JP2018534723A - スロット付きグランドプレートを有するプラズマモジュール - Google Patents
スロット付きグランドプレートを有するプラズマモジュール Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
- C23C16/45536—Use of plasma, radiation or electromagnetic fields
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
- C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
- C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
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- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
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- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
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- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
- H01J37/32651—Shields, e.g. dark space shields, Faraday shields
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- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
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Abstract
【選択図】図6
Description
[0096]様々な幅のスロットを有するブロッカプレートを用いるプラズマアセンブリが、イオン流量の均一性に関して分析された。図15及び図16は、スロットの幅の関数としてのプラズマのイオン流量のグラフを示す。200W、13.5MHzでのアルゴンプラズマが、これらの研究において使用された。19mm、10mm、6mm、4mm、3.5mm、3mm、2.5mm、及び2mmのスロット幅を有するブロッカプレートが分析された。幅広いスロットについては、プラズマ密度のピークがスロットの端部の近くにあることが発見された。図15で示すように、より広いスロット幅では、イオン流量の2つのピークが観察された。図15の2mmスロットで見られるように、スロットの幅が縮小するにつれて、スロット開口の近くのプラズマピークが合体するので、プラズマ密度が増大する。図16に示すさらなる研究では、スロットが約3mmの幅を有すると、イオン流量が、2つのピークから単一のピークに移行したことを示した。
Claims (15)
- プラズマ源アセンブリであって、
ハウジング、
前記ハウジングと電気的に連通しているブロッカプレートであって、前記ブロッカプレートが、フィールドを画定する内周端部と、外周端部と、第1の側面と、第2の側面と、を有し、細長いスロットが、前記フィールドの内部にあり、前記ブロッカプレートを貫通して延び、前記細長いスロットが、長さと幅を有する、ブロッカプレート、及び
前記ハウジングの内部のRFホット電極であって、前記RFホット電極が、前面と背面、内周端部と外周端部を有し、前記RFホット電極の前記前面が、間隙を画定するために、前記ブロッカプレートから離間されている、RFホット電極
を備えているプラズマ源アセンブリ。 - 前記細長いスロットの前記長さが、前記ブロッカプレートの前記第1の側面及び/又は前記第2の側面のうちの少なくとも1つに対して実質的に平行である、請求項1に記載のプラズマ源アセンブリ。
- 前記細長いスロットが、約2mmから約20mmの範囲内の幅を有する、請求項1に記載のプラズマ源アセンブリ。
- 前記細長いスロットの前記長さが、前記内周端部と前記外周端部との間の距離の約50%から約95%の範囲内である、請求項1に記載のプラズマ源アセンブリ。
- 前記ブロッカプレートが、前記外周端部よりも前記内周端部においてより狭い幅を有するくさび形状である、請求項1に記載のプラズマ源アセンブリ。
- 前記細長いスロットが、前記ブロッカプレートの前記第1の側面又は前記第2の側面のうちの1つに対して平行である、請求項5に記載のプラズマ源アセンブリ。
- 前記細長いスロットが、前記フィールドの中心軸に沿って中央に置かれる、請求項5に記載のプラズマ源アセンブリ。
- 前記細長いスロットが、前記フィールドの前記外周端部の近くよりも前記フィールドの前記内周端部の近くでより狭い幅を有するくさび形状である、請求項7に記載のプラズマ源アセンブリ。
- 前記フィールド内に第1の細長いスロット、且つ前記フィールド内に第2の細長いスロットがある、請求項5に記載のプラズマ源アセンブリ。
- 前記第1の細長いスロットが、前記ブロッカプレートの前記第1の側面又は前記第2の側面のうちの一方に対して実質的に平行であり、前記第2の細長いスロットが、前記第1の側面又は前記第2の側面のうちの他方に対して実質的に平行である、請求項9に記載のプラズマ源アセンブリ。
- 前記第1の細長いスロットが、前記第2の細長いスロットとは異なる長さを有し、前記第1の細長いスロットが、前記ブロッカプレートの前記第1の側面に対して実質的に平行であり、前記第2の細長いスロットが、前記第1の細長いスロットより短い長さを有し、且つ前記ブロッカプレートの前記第2の側面に対して実質的に平行である、請求項9に記載のプラズマ源アセンブリ。
- 前記フィールド内に第1の細長いスロット、前記フィールド内に第2の細長いスロット、且つ前記フィールド内に第3の細長いスロットがある、請求項5に記載のプラズマ源アセンブリ。
- 前記第1の細長いスロット、前記第2の細長いスロット、及び前記第3の細長いスロットが、それぞれ、異なる長さを有し、前記第1の細長いスロットが、前記ブロッカプレートの前記第1の側面に対して実質的に平行であり且つ隣接し、前記第2の細長いスロットが、前記ブロッカプレートの前記第2の側面に対して実質的に平行であり且つ隣接し、前記第1の細長いスロットの長さの約50%から約80%の範囲内の長さを有し、前記第3の細長いスロットが、前記第1の細長いスロットと前記第2の細長いスロットとの間にあり、前記第2の細長いスロットの前記長さの約50%から約80%の範囲内の長さを有する、請求項12に記載のプラズマ源アセンブリ。
- 基板の隣に位置付けされたときに前記ブロッカプレートの前記内周端部が前記ブロッカプレートの前記外周端部より基板から離れるように、前記内周端部が、前記外周端部より高い、請求項5に記載のプラズマ源アセンブリ。
- 前記細長いスロットが、誘電材料でライニングされている、請求項5に記載のプラズマ源アセンブリ。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201562217705P | 2015-09-11 | 2015-09-11 | |
US62/217,705 | 2015-09-11 | ||
PCT/US2016/050956 WO2017044754A1 (en) | 2015-09-11 | 2016-09-09 | Plasma module with slotted ground plate |
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JP2018534723A true JP2018534723A (ja) | 2018-11-22 |
