JP2018076602A5 - - Google Patents
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- Publication number
- JP2018076602A5 JP2018076602A5 JP2018015298A JP2018015298A JP2018076602A5 JP 2018076602 A5 JP2018076602 A5 JP 2018076602A5 JP 2018015298 A JP2018015298 A JP 2018015298A JP 2018015298 A JP2018015298 A JP 2018015298A JP 2018076602 A5 JP2018076602 A5 JP 2018076602A5
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- resin
- deposition mask
- opening
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000011347 resin Substances 0.000 claims 11
- 229920005989 resin Polymers 0.000 claims 11
- 238000007740 vapor deposition Methods 0.000 claims 10
- 239000002184 metal Substances 0.000 claims 7
- 230000003373 anti-fouling Effects 0.000 claims 4
- 230000000875 corresponding Effects 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
Claims (4)
前記樹脂層の一方の面において前記金属開口部と重なる位置に対応する領域、及び前記樹脂層の他方の面の何れか一方、又は双方の面上と、前記樹脂開口部の内壁面に防汚層が設けられ、
前記防汚層が、離型性樹脂を含有している、
蒸着マスク。 A vapor deposition mask in which a metal layer provided with a metal opening is laminated on one surface of a resin layer provided with a resin opening corresponding to a pattern to be produced by vapor deposition,
Either one of the other surface of the one corresponding to a position overlapping with the metal opening in the surface region of the resin layer, and the resin layer, or as on both surfaces, antifouling on the inner wall surface of the resin opening Layers are provided,
The antifouling layer contains a releasable resin,
Deposition mask.
前記樹脂層の一方の面において前記金属開口部と重なる位置に対応する領域、及び前記樹脂層の他方の面の何れか一方、又は双方の面上と、前記金属開口部の内壁面に防汚層が設けられた、 The region corresponding to the position overlapping with the metal opening on one surface of the resin layer, the other surface of the resin layer, or both surfaces, and the inner wall surface of the metal opening are antifouling. Layer was provided,
蒸着マスク。 Deposition mask.
請求項２に記載の蒸着マスク。 The vapor deposition mask of Claim 2.
蒸着マスクを用いて、蒸着対象物に蒸着パターンを形成する工程を含み、 Using a vapor deposition mask, forming a vapor deposition pattern on a vapor deposition object,
前記蒸着マスクとして、請求項１乃至３の何れか１項に記載の蒸着マスクを用いる、 The vapor deposition mask according to any one of claims 1 to 3, wherein the vapor deposition mask is used.
有機半導体素子の製造方法。 A method for producing an organic semiconductor element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018015298A JP6583446B2 (en) | 2018-01-31 | 2018-01-31 | Vapor deposition mask and organic semiconductor device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018015298A JP6583446B2 (en) | 2018-01-31 | 2018-01-31 | Vapor deposition mask and organic semiconductor device manufacturing method |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013205836A Division JP2015067892A (en) | 2013-09-30 | 2013-09-30 | Vapor deposition mask, and organic semiconductor element manufacturing method |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018076602A JP2018076602A (en) | 2018-05-17 |
| JP2018076602A5 true JP2018076602A5 (en) | 2018-07-12 |
| JP6583446B2 JP6583446B2 (en) | 2019-10-02 |
Family
ID=62150066
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018015298A Active JP6583446B2 (en) | 2018-01-31 | 2018-01-31 | Vapor deposition mask and organic semiconductor device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6583446B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116438324A (en) * | 2020-11-11 | 2023-07-14 | 凸版印刷株式会社 | Metal mask for vapor deposition and method for manufacturing metal mask for vapor deposition |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4635348B2 (en) * | 2001-02-08 | 2011-02-23 | 凸版印刷株式会社 | Pattern forming mask and pattern forming apparatus using the same |
| JP4961776B2 (en) * | 2006-03-07 | 2012-06-27 | 株式会社Ｓｕｍｃｏ | Pattern forming mask and cleaning method thereof |
| JP5816067B2 (en) * | 2011-12-06 | 2015-11-17 | 株式会社アルバック | Thin film manufacturing method and thin film manufacturing apparatus |
| JP5875851B2 (en) * | 2011-12-20 | 2016-03-02 | 株式会社アルバック | Thin film manufacturing method, thin film manufacturing apparatus |
| CN105322101B (en) * | 2012-01-12 | 2019-04-05 | 大日本印刷株式会社 | The manufacturing method of deposition mask and organic semiconductor device |
-
2018
- 2018-01-31 JP JP2018015298A patent/JP6583446B2/en active Active
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