JP2018030277A - Surface modification device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a surface modification device for removing gas or crystal-shaped debris such as crystals generated in an electric discharging process.SOLUTION: There is provided a surface modification device having a treatment roller 1, an electric discharge electrode 4 facing the treatment roller 1 and an electrode chamber 2 surrounding the electric discharge electrode 4, for a discharge treatment of a surface of a film F transported along the treatment roller 1 by discharging between the treatment roller 1 and the discharge electrode 4 to remove gas or crystal-shaped debris generated in the discharge treatment process. It has an aspiration means V for aspirating the crystal-shaped debris contained in the wake at a downstream side in a transportation direction of the film F than the electric discharge electrode 4.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a surface modification apparatus for modifying the surface of an insulating film by corona discharge treatment.

As this type of apparatus, the surface modification apparatus shown in FIG. 3 is conventionally known.
The apparatus includes a processing roller 1, an electrode chamber 2 disposed opposite to the processing roller 1, and a discharge electrode 4 provided in the electrode chamber 2.
The electrode chamber 2 has a size that covers a predetermined range of the processing roller 1. That is, the opening 2a of the electrode chamber 2 is substantially equal to the axial length of the processing roller 1, and the curvature of the opening 2a at both ends in the axial direction is substantially equal to the curvature of the processing roller 1.

Further, the electrode chamber 2 is provided with three discharge electrodes 4 having a length in the axial direction along the curvature of the processing roller 1.
Each of the discharge electrodes 4 is fixed to the ceiling 2b of the electrode chamber 2 via an electrode holder 3 made of an insulator and a support bar 5.

A plurality of exhaust ports 2c are formed in the ceiling portion 2b, and the exhaust ports 2c are connected to a suction machine (not shown).
Therefore, when a high frequency high voltage is applied to the discharge electrode 4 to cause corona discharge while the film F is conveyed along the processing roller 1, the surface of the film 1 is modified by the discharge energy.
Further, harmful ozone is generated in the process of corona discharge, and this ozone is exhausted from the exhaust port 2c by the suction force of the suction machine.

JP 2010-043215 A

As described above, ozone is generated in the process of corona discharge, and it is also known that crystalline foreign substances are generated in the discharge chamber by reacting with ozone.
However, the suction device of the conventional surface modification apparatus has a suction force set for the purpose of sucking a relatively light gas such as ozone. Therefore, there is a problem that relatively heavy crystalline foreign matters cannot be sucked.

In order to solve this problem, it is conceivable to increase the suction force of the suction machine.
However, if the suction force is too strong, the film F will flutter at the portion corresponding to the opening 2a. For example, if the suction force is too strong, the film F is lifted so as to be peeled off from the processing roller 1, but if it is lifted to some extent, this time, it is pulled back again to the processing roller 1 side by the tension on the film F side. Since the film F is repeatedly pulled up and pulled back in this manner, the film F flutters as described above.

And if the film F is pulled up as mentioned above, the space | interval of the film F and the discharge electrode 4 will become non-constant, and stability of discharge energy will also be impaired. If the discharge energy is not stable, the surface modification process will be non-uniform and the quality of the film F will be reduced.
Moreover, when the film F contacts the discharge electrode 4 when the film F is pulled up, the film F is damaged.

For these reasons, there is a limit to increasing the suction force of the suction machine.
Therefore, in the conventional surface modification apparatus, the crystalline foreign matter in the discharge chamber cannot be removed sufficiently.
The crystalline foreign matter that cannot be removed in this manner flows out of the electrode chamber 2 on the entrained flow generated on the surface of the film that is conveyed at high speed.
In addition, ozone that could not be removed in the electrode chamber 2 sometimes flowed out of the electrode chamber 2 along with the accompanying flow.

In this way, the crystalline foreign matter that flows out along with the entrained flow adheres to the film F as it is, or scatters around in the course of transporting the film F.
Crystalline foreign matter adhering to the film F has a problem that the film F is soiled to deteriorate the quality, and the scattered crystal foreign matter adheres to, for example, an external device and oxidizes it.

  Further, on the downstream side of the transport direction of the film F subjected to the discharge treatment, a guide roller for changing the transport direction of the film F and a nip roller for pressing the flutter of the film F are provided. As described above, the film F When the crystalline foreign matter adheres to the surface, the crystalline foreign matter adheres to or accumulates on the surface of the roller.

