JP2018016870A - Rotary plating device - Google Patents

Rotary plating device Download PDF

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JP2018016870A
JP2018016870A JP2016150000A JP2016150000A JP2018016870A JP 2018016870 A JP2018016870 A JP 2018016870A JP 2016150000 A JP2016150000 A JP 2016150000A JP 2016150000 A JP2016150000 A JP 2016150000A JP 2018016870 A JP2018016870 A JP 2018016870A
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workpiece
holding
rotation
rotary
plating apparatus
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JP6542168B2 (en
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孝志 上市
Takashi Ueichi
孝志 上市
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Abstract

PROBLEM TO BE SOLVED: To provide a rotary plating device conducting electroplating by impregnating a workpiece into a plating liquid and capable of plating treatment on the workpiece without unevenness.SOLUTION: There is provided a rotary plating device conducting electroplating by impregnating a workpiece into a plating liquid, having a holding part 28 for holding the workpiece detachably, and a rotation derive device 2 for rotating the workpiece at a state that the workpiece is impregnated into the plating liquid always or periodically, the holding part 28 has a structure for holding the workpiece at a state that the workpiece is positioned around an axis of a rotation axis by the rotation derive device 2.SELECTED DRAWING: Figure 2

Description

本発明は、ワークをメッキ槽内で回転作動させながらメッキ処理を行う回転メッキ装置に関する。   The present invention relates to a rotary plating apparatus that performs plating while rotating a workpiece in a plating tank.

ワークにメッキ処理をするメッキ装置として、ワークを陰極としてメッキ液が貯留されたメッキ槽に浸漬させた状態で静止させ、電圧を印加することによってワークの表面に金属膜を電解析出させることができるものが従来公知であり、ワークに耐食用の金属層を形成したり、ワークに砥石を電着させたり、電子部品に電極部を形成したりすることができる。   As a plating apparatus that performs plating on a workpiece, the workpiece can be kept stationary while immersed in a plating tank in which a plating solution is stored with the workpiece as a cathode, and a metal film is electrolytically deposited on the surface of the workpiece by applying a voltage. What can be made is conventionally known, and a corrosion-resistant metal layer can be formed on the workpiece, a grindstone can be electrodeposited on the workpiece, or an electrode portion can be formed on the electronic component.

また、上記メッキ装置の一種として、回転軸に吊るすように支持したワークをメッキ槽内のメッキ液に浸漬させ、ワークを回転軸回りに軸回転させつつ、該回転軸をメッキ槽内で揺動させることによって、ワークに施されるメッキ層を均一にする特許文献1に示す回転メッキ装置が従来公知である。   In addition, as a kind of the above plating apparatus, a work supported to be hung on a rotating shaft is immersed in a plating solution in the plating tank, and the rotating shaft is swung in the plating tank while rotating the work around the rotating shaft. Conventionally, a rotary plating apparatus shown in Patent Document 1 that makes a plating layer applied to a workpiece uniform is known.

特開平5−77168号公報Japanese Patent Laid-Open No. 5-77168

上記文献によれば、ワークを軸回転させることによりメッキされる面の角度を順次変化させることができるため、ワークの表面に形成されるメッキ厚のムラを低減できるものであるが、該メッキ装置は、回転軸に吊下げられるように支持される単一のワークを、メッキ槽内で回転軸を軸心として軸回転させるものであるため、ワークの被メッキ面が回転軸に近い箇所と遠い箇所とで、メッキ槽内での移動範囲に大きな差があり、メッキの均一化が十分ではない場合があるという課題があった。   According to the above document, since the angle of the surface to be plated can be sequentially changed by rotating the workpiece, the unevenness of the plating thickness formed on the surface of the workpiece can be reduced. Is to rotate a single workpiece supported so as to be suspended from the rotation axis around the rotation axis in the plating tank, so that the surface to be plated of the workpiece is far from the position close to the rotation axis. There is a large difference in the range of movement in the plating tank, and there is a problem in that uniform plating may not be sufficient.

本発明では、ワークをメッキ液に浸して電気めっきを行う回転メッキ装置において、ワークにムラなくメッキ処理することができる回転メッキ装置を提供することを課題としている。   It is an object of the present invention to provide a rotary plating apparatus capable of plating a work without unevenness in a rotary plating apparatus that performs electroplating by immersing a workpiece in a plating solution.

