CN103397308A - Spray head used for MOCVD equipment - Google Patents
Spray head used for MOCVD equipment Download PDFInfo
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- CN103397308A CN103397308A CN2013103331923A CN201310333192A CN103397308A CN 103397308 A CN103397308 A CN 103397308A CN 2013103331923 A CN2013103331923 A CN 2013103331923A CN 201310333192 A CN201310333192 A CN 201310333192A CN 103397308 A CN103397308 A CN 103397308A
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- diapire
- spray header
- anger
- face
- mocvd equipment
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Abstract
The invention provides a spray head used for MOCVD equipment. The spray head is used for providing a substrate under the spray head with reaction gas. The spray head comprises a main body layer, wherein a side close to the substrate is a gas outlet face, and gas flows of the reaction gas are formed between the gas outlet face and the substrate; and a flow limiting ring, wherein the flow limiting ring is connected to the gas outlet face, and is arranged around the gas outlet face, so as to control the direction of the gas flows. A thermal insulation layer is arranged between the flow limiting ring and the gas outlet face. According to the spray head used for the MOCVD equipment, the thermal insulation layer is arranged between the flow limiting ring and the gas outlet face, and influences of the flow limiting ring on the temperature of the gas outlet face are avoided, so that uniformity of the deposition of the MOCVD equipment is increased.
Description
Technical field
The present invention relates to the chemical vapor depsotition equipment technical field, particularly a kind of spray header for MOCVD equipment.
Background technology
In organometallics chemical vapour deposition (MOCVD) technological process, III clan source gas and group V source gas pass in reaction chamber respectively by the spray header of MOCVD equipment, and react to form film on heated substrate.Please refer to Fig. 1, it is the structural representation of reaction chamber of the MOCVD equipment of prior art.As shown in Figure 1, the spray header 1 that is used for MOCVD equipment is generally positioned at the top of pallet 2, described pallet 2 is used for placing substrate, and the lower surface of described spray header 1 is provided with production well 3, and spray header 1 can provide reactant gases for described pallet 2 equably by production well 3.In order further to improve homogeneity and the utilization ratio of reactant gases, the lower surface of spray header 1 also is provided with restrictor ring 4, and described restrictor ring 4 is connected with the lower surface of described spray header 1, and around the production well 3 of described spray header 1.As shown in Figure 1, an end of described restrictor ring 4 connects the lower surface of described spray header 1, and the other end is near described pallet 2 and face the marginal position of pallet 2.
Yet, to find in the MOCVD technological process, the deposition effect of tray edge position is compared very large difference is arranged with the deposition effect of other positions, and the deposition uniformity of MOCVD equipment is poor.
In order to improve the deposition uniformity of MOCVD equipment, promote yield, those skilled in the art always searching cause the poor reason of MOCVD equipment deposition uniformity with and solution.
Summary of the invention
The object of the present invention is to provide a kind of spray header for MOCVD equipment, to solve the poor problem of existing MOCVD equipment deposition uniformity.
For solving the problems of the technologies described above, the invention provides a kind of spray header for MOCVD equipment, the spray header of described MOCVD equipment comprises:
Body layer, the side near described substrate in described body layer is the face of giving vent to anger, described reactant gases forms air-flow described giving vent to anger between face and described substrate;
Restrictor ring, described restrictor ring is connected with the described face of giving vent to anger, and be compassingly set at the described face of giving vent to anger around, be used for controlling the direction of described air-flow;
Described restrictor ring and described giving vent to anger between face are provided with thermofin.
Optionally, at described spray header for MOCVD equipment, described body layer comprises a roof, a diapire and is connected a sidewall of described roof and described diapire, and described side wall ring is around in the edge of described roof and described diapire;
Wherein, be provided with several production wells through described diapire on described diapire.
Optionally, at described spray header for MOCVD equipment, the surface that deviates from described roof in described diapire is the face of giving vent to anger, and described thermofin is around the edge of described diapire.
Optionally, at described spray header for MOCVD equipment, described body layer also comprises the hot wall plate, and described hot wall plate is between described diapire and described restrictor ring;
Has gap between described hot wall plate and described diapire;
A side near described restrictor ring in described hot wall plate is the face of giving vent to anger, and described thermofin is around the edge of the described face of giving vent to anger.