JP6892439B2 JP6892439B2 (ja) | 2021-06-23 |
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JP2018512362A Active JP6892439B2 (ja) | 2015-09-11 | 2016-09-09 | スロット付きグランドプレートを有するプラズマモジュール |
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US (1) | US20170076917A1 (ja) |
JP (1) | JP6892439B2 (ja) |
KR (1) | KR102589972B1 (ja) |
CN (1) | CN108028164B (ja) |
TW (1) | TWI719049B (ja) |
WO (1) | WO2017044754A1 (ja) |
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JP2020031177A (ja) * | 2018-08-24 | 2020-02-27 | 株式会社Screenホールディングス | 基板処理装置 |
JP2021507453A (ja) * | 2017-12-15 | 2021-02-22 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 垂直プラズマ源からの改良されたプラズマ暴露のために成形された電極 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10273578B2 (en) * | 2014-10-03 | 2019-04-30 | Applied Materials, Inc. | Top lamp module for carousel deposition chamber |
KR102662705B1 (ko) * | 2016-01-24 | 2024-04-30 | 어플라이드 머티어리얼스, 인코포레이티드 | 파이 형상 처리를 발생시키기 위한 대칭적인 플라즈마 소스 |
TWI733021B (zh) | 2017-05-15 | 2021-07-11 | 美商應用材料股份有限公司 | 電漿源組件、處理腔室與處理基板的方法 |
TWI794240B (zh) * | 2017-06-22 | 2023-03-01 | 美商應用材料股份有限公司 | 用於電漿處理的處理工具及電漿反應器 |
US11355321B2 (en) | 2017-06-22 | 2022-06-07 | Applied Materials, Inc. | Plasma reactor with electrode assembly for moving substrate |
US11705312B2 (en) | 2020-12-26 | 2023-07-18 | Applied Materials, Inc. | Vertically adjustable plasma source |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000026975A (ja) * | 1998-07-09 | 2000-01-25 | Komatsu Ltd | 表面処理装置 |
JP2004006211A (ja) * | 2001-09-27 | 2004-01-08 | Sekisui Chem Co Ltd | プラズマ処理装置 |
JP2004507861A (ja) * | 1999-12-13 | 2004-03-11 | セメクイップ, インコーポレイテッド | イオン注入イオン源、システム、および方法 |
US20120225193A1 (en) * | 2011-03-01 | 2012-09-06 | Applied Materials, Inc. | Apparatus And Process For Atomic Layer Deposition |
JP2015032486A (ja) * | 2013-08-02 | 2015-02-16 | 三菱電機株式会社 | プラズマ処理装置、プラズマ処理方法、接着方法および複合構造体 |
WO2015023945A1 (en) * | 2013-08-16 | 2015-02-19 | Applied Materials, Inc. | Elongated capacitively coupled plasma source for high temperature low pressure environments |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5015331A (en) * | 1988-08-30 | 1991-05-14 | Matrix Integrated Systems | Method of plasma etching with parallel plate reactor having a grid |
JP3343629B2 (ja) * | 1993-11-30 | 2002-11-11 | アネルバ株式会社 | プラズマ処理装置 |
WO2002043803A1 (en) * | 2000-11-30 | 2002-06-06 | Semequip, Inc. | Ion implantation system and control method |
CN1302152C (zh) * | 2001-03-19 | 2007-02-28 | 株式会社Ips | 化学气相沉积设备 |
US6753507B2 (en) * | 2001-04-27 | 2004-06-22 | Kyocera Corporation | Wafer heating apparatus |
US6537928B1 (en) * | 2002-02-19 | 2003-03-25 | Asm Japan K.K. | Apparatus and method for forming low dielectric constant film |
JP2005142486A (ja) * | 2003-11-10 | 2005-06-02 | Pearl Kogyo Co Ltd | 整合器 |
CN101228288B (zh) * | 2005-07-26 | 2011-12-28 | Psm有限公司 | 注射型等离子体处理设备和方法 |
WO2008016836A2 (en) * | 2006-07-29 | 2008-02-07 | Lotus Applied Technology, Llc | Radical-enhanced atomic layer deposition system and method |
US20080193673A1 (en) * | 2006-12-05 | 2008-08-14 | Applied Materials, Inc. | Method of processing a workpiece using a mid-chamber gas distribution plate, tuned plasma flow control grid and electrode |
KR101087445B1 (ko) * | 2007-03-27 | 2011-11-25 | 세키스이가가쿠 고교가부시키가이샤 | 플라즈마 처리 장치 |
KR100905278B1 (ko) * | 2007-07-19 | 2009-06-29 | 주식회사 아이피에스 | 박막증착장치, 박막증착방법 및 반도체 소자의 갭-필 방법 |
