JP2018037635A - 磁性体組成物、インダクタおよび磁性体本体 - Google Patents
磁性体組成物、インダクタおよび磁性体本体 Download PDFInfo
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- 239000000203 mixture Substances 0.000 title claims abstract description 34
- 239000000696 magnetic material Substances 0.000 title claims abstract description 10
- 229910052751 metal Inorganic materials 0.000 claims abstract description 173
- 239000002184 metal Substances 0.000 claims abstract description 173
- 239000006249 magnetic particle Substances 0.000 claims abstract description 170
- 239000002245 particle Substances 0.000 claims abstract description 60
- 229920005989 resin Polymers 0.000 claims description 41
- 239000011347 resin Substances 0.000 claims description 41
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 24
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 12
- 239000011651 chromium Substances 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229920001187 thermosetting polymer Polymers 0.000 claims description 4
- 239000010410 layer Substances 0.000 description 50
- 239000000843 powder Substances 0.000 description 10
- 239000010949 copper Substances 0.000 description 8
- 230000035699 permeability Effects 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000003822 epoxy resin Substances 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
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- 230000001419 dependent effect Effects 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910008458 Si—Cr Inorganic materials 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 230000003071 parasitic effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
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Abstract
Description
20 支持部材
41 第1コイルパターン
42 第2コイルパターン
45 ビア
50 本体
55 コア部
60 樹脂
61 第1金属磁性粒子
63 第2金属磁性粒子
65 第3金属磁性粒子
81 第1外部電極
82 第2外部電極
Claims (26)
- 金属磁性粒子を含み、
前記金属磁性粒子は、
平均粒径が10〜28μmである第1金属磁性粒子と、
平均粒径が1〜4.5μmである第2金属磁性粒子と、
表面に配置された絶縁膜を含み、粒径が300nm以下である第3金属磁性粒子と、を含む、磁性体組成物。 - 前記磁性体組成物は樹脂をさらに含み、
前記金属磁性粒子は前記樹脂に分散され、
前記第2金属磁性粒子は前記第1金属磁性粒子の間の前記樹脂に分散され、
前記第3金属磁性粒子は前記第1及び第2金属磁性粒子の間の前記樹脂に分散される、請求項1に記載の磁性体組成物。 - 前記金属磁性粒子100wt%に対して、前記第1金属磁性粒子の含有量は70〜79wt%、前記第2金属磁性粒子の含有量は10〜20wt%、及び前記第3金属磁性粒子の含有量は1〜20wt%を満たす、請求項1または2に記載の磁性体組成物。
