JP2016108578A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2016108578A5 JP2016108578A5 JP2014244261A JP2014244261A JP2016108578A5 JP 2016108578 A5 JP2016108578 A5 JP 2016108578A5 JP 2014244261 A JP2014244261 A JP 2014244261A JP 2014244261 A JP2014244261 A JP 2014244261A JP 2016108578 A5 JP2016108578 A5 JP 2016108578A5
- Authority
- JP
- Japan
- Prior art keywords
- mask
- vapor deposition
- alignment mark
- deposition mask
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007740 vapor deposition Methods 0.000 claims 32
- 239000011347 resin Substances 0.000 claims 22
- 229920005989 resin Polymers 0.000 claims 22
- 239000002184 metal Substances 0.000 claims 9
- 239000000463 material Substances 0.000 claims 4
- 239000004065 semiconductor Substances 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 3
- 238000002360 preparation method Methods 0.000 claims 2
- 230000007261 regionalization Effects 0.000 claims 2
- 230000000149 penetrating Effects 0.000 claims 1
- 230000002093 peripheral Effects 0.000 claims 1
Claims (20)
前記金属マスクには、アライメント光の反射光によって検出されるアライメントマークが設けられ、
前記蒸着マスクを平面視したときの前記アライメントマークの外縁を起点としたときに、前記樹脂マスクの他方の面側には、前記起点と重なる位置から前記樹脂マスクの外周方向に向かって位置する反射層が設けられ、
前記反射層の表面における前記アライメント光の反射率が、前記アライメントマークの表面、及び前記樹脂マスクの表面における前記アライメント光の反射率よりも高い、
蒸着マスク。 A vapor deposition mask in which a metal mask is laminated on one surface side of a resin mask,
The metal mask is provided with an alignment mark detected by reflected light of alignment light,
When the outer edge of the alignment mark when the vapor deposition mask is viewed in plan is a starting point, the other surface side of the resin mask is reflected from the position overlapping the starting point toward the outer peripheral direction of the resin mask. Layers are provided,
Reflectance of the alignment light on the surface of the reflective layer is higher than the reflectance of the alignment light on the surface of the alignment mark, and the surface of the resin mask,
Deposition mask.
請求項1に記載の蒸着マスク。 The resin mask has an alignment mark opening for exposing only the alignment mark without exposing the surface of the metal mask .
The vapor deposition mask of Claim 1.
請求項2に記載の蒸着マスク。 The vapor deposition mask of Claim 2.
請求項3に記載の蒸着マスク。 The vapor deposition mask of Claim 3.
請求項2に記載の蒸着マスク。 The vapor deposition mask of Claim 2.
請求項1、2、5の何れか1項に記載の蒸着マスク。 The vapor deposition mask of any one of Claims 1, 2, and 5.
請求項6に記載の蒸着マスク。 The vapor deposition mask of Claim 6.
前記蒸着マスクを平面視したときに、1つの前記反射層は、複数の前記アライメントマークを一括して囲むように位置している、 When the vapor deposition mask is viewed in plan, one of the reflective layers is positioned so as to collectively surround the plurality of alignment marks.
請求項1乃至7の何れか1項に記載の蒸着マスク。 The vapor deposition mask of any one of Claims 1 thru | or 7.
前記金属マスクには、アライメント光の反射光によって検出されるアライメントマークが設けられ、 The metal mask is provided with an alignment mark detected by reflected light of alignment light,
前記樹脂マスクは、前記アライメントマークを露出させるためのアライメントマーク用開口部を有し、 The resin mask has an alignment mark opening for exposing the alignment mark,
前記蒸着マスクを平面視したときの、前記アライメントマーク用開口部の前記樹脂マスクの一方の面側における開口の大きさは、前記アライメントマークの大きさよりも大きく、 When the deposition mask is viewed in plan, the size of the opening on one surface side of the resin mask of the alignment mark opening is larger than the size of the alignment mark,
前記蒸着マスクを樹脂マスク側から平面視したときの前記アライメントマーク用開口部の外縁を起点としたときに、前記樹脂マスクの他方の面側には、前記起点から前記樹脂マスクの外周方向に向かって位置する反射層が設けられ、 When the outer edge of the alignment mark opening when the vapor deposition mask is viewed in plan from the resin mask side is a starting point, the other surface side of the resin mask is directed from the starting point toward the outer periphery of the resin mask. A reflective layer is provided,
前記反射層の表面における前記アライメント光の反射率は、前記アライメントマークの表面、及び前記樹脂マスクの表面における前記アライメント光の反射率よりも高い、 The reflectance of the alignment light on the surface of the reflective layer is higher than the reflectance of the alignment light on the surface of the alignment mark and the surface of the resin mask.
蒸着マスク。 Deposition mask.
請求項9に記載の蒸着マスク。 The vapor deposition mask of Claim 9.
請求項1乃至10の何れか1項に記載の蒸着マスク。 The vapor deposition mask of any one of Claims 1 thru | or 10.
請求項1乃至10の何れか1項に記載の蒸着マスク。 The vapor deposition mask of any one of Claims 1 thru | or 10.
請求項1乃至10の何れか1項に記載の蒸着マスク。 The vapor deposition mask of any one of Claims 1 thru | or 10.
請求項1乃至10の何れか1項に記載の蒸着マスク。 The vapor deposition mask of any one of Claims 1 thru | or 10.
樹脂板の一方の面側に金属マスクが位置しており、 A metal mask is located on one side of the resin plate,
前記金属マスクが前記アライメントマークを有し、 The metal mask has the alignment mark;
前記樹脂板の他方の面側に前記反射層が設けられた、 The reflective layer is provided on the other surface side of the resin plate,
蒸着マスク準備体。 Deposition mask preparation.
