for cleaning microelectronic substrates using ultradilute cleaning liquids
JP6092653B2 (ja) * 2012-02-27 2017-03-08 株式会社荏原製作所 基板洗浄装置及び洗浄方法
JP6748524B2 (ja) * 2015-09-30 2020-09-02 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法

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