- 前記絶縁膜は酸化膜からなる、請求項1〜3の何れか1項に記載の磁性体組成物。
- 前記絶縁膜は、2層からなり、FeO/SiOである、請求項4に記載の磁性体組成物。
- 前記絶縁膜の厚さは、前記第3金属磁性粒子の粒径の1〜20%である、請求項1〜5の何れか1項に記載の磁性体組成物。
- 樹脂を含み、
前記金属磁性粒子は前記樹脂に分散された形態である、請求項1に記載の磁性体組成物。 - 前記金属磁性粒子は、鉄(Fe)、シリコン(Si)、クロム(Cr)、アルミニウム(Al)、及びニッケル(Ni)からなる群より選択されたいずれか一つ以上を含む、請求項1〜7の何れか1項に記載の磁性体組成物。
- 金属磁性粒子を含む本体と、
前記本体内に配置されたコイル部と、を含み、
前記金属磁性粒子は、平均粒径が10〜28μmである第1金属磁性粒子と、平均粒径が1〜4.5μmである第2金属磁性粒子と、表面に配置された絶縁膜を含み、粒径が300nm以下である第3金属磁性粒子と、を含む、インダクタ。 - 前記金属磁性粒子は樹脂に分散され、
前記第2金属磁性粒子は前記第1金属磁性粒子の間の前記樹脂に分散され、
前記第3金属磁性粒子は前記第1及び第2金属磁性粒子の間の前記樹脂に分散される、請求項9に記載のインダクタ。 - 前記金属磁性粒子100wt%に対して、前記第1金属磁性粒子の含有量は70〜79wt%、前記第2金属磁性粒子の含有量は10〜20wt%、及び前記第3金属磁性粒子の含有量は1〜20wt%を満たす、請求項9または10に記載のインダクタ。
- 前記絶縁膜は酸化膜からなる、請求項9〜11の何れか1項に記載のインダクタ。
- 前記絶縁膜は、2層からなり、FeO/SiOである、請求項12に記載のインダクタ。
- 前記絶縁膜の厚さは、前記第3金属磁性粒子の粒径の1〜20%である、請求項9〜13の何れか1項に記載のインダクタ。
- 前記金属磁性粒子は、鉄(Fe)、シリコン(Si)、クロム(Cr)、アルミニウム(Al)、及びニッケル(Ni)からなる群より選択されたいずれか一つ以上を含む、請求項9〜14の何れか1項に記載のインダクタ。
- 前記本体は樹脂を含み、
前記金属磁性粒子は前記樹脂に分散された形態である、請求項9〜15の何れか1項に記載のインダクタ。 - 前記樹脂は熱硬化性樹脂である、請求項16に記載のインダクタ。
- 樹脂と、
前記樹脂に分散され、平均粒径が10〜28μmである第1金属磁性粒子と、前記第1金属磁性粒子の間の前記樹脂に分散され、平均粒径が1〜4.5μmである第2金属磁性粒子と、
前記第1及び第2金属磁性粒子の間の前記樹脂に分散され、表面に配置された絶縁膜を含み、粒径が300nm以下である第3金属磁性粒子と、を含む、磁性体本体。 - 前記磁性体本体は、前記磁性体本体内に配置されるコイル部をさらに含み、
前記樹脂と前記第1〜第3金属磁性粒子は、前記コイル部を取り囲むように配置され、前記コイル部の中央部の孔に延長してコア部を形成する、請求項18に記載の磁性体本体。 - 前記樹脂に分散された前記第1〜第3金属磁性粒子の含有量を100wt%とすると、前記第1金属磁性粒子の含有量は70〜79wt%であり、前記第2金属磁性粒子の含有量は10〜20wt%であり、前記第3金属磁性粒子は1〜20wt%である、請求項18または19に記載の磁性体本体。
- 前記絶縁膜は、2層からなり、FeO/CrOである、請求項18〜20の何れか1項に記載の磁性体本体。
- 前記絶縁膜は、3層からなり、FeO/CrO/SiOである、請求項18〜20の何れか1項に記載の磁性体本体。
- 前記絶縁膜の厚さは、前記第3金属磁性粒子の粒径の1〜20%である、請求項18〜22の何れか1項に記載の磁性体本体。
- 樹脂に分散された金属磁性粒子を含み、
前記金属磁性粒子は、
表面に配置された絶縁膜を含み、粒径が300nm以下である第1金属磁性粒子と、
平均粒径が1〜28μmである第2金属磁性粒子と、を含み、
前記第1金属磁性粒子の含有量は当該磁性体組成物の前記金属磁性粒子の含有量を100wt%とすると1〜20wt%であり、
前記第2金属磁性粒子の含有量は当該磁性体組成物の前記金属磁性粒子の含有量を100wt%とすると残量である、磁性体組成物。 - 前記第2金属磁性粒子のうち平均粒径が10〜28μmである金属磁性粒子の含有量は前記磁性体組成物の前記金属磁性粒子の含有量を100wt%とすると70〜79wt%であり、
前記第2金属磁性粒子のうち平均粒径が1〜4.5μmである金属磁性粒子の含有量は前記磁性体組成物の前記金属磁性粒子の含有量を100wt%とすると10〜20wt%である、請求項24に記載の磁性体組成物。 - 前記絶縁膜の厚さは、前記第1金属磁性粒子の粒径の1〜20%である、請求項24または25に記載の磁性体組成物。
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