本発明は上記課題を解決するため、第1に、ワークをメッキ液に浸して電気メッキを行う回転メッキ装置であって、上記ワークを着脱可能に保持させる保持部28と、上記ワークが常時又は周期的にメッキ液に浸される状態で該ワークを回転させる回転駆動装置2とを備え、前記保持部28は、上記回転駆動装置2による回転軸の軸回りに上記ワークを位置させた状態で該ワークを保持する構造を有することを特徴としている。   In order to solve the above-mentioned problems, the present invention is a rotary plating apparatus that performs electroplating by immersing a workpiece in a plating solution. The holding portion 28 detachably holds the workpiece, and the workpiece is always or A rotation drive device 2 that rotates the workpiece in a state where it is periodically immersed in a plating solution, and the holding portion 28 is in a state where the workpiece is positioned around the axis of the rotation axis of the rotation drive device 2. It has a structure for holding the workpiece.

第2に、前記回転軸に沿い且つ前記回転駆動装置2によって回転軸の軸回りに回転駆動される支持杆27を備え、前記保持部28は、上記支持杆27に一体的に設けられたことを特徴としている。   Secondly, a support rod 27 that is driven to rotate about the axis of the rotation shaft by the rotation driving device 2 along the rotation shaft is provided, and the holding portion 28 is provided integrally with the support rod 27. It is characterized by.

第3に、前記保持部28が上記支持杆27から放射状に突出形成されたことを特徴としている。   Thirdly, the holding portion 28 is characterized in that it protrudes radially from the support rod 27.

第4に、前記支持杆27を着脱自在に設けたことを特徴としている。   Fourth, the support rod 27 is detachably provided.

第5に、前記保持部28を上記支持杆27の軸方向に複数並べて設けたことを特徴としている。   Fifth, a plurality of the holding portions 28 are provided side by side in the axial direction of the support rod 27.

第6に、前記支持杆27を、上記回転軸の軸回りに複数並べて設けたことを特徴としている。   Sixth, a plurality of the support rods 27 are provided around the rotation axis.

第7に、前記保持部28は、上記ワークの回転中、該ワークとの接触部分が少なくとも一部で変更されるように、ガタを有した状態で該ワークを保持する構造を有することを特徴としている。   Seventh, the holding portion 28 has a structure for holding the work with a backlash so that a contact portion with the work is changed at least partially during the rotation of the work. It is said.

第8に、電圧を印加する印加装置と、該印加装置の陰極と保持部28とを電気的に接続する接続回路4とを備え、前記保持部28は、上記ワークを前記印加装置の陰極と電気的に接続された状態で保持するように構成されたことを特徴としている。   Eighth, an application device that applies a voltage, and a connection circuit 4 that electrically connects the cathode of the application device and the holding unit 28, and the holding unit 28 connects the workpiece to the cathode of the application device. It is characterized by being configured to hold in an electrically connected state.

第9に、前記接続回路4の少なくとも一部は上記回転軸上に形成されたことを特徴としている。   Ninth, at least a part of the connection circuit 4 is formed on the rotating shaft.

上記構成によれば、回転駆動装置によってメッキ液に浸漬された状態で回転されるワークは、回転駆動装置の回転軸上ではなく、回転軸の軸回りに位置させることにより、ワーク全体がメッキ液内で回転軸を軸心として大きく円軌道を描くように移動するため、ワークに施されるメッキをより均一に形成することができる。   According to the above configuration, the work rotated while being immersed in the plating solution by the rotary drive device is positioned not on the rotary shaft of the rotary drive device but around the axis of the rotary shaft, so that the entire workpiece is plated. Since the plate moves so as to draw a large circular orbit around the rotation axis, the plating applied to the workpiece can be formed more uniformly.

また、前記回転軸に沿い且つ前記回転駆動装置によって回転軸の軸回りに回転駆動される支持杆を備え、前記保持部は、上記支持杆に一体的に設けられたものによれば、前記保持部へのワークの着脱作業をよりスムーズにすることができる。   According to another aspect of the present invention, there is provided a support rod that is driven along the rotation axis and about the axis of the rotation shaft by the rotation driving device, and the holding portion is provided integrally with the support rod. The work of attaching and detaching the workpiece to the part can be made smoother.

また、前記保持部が上記支持杆から放射状に突出形成されたものによれば、ワークを保持するためのスペースを容易に確保できるとともに、保持部によって保持されるワーク全体が、メッキ液内をより大きな円軌跡上を移動するため、よりメッキのムラが出来難くなる。   In addition, according to the holding portion formed so as to protrude radially from the support rod, a space for holding the workpiece can be easily secured, and the entire workpiece held by the holding portion can be more easily contained in the plating solution. Since it moves on a large circular locus, uneven plating becomes more difficult.

