JP2016216332A5 - - Google Patents
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- Publication number
- JP2016216332A5 JP2016216332A5 JP2015106565A JP2015106565A JP2016216332A5 JP 2016216332 A5 JP2016216332 A5 JP 2016216332A5 JP 2015106565 A JP2015106565 A JP 2015106565A JP 2015106565 A JP2015106565 A JP 2015106565A JP 2016216332 A5 JP2016216332 A5 JP 2016216332A5
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- material solution
- alcohol
- organometallic complex
- yttrium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000002994 raw material Substances 0.000 claims description 21
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 125000002524 organometallic group Chemical group 0.000 claims description 12
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 9
- 229910052727 yttrium Inorganic materials 0.000 claims description 9
- 239000003595 mist Substances 0.000 claims description 8
- 239000012046 mixed solvent Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 239000012159 carrier gas Substances 0.000 claims description 6
- RUDFQVOCFDJEEF-UHFFFAOYSA-N oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 claims description 5
- POILWHVDKZOXJZ-ARJAWSKDSA-M (Z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 claims description 4
- 229910001507 metal halide Inorganic materials 0.000 claims description 4
- 150000005309 metal halides Chemical class 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 238000005755 formation reaction Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 1
Description
すなわち、本発明は、以下の発明に関する。
［１］ イットリウムを含む金属ハロゲン化物または有機金属錯体の原料溶液を霧化または液滴化し、得られたミストまたは液滴をキャリアガスで成膜室内に設置されている基体まで搬送し、ついで前記ミストまたは液滴を熱反応させて前記基体上に酸化イットリウム膜を成膜することを特徴とする酸化イットリウム膜の製造方法。
［２］ 原料溶液が有機金属錯体を含む前記［１］記載の製造方法。
［３］ 有機金属錯体がイットリウムアセチルアセトナート錯体である前記［２］に記載の製造方法。
［４］ 原料溶液の溶媒がアルコールと水との混合溶媒である前記［１］〜［３］のいずれかに記載の製造方法。
［５］ アルコールが低級アルコールである前記［４］記載の製造方法。
［６］ アルコールが混合溶媒中に１〜１０モル％含まれている前記［４］または［５］に記載の製造方法。
［７］ キャリアガスが不活性ガスである前記［１］〜［６］のいずれかに記載の製造方法。
［８］ 熱反応を、４００℃〜６００℃の温度範囲内にて行う前記［１］〜［７］のいずれかに記載の製造方法。
［９］ 原料溶液を霧化または液滴化し、得られたミストまたは液滴をキャリアガスで成膜室内に設置されている基体まで搬送し、ついで前記ミストまたは液滴を熱反応させて前記基体上に酸化イットリウム膜を成膜するための前記原料溶液であって、イットリウムを含む金属ハロゲン化物または有機金属錯体からなることを特徴とする、原料溶液。
［１０］有機金属錯体からなる前記［９］記載の原料溶液。
［１１］有機金属錯体がイットリウムアセチルアセトナート錯体である前記［１０］記載の原料溶液。
［１２］溶媒がアルコールと水の混合溶媒である前記［９］〜［１１］のいずれかに記載の原料溶液。
［１３］アルコールが低級アルコールである前記［１２］記載の原料溶液。
［１４］アルコールが混合溶媒中に１〜１０モル％含まれている前記［１２］または［１３］に記載の原料溶液。
That is, the present invention relates to the following inventions.
[1] A raw material solution of a metal halide or organometallic complex containing yttrium is atomized or formed into droplets, and the obtained mist or droplets are conveyed with a carrier gas to a substrate installed in a film forming chamber. A method for producing an yttrium oxide film, wherein a mist or droplet is reacted with heat to form an yttrium oxide film on the substrate.
[2] The method according to [1], wherein the raw material solution contains an organometallic complex.
[3] The production method according to [2], wherein the organometallic complex is an yttrium acetylacetonate complex.
[4] The production method according to any one of [1] to [3], wherein the solvent of the raw material solution is a mixed solvent of alcohol and water.
