JP2018160333A - プラズマ処理装置 - Google Patents
プラズマ処理装置 Download PDFInfo
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- JP2018160333A JP2018160333A JP2017055854A JP2017055854A JP2018160333A JP 2018160333 A JP2018160333 A JP 2018160333A JP 2017055854 A JP2017055854 A JP 2017055854A JP 2017055854 A JP2017055854 A JP 2017055854A JP 2018160333 A JP2018160333 A JP 2018160333A
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- 239000007789 gas Substances 0.000 claims description 28
- 239000004020 conductor Substances 0.000 claims description 27
- 238000001816 cooling Methods 0.000 claims description 13
- 238000005452 bending Methods 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 238000003786 synthesis reaction Methods 0.000 claims description 3
- 230000002194 synthesizing effect Effects 0.000 claims 1
- 239000003507 refrigerant Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 9
- 238000005259 measurement Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 230000003321 amplification Effects 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/32238—Windows
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32266—Means for controlling power transmitted to the plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/32119—Windows
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/3222—Antennas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32394—Treating interior parts of workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Abstract
Description
Claims (11)
- マイクロ波発生器を備えるプラズマ処理装置であって、前記マイクロ波発生器は、
高周波電気信号を分配する分配器を含み、複数の高周波電気信号を出力する第1のモジュールと、
前記第1のモジュールからの前記複数の高周波電気信号をそれぞれ増幅して複数のマイクロ波を出力する複数の増幅器モジュールを含む第2のモジュールと、
前記複数の増幅器モジュールからの前記複数のマイクロ波を空間合成により合成してマイクロ波を出力する合成器と、
を備え、
前記複数の増幅器モジュールの各々は、外部の直流電源からの第1の直流電力の電圧を降圧させて第2の直流電力を出力するDC/DC変換器、及び、該第2の直流電力を用いて前記第1のモジュールからの前記複数の高周波電気信号のうち対応の高周波電気信号を増幅してマイクロ波を出力する増幅器を有する、プラズマ処理装置。 - 前記複数の増幅器モジュールの個数は、前記マイクロ波発生器の仕様上の最大出力パワーを該複数の増幅器モジュールの最大動作点の出力パワーの平均値で除することによって得られる商に1を加算することによって得られる値以上の個数である、請求項1に記載のプラズマ処理装置。
- 前記複数の増幅器モジュールは、前記第1のモジュールを囲むように周方向に沿って均等に配列されている、請求項1又は2に記載のプラズマ処理装置。
- 前記マイクロ波発生器は、前記複数の増幅器モジュールを冷却するための複数のヒートシンクを更に備え、
前記複数の増幅器モジュールと前記複数のヒートシンクは前記周方向に沿って交互に配列されている、
請求項3に記載のプラズマ処理装置。 - 前記マイクロ波発生器は、前記高周波電気信号を生成する波形発生器を更に備える、請求項1〜4の何れか一項に記載のプラズマ処理装置。
- 前記第1のモジュールが前記波形発生器を含む、請求項5に記載のプラズマ処理装置。
- 前記第1の直流電力を発生する直流電源と、
前記直流電源と前記マイクロ波発生器の前記複数の増幅器モジュールとの間で前記第1の直流電力を伝送するためのケーブルと、
を更に備える請求項1〜6の何れか一項に記載のプラズマ処理装置。 - 前記ケーブルは、キャブタイヤケーブルであり、
前記ケーブルは、その重量が20kg以下であり、その外径が20mm以下であり、その最小曲げ半径が100mm以下であり、その耐電圧が600V以下であることを満たし、
前記ケーブルは、該ケーブル中の一以上の導体の総断面積が8mm2以下であることを満たす多芯ケーブルである、
請求項7に記載のプラズマ処理装置。 - チャンバを提供するチャンバ本体と、
前記マイクロ波発生器に接続されたアンテナであって、前記チャンバに供給されるガスを励起させるためにマイクロ波を前記チャンバに導入する該アンテナと、
を更に備える請求項7又は8に記載のプラズマ処理装置。 - 各々が前記マイクロ波発生器である複数のマイクロ波発生器を備え、
前記第1の直流電力を発生する直流電源と、
前記直流電源と前記複数のマイクロ波発生器の前記複数の増幅器モジュールとの間で前記第1の直流電力を伝送するための複数のケーブルと、
を更に備える、
請求項1〜6の何れか一項に記載のプラズマ処理装置。 - 複数のチャンバ本体と、
前記複数のマイクロ波発生器に接続された複数のアンテナであって、前記複数のチャンバ本体それぞれによって提供される複数のチャンバに供給されるガスを励起させるためにマイクロ波を前記複数のチャンバにそれぞれ導入する該複数のアンテナと、
を備える請求項10に記載のプラズマ処理装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017055854A JP6850645B2 (ja) | 2017-03-22 | 2017-03-22 | プラズマ処理装置 |
KR1020180030378A KR102469576B1 (ko) | 2017-03-22 | 2018-03-15 | 플라즈마 처리 장치 |
US15/922,215 US20180277339A1 (en) | 2017-03-22 | 2018-03-15 | Plasma processing apparatus |
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JP2017055854A JP6850645B2 (ja) | 2017-03-22 | 2017-03-22 | プラズマ処理装置 |
Publications (2)
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JP2018160333A true JP2018160333A (ja) | 2018-10-11 |
JP6850645B2 JP6850645B2 (ja) | 2021-03-31 |
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US (1) | US20180277339A1 (ja) |
JP (1) | JP6850645B2 (ja) |