なお、前記支持杆を着脱自在に設けたものによれば、回転駆動装置側へのワークの着脱が容易になるとともに、支持杆のみを変更することによって様々な種類のワークを保持できるように構成することができるため、コストも低く抑えることができる。   In addition, according to what provided the said support rod so that attachment or detachment was possible, it was comprised so that various types of workpiece | work could be hold | maintained by changing only a support rod while it became easy to attach or detach the workpiece | work to the rotation drive device side. Therefore, the cost can be kept low.

また、前記保持部を上記支持杆の軸方向に複数並べて設けたものによれば、一度に多数のワークをメッキ処理することができる。   Moreover, according to what provided the said holding part in multiple numbers in the axial direction of the said support rod, many workpiece | work can be plated at once.

また、前記支持杆を、上記回転軸の軸回りに複数並べて設けたものによれば、一度により多くのワークのメッキ処理を行うことができるとともに、対応する支持杆を別途に設けることで、形状の異なるワークも一度にメッキ処理を行うことができる。   Moreover, according to what provided the said support rod in multiple numbers around the axis | shaft of the said rotating shaft, while being able to perform the plating process of more workpiece | work at once, it can be formed by providing a corresponding support rod separately. Different workpieces can be plated at a time.

なお、前記保持部は、上記ワークの回転中、該ワークとの接触部分が少なくとも一部で変更されるように、ガタを有した状態で該ワークを保持する構造を有するものによれば、前記保持部とワークとが接触する箇所にもメッキ処理をすることができる。   In addition, according to the holding portion having a structure that holds the work in a state of having a backlash so that the contact portion with the work is changed at least partially during the rotation of the work, Plating treatment can also be performed at locations where the holding portion and the workpiece come into contact.

また、電圧を印加する印加装置と、該印加装置の陰極と保持部とを電気的に接続する接続回路とを備え、前記保持部は、上記ワークを前記印加装置の陰極と電気的に接続された状態で保持するように構成されたものによれば、ワークを前記保持部に保持させることによって自動的にワークにも印加することができる。   And an application device that applies a voltage, and a connection circuit that electrically connects a cathode of the application device and a holding unit, and the holding unit electrically connects the workpiece to the cathode of the application device. According to what was comprised in the state hold | maintained, it can apply also to a workpiece | work automatically by hold | maintaining a workpiece | work to the said holding | maintenance part.

また、前記接続回路の少なくとも一部は上記回転軸上に形成されたものによれば、前記回転軸回りの構成と、接続回路の一部の部材とを兼用することができるため、部品点数を減らしてコストを抑えることができるとともに、よりコンパクトに構成することができる。   In addition, according to the structure in which at least a part of the connection circuit is formed on the rotation shaft, the configuration around the rotation shaft and a part of the connection circuit can be used together. The cost can be reduced by reducing it, and the structure can be made more compact.

本発明を適用した回転メッキ装置を示す正面図である。It is a front view which shows the rotary plating apparatus to which this invention is applied. 回転メッキ装置のA−A断面図である。It is AA sectional drawing of a rotary plating apparatus. (A)及び(B)は、保持部を示した平面図及び正面図である。(A) And (B) is the top view and front view which showed the holding | maintenance part. 配線機構の構成を示した要部断面図である。It is principal part sectional drawing which showed the structure of the wiring mechanism. 配線機構の構成を示した組立図である。It is an assembly drawing which showed the structure of the wiring mechanism. 回転支持部の構成を示した要部側面図である。It is the principal part side view which showed the structure of the rotation support part.

図1は、本発明を適用した回転メッキ装置を示す正面図であり、図2は、回転メッキ装置のA−A断面図であり、図3(A)及び(B)は、保持部を示した平面図及び正面図である。図示される回転メッキ装置は、メッキ処理されるワーク(被メッキ体)Wが取付支持される支持体3と、該支持体3を回転作動させる回転駆動装置2と、該回転駆動装置2を支持する枠体1と、該枠体1側から前記支持体3に支持されたワークWに電圧を印加するための導電機構(接続回路)4とを備え、ワークWをメッキ液内で回転させながらメッキ処理を行うことができるように構成されている。   FIG. 1 is a front view showing a rotary plating apparatus to which the present invention is applied, FIG. 2 is a cross-sectional view taken along line AA of the rotary plating apparatus, and FIGS. 3A and 3B show a holding portion. It is a plan view and a front view. The illustrated rotary plating apparatus includes a support 3 on which a workpiece (to-be-plated) W to be plated is mounted and supported, a rotary drive device 2 that rotates the support 3, and supports the rotary drive device 2. And a conductive mechanism (connection circuit) 4 for applying a voltage to the workpiece W supported by the support 3 from the frame body 1 side, while rotating the workpiece W in the plating solution. It is comprised so that a plating process can be performed.