Optionally,, at described spray header for MOCVD equipment, be provided with gas passage between described hot wall plate and described diapire, an end of described gas passage connects described production well, and the other end of described gas passage passes described hot wall plate.
Optionally, at described spray header for MOCVD equipment, the material that described thermofin adopts is quartz or asbestos.
The invention provides a kind of MOCVD equipment, described MOCVD equipment comprises:
Reaction chamber, pallet and above-mentioned spray header for MOCVD equipment;
Described pallet and described spray header all are arranged at the inside of described reaction chamber and are oppositely arranged;
Described spray header has the hot wall plate, and described hot wall plate is positioned at a side of contiguous described pallet.
The contriver finds, cause the poor reason of existing MOCVD equipment deposition uniformity to be, in the MOCVD technological process, pallet is in the condition of high temperature, be arranged at the face of the giving vent to anger restrictor ring on every side of described spray header owing to intensification occurring near pallet, the restrictor ring temperature rises and causes the surface temperature of marginal position in the described face of giving vent to anger higher than the surface temperature on mid-way, affect the airflow field of reactant gases and being uniformly distributed of temperature field, made the deposition uniformity of MOCVD equipment poor., at the spray header for MOCVD equipment provided by the invention,, by setting up thermofin between the surface at described restrictor ring and described production well, be subject to the impact of restrictor ring with the temperature of avoiding the production well surface, thereby improved the homogeneity of MOCVD equipment deposition.
Description of drawings
Fig. 1 is the structural representation of reaction chamber of the MOCVD equipment of prior art;
Fig. 2 is the structural representation of the spray header that is used for MOCVD equipment of the embodiment of the present invention one;
Fig. 3 is the structural representation of the spray header that is used for MOCVD equipment of the embodiment of the present invention two.
Embodiment
Below in conjunction with the drawings and specific embodiments, the spray header that is used for MOCVD equipment that the present invention proposes is described in further detail.According to the following describes and claims, advantages and features of the invention will be clearer.It should be noted that, accompanying drawing all adopts very the form of simplifying and all uses non-ratio accurately, only in order to convenient, the purpose of the aid illustration embodiment of the present invention lucidly.
The contriver, through the research discovery, causes the poor reason of existing MOCVD equipment deposition uniformity to be, in the MOCVD technological process, pallet 2 is heated, pallet 2 is in the condition of high temperature, due to the close pallet 2 of an end of restrictor ring 4, be subject to the temperatures involved of pallet 2, the temperature of restrictor ring 4 raises.The temperature of restrictor ring 4 rises and makes the surface temperature near the production well 3 of restrictor ring 4 rise thereupon, and the surface temperature that causes being in the air outlet that the surface ratio of the air outlet of marginal position mediates is high.The temperature contrast on surface, air outlet has affected temperature field and the airflow field of reactant gases, makes on substrate the film of formation of deposits inhomogeneous, and the deposition effect of tray edge position is compared and larger difference occurred with the deposition effect of other positions.
To sum up, cause the poor reason of existing MOCVD equipment deposition uniformity to be, the be heated temperature on the surface that causes production well of restrictor ring is uneven, has affected the homogeneity of reactant gases, causes the deposition uniformity variation.In order to address the above problem, the application has proposed following technical scheme:
[embodiment one]
Please refer to Fig. 2, it is the structural representation of spray header of the MOCVD equipment of the embodiment of the present invention one.As shown in Figure 2, the spray header 10 of described MOCVD equipment is used for providing reactant gases to the substrate (not shown) that is positioned at spray header 10 belows, the spray header 10 of described MOCVD equipment comprises: body layer 11, a side near described substrate in described body layer 11 is the face of giving vent to anger 18, and described reactant gases forms air-flow described giving vent to anger between face 18 and described substrate; Restrictor ring 13, described restrictor ring 13 is connected with the described face 18 of giving vent to anger, and be compassingly set at the described face 18 of giving vent to anger around, be used for controlling the direction of described air-flow; Described restrictor ring 13 and described giving vent to anger between face 18 are provided with thermofin 14.