DE102007037406A1 (de) * | 2007-08-08 | 2009-06-04 | Neoplas Gmbh | Verfahren und Vorrichtung zur plasmagestützten Oberflächenbehandlung |
JP5150217B2 (ja) * | 2007-11-08 | 2013-02-20 | 東京エレクトロン株式会社 | シャワープレート及び基板処理装置 |
JP5141607B2 (ja) * | 2009-03-13 | 2013-02-13 | 東京エレクトロン株式会社 | 成膜装置 |
US8272346B2 (en) * | 2009-04-10 | 2012-09-25 | Lam Research Corporation | Gasket with positioning feature for clamped monolithic showerhead electrode |
US20110097494A1 (en) * | 2009-10-27 | 2011-04-28 | Kerr Roger S | Fluid conveyance system including flexible retaining mechanism |
KR20110054840A (ko) * | 2009-11-18 | 2011-05-25 | 주식회사 아토 | 샤워헤드 어셈블리 및 이를 구비한 박막증착장치 |
JP5511536B2 (ja) * | 2010-06-17 | 2014-06-04 | 株式会社日立国際電気 | 基板処理装置及び半導体装置の製造方法 |
US8485128B2 (en) * | 2010-06-30 | 2013-07-16 | Lam Research Corporation | Movable ground ring for a plasma processing chamber |
US9064815B2 (en) * | 2011-03-14 | 2015-06-23 | Applied Materials, Inc. | Methods for etch of metal and metal-oxide films |
US9082839B2 (en) * | 2011-03-14 | 2015-07-14 | Plasma-Therm Llc | Method and apparatus for plasma dicing a semi-conductor wafer |
US20140023794A1 (en) * | 2012-07-23 | 2014-01-23 | Maitreyee Mahajani | Method And Apparatus For Low Temperature ALD Deposition |
US9373517B2 (en) * | 2012-08-02 | 2016-06-21 | Applied Materials, Inc. | Semiconductor processing with DC assisted RF power for improved control |
CN105765697B (zh) * | 2013-11-26 | 2020-03-17 | 应用材料公司 | 用于批处理的倾斜板及其使用方法 |
JP2017503079A (ja) * | 2014-01-05 | 2017-01-26 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 空間的原子層堆積又はパルス化学気相堆積を使用する膜堆積 |
JP5938491B1 (ja) * | 2015-03-20 | 2016-06-22 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法、プログラムおよび記録媒体 |
-
2016
- 2016-09-09 JP JP2018512362A patent/JP6892439B2/ja active Active
- 2016-09-09 CN CN201680052156.1A patent/CN108028164B/zh active Active
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- 2016-09-09 KR KR1020187010290A patent/KR102589972B1/ko active IP Right Grant
- 2016-09-10 TW TW105129470A patent/TWI719049B/zh active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000026975A (ja) * | 1998-07-09 | 2000-01-25 | Komatsu Ltd | 表面処理装置 |
JP2004507861A (ja) * | 1999-12-13 | 2004-03-11 | セメクイップ, インコーポレイテッド | イオン注入イオン源、システム、および方法 |
JP2004006211A (ja) * | 2001-09-27 | 2004-01-08 | Sekisui Chem Co Ltd | プラズマ処理装置 |
US20120225193A1 (en) * | 2011-03-01 | 2012-09-06 | Applied Materials, Inc. | Apparatus And Process For Atomic Layer Deposition |
JP2015032486A (ja) * | 2013-08-02 | 2015-02-16 | 三菱電機株式会社 | プラズマ処理装置、プラズマ処理方法、接着方法および複合構造体 |
WO2015023945A1 (en) * | 2013-08-16 | 2015-02-19 | Applied Materials, Inc. | Elongated capacitively coupled plasma source for high temperature low pressure environments |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021507453A (ja) * | 2017-12-15 | 2021-02-22 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 垂直プラズマ源からの改良されたプラズマ暴露のために成形された電極 |
JP7069319B2 (ja) | 2017-12-15 | 2022-05-17 | アプライド マテリアルズ インコーポレイテッド | 垂直プラズマ源からの改良されたプラズマ暴露のために成形された電極 |
JP2020031177A (ja) * | 2018-08-24 | 2020-02-27 | 株式会社Screenホールディングス | 基板処理装置 |
JP7105649B2 (ja) | 2018-08-24 | 2022-07-25 | 株式会社Screenホールディングス | 基板処理装置 |
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KR102589972B1 (ko) | 2023-10-13 |
CN108028164A (zh) | 2018-05-11 |
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JP6892439B2 (ja) | 2021-06-23 |
US20170076917A1 (en) | 2017-03-16 |
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