JP2019038719A - Near-infrared radiation absorption glass - Google Patents
Near-infrared radiation absorption glass Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims abstract description 31
- 238000010521 absorption reaction Methods 0.000 title abstract description 8
- 230000005855 radiation Effects 0.000 title abstract 3
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 12
- 239000011737 fluorine Substances 0.000 claims abstract description 12
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 11
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 238000004031 devitrification Methods 0.000 abstract description 29
- 230000003287 optical effect Effects 0.000 abstract description 14
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- 238000002844 melting Methods 0.000 description 10
- 230000008018 melting Effects 0.000 description 10
- 238000002834 transmittance Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- 239000007791 liquid phase Substances 0.000 description 7
- 238000000465 moulding Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 4
- 238000004017 vitrification Methods 0.000 description 4
- 229910018068 Li 2 O Inorganic materials 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000003280 down draw process Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- -1 Ta 2 O 5 Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/17—Silica-free oxide glass compositions containing phosphorus containing aluminium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/08—Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/226—Glass filters
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Glass Compositions (AREA)
- Optical Filters (AREA)
Abstract
Description
本発明は、近赤外線を選択的に吸収することが可能な近赤外線吸収ガラスに関するものである。 The present invention relates to a near infrared ray absorbing glass capable of selectively absorbing near infrared rays.
一般に、デジタルカメラやスマートフォン等の光学デバイス内のカメラ部分には、CCDやCMOS等の固体撮像素子の視感度補正を目的として、近赤外線吸収ガラスが用いられている。例えば、特許文献1には、フッ素を含有するリン酸系の近赤外線吸収ガラスが開示されている。フッ素は耐候性向上効果が高いため、特許文献1に記載の近赤外線吸収ガラスは耐候性に優れている。 In general, near-infrared absorbing glass is used in a camera portion in an optical device such as a digital camera or a smartphone for the purpose of correcting the visibility of a solid-state imaging device such as a CCD or CMOS. For example, Patent Document 1 discloses a phosphoric acid-based near-infrared absorbing glass containing fluorine. Since fluorine has a high effect of improving weather resistance, the near-infrared absorbing glass described in Patent Document 1 is excellent in weather resistance.
フッ素成分は環境負荷物質であるため、近年その使用が制限されつつある。しかしながら、フッ素成分を含有しない場合、耐候性を向上させることが困難であり、耐候性を改善しようとすると、耐失透性や光学特性等が低下する等の不具合が発生しやすくなる。また、近年光学デバイスの薄型化が強く望まれており近赤外線吸収ガラスを薄くする必要があるが、薄い近赤外線吸収ガラスを作製するには、より高い耐失透性が要求される。 Since the fluorine component is an environmentally hazardous substance, its use is being restricted in recent years. However, when it does not contain a fluorine component, it is difficult to improve the weather resistance, and when it is attempted to improve the weather resistance, problems such as a decrease in devitrification resistance and optical characteristics tend to occur. In recent years, thinning of optical devices has been strongly desired, and it is necessary to make the near-infrared absorbing glass thin. However, in order to produce a thin near-infrared absorbing glass, higher devitrification resistance is required.
以上に鑑み、本発明は、光学デバイスを薄型化でき、かつ、フッ素を含有させない場合であっても、耐候性、耐失透性及び光学特性の各特性に優れた近赤外線吸収ガラスを提供することを目的とする。 In view of the above, the present invention provides a near-infrared absorptive glass that is excellent in weather resistance, devitrification resistance, and optical characteristics even when the optical device can be thinned and does not contain fluorine. For the purpose.
本発明の近赤外線吸収ガラスは、質量%で、P2O5 20〜80%、RO(ただしRはMg、Ca、Sr及びBaから選択される少なくとも1種) 1〜50%、MgO 0.1〜30%、Na2O 0〜15%、K2O 0〜14%未満、及びCuO 0.1〜30%を含有し、厚みが0.25mm以下であることを特徴とする。 The near-infrared absorbing glass of the present invention is in mass%, P 2 O 5 20-80%, RO (however, R is at least one selected from Mg, Ca, Sr and Ba) 1-50%, MgO 0. It contains 1 to 30%, Na 2 O 0 to 15%, K 2 O 0 to less than 14%, and CuO 0.1 to 30%, and has a thickness of 0.25 mm or less.