Concrete, described body layer 11 is generally made by metallic substance, described body layer 11 comprises a roof, a diapire and connects a sidewall of described roof and described diapire, described side wall ring is around in the edge of described roof and described diapire, and described roof, diapire and side walls enclose form the shell of described body layer.Wherein, be provided with several production wells 12 on the diapire of described body layer 11, described production well 12 is through described diapire.The surface that deviates from described top board in described diapire is the face of giving vent to anger 18, and the production well 12 on described diapire faces described substrate, and the spray header 10 of described MOCVD equipment can provide reactant gases for described substrate equably by production well 12.
Described spray header 10 sprays reactant gases to form air-flow between the face of giving vent to anger 18 and described substrate to described substrate.Be provided with restrictor ring 13 around described production well 12, described restrictor ring 13 is used for controlling described air-flow take vertical direction as described substrate air feed.Described restrictor ring 13 is connected with the diapire of described body layer 11, is provided with thermofin 14 between the diapire of described restrictor ring 13 and described body layer 11, and described thermofin 14 is around the edge of the described face 18 of giving vent to anger.The material that described thermofin 14 adopts is quartz or asbestos.In the present embodiment, described thermofin 14 is to adopt quartzy the making.
Due to, being provided with thermofin 14 between body layer 11 and restrictor ring 13, the temperature of body layer 11 is the impact of restricted flow ring 13 not.The face 18 of giving vent to anger is to deviate from the surface of described roof in the diapire of body layer 11, the also temperatures involved of restricted flow ring 13 not, and the temperature of the face 18 of giving vent to anger is comparatively even.
[embodiment two]
Please refer to Fig. 3, it is the structural representation of spray header of the MOCVD equipment of the embodiment of the present invention two.As shown in Figure 3, the spray header 20 of described MOCVD equipment is used for providing reactant gases to the substrate (not shown) that is positioned at spray header 20 belows, the spray header 20 of described MOCVD equipment comprises: body layer 21, a side near described substrate in described body layer 21 is the face of giving vent to anger 28, and described reactant gases forms air-flow described giving vent to anger between face 28 and described substrate; Restrictor ring 23, described restrictor ring 23 is connected with the described face 28 of giving vent to anger, and be compassingly set at the described face 28 of giving vent to anger around, be used for controlling the direction of described air-flow; Described restrictor ring 23 and described giving vent to anger between face 28 are provided with thermofin 24.
Concrete, described body layer 21 is generally made by metallic substance, described body layer 21 comprises a roof, a diapire and connects a sidewall of described roof and described diapire, described side wall ring is around in the edge of described roof and described diapire, and described roof, diapire and side walls enclose form the shell of described body layer.Wherein, be provided with several production wells 22 on the diapire of described body layer 21, described production well 22 is through described diapire.Described body layer 21 also comprises hot wall plate 25, and described hot wall plate 25 between described diapire and described restrictor ring 23, has gap between described hot wall plate 25 and described diapire.Be provided with gas passage 26 between described hot wall plate 23 and described diapire, an end of described gas passage 26 connects described production well 22, and the other end of described gas passage 26 passes described hot wall plate 25.
In the present embodiment, the side near described restrictor ring 23 in described hot wall plate 25 is the face of giving vent to anger 28, and described thermofin 24 is around the edge of the described face 28 of giving vent to anger.Reactant gases sprays from the production well 22 on diapire described in body layer 21, passes described hot wall plate 25 via gas passage 26 and arrives described substrates.Described spray header 20, to the reactant gases that described substrate sprays, forms air-flow between described hot wall plate 25 and described substrate.
Be provided with restrictor ring 23 around described production well 22, described restrictor ring 23 is used for controlling described air-flow take vertical direction as described substrate air feed.Described restrictor ring 23 is connected with hot wall plate 25, is provided with thermofin 24 between described restrictor ring 23 and described hot wall plate 25, and the material that described thermofin 24 adopts is quartz or asbestos.
