JP2018015706A5 - - Google Patents

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JP2018015706A5
JP2018015706A5 JP2016147898A JP2016147898A JP2018015706A5 JP 2018015706 A5 JP2018015706 A5 JP 2018015706A5 JP 2016147898 A JP2016147898 A JP 2016147898A JP 2016147898 A JP2016147898 A JP 2016147898A JP 2018015706 A5 JP2018015706 A5 JP 2018015706A5
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raw material
manufacturing
mists
mist
material solutions
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JP2016147898A
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JP2018015706A (en
JP6849874B2 (en
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Claims (8)

第1及び第2の原料溶液をそれぞれ霧化し、得られた第1及び第2のミストをそれぞれ第1及び第2のキャリアガスをそれぞれ用いて基体近傍まで搬送し、ついで前記基体近傍で第1及び第2のミストをそれぞれ熱反応させることにより、前記基体上に直接又は他の層を介して第1及び第2の膜をそれぞれ形成する積層構造体の製造方法であって、第1及び第2のキャリアガスはそれぞれ互いに同一又は異なるガスであり、第1及び第2の原料溶液のうちいずれか一方はモノマーを含み、他方は金属を含むことを特徴とする積層構造体の製造方法。   The first and second raw material solutions are atomized, respectively, and the obtained first and second mists are respectively transported to the vicinity of the substrate using the first and second carrier gases, respectively, and then the first and second mists are first detected near the substrate. The first and second films are respectively formed by directly reacting the second mist and the second mist directly or via another layer on the substrate. The two carrier gases are the same or different from each other, and one of the first and second raw material solutions contains a monomer, and the other contains a metal. 第1及び第2のミストの熱反応を、いずれも非酸素雰囲気下で行う請求項1記載の製造方法。   The manufacturing method according to claim 1, wherein the thermal reactions of the first and second mists are both performed in a non-oxygen atmosphere. 第1及び第2のミストのいずれかの熱反応後、得られた膜を酸化処理に付す請求項1又は2に記載の製造方法。   The manufacturing method of Claim 1 or 2 which attaches | subjects the obtained film | membrane to an oxidation process after the thermal reaction of either the 1st and 2nd mist. 第1及び第2の原料溶液のうちいずれかの原料溶液が有機錯体を含む請求項1〜3のいずれかに記載の製造方法。   The manufacturing method in any one of Claims 1-3 in which any raw material solution contains an organic complex among the 1st and 2nd raw material solutions. 第1及び第2の原料溶液のうちいずれかの原料溶液が水を含む請求項1〜4のいずれかに記載の製造方法。   The manufacturing method in any one of Claims 1-4 in which any raw material solution contains water among 1st and 2nd raw material solutions. 第1、第2及び第3の原料溶液をそれぞれ霧化し、得られた第1、第2及び第3のミストをそれぞれ第1、第2及び第3のキャリアガスをそれぞれ用いて基体近傍まで搬送し、ついで前記基体近傍で第1、第2及び第3のミストをそれぞれ熱反応させることにより、前記基体上に直接又は他の層を介して第1、第2及び第3の膜をそれぞれ形成する積層構造体の製造方法であって、第1、第2及び第3のキャリアガスはそれぞれ互いに同一又は異なるガスであり、第1、第2及び第3の原料溶液のうちいずれかはモノマーを含み、他の原料溶液はそれぞれ互いに同一又は異なる金属を含むことを特徴とする積層構造体の製造方法。   The first, second, and third raw material solutions are atomized, and the obtained first, second, and third mists are conveyed to the vicinity of the substrate using the first, second, and third carrier gases, respectively. Then, the first, second, and third mists are thermally reacted in the vicinity of the base, thereby forming the first, second, and third films on the base either directly or via other layers, respectively. The first, second, and third carrier gases are the same or different from each other, and any one of the first, second, and third raw material solutions contains a monomer. And the other raw material solutions each contain the same or different metals. 第3の原料溶液が金属を含み、第3のミストの熱反応を酸素雰囲気下で行う請求項6記載の製造方法。   The manufacturing method according to claim 6, wherein the third raw material solution contains a metal, and the thermal reaction of the third mist is performed in an oxygen atmosphere. 第1の原料溶液がモノマーを含み、第1のミストの熱反応を350℃以下の温度で行う請求項1〜7のいずれかに記載の製造方法。
The manufacturing method according to claim 1, wherein the first raw material solution contains a monomer and the thermal reaction of the first mist is performed at a temperature of 350 ° C. or lower.
JP2016147898A 2016-07-27 2016-07-27 Manufacturing method of laminated structure Active JP6849874B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2016147898A JP6849874B2 (en) 2016-07-27 2016-07-27 Manufacturing method of laminated structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016147898A JP6849874B2 (en) 2016-07-27 2016-07-27 Manufacturing method of laminated structure

Publications (3)

Publication Number Publication Date
JP2018015706A JP2018015706A (en) 2018-02-01
JP2018015706A5 true JP2018015706A5 (en) 2019-09-12
JP6849874B2 JP6849874B2 (en) 2021-03-31

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JP2016147898A Active JP6849874B2 (en) 2016-07-27 2016-07-27 Manufacturing method of laminated structure

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Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0714771A (en) * 1993-06-26 1995-01-17 Taiyo Yuden Co Ltd Method and equipment for forming thin film
JP2003051499A (en) * 2001-08-07 2003-02-21 Matsushita Electric Ind Co Ltd Method and device for thin film formation
US8658248B2 (en) * 2005-12-29 2014-02-25 3M Innovative Properties Company Method for atomizing material for coating processes
EP2740593A4 (en) * 2011-07-28 2015-04-15 Toppan Printing Co Ltd Laminate, gas barrier film, production method for laminate, and laminate production device
JP6547930B2 (en) * 2014-08-29 2019-07-24 株式会社Flosfia Metal film formation method

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