前記枠体1は、上下方向に延設された左右一対の側板6,6と、対向配置された一対の側板6,6の上端側同士を連結する上部連結杆7と、一対の側板6,6の下端側同士を連結する前後一対の下部連結杆8,8と、一対の側板6,6の上部側に架渡される上部支持板9とから構成されており、各部材が樹脂製の素材で構成されている。なお、枠体1を構成する各部材は、導電性のない部材であれば他の部材であっても良い。   The frame 1 includes a pair of left and right side plates 6, 6 extending in the vertical direction, an upper connecting rod 7 that connects upper end sides of a pair of side plates 6, 6 that are opposed to each other, and a pair of side plates 6, 6. 6 is composed of a pair of front and rear lower connecting rods 8 and 8 for connecting the lower end sides of the base plate 6 and an upper support plate 9 spanned on the upper side of the pair of side plates 6 and 6, each member being a resin material It consists of In addition, as long as each member which comprises the frame 1 is a member without electroconductivity, another member may be sufficient.

前記回転駆動装置2は、対向配置された一対の側板6,6の対向面側に回転可能に軸支された回転支持部11,11と、該回転支持部11に回転動力を伝動するギヤ伝動機構12と、前記上部支持板9に載置されたモータ13とを備え、該モータ13から出力される駆動力によって回転支持部11をメッキ液内で回転駆動させることができるように構成されている。各構成について以下説明する。   The rotational driving device 2 includes rotational support portions 11 and 11 that are rotatably supported on opposing surfaces of a pair of opposed side plates 6 and 6, and a gear transmission that transmits rotational power to the rotational support portion 11. A mechanism 12 and a motor 13 mounted on the upper support plate 9 are provided, and the rotation support portion 11 can be rotationally driven in the plating solution by a driving force output from the motor 13. Yes. Each configuration will be described below.

前記モータ13は、前記上部支持板9に載置固定され、前記ギヤ伝動機構12側に動力を出力する出力ギヤ14と、該出力ギヤ14から出力する駆動力(回転速度)の調整操作を行う操作部16とを備え、側板6の左右一方側(図示する例では左側)に寄せた位置で、前記上部支持板9の上面側に支持固定されている(図1参照)。   The motor 13 is mounted and fixed on the upper support plate 9, and adjusts the output gear 14 that outputs power to the gear transmission mechanism 12 and the driving force (rotational speed) output from the output gear 14. The operation unit 16 is provided, and is supported and fixed on the upper surface side of the upper support plate 9 at a position close to the left and right sides (left side in the illustrated example) of the side plate 6 (see FIG. 1).

該モータ13は、操作具16によって回転速度を自由に調整することができるように構成されており、メッキ処理をするワークWの形状・種類、メッキ液の濃度等に合わせて、前記回転駆動装置による回転速度を調整、変更することができる。なお、図示する例ではDCモータが用いられているが、任意に回転速度が調整できるものであればモータの種類は問わない。   The motor 13 is configured such that the rotation speed can be freely adjusted by the operation tool 16, and the rotation driving device is adapted to the shape / type of the workpiece W to be plated, the concentration of the plating solution, and the like. The rotation speed can be adjusted and changed. In the example shown in the figure, a DC motor is used, but the type of motor is not limited as long as the rotational speed can be arbitrarily adjusted.

