JP2018530169A - デジタル撮像システムにおける放射線検出のための装置 - Google Patents
デジタル撮像システムにおける放射線検出のための装置 Download PDFInfo
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Abstract
Description
本出願は、2015年7月14日に出願された米国特許出願62/192,110号の利益を主張し、その内容が参照により組み込まれる。
[開示の分野]
本開示は、一般的に、デジタル撮像システムに関し、より詳細には、デジタル撮像システムにおける放射線検出のための装置に関する。
Claims (20)
- デジタル撮像システム用の検出器素子であって、
光子を吸収するための半導体層と、
前記半導体層の第1の側に位置する第1の電極と、
前記半導体層の第2の側に位置する第2の電極であって、前記第1の側と前記第2の側は前記半導体層の両側である、第2の電極と、を備え、
前記第1の電極と前記第2の電極は、前記半導体層に垂直な面内で互い違いに配置されている検出器素子。 - 前記第1の電極と前記第2の電極は互いに重なり合わない、請求項1に記載の検出器素子。
- 前記第1の電極と前記半導体層との間のブロッキング層をさらに含む、請求項1に記載の検出器素子。
- 前記第2の電極と前記半導体層との間のブロッキング層をさらに含む、請求項3に記載の検出器素子。
- 前記ブロッキング層は、絶縁層、オーミック層、または、ショットキー層のうちの少なくとも1つを備える、請求項3に記載の検出器素子。
- 前記絶縁層は、アモルファス窒化シリコン、アモルファスシリコン酸化物、アモルファスシリコン酸窒化物、ポリイミド、ベンゾシクロブテン(BCB)、ポリ(N−ビニルカルバゾール)(PVK)、パリレン、アクリル、および、ポリスチレンのうちの少なくとも1つである、請求項5に記載の検出器素子。
- 前記第1の電極または前記第2の電極の少なくとも一方の側に位置する反射防止層をさらに含む、請求項1に記載の検出器素子。
- 前記反射防止層は、アモルファス窒化シリコン、アモルファスシリコン酸化物、アモルファスシリコン酸窒化物、または、有機材料のうちの少なくとも1つである、請求項7に記載の検出器素子。
- 前記ブロッキング層は反射防止層としても機能する、請求項3に記載の検出器素子。
- 前記電極は、不透明または透明導電性材料の少なくとも1つである、請求項1に記載の検出器素子。
- 前記検出器素子は読み出し回路素子に結合されている、請求項1に記載の検出器素子。
- 前記読み出し回路素子は、トランジスタスイッチ回路、アクティブピクセルセンサ回路、または、フォトンカウンティングピクセル回路の少なくとも1つを備える、請求項11に記載の検出器素子。
- 前記検出器素子は表示画素と一体化されている、請求項11に記載の検出器素子。
- 基板上に第1の電極を堆積し、
前記第1の電極の上に半導体層を堆積し、
前記半導体層上に第2の電極を堆積することを備え、
前記第1の電極と前記第2の電極は、前記半導体層の両側にあり、
前記第1の電極と前記第2の電極は、前記半導体層に垂直な面内で互い違いに配置されている検出器素子の製造方法。 - 前記第1の電極と前記第2の電極は互いに重なり合わない、請求項14に記載の方法。
- 前記半導体層を堆積する前に、前記第1の電極上にブロッキング層を堆積することをさらに備える、請求項14に記載の方法。
- 前記第2の電極を堆積する前に、前記半導体層上にブロッキング層を堆積することをさらに備える、請求項16に記載の方法。
- 前記ブロッキング層は、絶縁層、オーミック層、または、ショットキー層のうちの少なくとも1つである、請求項15に記載の方法。
- 前記第1の電極または前記第2の電極のいずれかの上に反射防止層を堆積することをさらに備える、請求項17に記載の方法。
- 前記反射防止層は、アモルファス窒化シリコン、アモルファスシリコン酸化物、アモルファスシリコン酸窒化物、または、有機材料のうちの少なくとも1つである、請求項19に記載の方法。
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