JP2018517794A5 - - Google Patents
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- Publication number
- JP2018517794A5 JP2018517794A5 JP2017552482A JP2017552482A JP2018517794A5 JP 2018517794 A5 JP2018517794 A5 JP 2018517794A5 JP 2017552482 A JP2017552482 A JP 2017552482A JP 2017552482 A JP2017552482 A JP 2017552482A JP 2018517794 A5 JP2018517794 A5 JP 2018517794A5
- Authority
- JP
- Japan
- Prior art keywords
- ppm
- reaction product
- bath
- amount
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007795 chemical reaction product Substances 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 10
- 239000000178 monomer Substances 0.000 claims description 6
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 5
- 150000001412 amines Chemical class 0.000 claims description 3
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 2
- 238000009713 electroplating Methods 0.000 description 13
- 238000007747 plating Methods 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- 239000010949 copper Substances 0.000 description 10
- 230000002378 acidificating effect Effects 0.000 description 8
- 238000009472 formulation Methods 0.000 description 8
- 238000000746 purification Methods 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000006259 organic additive Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- PSBDWGZCVUAZQS-UHFFFAOYSA-N (dimethylsulfonio)acetate Chemical compound C[S+](C)CC([O-])=O PSBDWGZCVUAZQS-UHFFFAOYSA-N 0.000 description 1
- JEXYCADTAFPULN-UHFFFAOYSA-N 1-propylsulfonylpropane Chemical compound CCCS(=O)(=O)CCC JEXYCADTAFPULN-UHFFFAOYSA-N 0.000 description 1
- MHGUSQPDQPUNQD-UHFFFAOYSA-N 2-(2,2-disulfoethyldisulfanyl)ethane-1,1-disulfonic acid Chemical compound OS(=O)(=O)C(S(O)(=O)=O)CSSCC(S(O)(=O)=O)S(O)(=O)=O MHGUSQPDQPUNQD-UHFFFAOYSA-N 0.000 description 1
- YXEXMVJHQLWNGG-UHFFFAOYSA-N 3-(3,3-disulfopropyldisulfanyl)propane-1,1-disulfonic acid Chemical compound OS(=O)(=O)C(S(O)(=O)=O)CCSSCCC(S(O)(=O)=O)S(O)(=O)=O YXEXMVJHQLWNGG-UHFFFAOYSA-N 0.000 description 1
- FULCXPQDMXUVSB-UHFFFAOYSA-N 3-(3-sulfanylpropylsulfonyloxy)propane-1-sulfonic acid Chemical compound OS(=O)(=O)CCCOS(=O)(=O)CCCS FULCXPQDMXUVSB-UHFFFAOYSA-N 0.000 description 1
- WRBSVISDQAINGQ-UHFFFAOYSA-N 3-(dimethylcarbamothioylsulfanyl)propane-1-sulfonic acid Chemical compound CN(C)C(=S)SCCCS(O)(=O)=O WRBSVISDQAINGQ-UHFFFAOYSA-N 0.000 description 1
- REEBJQTUIJTGAL-UHFFFAOYSA-N 3-pyridin-1-ium-1-ylpropane-1-sulfonate Chemical compound [O-]S(=O)(=O)CCC[N+]1=CC=CC=C1 REEBJQTUIJTGAL-UHFFFAOYSA-N 0.000 description 1
- PVOAHINGSUIXLS-UHFFFAOYSA-N CN1CCNCC1 Chemical compound CN1CCNCC1 PVOAHINGSUIXLS-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- WIYCQLLGDNXIBA-UHFFFAOYSA-L disodium;3-(3-sulfonatopropyldisulfanyl)propane-1-sulfonate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)CCCSSCCCS([O-])(=O)=O WIYCQLLGDNXIBA-UHFFFAOYSA-L 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002897 organic nitrogen compounds Chemical class 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- ZQUDHVGNIZTEDK-UHFFFAOYSA-M potassium;propane-1-sulfonate Chemical compound [K+].CCCS([O-])(=O)=O ZQUDHVGNIZTEDK-UHFFFAOYSA-M 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- FRTIVUOKBXDGPD-UHFFFAOYSA-M sodium;3-sulfanylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CCCS FRTIVUOKBXDGPD-UHFFFAOYSA-M 0.000 description 1