Crystalline foreign matter adhering to or depositing on the guide roller or nip roller must be removed positively if it is left untreated because it will contaminate or damage the surface of the film that comes in contact with it.
However, in order to remove the crystalline foreign matter adhering to or accumulating on the guide roller or the nip roller, the conveyance line of the film F must be stopped. Therefore, the operation must be stopped every time the crystalline foreign matter is removed.

In addition, the ozone flowing out from the electrode chamber 2 on the accompanying flow has a risk of adversely affecting the human body.
As described above, in the conventional surface modification apparatus, since ozone and crystalline foreign matters generated in the electrode chamber 2 cannot be removed, various problems have occurred.
An object of the present invention is to provide a surface modification apparatus capable of removing not only exhaust gases such as ozone and Nox but also crystalline foreign matters generated in an electrode chamber.

The present invention provides a processing roller, a discharge electrode facing the processing roller, and an electrode chamber surrounding the discharge electrode, and discharges between the processing roller and the discharge electrode along the processing roller. It is premised on a surface modification device for modifying the film surface to be conveyed.
And the 1st invention was provided with the suction means which sucks gas, such as ozone, and a crystalline foreign material with the entrained flow accompanying the film in the downstream of the conveyance direction of the film rather than the discharge electrode. It is said.

  The second invention is characterized in that the suction means is movable between a set position facing the film conveyed by the processing roller and an offset position retracted from the film position conveyed by the processing roller. Have.

  According to the first aspect of the present invention, the suction means for sucking the gas and the crystalline foreign matter included in the entrained flow generated along the film is provided downstream of the electrode chamber in the film transport direction. The force only needs to be capable of exhausting only a relatively light gas such as ozone. In other words, the suction force in the electrode chamber does not have to be increased more than necessary, so that the suction force is too strong and the film does not flutter. Since the flutter of the film can be suppressed, the problem caused by the flutter does not occur.

Further, since the gas and crystalline foreign matter contained in the entrained flow can be removed by the suction means provided separately from the electrode chamber, the suction force of the suction means has a magnitude necessary for sucking the crystalline foreign matter. Can be set freely. Thus, the suction force of the suction means can be set to a required magnitude, so that the crystalline foreign matter can be reliably removed together with the gas contained in the accompanying flow.
Therefore, it is possible to solve all the problems of ozone outflow from the electrode chamber and harmful effects caused by crystalline foreign matters on the film.

  According to the second invention, when the film is set on the transport line, the work for setting the film on the transport line can be easily performed by retracting the suction means to the offset position. And after setting a film in a conveyance line, if a suction means is returned to a set position, a crystalline foreign material can be removed with gas, such as ozone.

It is the schematic which showed the positional relationship with the process roller in 1st Embodiment, the electrode chamber, and the suction box which is a suction means. It is the perspective view which showed the suction box in 1st Embodiment. It is the schematic which showed the positional relationship of the processing roller and electrode chamber of the conventional surface modification apparatus.

An embodiment of the surface modification apparatus will be described with reference to FIGS.
The present invention is different from the conventional configuration in that a suction means for removing crystalline foreign matters and the like is added at a position different from the electrode chamber 2. The same symbols are used.

As shown in FIG. 1, this surface modification apparatus has, as its premise, a processing roller 1, an electrode chamber 2 disposed to face the processing roller 1, and a discharge electrode 4 provided in the electrode chamber 2. I have.
The electrode chamber 2 has a size that covers a predetermined range of the processing roller 1. That is, the opening 2a of the electrode chamber 2 is substantially equal to the axial length of the processing roller 1, and the curvature of the opening 2a at both ends in the axial direction is substantially equal to the curvature of the processing roller 1.

Further, the electrode chamber 2 is provided with three discharge electrodes 4 having a length in the axial direction along the curvature of the processing roller 1. The discharge electrode 4 is connected to a high voltage source (not shown).
Each of the discharge electrodes 4 is fixed to the ceiling portion 2b of the electrode chamber 2 via an electrode holder 3 made of an insulator and a support rod 5.
There are various types of the discharge electrode 4, but the type is not limited. For example, any of a wire, a needle, a dielectric, or a bar may be used.

A plurality of exhaust ports 2c are formed in the ceiling portion 2b, and a suction machine (not shown) is connected to the exhaust ports 2c.
The film F is conveyed along the processing roller 1 between the electrode chamber 2 and the processing roller 1 configured as described above. When a high frequency high voltage is applied to the discharge electrode 4 for corona discharge, ions are generated by the discharge energy, and the surface of the film F is modified by the ions.
The electrode chamber 2 is provided so as to face the uppermost part of the processing roller 1. However, the electrode chamber 2 may be arranged at any position as long as the electrode chamber 2 faces the processing roller 1. Absent.