[5] The production method of the above-mentioned [4], wherein the alcohol is a lower alcohol.
[6] The production method according to [4] or [5], wherein 1 to 10 mol% of alcohol is contained in the mixed solvent.
[7] The production method according to any one of [1] to [6], wherein the carrier gas is an inert gas.
[8] The production method according to any one of [1] to [7], wherein the thermal reaction is performed within a temperature range of 400 ° C to 600 ° C.
[9] The raw material solution was atomized or liquid droplets, and transported the resulting mist or droplets to the substrate which is installed in the deposition chamber in a carrier gas, then the said mist or droplets by thermally reacting A raw material solution for forming an yttrium oxide film on a substrate, comprising a metal halide or an organometallic complex containing yttrium.
[ 10 ] The raw material solution according to [ 9 ], comprising an organometallic complex.
[ 11 ] The raw material solution according to [ 10 ], wherein the organometallic complex is an yttrium acetylacetonate complex.
[ 12 ] The raw material solution according to any one of [ 9 ] to [ 11 ], wherein the solvent is a mixed solvent of alcohol and water.
[ 13 ] The raw material solution according to [ 12 ], wherein the alcohol is a lower alcohol.
[ 14 ] The raw material solution according to [ 12 ] or [ 13 ], wherein 1 to 10 mol% of alcohol is contained in the mixed solvent.
Claims (14)
The raw material solution according to claim 12 or 13 , wherein 1 to 10 mol% of alcohol is contained in the mixed solvent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015106565A JP6876893B2 (en) | 2015-05-26 | 2015-05-26 | Method for manufacturing yttrium oxide film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015106565A JP6876893B2 (en) | 2015-05-26 | 2015-05-26 | Method for manufacturing yttrium oxide film |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016216332A JP2016216332A (en) | 2016-12-22 |
| JP2016216332A5 true JP2016216332A5 (en) | 2018-07-12 |
| JP6876893B2 JP6876893B2 (en) | 2021-05-26 |
Family
ID=57578052
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015106565A Active JP6876893B2 (en) | 2015-05-26 | 2015-05-26 | Method for manufacturing yttrium oxide film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6876893B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7165313B2 (en) * | 2017-12-01 | 2022-11-04 | 株式会社Flosfia | coloring method |
| JP7165314B2 (en) * | 2017-12-01 | 2022-11-04 | 株式会社Flosfia | Colored film-forming composition |
| JP6980182B2 (en) * | 2017-12-01 | 2021-12-15 | 株式会社Flosfia | Ultrasonic mist |
| JP2019116676A (en) * | 2017-12-27 | 2019-07-18 | テクノクオーツ株式会社 | Corrosion resistant structure of component of film deposition apparatus, and manufacturing method of component |
| JP7280462B2 (en) * | 2018-04-27 | 2023-05-24 | 株式会社Flosfia | Optical waveguide manufacturing method |
| CN117837273A (en) * | 2021-08-31 | 2024-04-05 | 京瓷株式会社 | Plasma resistant laminate, method for producing same, and plasma processing apparatus |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4205912B2 (en) * | 2002-08-13 | 2009-01-07 | 時田シーブイディーシステムズ株式会社 | Transparent yttrium oxide film and manufacturing method thereof |
| JP2007197296A (en) * | 2005-07-27 | 2007-08-09 | Showa Denko Kk | Dispersion of metal oxide fine particle and its manufacturing method |
| US20130260047A1 (en) * | 2012-03-27 | 2013-10-03 | Rajan Bamola | Coating and methods thereof |
| JP6137668B2 (en) * | 2012-08-26 | 2017-05-31 | 国立大学法人 熊本大学 | Zinc oxide crystal layer manufacturing method and mist chemical vapor deposition apparatus |
| JP5397795B1 (en) * | 2013-06-21 | 2014-01-22 | Ｒｏｃａ株式会社 | Semiconductor device and manufacturing method thereof, crystal and manufacturing method thereof |
-
2015
- 2015-05-26 JP JP2015106565A patent/JP6876893B2/en active Active
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