- KQFAFFYKLIBKDE-UHFFFAOYSA-M sodium;ethanesulfonate Chemical compound [Na+].CCS([O-])(=O)=O KQFAFFYKLIBKDE-UHFFFAOYSA-M 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229940117986 sulfobetaine Drugs 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/CN2015/077683 WO2016172852A1 (en) | 2015-04-28 | 2015-04-28 | Reaction products of amine monomers and polymers containing saturated heterocyclic moieties as additives for electroplating baths |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018196130A Division JP6637570B2 (ja) | 2018-10-17 | 2018-10-17 | 電気めっき浴用の添加剤としてのアミンモノマー及び飽和複素環部分を含有するポリマーの反応生成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018517794A JP2018517794A (ja) | 2018-07-05 |
| JP2018517794A5 true JP2018517794A5 (https=) | 2018-11-29 |
| JP6572322B2 JP6572322B2 (ja) | 2019-09-04 |
Family
ID=57199669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017552482A Expired - Fee Related JP6572322B2 (ja) | 2015-04-28 | 2015-04-28 | 電気めっき浴用の添加剤としてのアミンモノマー及び飽和複素環部分を含有するポリマーの反応生成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US10604856B2 (https=) |
| EP (1) | EP3289003A4 (https=) |
| JP (1) | JP6572322B2 (https=) |
| KR (1) | KR101936107B1 (https=) |
| CN (1) | CN107531899A (https=) |
| TW (1) | TWI632175B (https=) |
| WO (1) | WO2016172852A1 (https=) |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3846380A (en) | 1972-10-31 | 1974-11-05 | M Teranishi | Polyamino acid derivatives and compositions containing same |
| FR2403076A1 (fr) * | 1977-09-14 | 1979-04-13 | Oreal | Nouvelles compositions cosmetiques a base d'amides de l'acide polyaspartique |
| FR2726963B1 (fr) | 1994-11-15 | 1996-12-06 | Europ Equip Menager | Foyer de cuisson a induction |
| DE69626589T2 (de) * | 1995-10-05 | 2004-02-12 | Mitsui Chemicals, Inc. | Polymer, Verfahren zur Herstellung, Haarbehandlungszusammensetzungen und kosmetische Zusammensetzungen |
| JP3590217B2 (ja) * | 1995-10-05 | 2004-11-17 | 三井化学株式会社 | ポリアスパラギン酸誘導体、その製造方法、毛髪処理剤組成物及び香粧品組成物 |
| DE19631379A1 (de) | 1996-08-02 | 1998-02-05 | Basf Ag | Wasserlösliche oder wasserdispergierbare Polyasparaginsäure-Derivate, ihre Herstellung und ihre Verwendung |
| US7166688B1 (en) * | 2000-07-08 | 2007-01-23 | Lidochem, Inc. | Chelation compositions |
| US6610192B1 (en) | 2000-11-02 | 2003-08-26 | Shipley Company, L.L.C. | Copper electroplating |
| WO2002090623A1 (fr) | 2001-05-09 | 2002-11-14 | Ebara-Udylite Co., Ltd. | Bain galvanoplastique et procede pour substrat de galvanoplastie faisant appel audit bain |
| CN1538985A (zh) * | 2001-08-03 | 2004-10-20 | 用于洗涤剂组合物中的聚天冬氨酸衍生物 | |
| US7128822B2 (en) | 2003-06-04 | 2006-10-31 | Shipley Company, L.L.C. | Leveler compounds |
| CN1997776A (zh) * | 2004-08-18 | 2007-07-11 | 荏原优莱特科技股份有限公司 | 铜电镀用添加剂及采用该添加剂的电子电路基板的制法 |
| US20060205919A1 (en) * | 2005-03-09 | 2006-09-14 | Graham Swift | Derivatives of end capped polysuccinimides |
| EP1741804B1 (en) | 2005-07-08 | 2016-04-27 | Rohm and Haas Electronic Materials, L.L.C. | Electrolytic copper plating method |
-
2015
- 2015-04-28 KR KR1020177032803A patent/KR101936107B1/ko not_active Expired - Fee Related
- 2015-04-28 CN CN201580078476.XA patent/CN107531899A/zh active Pending
- 2015-04-28 WO PCT/CN2015/077683 patent/WO2016172852A1/en not_active Ceased
- 2015-04-28 EP EP15890232.0A patent/EP3289003A4/en not_active Withdrawn
- 2015-04-28 US US15/560,228 patent/US10604856B2/en not_active Expired - Fee Related
- 2015-04-28 JP JP2017552482A patent/JP6572322B2/ja not_active Expired - Fee Related
-
2016
- 2016-04-01 TW TW105110604A patent/TWI632175B/zh not_active IP Right Cessation
-
2020
- 2020-01-17 US US16/745,544 patent/US11732374B2/en active Active
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