本発明の近赤外線吸収ガラスは、耐失透性を向上させるROを1%以上、耐失透性を低下させるNa2Oを15%以下、K2Oを14%未満に規制することにより、高い耐失透性を達成している。そのため、厚みの小さい赤外線吸収ガラスを効率よく製造できるダウンドロー法、リドロー法等の失透を伴いやすい成形方法にも適用することができる。 The near-infrared absorbing glass of the present invention regulates RO for improving devitrification resistance to 1% or more, Na 2 O for reducing devitrification resistance to 15% or less, and K 2 O to less than 14%, High devitrification resistance is achieved. Therefore, the present invention can also be applied to molding methods that are likely to cause devitrification, such as a downdraw method and a redraw method, which can efficiently manufacture a thin infrared absorbing glass.
本発明の近赤外線吸収ガラスは、さらに、質量%で、Al2O3 0〜19%、ZnO 0〜13%を含有することが好ましい。 The near-infrared absorbing glass of the present invention further preferably contains Al 2 O 3 0 to 19% and ZnO 0 to 13% by mass.
本発明の近赤外線吸収ガラスは、フッ素成分を含有しないことが好ましい。ここで、「フッ素成分を含有しない」とは、意図的に含有させないことを意味し、不可避的不純物の混入を排除するものではない。具体的には、フッ素成分の含有量が1000ppm以下であることを意味する。 The near-infrared absorbing glass of the present invention preferably contains no fluorine component. Here, “does not contain a fluorine component” means that it is not intentionally contained, and does not exclude inevitable contamination. Specifically, it means that the content of the fluorine component is 1000 ppm or less.
本発明によれば、光学デバイスを薄型化でき、かつ、フッ素を含有させない場合であっても、耐候性、耐失透性及び光学特性の各特性に優れた近赤外線吸収ガラスを提供することが可能となる。 ADVANTAGE OF THE INVENTION According to this invention, even if it is a case where an optical device can be made thin and it is a case where it does not contain a fluorine, it is providing the near-infrared absorption glass excellent in each characteristic of a weather resistance, devitrification resistance, and an optical characteristic. It becomes possible.
本発明の近赤外線吸収ガラスは、P2O5 20〜80%、RO(ただしRはMg、Ca、Sr及びBaから選択される少なくとも1種) 1〜50%、MgO 0.1〜30%、Na2O 0〜15%、K2O 0〜14%未満、及びCuO 0.1〜30%を含有する。ガラス組成を上記のように限定した理由を以下に説明する。なお、以下の各成分の含有量に関する説明において、特に断りのない限り、「%」は「質量%」を意味する。 The near-infrared absorbing glass of the present invention is 20 to 80% P 2 O 5 , RO (where R is at least one selected from Mg, Ca, Sr and Ba) 1 to 50%, MgO 0.1 to 30% , Na 2 O 0~15%, K less than 2 O 0 to 14%, and containing 0.1 to 30% CuO. The reason for limiting the glass composition as described above will be described below. In the following description regarding the content of each component, “%” means “mass%” unless otherwise specified.
P2O5はガラス骨格を形成するために欠かせない成分である。P2O5の含有量は20〜80%であり、31〜73%、特に45〜67%であることが好ましい。P2O5の含有量が少なすぎると、ガラス化が不安定になる傾向がある。一方、P2O5の含有量が多すぎると、液相粘度が低くなって耐失透性が低下したり、耐候性が低下しやすくなる。 P 2 O 5 is an essential component for forming a glass skeleton. The content of P 2 O 5 is 20 to 80%, 31 to 73%, and particularly preferably 45 to 67%. If the content of P 2 O 5 is too small, there is a tendency for vitrification tends to be unstable. On the other hand, when the content of P 2 O 5 is too large, lowered resistance to devitrification liquidus viscosity is low, the weather resistance tends to lower.
RO(ただしRはMg、Ca、Sr及びBaから選択される少なくとも1種)は耐失透性、耐候性を向上させる成分である。ROの含有量は合量で1〜50%であり、3〜34%、特に6〜20%であることが好ましい。ROの含有量が少なすぎると、上記効果が得られにくい。一方、ROの含有量が多すぎると、耐失透性が低下し、RO成分起因の結晶が析出しやすくなる。 RO (where R is at least one selected from Mg, Ca, Sr, and Ba) is a component that improves devitrification resistance and weather resistance. The total RO content is 1 to 50%, preferably 3 to 34%, particularly preferably 6 to 20%. If the RO content is too small, the above effects are difficult to obtain. On the other hand, when there is too much content of RO, devitrification resistance will fall and the crystal | crystallization resulting from RO component will precipitate easily.
