JP2019062188A - 垂直共振器面発光レーザのビーム広がり制御 - Google Patents
垂直共振器面発光レーザのビーム広がり制御 Download PDFInfo
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- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18305—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] with emission through the substrate, i.e. bottom emission
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- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
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Abstract
Description
Claims (20)
- 垂直共振器面発光レーザ(VCSEL)であって、前記VCSELは、
基板層と、
前記基板層の上のエピタキシャル層と、
を備え、
前記エピタキシャル層は、活性層と、第1のミラーと、第2のミラーと、1つ以上の酸化層とを含み、
前記活性層は前記第1のミラーと前記第2のミラーの間にあり、
前記1つ以上の酸化層は前記活性層に近接し、且つ
前記1つ以上の酸化層は、前記VCSELにより放射されるレーザビームのビーム広がりを、
前記1つ以上の酸化層の個数、
前記1つ以上の酸化層の形状、
前記1つ以上の酸化層の厚さ、又は
前記1つ以上の酸化層と活性層との近接度、
のうちの少なくとも1つに基づいて制御するように構成されている、
VCSEL。 - 前記1つ以上の酸化層は、前記レーザビームの広い広がりを形成するために前記活性層の活性領域と前記1つ以上の酸化層と関連する酸化領域との間に実効屈折率ステップを生成するように構成されている、請求項1に記載のVCSEL。
- 前記1つ以上の酸化層は前記ビーム広がりを制御するために複数の酸化層を含んでいる、請求項1に記載のVCSEL。
- 前記1つ以上の酸化層の前記形状は前記ビーム広がりを制御するように構成されている、請求項1に記載のVCSEL。
- 前記1つ以上の酸化層の前記厚さは前記ビーム広がりを制御するように構成されている、請求項1に記載のVCSEL。
- 前記1つ以上の酸化層と前記活性との前記近接度は前記ビーム広がりを制御するように構成されている、請求項1に記載のVCSEL。
- 前記1つ以上の酸化層のうちで前記活性層に最も近い酸化層は閾程度未満のテーパを有する、請求項1に記載のVCSEL。
- 前記VCSELは上面発光VCSELである、請求項1に記載のVCSEL。
- 前記VCSELは底面発光VCSELである、請求項1に記載のVCSEL。
- 垂直共振器面発光レーザ(VCSEL)のビーム広がりを制御する方法であって、前記方法は、
前記VCSELの基板層の上に、活性層、第1のミラー及び第2のミラーを形成するステップであって、
前記活性層は前記第1のミラーと前記第2のミラーの間に形成するステップと、
1つ以上の酸化層を前記活性層に近接して形成するステップであって、
前記1つ以上の酸化層は、前記VCSELにより放射されるレーザビームのビーム広がりを、
前記1つ以上の酸化層の個数、
前記1つ以上の酸化層の形状、
前記1つ以上の酸化層の厚さ、又は
前記1つ以上の酸化層と活性層との近接度、
のうちの少なくとも1つに基づいて制御するように構成する、ステップと、
を備える、方法。 - 前記1つ以上の酸化層は、前記レーザビームの比較的広い広がりを形成するために前記活性層の活性領域と前記1つ以上の酸化層と関連する酸化領域との間に比較的大きい実効屈折率ステップを生成するように構成する、請求項10に記載の方法。
- 前記1つ以上の酸化層は、前記レーザビームの比較的狭いビーム広がりを形成するために、前記活性層の活性領域に近接して比較的小さい実効屈折率ステップを生成するように構成する、請求項10に記載の方法。
- 前記VCSELは上面発光VCSELである、請求項10に記載の方法。
- 前記1つ以上の酸化層のうちで前記活性層に最も近い活性層はテーパ化されない、請求項10に記載の方法。
- 垂直共振器面発光レーザ(VCSEL)ウェハであって、前記VCSELは、
基板層と、
前記基板層の上のエピタキシャル層と、
を備え、前記エピタキシャル層は、
第1のミラーと第2のミラーとの間の活性層と、
前記活性層に近接する1つ以上の酸化層と、
を含み、前記1つ以上の酸化層は、
前記1つ以上の酸化層の個数、
前記1つ以上の酸化層の形状、
前記1つ以上の酸化層の厚さ、又は
前記1つ以上の酸化層と前記活性層の活性領域との近接度、
のうちの少なくとも1つに基づいて前記活性層の活性領域に近接する実効屈折率ステップを制御することによって、前記VCSELにより放射されるレーザビームのビーム広がりを制御するように構成されている、
VCSELウェハ。 - 比較的大きい屈折率ステップが放射される前記レーザビームの比較的広いビーム広がりを生じさせ、且つ比較的小さい屈折率ステップが放射される前記レーザビームの比較的狭いビーム広がりを生じさせる、請求項15に記載のVCSELウェハ。
- 前記ビーム広がりは前記1つ以上の酸化層に含まれる酸化層の個数に基づいて制御される、請求項15に記載のVCSELウェハ。
- 前記ビーム広がりは前記1つ以上の酸化層の少なくとも1つの酸化層の形状に基づいて制御される、請求項15に記載のVCSELウェハ。
- 前記ビーム広がりは前記1つ以上の酸化層の少なくとも1つの酸化層の厚さに基づいて制御される、請求項15に記載のVCSELウェハ。
- 前記ビーム広がりは前記1つ以上の酸化層の少なくとも1つの酸化層と前記活性層の活性領域との近接度に基づいて制御される、請求項15に記載のVCSELウェハ。
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US15/688,218 US11088508B2 (en) | 2017-08-28 | 2017-08-28 | Controlling beam divergence in a vertical-cavity surface-emitting laser |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020174097A (ja) * | 2019-04-10 | 2020-10-22 | 富士ゼロックス株式会社 | 発光装置、光学装置及び情報処理装置 |
WO2022201772A1 (ja) * | 2021-03-23 | 2022-09-29 | ソニーセミコンダクタソリューションズ株式会社 | 面発光レーザ、光源装置、電子機器及び面発光レーザの製造方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11456575B2 (en) * | 2017-08-28 | 2022-09-27 | Lumentum Operations Llc | Distributed oxide lens for beam shaping |
