JP2018104268A - レーザを用いるガラス部材の表面仕上げ - Google Patents
レーザを用いるガラス部材の表面仕上げ Download PDFInfo
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- JP2018104268A JP2018104268A JP2017216173A JP2017216173A JP2018104268A JP 2018104268 A JP2018104268 A JP 2018104268A JP 2017216173 A JP2017216173 A JP 2017216173A JP 2017216173 A JP2017216173 A JP 2017216173A JP 2018104268 A JP2018104268 A JP 2018104268A
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- Prior art keywords
- glass substrate
- laser
- applying
- glass
- substrate
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- 239000011521 glass Substances 0.000 title claims abstract description 62
- 239000000758 substrate Substances 0.000 claims abstract description 63
- 238000000034 method Methods 0.000 claims abstract description 38
- 239000011248 coating agent Substances 0.000 claims abstract description 12
- 238000000576 coating method Methods 0.000 claims abstract description 12
- 230000003287 optical effect Effects 0.000 claims description 13
- 230000007547 defect Effects 0.000 claims description 6
- 239000000356 contaminant Substances 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 238000002844 melting Methods 0.000 claims description 3
- 230000008018 melting Effects 0.000 claims description 3
- 238000005498 polishing Methods 0.000 description 5
- 238000009499 grossing Methods 0.000 description 4
- 230000003749 cleanliness Effects 0.000 description 3
- 238000001393 microlithography Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005542 laser surface treatment Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/3568—Modifying rugosity
- B23K26/3576—Diminishing rugosity, e.g. grinding; Polishing; Smoothing
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B29/00—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins
- C03B29/02—Reheating glass products for softening or fusing their surfaces; Fire-polishing; Fusing of margins in a discontinuous way
- C03B29/025—Glass sheets
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/10—Mirrors with curved faces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/54—Glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Laser Beam Processing (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
【解決手段】方法は、ガラス基板の表面にレーザを直接当て、ガラス基板の表面を滑らかにすることを包含する。この方法は、更に、ガラス基板の平滑化された表面に反射コーティングを直接施すことを包含することができる。装置は、ガラス基板から独立した層ではないレーザ研磨面を有するチタニア−シリカガラス基板を備えることができる。この装置は、レーザ研磨面に直接設けられた反射面を有することができる。
【選択図】図1
Description
1.分野
本開示は、構造体の表面仕上げ、特に、ガラス部材(例えば、チタニア−シリカガラス)の表面仕上げに関する。
低膨張のチタニア−シリカガラスの構造体の表面仕上げは、構造体の強度及び清浄性に影響を及ぼし得る。粗い非鏡面は、構造体を形成する機械加工、研削、ラッピング及び酸エッチング工程により作り出される。研磨は、伝統的に、ガラス研磨に伴う高コスト及び時間を必要とする機械的に及び/または化学的に行われている。
次に図を参照すると、ここでは、同様な参照番号が同様な構造的特徴または主題の開示の態様を特定する。制限するのではなく、説明及び図示のため、本開示による方法の実施形態の説明図が、図1に示してあり、全体的に参照文字100で示してある。他の実施形態及び/または本開示の態様は、図2及び3に示してある。ここに記載のシステム及び方法は、例えば、ガラス基板を滑らかにするために使用することができる。