なお、ROの各成分の含有量の好ましい範囲は以下の通りである。 In addition, the preferable range of content of each component of RO is as follows.
MgOは耐失透性、耐候性を向上させる成分である。MgOの含有量は0.1〜30%、特に0.4〜13%であることが好ましい。MgOの含有量が少なすぎると、上記効果が得られにくい。一方、MgOの含有量が多すぎると、ガラス化の安定性が低下しやすくなる。 MgO is a component that improves devitrification resistance and weather resistance. The content of MgO is preferably 0.1 to 30%, particularly preferably 0.4 to 13%. If the content of MgO is too small, the above effect is difficult to obtain. On the other hand, when there is too much content of MgO, stability of vitrification will fall easily.
CaOはMgOと同様に耐失透性、耐候性を向上させる成分である。CaOの含有量は0〜15%、特に0.4〜7%であることが好ましい。CaOの含有量が多すぎると、ガラス化の安定性が低下しやすくなる。 CaO, like MgO, is a component that improves devitrification resistance and weather resistance. The CaO content is preferably 0 to 15%, particularly preferably 0.4 to 7%. When there is too much content of CaO, stability of vitrification will fall easily.
SrOもMgOと同様に耐失透性、耐候性を向上させる成分である。SrOの含有量は0〜12%、特に0.3〜6%であることが好ましい。SrOの含有量が多すぎると、ガラス化の安定性が低下しやすくなる。 SrO, like MgO, is a component that improves devitrification resistance and weather resistance. The SrO content is preferably 0 to 12%, particularly preferably 0.3 to 6%. When there is too much content of SrO, stability of vitrification will fall easily.
BaOもMgOと同様に耐失透性、耐候性を向上させる成分である。BaOの含有量は0〜30%、1〜25%、特に3〜20%であることが好ましい。BaOの含有量が多すぎると、成形中にBaO起因の結晶が析出しやすくなる。 BaO, like MgO, is a component that improves devitrification resistance and weather resistance. The content of BaO is preferably 0 to 30%, 1 to 25%, particularly 3 to 20%. When there is too much content of BaO, the crystal | crystallization resulting from BaO will precipitate easily during shaping | molding.
以上の通り、ROは耐失透性を向上させる効果があり、特にP2O5が少ない場合に、その効果を享受しやすい。 As described above, RO has an effect of improving devitrification resistance, and when the amount of P 2 O 5 is small, it is easy to enjoy the effect.
Na2Oは溶融温度を低下させる成分である。Na2Oの含有量は0〜15%であり、特に0.1〜10%であることが好ましい。Na2Oの含有量が多すぎると、耐失透性が低下する傾向がある。 Na 2 O is a component that lowers the melting temperature. The content of Na 2 O is 0 to 15%, and particularly preferably 0.1 to 10%. When the content of Na 2 O is too large, the devitrification resistance tends to decrease.
K2OもNa2Oと同様に溶融温度を低下させる成分である。K2Oの含有量は0〜14%未満であり、特に0.1〜12%であることが好ましい。K2Oの含有量が多すぎると、K2O起因の結晶が成形中に析出しやすくなり、耐失透性が低下する傾向がある。 K 2 O is a component that lowers the melting temperature in the same manner as Na 2 O. The content of K 2 O is 0 to less than 14%, particularly preferably 0.1 to 12%. When the content of K 2 O is too large, K 2 O resulting crystal tends to deposit in the molding, the devitrification resistance tends to decrease.
CuOは近赤外線を吸収するための必須成分である。CuOの含有量は0.1〜30%、0.3〜20%、2〜15%、特に3〜13%であることが好ましい。CuOの含有量が少なすぎると、所望の近赤外線吸収特性が得られにくくなる。一方、CuOの含有量が多すぎると、紫外〜可視域の光透過率が低下しやすくなる。また耐失透性が低下する傾向がある。 CuO is an essential component for absorbing near infrared rays. The CuO content is preferably 0.1 to 30%, 0.3 to 20%, 2 to 15%, particularly 3 to 13%. When there is too little content of CuO, it will become difficult to obtain a desired near-infrared absorption characteristic. On the other hand, when there is too much content of CuO, the light transmittance of an ultraviolet-visible range will fall easily. Moreover, there exists a tendency for devitrification resistance to fall.
