JP6750870B2 - Surface modification device - Google Patents

Description

The present invention relates to a surface modification device that modifies the surface of an insulating film by corona discharge treatment.

As this type, the surface modification device shown in FIG. 3 is conventionally known.
This apparatus includes a processing roller 1, an electrode chamber 2 arranged to face the processing roller 1, and a discharge electrode 4 provided in the electrode chamber 2.
The electrode chamber 2 has a size that covers a predetermined range of the processing roller 1. That is, the opening 2a of the electrode chamber 2 is made substantially equal to the axial length of the processing roller 1, and the curvature of the openings 2a at both ends in the axial direction is made substantially equal to the curvature of the processing roller 1.

Further, the electrode chamber 2 is provided with three discharge electrodes 4 having a length in the axial direction along the curvature of the processing roller 1.
Each of the discharge electrodes 4 is fixed to the ceiling portion 2b of the electrode chamber 2 via an electrode holder 3 and a support rod 5 made of an insulator.

A plurality of exhaust ports 2c are formed in the ceiling portion 2b, and the exhaust ports 2c are connected to a suction device (not shown).
Therefore, when the high frequency high voltage is applied to the discharge electrode 4 to carry out corona discharge while the film F is conveyed along the processing roller 1, the surface of the film 1 is modified by the discharge energy.
Further, harmful ozone is generated in the process of corona discharge, and this ozone is exhausted from the exhaust port 2c by the suction force of the suction device.

JP, 2010-043215, A

As described above, ozone is generated in the corona discharge treatment process, but it is also known that crystalline foreign matter is generated in the discharge chamber by reacting with ozone.
However, the suction force of the conventional surface reforming apparatus has a suction force set for the purpose of sucking a relatively light gas such as ozone. Therefore, there is a problem that the relatively heavy crystalline foreign matter cannot be sucked.

In order to solve this problem, it is possible to increase the suction force of the suction device.
However, if the suction force is too strong, the film F will flap at the portion corresponding to the opening 2a. For example, when the suction force is too strong, the film F is lifted so as to be peeled off from the processing roller 1, but when it is lifted to some extent, the tension on the film F side pulls it back to the processing roller 1 side again. Since the film F is repeatedly pulled up and pulled back in this manner, the film F flutters as described above.

When the film F is pulled up as described above, the distance between the film F and the discharge electrode 4 is not constant, and the stability of discharge energy is also impaired. If the discharge energy is not stable, the surface modification treatment also becomes non-uniform and the quality of the film F is degraded.
Further, when the film F is pulled up, if the film F contacts the discharge electrode 4, the film F will be damaged.

For this reason, there is a limit to increasing the suction force of the suction device.
Therefore, the conventional surface reforming device cannot sufficiently remove the crystalline foreign matter in the discharge chamber.
The crystalline foreign matter that cannot be removed in this manner flows out from the electrode chamber 2 along with the accompanying flow generated on the surface of the film that is conveyed at high speed.
In addition, ozone that could not be completely removed in the electrode chamber 2 may flow along with the accompanying flow out of the electrode chamber 2.

In this way, the crystalline foreign matter that has flowed out together with the entrained flow adheres to the film F as it is, or scatters around in the course of transporting the film F.
The crystalline foreign matter attached to the film F stains the film F and deteriorates the quality, and the scattered crystalline foreign matter attaches to an external device and oxidizes it.

Further, a guide roller for changing the transport direction of the film F, a nip roller for pressing the flapping of the film F, and the like are provided on the downstream side of the transport direction of the discharged film F. When the crystalline foreign matter adheres to the roller, the crystalline foreign matter adheres to the surface of the roller or accumulates on the surface.

The crystalline foreign matter adhering to or accumulated on the guide roller or the nip roller may stain the contacting film surface or damage the surface if left unattended, and therefore must be actively removed.
However, in order to remove the crystalline foreign matter adhering to or accumulated on the guide roller or the nip roller, the transport line of the film F must be stopped, so the operation must be stopped every time the crystalline foreign matter is removed.

Further, the ozone flowing out from the electrode chamber 2 along with the accompanying flow may have a harmful effect on the human body.
As described above, in the conventional surface reforming apparatus, various problems occur because the ozone and the crystalline foreign matter generated in the electrode chamber 2 cannot be removed.
The purpose of this invention, the exhaust of ozone and N O x or the like of the gas, of course, is to provide a surface modification apparatus also crystalline foreign matter generated in the electrode chamber can be removed.