US11594857B2 (en) * | 2018-02-20 | 2023-02-28 | Ii-Vi Delaware Inc. | Tailoring of high power VCSEL arrays |
WO2020026573A1 (ja) * | 2018-07-31 | 2020-02-06 | ソニー株式会社 | 面発光半導体レーザ |
US11165222B2 (en) * | 2019-05-06 | 2021-11-02 | Mellanox Technologies, Ltd. | Optically matched vertical-cavity surface-emitting laser (VCSEL) with passivation |
US11362486B2 (en) | 2019-05-06 | 2022-06-14 | Mellanox Technologies, Ltd. | High speed high bandwidth vertical-cavity surface-emitting laser with controlled overshoot |
US11552450B2 (en) * | 2019-08-14 | 2023-01-10 | Ii-Vi Delaware, Inc. | VCSEL with double oxide apertures |
US11909172B2 (en) * | 2020-01-08 | 2024-02-20 | Asahi Kasei Kabushiki Kaisha | Method for manufacturing optical device and optical device |
US11984541B2 (en) * | 2020-04-14 | 2024-05-14 | Raysolve Optoelectronics (Suzhou) Company Limited | Light emitting diode structure having resonant cavity and method for manufacturing the same |
US11757253B2 (en) * | 2020-05-21 | 2023-09-12 | Lumentum Operations Llc | Vertical cavity surface emitting laser with active layer-specific addressability |
US11855413B2 (en) * | 2020-06-22 | 2023-12-26 | Lumentum Operations Llc | Vertical-cavity surface-emitting laser array with isolated cathodes and a common anode |
CN116420236A (zh) * | 2020-11-27 | 2023-07-11 | 苏州晶湛半导体有限公司 | 半导体发光器件及其制备方法 |
CN114069391B (zh) * | 2021-11-11 | 2023-06-16 | 常州纵慧芯光半导体科技有限公司 | 一种垂直腔面发射激光器以及制备方法 |
CN115395367B (zh) * | 2022-08-23 | 2023-05-12 | 深圳技术大学 | 一种椭圆形多台面激光器结构 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005277309A (ja) * | 2004-03-26 | 2005-10-06 | Seiko Epson Corp | 面発光型半導体レーザおよびその製造方法 |
JP2007318064A (ja) * | 2005-11-30 | 2007-12-06 | Ricoh Co Ltd | 面発光レーザ素子、それを備えた面発光レーザアレイ、面発光レーザ素子または面発光レーザアレイを備えた電子写真システムおよび面発光レーザ素子または面発光レーザアレイを備えた光通信システム |
JP2008192733A (ja) * | 2007-02-02 | 2008-08-21 | Fuji Xerox Co Ltd | 面発光型半導体レーザ、面発光型半導体レーザの製造方法、光学装置、光照射装置、情報処理装置、光送信装置、光空間伝送装置および光伝送システム。 |
US20090262765A1 (en) * | 2008-03-24 | 2009-10-22 | The Regents Of The University Of California | Small dimension high-efficiency high-speed vertical-cavity surface-emitting lasers |
JP2010010645A (ja) * | 2008-05-27 | 2010-01-14 | Ricoh Co Ltd | 面発光レーザ素子、面発光レーザアレイ、光走査装置、及び画像形成装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5881085A (en) * | 1996-07-25 | 1999-03-09 | Picolight, Incorporated | Lens comprising at least one oxidized layer and method for forming same |
US5822356A (en) | 1997-02-06 | 1998-10-13 | Picolight Incorporated | Intra-cavity lens structures for semiconductor lasers |
JP2001251016A (ja) * | 1999-12-28 | 2001-09-14 | Canon Inc | 面発光半導体レーザ及びその製造方法 |
TW447186B (en) * | 2000-06-08 | 2001-07-21 | Chunghwa Telecom Lab | Manufacturing method of selective area wet oxidation of surface emitting laser |
US7061955B2 (en) * | 2000-09-15 | 2006-06-13 | The Regents Of The University Of California | Heterogeneous composite semiconductor structures for enhanced oxide and air aperture formation for semiconductor lasers and detectors and method of manufacture |