Due to, being provided with thermofin 24 between hot wall plate 25 and restrictor ring 23, the temperature of hot wall plate 25 is the impact of restricted flow ring 23 not.The face 28 of giving vent to anger be in described hot wall plate 25 near a side of described restrictor ring 23, the also temperatures involved of restricted flow ring 23 not, the temperature of the face 28 of giving vent to anger is comparatively even.
In another embodiment of the present invention, the present invention also provides the MOCVD equipment of the spray header that has adopted above-mentioned MOCVD equipment, and described MOCVD equipment comprises: reaction chamber, pallet and above-mentioned spray header for MOCVD equipment; Described pallet and described spray header all are arranged at the inside of described reaction chamber and are oppositely arranged.
Described spray header comprises: body layer, and the side near described substrate in described body layer is the face of giving vent to anger, described reactant gases forms air-flow described giving vent to anger between face and described substrate; Restrictor ring, described restrictor ring is connected with the described face of giving vent to anger, and be compassingly set at the described face of giving vent to anger around, be used for controlling the direction of described air-flow; Described restrictor ring and described giving vent to anger between face are provided with thermofin.
Concrete, described body layer comprise a roof, a diapire and be connected to described roof and described diapire between sidewall, described roof, diapire and side walls enclose form the shell of described body layer.Wherein, be provided with some production wells on described diapire.The surface that deviates from described top board in described diapire is the face of giving vent to anger.
Wherein, be provided with restrictor ring around described production well, described restrictor ring is used for controlling described air-flow take vertical direction as described substrate air feed.Described restrictor ring is connected with the diapire of described body layer, is provided with thermofin between the diapire of described restrictor ring and described body layer.The material that described thermofin adopts is quartz or asbestos.
Preferably, described spray header has the hot wall plate, and described hot wall plate is arranged in a side of the contiguous described pallet of described spray header.Concrete, described hot wall plate between described diapire and described restrictor ring, has gap between described hot wall plate and described diapire.Be provided with gas passage between described hot wall plate and described diapire, an end of described gas passage connects described production well, and the other end of described gas passage passes described hot wall plate.In the body layer with hot wall plate, the face of giving vent to anger is a side of close described restrictor ring in described hot wall plate, and described thermofin is arranged between described restrictor ring and described hot wall plate.
In described MOCVD equipment, the restrictor ring of spray header and give vent to anger between face and be provided with thermofin, the material that described thermofin adopts is quartz or asbestos, can avoid the temperature of the face of giving vent to anger to be subject to the impact of restrictor ring, thus, in described MOCVD equipment, the temperature field of reactant gases and the homogeneity of airflow field improve.
To sum up, in the spray header of the MOCVD equipment that the embodiment of the present invention provides, restrictor ring and give vent to anger between face and set up thermofin, thermofin can avoid the temperature of the face of giving vent to anger to be subject to the impact of restrictor ring, thereby improve the temperature field of reactant gases and the homogeneity of airflow field, improve the homogeneity of MOCVD equipment deposition.
Foregoing description is only the description to preferred embodiment of the present invention, and not to any restriction of the scope of the invention, any change, modification that the those of ordinary skill in field of the present invention is done according to above-mentioned disclosure, all belong to the protection domain of claims.
Claims (7)
1. a spray header that is used for MOCVD equipment, be used for providing reactant gases to the substrate that is positioned at described spray header below, it is characterized in that, comprising:
Body layer, the side near described substrate in described body layer is the face of giving vent to anger, described reactant gases forms air-flow described giving vent to anger between face and described substrate;
Restrictor ring, described restrictor ring is connected with the described face of giving vent to anger, and be compassingly set at the described face of giving vent to anger around, be used for controlling the direction of described air-flow;
Described restrictor ring and described giving vent to anger between face are provided with thermofin.
2. the spray header for MOCVD equipment as claimed in claim 1, is characterized in that, described body layer comprises a roof, a diapire and be connected a sidewall of described roof and described diapire, and described side wall ring is around in the edge of described roof and described diapire;
Wherein, be provided with several production wells through described diapire on described diapire.
3. the spray header for MOCVD equipment as claimed in claim 2, is characterized in that, the surface that deviates from described roof in described diapire is the face of giving vent to anger, and described thermofin is around the edge of described diapire.