The present invention provides a processing roller, a discharge electrode facing the processing roller, and an electrode chamber surrounding the discharge electrode, and discharges between the processing roller and the discharge electrode. It is premised on a surface reforming device that reforms the surface of a film being conveyed.
The first invention, on the downstream side in the transport direction of the film than the discharge electrodes, a suction means for sucking the gases and crystalline foreign substances such as ozone with entrained flow entrained in the film, the suction means Consists of a suction box and a suction machine. The suction box has a facing surface formed of a curved surface that faces the processing roller along the curvature of the processing roller, and a plurality of small holes are formed on the entire facing surface. It has a feature.

A second invention is characterized in that the suction means is movable between a set position facing the film conveyed by the processing roller and an offset position retracted from the film position conveyed by the processing roller. Have.

According to the first aspect of the present invention, the suction means for sucking gas or crystalline foreign matter contained in the entrained flow generated along the film is provided on the downstream side of the electrode chamber in the transport direction of the film. The force has only to have the ability to exhaust only relatively light gas such as ozone. In other words, since the suction force in the electrode chamber does not need to be increased more than necessary, the suction force is not too strong and the film does not flap. Since the flapping of the film can be suppressed, the problem caused by the flapping does not occur.

Further, since the gas and the crystalline foreign matter contained in the entrained flow can be removed by the suction means provided separately from the electrode chamber, the suction force of the suction means has a magnitude necessary for sucking the crystalline foreign matter. It can be set freely. In this way, the suction force of the suction means can be set to a required magnitude, so that the crystalline foreign matter can be reliably removed together with the gas contained in the entrained flow.
Therefore, it is possible to solve all the problems such as the outflow of ozone from the electrode chamber and the harmful effects of the crystalline foreign matter on the film.

According to the second aspect, when the film is set on the transport line, if the suction means is retracted to the offset position, the work for setting the film on the transport line becomes easy. After setting the film on the transport line, the crystalline foreign matter can be removed together with the gas such as ozone by returning the suction means to the setting position.

It is the schematic which showed the positional relationship with the processing box in 1st Embodiment, the electrode chamber, and the suction box which is a suction means. It is the perspective view which showed the suction box in 1st Embodiment. It is the schematic which showed the positional relationship of the processing roller and electrode chamber of the conventional surface modification apparatus.

An embodiment of this surface modification device will be described with reference to FIGS.
The present invention is different from the conventional configuration in that a suction means for removing crystalline foreign matter or the like is added at a position different from that of the electrode chamber 2. The same reference numerals are used.

As shown in FIG. 1, this surface reforming apparatus is premised on a treatment roller 1, an electrode chamber 2 arranged to face the treatment roller 1, and a discharge electrode 4 provided in the electrode chamber 2. I have it.
The electrode chamber 2 has a size that covers a predetermined range of the processing roller 1. That is, the opening 2a of the electrode chamber 2 is made substantially equal to the axial length of the processing roller 1, and the curvature of the openings 2a at both ends in the axial direction is made substantially equal to the curvature of the processing roller 1.

Further, the electrode chamber 2 is provided with three discharge electrodes 4 having a length in the axial direction along the curvature of the processing roller 1. A high voltage source (not shown) is connected to the discharge electrode 4.
Then, each of the discharge electrodes 4 is fixed to the ceiling portion 2b of the electrode chamber 2 via the electrode holder 3 and the support rod 5 made of an insulator.
There are various types of the discharge electrode 4, but the type is not limited. For example, it may be a wire, a needle, a dielectric or a bar.

A plurality of exhaust ports 2c are formed in the ceiling portion 2b, and a suction device (not shown) is connected to the exhaust ports 2c.
The film F is conveyed along the processing roller 1 between the electrode chamber 2 and the processing roller 1 configured as described above. Then, when a high frequency high voltage is applied to the discharge electrode 4 to cause corona discharge, the discharge energy generates ions, and the ions modify the surface of the film F.
The electrode chamber 2 is provided so as to face the uppermost portion of the processing roller 1. However, the electrode chamber 2 may be arranged at any position as long as it faces the processing roller 1. Absent.