Further, it is known that harmful ozone is generated in the process of corona discharge. The generated ozone is exhausted from the exhaust port 2c by the suction force of the suction machine.
Further, since ozone continues to be generated in the process of corona discharge, it is also known that crystalline foreign substances are generated in the discharge chamber 2 by reacting with ozone.

The suction device connected to the electrode chamber 2 has a suction force set for the purpose of sucking a relatively light gas such as ozone. Therefore, relatively heavy crystalline foreign substances cannot be sucked and flow out of the electrode chamber 2 together with the accompanying flow generated by the conveyance of the film F.
The entrained flow includes not only crystalline foreign substances but also gases such as ozone that could not be sucked.

In this embodiment, a suction means V for sucking gas and crystalline foreign matter contained in the accompanying flow is provided downstream of the discharge electrode 4 in the transport direction of the film F.
The suction means V includes a suction box 6 disposed opposite to the processing roller 1 and a suction machine (not shown) connected to the suction box 6.

  The suction box 6 is substantially equal to the axial length of the processing roller 1, and includes a facing surface 6 a that faces the processing roller 1. The curvature of the facing surface 6 a is substantially equal to the curvature of the processing roller 1. ing. A plurality of small holes 7 are formed in the facing surface 6a. In addition, the suction box 6 includes an exhaust port 6 b that continues to the suction device via the pipes 8 and 10.

The suction machine connected to the suction box 6 is operated to make the inside of the suction box 6 have a negative pressure, and gas and crystalline foreign substances contained in the accompanying flow accompanying the surface of the film F moving at a high speed are sucked into the suction box 6. Inhale inside box 6.
Thus, since the suction means V is separated from the electrode chamber 2, the suction force of the suction means V can be increased to remove the gas and the crystalline foreign matter contained in the accompanying flow.

  In this embodiment, the suction box 6 is used. However, any shape may be used as long as it can suck crystalline foreign matters. For example, pipes may be arranged in the axial direction of the processing roller 1.

Further, the suction box 6 is provided so as to be movable on the moving rails 9, 9 shown in FIG. 2, and the suction box 6 is disposed at a set position facing the film F conveyed by the processing roller 1 and from the processing film F. It can be moved between the offset position for retraction.
Therefore, when the film F is set on the transport line, the work can be easily performed by retracting the suction means V to the offset position. And after setting the film F to a conveyance line, if a suction means V is returned to a set position, a crystalline foreign material can be removed with gas, such as ozone.

Reference numeral 11 in the drawing denotes a nip roller provided on the downstream side in the transport direction of the film F with respect to the suction box 6 and presses the film F against the processing roller 1. If the film F is pressed against the processing roller 1 by the nip roller 11, even if the suction force of the suction means V is increased, the film F will not flutter between the processing roller 1 and the facing surface 6a.
Reference numeral 12 denotes a guide roller that suppresses slack in the process of transporting the film F and changes the transport direction.

In this embodiment, since the crystalline foreign matter can be removed by the suction means V, the crystalline foreign matter does not adhere to the nip roller 11 and the guide roller 12.
Since no crystalline foreign matter adheres to the nip roller 11 or the guide roller 12, for example, the nip roller 11 or the guide roller 12 does not need to be cleaned in a short period of time in order to remove the adhering matter. In other words, it is not necessary to stop the transport line in order to clean the rollers 11 and 12.

  This is useful for removing crystalline foreign matters such as gas and crystals generated in the discharge treatment process.

F ... film, 1 ... processing roller, 2 ... electrode chamber, 2a ... opening, 2c ... exhaust port, 4 ... discharge electrode, 6 ... suction box, 6a ... opposing surface, 6b ... exhaust port, 7 ... suction port, 11 ... Nip roller, 12 ... Guide roller

Claims (2)

A film provided with a processing roller, a discharge electrode facing the processing roller, and an electrode chamber surrounding the discharge electrode, discharged between the processing roller and the discharge electrode, and conveyed along the processing roller A surface modification device for modifying the surface of
A surface modification apparatus provided with a suction means for sucking a gas or a crystalline foreign substance contained in the entrained flow downstream of the discharge electrode in the transport direction of the film.   The surface modification apparatus according to claim 1, wherein the suction means is movable between a set position facing the film conveyed by the processing roller and an offset position retracted from the film conveyed by the processing roller. .

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