JP2019070179A5 - - Google Patents
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- Publication number
- JP2019070179A5 JP2019070179A5 JP2017196464A JP2017196464A JP2019070179A5 JP 2019070179 A5 JP2019070179 A5 JP 2019070179A5 JP 2017196464 A JP2017196464 A JP 2017196464A JP 2017196464 A JP2017196464 A JP 2017196464A JP 2019070179 A5 JP2019070179 A5 JP 2019070179A5
- Authority
- JP
- Japan
- Prior art keywords
- forming method
- film forming
- group
- periodic table
- raw material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 230000000737 periodic Effects 0.000 claims 5
- 239000002994 raw material Substances 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 3
- 229910052800 carbon group element Inorganic materials 0.000 claims 2
- 239000011261 inert gas Substances 0.000 claims 2
- 239000003595 mist Substances 0.000 claims 2
- 239000012159 carrier gas Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
Claims (10)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017196464A JP7023445B2 (en) | 2017-10-07 | 2017-10-07 | Film formation method |
CN201811147185.3A CN109628910B (en) | 2017-10-07 | 2018-09-29 | Method of forming film |
US16/151,461 US10927458B2 (en) | 2017-10-07 | 2018-10-04 | Method of forming film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017196464A JP7023445B2 (en) | 2017-10-07 | 2017-10-07 | Film formation method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2019070179A JP2019070179A (en) | 2019-05-09 |
JP2019070179A5 true JP2019070179A5 (en) | 2020-11-19 |
JP7023445B2 JP7023445B2 (en) | 2022-02-22 |
Family
ID=66441860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017196464A Active JP7023445B2 (en) | 2017-10-07 | 2017-10-07 | Film formation method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP7023445B2 (en) |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4975299A (en) * | 1989-11-02 | 1990-12-04 | Eastman Kodak Company | Vapor deposition process for depositing an organo-metallic compound layer on a substrate |
JPH05345983A (en) * | 1991-06-18 | 1993-12-27 | Denki Kagaku Kogyo Kk | Corrosion resistant metal member |
JP2008120654A (en) * | 2006-11-15 | 2008-05-29 | Nihon Ceratec Co Ltd | Ceramic-coated member and method of manufacturing the same |
FI20105719A0 (en) * | 2010-06-21 | 2010-06-21 | Beneq Oy | Apparatus for application of coating |
WO2013192220A1 (en) * | 2012-06-18 | 2013-12-27 | University Of Florida Research Foundation, Inc. | Tungsten nitrido precursors for the cvd of tungsten nitride, carbonitride, and oxide films |
JP2014043640A (en) * | 2012-07-31 | 2014-03-13 | Tosoh Corp | Method for manufacturing silicon-containing thin film, and silicon-containing thin film |
EP3783662A1 (en) * | 2014-09-02 | 2021-02-24 | Flosfia Inc. | Laminated structure and method for manufacturing same, semiconductor device, and crystalline film |
JP6613520B2 (en) * | 2015-03-30 | 2019-12-04 | 株式会社Flosfia | Atomization apparatus and film forming apparatus |
WO2016191199A1 (en) * | 2015-05-22 | 2016-12-01 | Dow Corning Corporation | Diisopropylaminopentachlorodisilane |
KR20180095561A (en) * | 2015-12-18 | 2018-08-27 | 다우 실리콘즈 코포레이션 | METHOD FOR PRODUCING ORGANO AMINOSILANE AND METHOD FOR MANUFACTURING SILYLAMINE FROM ORGANO AMINOSILANE |
-
2017
- 2017-10-07 JP JP2017196464A patent/JP7023445B2/en active Active
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