Further, it is known that harmful ozone is generated in the process of corona discharge treatment. The ozone thus generated is attracted by the suction force of the suction device and is exhausted from the exhaust port 2c.
Further, it is known that ozone continues to be generated during the corona discharge treatment process, and thus reacts with this ozone to generate crystalline foreign matter in the discharge chamber 2.

The suction force of the suction device connected to the electrode chamber 2 is set for the purpose of suctioning a relatively light gas such as ozone. Therefore, the relatively heavy crystalline foreign matter cannot be sucked, and flows out from the electrode chamber 2 together with the accompanying flow generated by the transport of the film F.
The entrained flow contains not only the crystalline foreign matter but also a gas such as ozone that could not be completely sucked.

In this embodiment, a suction means V for sucking gas or crystalline foreign matter contained in the entrained flow is provided downstream of the discharge electrode 4 in the transport direction of the film F.
The suction means V is composed of a suction box 6 arranged to face the processing roller 1 and a suction device (not shown) connected to the suction box 6.

The suction box 6 has a length substantially equal to the axial length of the processing roller 1 and includes a facing surface 6a facing the processing roller 1. The facing surface 6a has a curvature substantially equal to that of the processing roller 1. ing. A plurality of small holes 7 are formed on the facing surface 6a. Further, the suction box 6 is provided with an exhaust port 6b which is continuous with the suction machine via the pipes 8 and 10.

The suction machine connected to the suction box 6 is operated to make the inside of the suction box 6 a negative pressure, and the gas and the crystalline foreign matter contained in the entrained flow accompanying the surface of the film F moving at high speed are sucked into Inhale inside Box 6.
Since the suction means V is separated from the electrode chamber 2 in this way, the suction force of the suction means V can be increased to remove the gas and crystalline foreign matter contained in the entrained flow.

Further, the suction box 6 is movably provided on the moving rails 9 shown in FIG. 2, and the suction box 6 is set at a set position facing the film F conveyed by the processing roller 1 and from the processing film F. It is movable between the retracted offset position.
Therefore, when the film F is set on the transport line, the work can be facilitated if the suction means V is retracted to the offset position. Then, after the film F is set on the transport line, the crystalline foreign matter can be removed together with a gas such as ozone by returning the suction means V to the set position.

Reference numeral 11 in the drawing denotes a nip roller provided on the downstream side of the suction box 6 in the transport direction of the film F, and presses the film F against the processing roller 1. If the film F is pressed against the processing roller 1 by the nip roller 11, the film F will not flutter between the processing roller 1 and the facing surface 6a even if the suction force of the suction means V is increased.
Further, reference numeral 12 is a guide roller that holds slack in the process of transporting the film F and changes the transport direction.

In this embodiment, since the crystalline foreign matter can be removed by the suction means V, the crystalline foreign matter does not adhere to the nip roller 11 or the guide roller 12.
Since the crystalline foreign matter does not adhere to the nip roller 11 and the guide roller 12, for example, it is not necessary to clean the nip roller 11 and the guide roller 12 in a short period of time in order to remove the adhered matter. In other words, the transport line does not have to be stopped in order to clean the rollers 11 and 12.

This is useful when removing crystalline foreign substances such as gas and crystals generated in the discharge treatment process.

F... Film, 1... Processing roller, 2... Electrode chamber, 2a... Opening part, 2c... Exhaust port, 4... Discharge electrode, 6... Suction box, 6a... Opposing surface, 6b... Exhaust port, 7... Suction port, 11 … Nip rollers, 12… Guide rollers

Claims (2)

A processing roller, a discharge electrode facing the processing roller, and an electrode chamber surrounding the discharge electrode are provided, a film is discharged along the processing roller by causing discharge between the processing roller and the discharge electrode. A surface modification device for modifying the surface of
Downstream of the discharge electrode in the transport direction of the film, a suction means for sucking gas or crystalline foreign matter contained in the entrained flow is provided ,
The suction means is
Consisting of a suction box arranged to face the processing roller, and a suction machine connected to this suction box,
The suction box is
A surface reforming apparatus having a facing surface formed of a curved surface facing the processing roller along the curvature of the processing roller, and having a plurality of small holes formed on the entire facing surface . The surface reforming apparatus according to claim 1, wherein the suction means is movable between a set position facing the film conveyed by the processing roller and an offset position retracted from the film conveyed by the processing roller. ..

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