JP2018076602A5 - - Google Patents

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Publication number
JP2018076602A5
JP2018076602A5 JP2018015298A JP2018015298A JP2018076602A5 JP 2018076602 A5 JP2018076602 A5 JP 2018076602A5 JP 2018015298 A JP2018015298 A JP 2018015298A JP 2018015298 A JP2018015298 A JP 2018015298A JP 2018076602 A5 JP2018076602 A5 JP 2018076602A5
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JP
Japan
Prior art keywords
vapor deposition
resin
deposition mask
opening
metal
Prior art date
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Application number
JP2018015298A
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English (en)
Japanese (ja)
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JP2018076602A (ja
JP6583446B2 (ja
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Priority to JP2018015298A priority Critical patent/JP6583446B2/ja
Priority claimed from JP2018015298A external-priority patent/JP6583446B2/ja
Publication of JP2018076602A publication Critical patent/JP2018076602A/ja
Publication of JP2018076602A5 publication Critical patent/JP2018076602A5/ja
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Publication of JP6583446B2 publication Critical patent/JP6583446B2/ja
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JP2018015298A 2018-01-31 2018-01-31 蒸着マスク、及び有機半導体素子の製造方法 Active JP6583446B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2018015298A JP6583446B2 (ja) 2018-01-31 2018-01-31 蒸着マスク、及び有機半導体素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018015298A JP6583446B2 (ja) 2018-01-31 2018-01-31 蒸着マスク、及び有機半導体素子の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2013205836A Division JP2015067892A (ja) 2013-09-30 2013-09-30 蒸着マスク、及び有機半導体素子の製造方法

Publications (3)

Publication Number Publication Date
JP2018076602A JP2018076602A (ja) 2018-05-17
JP2018076602A5 true JP2018076602A5 (enExample) 2018-07-12
JP6583446B2 JP6583446B2 (ja) 2019-10-02

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ID=62150066

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018015298A Active JP6583446B2 (ja) 2018-01-31 2018-01-31 蒸着マスク、及び有機半導体素子の製造方法

Country Status (1)

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JP (1) JP6583446B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116438324B (zh) * 2020-11-11 2025-12-02 凸版印刷株式会社 蒸镀用金属掩模以及蒸镀用金属掩模的制造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4635348B2 (ja) * 2001-02-08 2011-02-23 凸版印刷株式会社 パターン形成用マスクおよびそれを使用したパターン形成装置
JP4961776B2 (ja) * 2006-03-07 2012-06-27 株式会社Ｓｕｍｃｏ パターン形成用マスクおよびその洗浄方法
JP5816067B2 (ja) * 2011-12-06 2015-11-17 株式会社アルバック 薄膜製造方法及び薄膜製造装置
JP5875851B2 (ja) * 2011-12-20 2016-03-02 株式会社アルバック 薄膜製造方法、薄膜製造装置
TWI720818B (zh) * 2012-01-12 2021-03-01 日商大日本印刷股份有限公司 蒸鍍遮罩、圖案之製造方法、有機半導體元件的製造方法

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