Claims (20)
- ガラス基板の表面にレーザを直接当て、前記ガラス基板の表面を滑らかにすることを含む方法。
- 反射コーティングを、前記ガラス基板の平滑化された表面に直接施すことを更に含む、請求項1に記載の方法。
- 前記レーザを当てた後で、反射コーティングを施す前に前記ガラス基板を光学的に仕上げし、そのコーティング前に、前記平滑化された表面の寸法精度を確保することを更に含む、請求項2に記載の方法。
- 前記ガラス基板は、超低膨張ガラスから形成される、請求項1に記載の方法。
- 前記超低膨張ガラスは、チタニア−シリカガラスである、請求項4に記載の方法。
- 前記ガラス基板は、単一部材である、請求項5に記載の方法。
- 前記ガラス基板は、光学部品用基板となるように成形される、請求項6に記載の方法。
- 前記ガラス基板は、反射鏡基板となるように成形される、請求項7に記載の方法。
- レーザを当てることは、前記ガラス基板の光学的形状または特性を変えることなく行うことを含む、請求項1に記載の方法。
- レーザを当てることは、前記ガラス基板の表面を溶融することを含む、請求項1に記載の方法。
- 前記方法は、前記表面の窪みを充填することを含む、請求項1に記載の方法。
- レーザを当てることは、前記レーザをパルシングすることを含む、請求項1に記載の方法。
- レーザを当てることは、前記レーザパルシングの周波数を変えることを含む、請求項12に記載の方法。
- レーザを当てることは、前記表面の欠陥または汚染物を除去及び/または蒸発させることを含む、請求項1に記載の方法。
- レーザを当てることは、前記表面から気泡を除去することを含む、請求項1に記載の方法。
- チタニア−シリカガラス基板であって、前記ガラス基板から独立した層ではないレーザ研磨面を有するチタニア−シリカガラス基板、を備える、装置。
- 前記レーザ研磨面に直接設けた反射面を更に備える、請求項16に記載の装置。
- 前記ガラス基板は、単一部材である、請求項17に記載の装置。
- 前記ガラス基板は、光学部品用基板となるように成形される、請求項18に記載の装置。
- 前記ガラス基板は、反射鏡基板となるように成形される、請求項19に記載の装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/348,665 | 2016-11-10 | ||
US15/348,665 US20180126485A1 (en) | 2016-11-10 | 2016-11-10 | Surface finishing for glass components using a laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2018104268A true JP2018104268A (ja) | 2018-07-05 |
Family
ID=60301926
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017216173A Pending JP2018104268A (ja) | 2016-11-10 | 2017-11-09 | レーザを用いるガラス部材の表面仕上げ |
Country Status (3)
Country | Link |
---|---|
US (1) | US20180126485A1 (ja) |
EP (1) | EP3321240A1 (ja) |
JP (1) | JP2018104268A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109516697A (zh) * | 2019-01-11 | 2019-03-26 | 中国科学院上海光学精密机械研究所 | 手机显示屏玻璃的激光抛光方法 |
CN111230308A (zh) * | 2020-02-14 | 2020-06-05 | 西京学院 | 一种3d打印模型激光抛光系统及其使用方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109985790B (zh) * | 2019-04-03 | 2021-11-23 | 蔡健文 | 一种激光打磨油漆工艺 |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6285433A (ja) * | 1985-10-09 | 1987-04-18 | Sumitomo Electric Ind Ltd | 研摩装置 |
JPH0616440A (ja) * | 1992-06-30 | 1994-01-25 | Sharp Corp | 透明板表面の欠陥修正方法 |
US5742026A (en) * | 1995-06-26 | 1998-04-21 | Corning Incorporated | Processes for polishing glass and glass-ceramic surfaces using excimer laser radiation |
US20040198047A1 (en) * | 2002-12-18 | 2004-10-07 | Infineon Technologies Ag | Method for fabricating a photomask for an integrated circuit and corresponding photomask |
WO2006112415A1 (ja) * | 2005-04-15 | 2006-10-26 | Asahi Glass Company, Limited | ガラス板の内部に存在する泡の径を縮小する方法 |
JP2009023885A (ja) * | 2007-07-20 | 2009-02-05 | Asahi Glass Co Ltd | レーザ照射によるガラス基板表面の表面傷部の修復法 |
JP2009221095A (ja) * | 2008-02-19 | 2009-10-01 | Asahi Glass Co Ltd | Euvl用光学部材、およびその平滑化方法 |
