JP2018529952A5 - - Google Patents

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JP2018529952A5
JP2018529952A5 JP2018512605A JP2018512605A JP2018529952A5 JP 2018529952 A5 JP2018529952 A5 JP 2018529952A5 JP 2018512605 A JP2018512605 A JP 2018512605A JP 2018512605 A JP2018512605 A JP 2018512605A JP 2018529952 A5 JP2018529952 A5 JP 2018529952A5
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JP
Japan
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measurement
order diffraction
target
illumination
metrology
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JP2018512605A
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Japanese (ja)
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JP6827466B2 (ja
JP2018529952A (ja
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Priority claimed from PCT/US2016/047619 external-priority patent/WO2017044283A1/en
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JP2018512605A 2015-09-09 2016-08-18 補助電磁場の導入に基づく１次スキャトロメトリオーバーレイでの新たなアプローチ Active JP6827466B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562215895P 2015-09-09 2015-09-09
US62/215,895 2015-09-09
PCT/US2016/047619 WO2017044283A1 (en) 2015-09-09 2016-08-18 New approaches in first order scatterometry overlay based on introduction of auxiliary elecromagnetic fields

Publications (3)

Publication Number Publication Date
JP2018529952A JP2018529952A (ja) 2018-10-11
JP2018529952A5 true JP2018529952A5 (cg-RX-API-DMAC7.html) 2019-09-26
JP6827466B2 JP6827466B2 (ja) 2021-02-10

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JP2018512605A Active JP6827466B2 (ja) 2015-09-09 2016-08-18 補助電磁場の導入に基づく１次スキャトロメトリオーバーレイでの新たなアプローチ

Country Status (7)

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US (1) US10197389B2 (cg-RX-API-DMAC7.html)
EP (1) EP3347701B1 (cg-RX-API-DMAC7.html)
JP (1) JP6827466B2 (cg-RX-API-DMAC7.html)
KR (1) KR102407073B1 (cg-RX-API-DMAC7.html)
CN (1) CN108027320B (cg-RX-API-DMAC7.html)
TW (1) TWI656409B (cg-RX-API-DMAC7.html)
WO (1) WO2017044283A1 (cg-RX-API-DMAC7.html)

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US10767978B2 (en) * 2017-04-14 2020-09-08 Kla-Tencor Corporation Transmission small-angle X-ray scattering metrology system
US10705435B2 (en) 2018-01-12 2020-07-07 Globalfoundries Inc. Self-referencing and self-calibrating interference pattern overlay measurement
CN112005169B (zh) * 2018-04-06 2023-03-28 Asml荷兰有限公司 具有非线性光学器件的检查设备
US10622238B2 (en) * 2018-06-07 2020-04-14 Kla-Tencor Corporation Overlay measurement using phase and amplitude modeling
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CN112567296B (zh) * 2018-08-28 2024-03-08 科磊股份有限公司 使用二衍射级成像的离轴照明覆盖测量
JP7431824B2 (ja) * 2018-11-21 2024-02-15 ケーエルエー コーポレイション スキャトロメトリオーバーレイ（ｓｃｏｌ）測定方法及びｓｃｏｌ測定システム
CN113039407B (zh) * 2018-11-21 2024-11-15 科磊股份有限公司 单个单元灰度散射术重叠目标及其使用变化照明参数的测量
EP3879343A1 (en) * 2020-03-11 2021-09-15 ASML Netherlands B.V. Metrology measurement method and apparatus
US11604149B2 (en) 2020-04-23 2023-03-14 Kla Corporation Metrology methods and optical schemes for measurement of misregistration by using hatched target designs
US11346657B2 (en) * 2020-05-22 2022-05-31 Kla Corporation Measurement modes for overlay
US11686576B2 (en) 2020-06-04 2023-06-27 Kla Corporation Metrology target for one-dimensional measurement of periodic misregistration
CN115698865A (zh) * 2020-06-09 2023-02-03 Asml荷兰有限公司 用于测量光刻过程的参数的目标
US11164307B1 (en) 2020-07-21 2021-11-02 Kla Corporation Misregistration metrology by using fringe Moiré and optical Moiré effects
US11300405B2 (en) * 2020-08-03 2022-04-12 Kla Corporation Grey-mode scanning scatterometry overlay metrology
EP4020084A1 (en) * 2020-12-22 2022-06-29 ASML Netherlands B.V. Metrology method
US11841621B2 (en) 2021-10-29 2023-12-12 KLA Corporation CA Moiré scatterometry overlay
US11796925B2 (en) 2022-01-03 2023-10-24 Kla Corporation Scanning overlay metrology using overlay targets having multiple spatial frequencies
US12105431B2 (en) 2022-01-25 2024-10-01 Kla Corporation Annular apodizer for small target overlay measurement
US11861824B1 (en) * 2022-02-03 2024-01-02 Kla Corporation Reference image grouping in overlay metrology
US12032300B2 (en) * 2022-02-14 2024-07-09 Kla Corporation Imaging overlay with mutually coherent oblique illumination
US12422363B2 (en) 2022-03-30 2025-09-23 Kla Corporation Scanning scatterometry overlay metrology
US12487190B2 (en) 2022-03-30 2025-12-02 Kla Corporation System and method for isolation of specific fourier pupil frequency in overlay metrology
US12235588B2 (en) 2023-02-16 2025-02-25 Kla Corporation Scanning overlay metrology with high signal to noise ratio
US12504697B2 (en) 2023-06-02 2025-12-23 Kla Corporation Single grab pupil landscape via broadband illumination
US12373936B2 (en) 2023-12-08 2025-07-29 Kla Corporation System and method for overlay metrology using a phase mask

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JPH0536586A (ja) 1991-08-02 1993-02-12 Canon Inc 像投影方法及び該方法を用いた半導体デバイスの製造方法
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