上記成分以外にも、以下に示す種々の成分を含有させることができる。 In addition to the above components, the following various components can be contained.
Al2O3は耐候性を向上させるとともに、液相粘度を高め、耐失透性を向上させる成分である。Al2O3の含有量は0〜19%、2〜19%、3〜14%、特に3〜9%であることが好ましい。Al2O3の含有量が多すぎると、溶融性が低下して溶融温度が上昇する傾向がある。なお、溶融温度が上昇すると、Cuイオンが還元されてCu2+からCu+にシフトしやすくなるため、所望の光学特性が得られにくくなる。具体的には、近紫外〜可視域における光透過率が低下したり、近赤外線吸収特性が低下しやすくなる。 Al 2 O 3 is a component that improves weather resistance, increases liquid phase viscosity, and improves devitrification resistance. The content of Al 2 O 3 is preferably 0 to 19%, 2 to 19%, 3 to 14%, particularly 3 to 9%. When the content of Al 2 O 3 is too large, there is a tendency that the melting temperature fusible reduced increases. Note that when the melting temperature rises, Cu ions are reduced and easily shift from Cu 2+ to Cu + , making it difficult to obtain desired optical characteristics. Specifically, the light transmittance in the near ultraviolet to visible range is lowered, and the near infrared absorption characteristics are liable to be lowered.
ZnOは耐失透性、耐候性を向上させる成分である。ZnOの含有量は0〜13%、0.1〜12%、特に1〜10%であることが好ましい。ZnOの含有量が多すぎると、溶融性が低下して溶融温度が高くなり、結果として所望の光学特性が得られにくくなる。また、ZnO起因の結晶が成形中に析出しやすくなり、耐失透性が低下する傾向がある。 ZnO is a component that improves devitrification resistance and weather resistance. The content of ZnO is preferably 0 to 13%, 0.1 to 12%, particularly preferably 1 to 10%. When there is too much content of ZnO, a meltability will fall and a melting temperature will become high, and it will become difficult to obtain a desired optical characteristic as a result. In addition, crystals derived from ZnO tend to precipitate during molding, and the devitrification resistance tends to decrease.
Li2Oは溶融温度を低下させる成分である。Li2Oの含有量は0〜15%であり、特に0.1〜10%であることが好ましい。Li2Oの含有量が多すぎると、耐失透性が低下する傾向がある。 Li 2 O is a component that lowers the melting temperature. The content of Li 2 O is 0 to 15%, and particularly preferably 0.1 to 10%. The content of Li 2 O is too large, the devitrification resistance tends to decrease.
また、上記成分以外にも、B2O3、Nb2O5、Y2O3、La2O3、Ta2O5、CeO2、Sb2O3等を本発明の効果を損なわない範囲で含有させても構わない。具体的には、これらの成分の含有量は、各々0〜3%、特に0〜2%であることが好ましい。なお、フッ素成分は環境負荷物質であるため含有しないことが好ましい。 Further, in addition to the above components, B 2 O 3 , Nb 2 O 5 , Y 2 O 3 , La 2 O 3 , Ta 2 O 5 , CeO 2 , Sb 2 O 3 and the like do not impair the effects of the present invention. You may make it contain. Specifically, the content of these components is preferably 0 to 3%, particularly 0 to 2%. In addition, since a fluorine component is an environmental impact substance, it is preferable not to contain.
本発明の近赤外線吸収ガラスは、通常、板状で用いられる。厚みは0.25mm以下であり、0.2mm以下、0.15mm以下、特に0.1mm以下であることが好ましい。厚みが大きすぎると、光学デバイスの薄型化が困難になる。なお、厚みの下限は特に限定されないが、機械的強度の観点から0.01mm以上であることが好ましい。 The near infrared ray absorbing glass of the present invention is usually used in a plate shape. The thickness is 0.25 mm or less, preferably 0.2 mm or less, 0.15 mm or less, particularly preferably 0.1 mm or less. If the thickness is too large, it is difficult to reduce the thickness of the optical device. In addition, although the minimum of thickness is not specifically limited, From a viewpoint of mechanical strength, it is preferable that it is 0.01 mm or more.
