JP2019070179A5 - - Google Patents
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- Publication number
- JP2019070179A5 JP2019070179A5 JP2017196464A JP2017196464A JP2019070179A5 JP 2019070179 A5 JP2019070179 A5 JP 2019070179A5 JP 2017196464 A JP2017196464 A JP 2017196464A JP 2017196464 A JP2017196464 A JP 2017196464A JP 2019070179 A5 JP2019070179 A5 JP 2019070179A5
- Authority
- JP
- Japan
- Prior art keywords
- forming method
- film forming
- group
- periodic table
- raw material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 230000000737 periodic Effects 0.000 claims 5
- 239000002994 raw material Substances 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 3
- 229910052800 carbon group element Inorganic materials 0.000 claims 2
- 239000011261 inert gas Substances 0.000 claims 2
- 239000003595 mist Substances 0.000 claims 2
- 239000012159 carrier gas Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017196464A JP7023445B2 (ja) | 2017-10-07 | 2017-10-07 | 成膜方法 |
| CN201811147185.3A CN109628910B (zh) | 2017-10-07 | 2018-09-29 | 形成膜的方法 |
| US16/151,461 US10927458B2 (en) | 2017-10-07 | 2018-10-04 | Method of forming film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017196464A JP7023445B2 (ja) | 2017-10-07 | 2017-10-07 | 成膜方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019070179A JP2019070179A (ja) | 2019-05-09 |
| JP2019070179A5 true JP2019070179A5 (zh) | 2020-11-19 |
| JP7023445B2 JP7023445B2 (ja) | 2022-02-22 |
Family
ID=66441860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017196464A Active JP7023445B2 (ja) | 2017-10-07 | 2017-10-07 | 成膜方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7023445B2 (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021210350A1 (ja) * | 2020-04-13 | 2021-10-21 | 信越化学工業株式会社 | 成膜装置及び成膜方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4975299A (en) * | 1989-11-02 | 1990-12-04 | Eastman Kodak Company | Vapor deposition process for depositing an organo-metallic compound layer on a substrate |
| JPH05345983A (ja) * | 1991-06-18 | 1993-12-27 | Denki Kagaku Kogyo Kk | 耐食性金属部材 |
| JP2008120654A (ja) * | 2006-11-15 | 2008-05-29 | Nihon Ceratec Co Ltd | セラミックコーティング部材およびその製造方法 |
| FI20105719A0 (fi) * | 2010-06-21 | 2010-06-21 | Beneq Oy | Pinnoituslaite |
| WO2013192220A1 (en) * | 2012-06-18 | 2013-12-27 | University Of Florida Research Foundation, Inc. | Tungsten nitrido precursors for the cvd of tungsten nitride, carbonitride, and oxide films |
| JP2014043640A (ja) * | 2012-07-31 | 2014-03-13 | Tosoh Corp | ケイ素含有薄膜の製造方法及びケイ素含有薄膜 |
| JP6916426B2 (ja) * | 2014-09-02 | 2021-08-11 | 株式会社Flosfia | 積層構造体およびその製造方法、半導体装置ならびに結晶膜 |
| JP6613520B2 (ja) * | 2015-03-30 | 2019-12-04 | 株式会社Ｆｌｏｓｆｉａ | 霧化装置および成膜装置 |
| WO2016191199A1 (en) * | 2015-05-22 | 2016-12-01 | Dow Corning Corporation | Diisopropylaminopentachlorodisilane |
| TWI754626B (zh) * | 2015-12-18 | 2022-02-11 | 中國大陸商南大光電半導體材料有限公司 | 高純度三矽烷胺、製造方法、及用途 |
-
2017
- 2017-10-07 JP JP2017196464A patent/JP7023445B2/ja active Active
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