JP2009283684A (ja) * | 2008-05-22 | 2009-12-03 | Asahi Glass Co Ltd | Euvl用光学部材、およびその平滑化方法 |
WO2010029836A1 (ja) * | 2008-09-12 | 2010-03-18 | 旭硝子株式会社 | Euvl用光学部材の平滑化方法、および光学面が平滑化されたeuvl用光学部材 |
JP2010222183A (ja) * | 2009-03-24 | 2010-10-07 | Sumitomo Electric Ind Ltd | ガラス材の表面加工方法 |
JP2013082612A (ja) * | 2011-09-28 | 2013-05-09 | Hoya Corp | マスクブランク用ガラス基板の製造方法、マスクブランクの製造方法及びマスクの製造方法、並びにインプリントモールドの製造方法 |
JP2014059305A (ja) * | 2013-10-01 | 2014-04-03 | Ebara Corp | インプリント用ガラス基板、レジストパターン形成方法、インプリント用ガラス基板の検査方法及び検査装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120026473A1 (en) * | 2010-07-29 | 2012-02-02 | Michael Lucien Genier | Highly reflective, hardened silica titania article and method of making |
-
2016
- 2016-11-10 US US15/348,665 patent/US20180126485A1/en not_active Abandoned
-
2017
- 2017-11-09 JP JP2017216173A patent/JP2018104268A/ja active Pending
- 2017-11-10 EP EP17201154.6A patent/EP3321240A1/en not_active Withdrawn
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6285433A (ja) * | 1985-10-09 | 1987-04-18 | Sumitomo Electric Ind Ltd | 研摩装置 |
JPH0616440A (ja) * | 1992-06-30 | 1994-01-25 | Sharp Corp | 透明板表面の欠陥修正方法 |
US5742026A (en) * | 1995-06-26 | 1998-04-21 | Corning Incorporated | Processes for polishing glass and glass-ceramic surfaces using excimer laser radiation |
US20040198047A1 (en) * | 2002-12-18 | 2004-10-07 | Infineon Technologies Ag | Method for fabricating a photomask for an integrated circuit and corresponding photomask |
WO2006112415A1 (ja) * | 2005-04-15 | 2006-10-26 | Asahi Glass Company, Limited | ガラス板の内部に存在する泡の径を縮小する方法 |
JP2009023885A (ja) * | 2007-07-20 | 2009-02-05 | Asahi Glass Co Ltd | レーザ照射によるガラス基板表面の表面傷部の修復法 |
JP2009221095A (ja) * | 2008-02-19 | 2009-10-01 | Asahi Glass Co Ltd | Euvl用光学部材、およびその平滑化方法 |
JP2009283684A (ja) * | 2008-05-22 | 2009-12-03 | Asahi Glass Co Ltd | Euvl用光学部材、およびその平滑化方法 |
WO2010029836A1 (ja) * | 2008-09-12 | 2010-03-18 | 旭硝子株式会社 | Euvl用光学部材の平滑化方法、および光学面が平滑化されたeuvl用光学部材 |
JP2010222183A (ja) * | 2009-03-24 | 2010-10-07 | Sumitomo Electric Ind Ltd | ガラス材の表面加工方法 |
JP2013082612A (ja) * | 2011-09-28 | 2013-05-09 | Hoya Corp | マスクブランク用ガラス基板の製造方法、マスクブランクの製造方法及びマスクの製造方法、並びにインプリントモールドの製造方法 |
JP2014059305A (ja) * | 2013-10-01 | 2014-04-03 | Ebara Corp | インプリント用ガラス基板、レジストパターン形成方法、インプリント用ガラス基板の検査方法及び検査装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109516697A (zh) * | 2019-01-11 | 2019-03-26 | 中国科学院上海光学精密机械研究所 | 手机显示屏玻璃的激光抛光方法 |
CN111230308A (zh) * | 2020-02-14 | 2020-06-05 | 西京学院 | 一种3d打印模型激光抛光系统及其使用方法 |
CN111230308B (zh) * | 2020-02-14 | 2021-07-13 | 西京学院 | 一种3d打印模型激光抛光系统及其使用方法 |
Also Published As
Publication number | Publication date |
---|---|
US20180126485A1 (en) | 2018-05-10 |
EP3321240A1 (en) | 2018-05-16 |
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