本発明の近赤外線吸収ガラスは上記組成を有することにより、可視域における高い光透過率及び近赤外域における優れた光吸収特性の両者を達成することが可能となる。具体的には、波長500nmにおける光透過率は75%以上、特に77%以上であることが好ましい。一方、波長700nmにおける光透過率は30%以下、特に28%以下であることが好ましく、波長1200nmにおける光透過率は40%以下、特に38%以下であることが好ましい。 By having the above composition, the near-infrared absorbing glass of the present invention can achieve both high light transmittance in the visible range and excellent light absorption characteristics in the near-infrared range. Specifically, the light transmittance at a wavelength of 500 nm is preferably 75% or more, particularly 77% or more. On the other hand, the light transmittance at a wavelength of 700 nm is preferably 30% or less, particularly preferably 28% or less, and the light transmittance at a wavelength of 1200 nm is preferably 40% or less, particularly preferably 38% or less.
本発明の近赤外線吸収ガラスの液相粘度は101.6dPa・s以上、特に101.9dPa・s以上であることが好ましい。液相粘度が低すぎると、成形時に失透しやすくなる。 The near-infrared absorbing glass of the present invention preferably has a liquidus viscosity of 10 1.6 dPa · s or more, particularly 10 1.9 dPa · s or more. If the liquid phase viscosity is too low, it tends to devitrify during molding.
本発明の近赤外線吸収ガラスは、所望の組成となるように調製した原料粉末バッチを溶融、成形することにより製造することができる。溶融温度は900〜1200℃であることが好ましい。溶融温度が低すぎると、均質なガラスが得られにくくなる。一方、溶融温度が高すぎると、Cuイオンが還元されてCu2+からCu+にシフトしやすくなるため、所望の光学特性が得られにくくなる。 The near-infrared absorbing glass of the present invention can be produced by melting and molding a raw material powder batch prepared to have a desired composition. The melting temperature is preferably 900 to 1200 ° C. If the melting temperature is too low, it is difficult to obtain a homogeneous glass. On the other hand, if the melting temperature is too high, Cu ions are reduced and it is easy to shift from Cu 2+ to Cu + , so that it becomes difficult to obtain desired optical characteristics.
その後、溶融ガラスを所定の形状に成形し、必要な後加工を施して、各種の用途に供することができる。なお、厚みの小さい近赤外線吸収ガラスを効率良く製造するためには、ダウンドロー法、リドロー法等の成形方法を適用することが好ましい。これらの成形方法は失透を伴いやすいため、耐失透性に優れる本発明の近赤外線吸収ガラスの効果を享受しやすい。 Thereafter, the molten glass can be formed into a predetermined shape, subjected to necessary post-processing, and used for various purposes. In order to efficiently produce a near-infrared absorbing glass having a small thickness, it is preferable to apply a molding method such as a downdraw method or a redraw method. Since these forming methods are easily accompanied by devitrification, it is easy to enjoy the effect of the near-infrared absorbing glass of the present invention, which is excellent in devitrification resistance.
以下、本発明の近赤外線吸収ガラスを実施例に基づいて詳細に説明するが、本発明はこれらの実施例に限定されるものではない。 Hereinafter, although the near-infrared absorption glass of this invention is demonstrated in detail based on an Example, this invention is not limited to these Examples.
表1は本発明の実施例(試料No.1〜8)及び比較例(試料No.9、10)を示す。 Table 1 shows Examples (Sample Nos. 1 to 8) and Comparative Examples (Sample Nos. 9 and 10) of the present invention.
(1)各試料の作製
まず、表1の組成となるように調合したガラス原料を白金ルツボに投入し、1000〜1200℃の温度で溶融した。次に、溶融ガラスをカーボン板上に流し出し、冷却固化した。その後、アニールを行って試料を得た。
(1) Preparation of each sample First, the glass raw material prepared so that it might become the composition of Table 1 was thrown into the platinum crucible, and it fuse | melted at the temperature of 1000-1200 degreeC. Next, the molten glass was poured onto a carbon plate and cooled and solidified. Thereafter, annealing was performed to obtain a sample.
(2)各試料の評価
得られた各試料について、光透過特性、耐候性及び液相粘度を以下の方法によって測定または評価した。結果を表1に示す。
(2) Evaluation of each sample About each obtained sample, the light transmission characteristic, the weather resistance, and the liquid phase viscosity were measured or evaluated with the following method. The results are shown in Table 1.