US6803604B2 (en) * | 2001-03-13 | 2004-10-12 | Ricoh Company, Ltd. | Semiconductor optical modulator, an optical amplifier and an integrated semiconductor light-emitting device |
US6904072B2 (en) * | 2001-12-28 | 2005-06-07 | Finisar Corporation | Vertical cavity surface emitting laser having a gain guide aperture interior to an oxide confinement layer |
JP3860494B2 (ja) * | 2002-03-13 | 2006-12-20 | 富士通株式会社 | 面発光レーザおよびその製造方法 |
CA2581614A1 (en) * | 2004-10-01 | 2006-04-13 | Finisar Corporation | Vertical cavity surface emitting laser having multiple top-side contacts |
WO2010103064A1 (en) * | 2009-03-13 | 2010-09-16 | Neurosearch A/S | Novel benzoxazinone derivatives useful for the treatment of cns disorders |
JP2012216664A (ja) * | 2011-03-31 | 2012-11-08 | Furukawa Electric Co Ltd:The | レーザ素子、レーザ素子アレイ、光源及び光モジュール |
US9269862B2 (en) * | 2013-11-29 | 2016-02-23 | Epistar Corporation | Light-emitting device |
WO2016008083A1 (zh) * | 2014-07-15 | 2016-01-21 | 华为技术有限公司 | 一种垂直腔面发射激光器vcsel |
JP5729515B1 (ja) * | 2014-08-26 | 2015-06-03 | 富士ゼロックス株式会社 | 面発光型半導体レーザ、面発光型半導体レーザの製造方法、面発光型半導体レーザ装置、光伝送装置および情報処理装置 |
-
2017
- 2017-08-28 US US15/688,218 patent/US11088508B2/en active Active
-
2018
- 2018-08-06 TW TW107127252A patent/TWI802581B/zh active
- 2018-08-06 JP JP2018147668A patent/JP2019062188A/ja active Pending
- 2018-08-09 IL IL261085A patent/IL261085B2/en unknown
- 2018-08-15 EP EP18189172.2A patent/EP3451471A1/en active Pending
- 2018-08-27 KR KR1020180100696A patent/KR102528763B1/ko active IP Right Grant
- 2018-08-27 CN CN201810980031.6A patent/CN109428263B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005277309A (ja) * | 2004-03-26 | 2005-10-06 | Seiko Epson Corp | 面発光型半導体レーザおよびその製造方法 |
JP2007318064A (ja) * | 2005-11-30 | 2007-12-06 | Ricoh Co Ltd | 面発光レーザ素子、それを備えた面発光レーザアレイ、面発光レーザ素子または面発光レーザアレイを備えた電子写真システムおよび面発光レーザ素子または面発光レーザアレイを備えた光通信システム |
JP2008192733A (ja) * | 2007-02-02 | 2008-08-21 | Fuji Xerox Co Ltd | 面発光型半導体レーザ、面発光型半導体レーザの製造方法、光学装置、光照射装置、情報処理装置、光送信装置、光空間伝送装置および光伝送システム。 |
US20090262765A1 (en) * | 2008-03-24 | 2009-10-22 | The Regents Of The University Of California | Small dimension high-efficiency high-speed vertical-cavity surface-emitting lasers |
JP2010010645A (ja) * | 2008-05-27 | 2010-01-14 | Ricoh Co Ltd | 面発光レーザ素子、面発光レーザアレイ、光走査装置、及び画像形成装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020174097A (ja) * | 2019-04-10 | 2020-10-22 | 富士ゼロックス株式会社 | 発光装置、光学装置及び情報処理装置 |
WO2022201772A1 (ja) * | 2021-03-23 | 2022-09-29 | ソニーセミコンダクタソリューションズ株式会社 | 面発光レーザ、光源装置、電子機器及び面発光レーザの製造方法 |
DE112022001629T5 (de) | 2021-03-23 | 2024-01-04 | Sony Semiconductor Solutions Corporation | Oberflächenemittierender laser, lichtquellenvorrichtung, elektronische vorrichtung und verfahren zum herstellen eines oberflächenemittierenden lasers |
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IL261085A (en) | 2019-01-31 |
IL261085B2 (en) | 2023-07-01 |
KR20190024770A (ko) | 2019-03-08 |
US20190067906A1 (en) | 2019-02-28 |
CN109428263B (zh) | 2024-01-05 |
TWI802581B (zh) | 2023-05-21 |
US11088508B2 (en) | 2021-08-10 |
KR102528763B1 (ko) | 2023-05-03 |
TW201914133A (zh) | 2019-04-01 |
EP3451471A1 (en) | 2019-03-06 |
IL261085B1 (en) | 2023-03-01 |
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