フレーム付き蒸着マスク。 Vapor deposition mask with frame.
請求項1乃至14の何れか1項に記載の蒸着マスク、又は請求項16に記載のフレーム付き蒸着マスクを使用する、
有機半導体素子の製造方法。 A method for producing an organic semiconductor element, comprising:
Use the vapor deposition mask according to any one of claims 1 to 14, or the vapor deposition mask with a frame according to claim 16.
A method for producing an organic semiconductor element.
請求項17に記載の有機半導体素子の製造方法。 The manufacturing method of the organic-semiconductor element of Claim 17.
請求項1乃至14の何れか1項に記載の蒸着マスク、又は請求項16に記載のフレーム付き蒸着マスクを使用する、 Use the vapor deposition mask according to any one of claims 1 to 14, or the vapor deposition mask with a frame according to claim 16.
パターンの形成方法。 Pattern formation method.
請求項19に記載のパターンの形成方法。 The pattern formation method according to claim 19.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014244261A JP6375906B2 (en) | 2014-12-02 | 2014-12-02 | Vapor deposition mask, vapor deposition mask preparation, framed vapor deposition mask, and organic semiconductor device manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014244261A JP6375906B2 (en) | 2014-12-02 | 2014-12-02 | Vapor deposition mask, vapor deposition mask preparation, framed vapor deposition mask, and organic semiconductor device manufacturing method |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016108578A JP2016108578A (en) | 2016-06-20 |
JP2016108578A5 true JP2016108578A5 (en) | 2018-03-15 |
JP6375906B2 JP6375906B2 (en) | 2018-08-22 |
Family
ID=56121998
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014244261A Active JP6375906B2 (en) | 2014-12-02 | 2014-12-02 | Vapor deposition mask, vapor deposition mask preparation, framed vapor deposition mask, and organic semiconductor device manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP6375906B2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6891449B2 (en) * | 2016-10-27 | 2021-06-18 | 大日本印刷株式会社 | A method for manufacturing a vapor deposition mask, a method for manufacturing a vapor deposition mask preparation, a method for manufacturing an organic semiconductor element, and a method for manufacturing an organic EL display. |
CN106637074B (en) * | 2017-01-09 | 2019-02-22 | 昆山国显光电有限公司 | The method that mask plate, oled substrate and measurement vapor deposition pixel deviation is deposited |
JP7406719B2 (en) | 2019-01-29 | 2023-12-28 | 大日本印刷株式会社 | Vapor deposition mask and manufacturing method thereof, vapor deposition mask device and manufacturing method thereof, intermediate, vapor deposition method, and manufacturing method of organic EL display device |
CN111485194A (en) * | 2019-01-29 | 2020-08-04 | 大日本印刷株式会社 | Vapor deposition mask, vapor deposition mask device, method for manufacturing vapor deposition mask device, intermediate, vapor deposition method, and method for manufacturing organic E L display device |
CN111876726B (en) * | 2020-08-04 | 2022-12-20 | 京东方科技集团股份有限公司 | Metal mask plate, evaporation method, display panel and display device |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2889062B2 (en) * | 1991-10-24 | 1999-05-10 | 松下電器産業株式会社 | X-ray mask and manufacturing method thereof |
JPH05188579A (en) * | 1992-01-08 | 1993-07-30 | Seiko Epson Corp | Photomask and production of semiconductor device |
JP3446943B2 (en) * | 1998-09-21 | 2003-09-16 | 大日本印刷株式会社 | Phase shift mask having alignment mark for drawing |
JP2010106358A (en) * | 2008-09-30 | 2010-05-13 | Canon Inc | Film formation mask and film formation method using the same |
KR20210046847A (en) * | 2012-01-12 | 2021-04-28 | 다이니폰 인사츠 가부시키가이샤 | Metal mask having a resin plate, vapor deposition mask, method for producing vapor deposition mask device, and method for producing organic semiconductor element |
-
2014
- 2014-12-02 JP JP2014244261A patent/JP6375906B2/en active Active
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2014208899A5 (en) | ||
JP2016108578A5 (en) | ||
USD693583S1 (en) | Substrate with a camouflage pattern | |
USD789697S1 (en) | Film with embossing pattern | |
USD720140S1 (en) | Substrate with camouflage pattern | |
JP2015195106A5 (en) | Display device manufacturing method and display device mother substrate | |
JP2017210657A5 (en) | ||
JP2016136508A5 (en) | Secondary battery | |
JP2016072471A5 (en) | ||
TW201614086A (en) | Vapor deposition mask manufacturing method and organic semiconductor element manufacturing method | |
EP2863446A3 (en) | Flexible organic light emitting diode display and manufacturing method thereof | |
JP2014179457A5 (en) | ||
JP2013247367A5 (en) | ||
JP2014036110A5 (en) | ||
EP2905097A3 (en) | Article produced by additive manufacturing | |
JP2014072415A5 (en) | Light emitting device and manufacturing method thereof | |
JP2018181668A5 (en) | ||
JP2013002887A5 (en) | Radiation detection panel, radiation imaging apparatus, and method of manufacturing radiation detection apparatus | |
JP2018059211A5 (en) | ||
JP2016119454A5 (en) | ||
USD845648S1 (en) | Film with pattern | |
JP2015156471A5 (en) | ||
USD772069S1 (en) | Film for making packages | |
JP2015035438A5 (en) | ||
JP2016127144A5 (en) |