光透過特性は、両面を鏡面研磨した表1に記載の厚みの試料について、分光分析装置(島津製作所製 UV3100)を用いて、波長500nm、700nm、1200nmにおけるそれぞれの透過率を測定した。なお、波長500nm、700nm、1200nmにおける透過率が、それぞれ77%以上、28%以下、38%以下であれば、光透過特性が良好であると判断できる。 For the light transmission characteristics, the transmittances at wavelengths of 500 nm, 700 nm, and 1200 nm were measured using a spectroscopic analyzer (UV3100, manufactured by Shimadzu Corporation) for the samples having the thicknesses shown in Table 1 whose surfaces were mirror-polished. It should be noted that if the transmittances at wavelengths of 500 nm, 700 nm, and 1200 nm are 77% or more, 28% or less, and 38% or less, respectively, it can be determined that the light transmission characteristics are good.
耐候性は、両面を鏡面研磨した試料について、温度120℃、相対湿度100%の条件下に24時間保持した後、外観上の変化の有無により判定した。具体的には、試験後に外観上の変化が見られなかったものを「○」、白ヤケ等の外観上の変化が見られたものを「×」として評価した。 The weather resistance was determined by the presence or absence of a change in appearance of a sample whose both surfaces were mirror-polished after being held for 24 hours under conditions of a temperature of 120 ° C. and a relative humidity of 100%. Specifically, “◯” indicates that no change in appearance was observed after the test, and “×” indicates change in appearance such as white discoloration.
液相粘度は次のようにして求めた。粒度300〜600μmとなるように粗砕した試料を白金容器に入れ、温度傾斜炉中で24時間保持した。白金容器の底面において界面結晶が析出している最高温度を液相温度とした。そして試料の粘度を測定し、液相温度における粘度を液相粘度とした。 The liquid phase viscosity was determined as follows. A sample crushed so as to have a particle size of 300 to 600 μm was placed in a platinum container and held in a temperature gradient furnace for 24 hours. The maximum temperature at which the interface crystals were precipitated on the bottom surface of the platinum container was defined as the liquidus temperature. The viscosity of the sample was measured, and the viscosity at the liquidus temperature was defined as the liquidus viscosity.
表1から明らかなように、本発明の実施例であるNo.1〜8の試料は可視域での光透過率が高く、近赤外域での吸収が大きかった。また、耐候性評価において試験前後で変化が見られず、液相粘度も101.6dPa・s以上であり耐失透性にも優れていた。なお、厚みが0.23mm以下であるため、光学デバイスを薄型化しやすい。 As is apparent from Table 1, No. 1 as an example of the present invention. Samples 1 to 8 had a high light transmittance in the visible range and a large absorption in the near infrared range. Further, no change was observed before and after the test in the weather resistance evaluation, and the liquid phase viscosity was 10 1.6 dPa · s or more, and the devitrification resistance was excellent. Since the thickness is 0.23 mm or less, the optical device can be easily thinned.
一方、比較例であるNo.9の試料は、耐候性に劣っており、液相粘度が101.2dPa・sであるため耐失透性に劣っていた。No.10の試料は液相粘度が101.3dPa・sであるため耐失透性に劣っていた。 On the other hand, No. which is a comparative example. The sample of 9 was inferior in weather resistance, and was inferior in devitrification resistance because the liquid phase viscosity was 10 1.2 dPa · s. No. The sample No. 10 was inferior in devitrification resistance because the liquid phase viscosity was 10 1.3 dPa · s.
Claims (3)
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JP2017161910A JP7071608B2 (en) | 2017-08-25 | 2017-08-25 | Near infrared absorber glass |
TW107117336A TWI704117B (en) | 2017-08-25 | 2018-05-22 | Near infrared absorption glass |
CN201880031895.1A CN110621627A (en) | 2017-08-25 | 2018-07-30 | Near infrared ray absorption glass |
KR1020197031984A KR20200043310A (en) | 2017-08-25 | 2018-07-30 | Near infrared absorbing glass |
PCT/JP2018/028477 WO2019039202A1 (en) | 2017-08-25 | 2018-07-30 | Near-infrared radiation absorption glass |
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WO2021132645A1 (en) * | 2019-12-27 | 2021-07-01 | Hoya株式会社 | Near-infrared absorbing glass and near-infrared cut filter |
KR20240021874A (en) | 2021-06-11 | 2024-02-19 | 호야 가부시키가이샤 | Near-infrared absorbing glass and near-infrared cut filter |
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CN114538772B (en) * | 2022-03-24 | 2022-12-02 | 成都光明光电股份有限公司 | Glass, glass element and optical filter |
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TWI704117B (en) | 2020-09-11 |
JP7071608B2 (en) | 2022-05-19 |
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TW201912600A (en) | 2019-04-01 |
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