KR (1) | KR102469576B1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021015889A1 (en) * | 2019-07-22 | 2021-01-28 | Tokyo Electron Limited | Power generation systems and methods for plasma stability and control |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10334569B2 (en) * | 2013-06-05 | 2019-06-25 | Texas Instruments Incorporated | NLOS wireless backhaul downlink communication |
US10748745B2 (en) | 2016-08-16 | 2020-08-18 | Applied Materials, Inc. | Modular microwave plasma source |
US10707058B2 (en) | 2017-04-11 | 2020-07-07 | Applied Materials, Inc. | Symmetric and irregular shaped plasmas using modular microwave sources |
US11037764B2 (en) | 2017-05-06 | 2021-06-15 | Applied Materials, Inc. | Modular microwave source with local Lorentz force |
US11081317B2 (en) | 2018-04-20 | 2021-08-03 | Applied Materials, Inc. | Modular high-frequency source |
US11393661B2 (en) | 2018-04-20 | 2022-07-19 | Applied Materials, Inc. | Remote modular high-frequency source |
US10504699B2 (en) | 2018-04-20 | 2019-12-10 | Applied Materials, Inc. | Phased array modular high-frequency source |
WO2020200442A1 (en) * | 2019-04-03 | 2020-10-08 | Applied Materials, Inc. | Sputter deposition source, sputter deposition apparatus, and method of powering a sputter deposition source |
US11050394B2 (en) * | 2019-06-14 | 2021-06-29 | Tokyo Electron Limited | Modules, multi-stage systems, and related methods for radio frequency power amplifiers |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11340755A (ja) * | 1998-05-27 | 1999-12-10 | Mitsubishi Electric Corp | マイクロ波モジュール |
JP2004128141A (ja) * | 2002-10-01 | 2004-04-22 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2004128385A (ja) * | 2002-10-07 | 2004-04-22 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2006094214A (ja) * | 2004-09-24 | 2006-04-06 | Nihon Koshuha Co Ltd | マグネトロン発振装置 |
JP2009230915A (ja) * | 2008-03-19 | 2009-10-08 | Tokyo Electron Ltd | 電力合成器およびマイクロ波導入機構 |
Family Cites Families (4)
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JP5064924B2 (ja) * | 2006-08-08 | 2012-10-31 | パナソニック株式会社 | マイクロ波処理装置 |
US20120109080A1 (en) * | 2010-11-02 | 2012-05-03 | Allergan, Inc. | Puncture resistant composite materials |
JP2012109080A (ja) * | 2010-11-16 | 2012-06-07 | Tokyo Electron Ltd | プラズマ処理装置およびプラズマ処理方法 |
JP5935184B2 (ja) * | 2011-07-21 | 2016-06-15 | 矢崎総業株式会社 | 自動車用高圧ワイヤハーネス及びこの製造方法 |
-
2017
- 2017-03-22 JP JP2017055854A patent/JP6850645B2/ja active Active
-
2018
- 2018-03-15 US US15/922,215 patent/US20180277339A1/en not_active Abandoned
- 2018-03-15 KR KR1020180030378A patent/KR102469576B1/ko active IP Right Grant
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11340755A (ja) * | 1998-05-27 | 1999-12-10 | Mitsubishi Electric Corp | マイクロ波モジュール |
JP2004128141A (ja) * | 2002-10-01 | 2004-04-22 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2004128385A (ja) * | 2002-10-07 | 2004-04-22 | Tokyo Electron Ltd | プラズマ処理装置 |
JP2006094214A (ja) * | 2004-09-24 | 2006-04-06 | Nihon Koshuha Co Ltd | マグネトロン発振装置 |
JP2009230915A (ja) * | 2008-03-19 | 2009-10-08 | Tokyo Electron Ltd | 電力合成器およびマイクロ波導入機構 |
US20110018651A1 (en) * | 2008-03-19 | 2011-01-27 | Tokyo Electron Limited | Power combiner and microwave introduction mechanism |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021015889A1 (en) * | 2019-07-22 | 2021-01-28 | Tokyo Electron Limited | Power generation systems and methods for plasma stability and control |
US11094507B2 (en) | 2019-07-22 | 2021-08-17 | Tokyo Electron Limited | Power generation systems and methods for plasma stability and control |
US11721524B2 (en) | 2019-07-22 | 2023-08-08 | Tokyo Electron Limited | Power generation systems and methods for plasma stability and control |
Also Published As
Publication number | Publication date |
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JP6850645B2 (ja) | 2021-03-31 |
KR102469576B1 (ko) | 2022-11-22 |
KR20180107728A (ko) | 2018-10-02 |
US20180277339A1 (en) | 2018-09-27 |
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