4. the spray header for MOCVD equipment as claimed in claim 2, is characterized in that, described body layer also comprises the hot wall plate, and described hot wall plate is between described diapire and described restrictor ring;
Has gap between described hot wall plate and described diapire;
A side near described restrictor ring in described hot wall plate is the face of giving vent to anger, and described thermofin is around the edge of the described face of giving vent to anger.
5. the spray header for MOCVD equipment as claimed in claim 4, it is characterized in that, be provided with gas passage between described hot wall plate and described diapire, an end of described gas passage connects described production well, and the other end of described gas passage passes described hot wall plate.
6. the spray header for MOCVD equipment as described in claim 1 to 5 any one, is characterized in that, the material that described thermofin adopts is quartz or asbestos.
7. a MOCVD equipment, is characterized in that, comprising:
Reaction chamber, pallet and the spray header for MOCVD equipment as described in any one in claim 1 to 6;
Described pallet and described spray header all are arranged at the inside of described reaction chamber and are oppositely arranged;
Described spray header has the hot wall plate, and described hot wall plate is positioned at a side of contiguous described pallet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013103331923A CN103397308A (en) | 2013-08-01 | 2013-08-01 | Spray head used for MOCVD equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2013103331923A CN103397308A (en) | 2013-08-01 | 2013-08-01 | Spray head used for MOCVD equipment |
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| CN103397308A true CN103397308A (en) | 2013-11-20 |
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| CN2013103331923A Pending CN103397308A (en) | 2013-08-01 | 2013-08-01 | Spray head used for MOCVD equipment |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106544639A (en) * | 2015-09-21 | 2017-03-29 | 中微半导体设备(上海)有限公司 | Prevent the gas extraction arrangement for blocking and the MOCVD device that the device is set |
| CN106702483A (en) * | 2017-03-27 | 2017-05-24 | 重庆墨希科技有限公司 | Continuous graphene growth equipment with vertically arranged high-temperature process cavity |
| CN106835068A (en) * | 2017-03-27 | 2017-06-13 | 重庆墨希科技有限公司 | The continuous growth apparatus of rolling Graphene |
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| US20090239362A1 (en) * | 2008-03-24 | 2009-09-24 | Hironobu Hirata | Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device |
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| TW201309298A (en) * | 2011-02-04 | 2013-03-01 | Actelion Pharmaceuticals Ltd | Pharmaceutical compositions for treating malignant glioma |
| CN103074601A (en) * | 2012-01-21 | 2013-05-01 | 光达光电设备科技（嘉兴）有限公司 | Spray head used in chemical vapor deposition process |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US5919332A (en) * | 1995-06-07 | 1999-07-06 | Tokyo Electron Limited | Plasma processing apparatus |
| US20090239362A1 (en) * | 2008-03-24 | 2009-09-24 | Hironobu Hirata | Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device |
| CN102047388A (en) * | 2008-06-20 | 2011-05-04 | 应用材料股份有限公司 | Gas distribution showerhead skirt |
| TW201309298A (en) * | 2011-02-04 | 2013-03-01 | Actelion Pharmaceuticals Ltd | Pharmaceutical compositions for treating malignant glioma |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106544639A (en) * | 2015-09-21 | 2017-03-29 | 中微半导体设备(上海)有限公司 | Prevent the gas extraction arrangement for blocking and the MOCVD device that the device is set |
| CN106544639B (en) * | 2015-09-21 | 2019-03-05 | 中微半导体设备(上海)有限公司 | It prevents the gas extraction arrangement of blocking and the MOCVD device of the device is set |
| CN106702483A (en) * | 2017-03-27 | 2017-05-24 | 重庆墨希科技有限公司 | Continuous graphene growth equipment with vertically arranged high-temperature process cavity |
| CN106835068A (en) * | 2017-03-27 | 2017-06-13 | 重庆墨希科技有限公司 | The continuous growth apparatus of rolling Graphene |
| CN106702483B (en) * | 2017-03-27 | 2020-01-03 | 重庆墨希科技有限公司 | Graphene continuous growth equipment with vertically arranged high-temperature process cavity |
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Application publication date: 20131120 |