前記ギヤ伝動機構12は、前記モータ13が配置されている左右一方側(図示する例では左側)の側板6の内面側に設けられており、側板6に沿って上下方向に延設された方形板状のギヤ支持板17と、前記モータ13の出力軸14からの動力がギヤ伝動される第1伝動ギヤ18と、該第1伝動ギヤ18から伝動された動力がギヤ伝動される第2伝動ギヤ19と、該第2伝動ギヤ19から伝動された動力を前記回転支持部11側へとギヤ伝動する第3伝動ギヤ21とから構成され、各伝動ギヤ18,19,21は、側板6の内面側のギヤ支持板17に回転駆動可能に支持されている。すなわち、各伝動ギヤ18,19,21は、モータ13の出力ギヤ14側から、側板6下部の回転支持部11側へと駆動力を伝動できるように上下方向に並べて配置されている(図1及び図2参照)。   The gear transmission mechanism 12 is provided on the inner surface side of the side plate 6 on one of the left and right sides (left side in the illustrated example) where the motor 13 is disposed, and extends in the vertical direction along the side plate 6. A plate-like gear support plate 17, a first transmission gear 18 to which power from the output shaft 14 of the motor 13 is transmitted, and a second transmission to which power transmitted from the first transmission gear 18 is transmitted. The gear 19 and a third transmission gear 21 that transmits the power transmitted from the second transmission gear 19 to the rotation support portion 11 side are configured. The transmission gears 18, 19, 21 are provided on the side plate 6. It is supported by the gear support plate 17 on the inner surface side so as to be rotationally driven. That is, the transmission gears 18, 19, and 21 are arranged side by side in the vertical direction so that the driving force can be transmitted from the output gear 14 side of the motor 13 to the rotation support portion 11 side below the side plate 6 (FIG. 1). And FIG. 2).

前記回転支持部11は、前記ギヤ伝動機構12(第3伝動ギヤ21)から伝動される動力がギヤ伝動される円板状の回転体22と、該回転体22を側板6側に回転可能に軸支する軸部24と、回転体22側に設けられて前記支持体3が着脱可能に構成された取付部23とから構成されている。また、該回転支持部11は、一対の側板6,6の下部側にそれぞれ設けられており、一対の回転支持部11が向い合うように配置されている(図1参照)。   The rotation support portion 11 includes a disk-shaped rotating body 22 to which power transmitted from the gear transmission mechanism 12 (third transmission gear 21) is transmitted, and the rotating body 22 is rotatable to the side plate 6 side. The shaft portion 24 is pivotally supported, and the mounting portion 23 is provided on the rotating body 22 side and is configured to be detachable from the support body 3. The rotation support portions 11 are provided on the lower sides of the pair of side plates 6 and 6, respectively, and are arranged so that the pair of rotation support portions 11 face each other (see FIG. 1).

該取付部23は、回転体22の内面中心側に配置された円柱状の密閉カバー26の周面に複数(図示する例では、8箇所)設けられており、各取付部23は、前記密閉カバー26の外周(円軌跡)に沿って等間隔で配置されている(図2参照)。すなわち、該取付部23は、軸部24の回転軸の軸心上から所定の半径分離れた位置に配置されており、各取付部23が軸部24の回転軸を軸心として上下前後方向に円運動するように構成されている。   A plurality (8 in the illustrated example) of the mounting portions 23 are provided on the peripheral surface of the cylindrical sealing cover 26 disposed on the inner surface center side of the rotating body 22. It arrange | positions at equal intervals along the outer periphery (circular locus | trajectory) of the cover 26 (refer FIG. 2). That is, the attachment portion 23 is disposed at a position separated from the axis of the rotation axis of the shaft portion 24 by a predetermined radius, and each attachment portion 23 is in the vertical and longitudinal directions with the rotation axis of the shaft portion 24 as the axis. It is configured to move circularly.

また、該取付部23は、支持体3が取付けられる取付面が回転軸と平行となるようにL字状に屈曲形成されており、該取付面に支持体3の端部側が着脱可能にボルト固定することができる固定孔23aが穿設されている。   The mounting portion 23 is bent in an L shape so that the mounting surface to which the support 3 is mounted is parallel to the rotation axis, and the bolt 3 is attached to the mounting surface so that the end of the support 3 can be attached and detached. A fixing hole 23a that can be fixed is formed.

さらに、側板6,6に設けられた左右一対の回転支持部11,11は、左右方向に延設された前記支持体3の両端側が左右の回転支持部11の取付部23,23にそれぞれ取付固定されることにより、一体的に回転するように構成されている。すなわち、前記モータ13から出力される駆動力により、左右一方側(図示する例では左側)の回転支持部11(回転体22)を回転駆動させることによって、左右他方側の回転支持部11,11も同時に一体回転させることができる。   Further, the pair of left and right rotation support portions 11, 11 provided on the side plates 6, 6 are attached to the attachment portions 23, 23 of the left and right rotation support portions 11 on both ends of the support body 3 extending in the left-right direction. By being fixed, it is configured to rotate integrally. That is, the rotation support portions 11 and 11 on the left and right other sides are driven by rotating the rotation support portion 11 (rotating body 22) on the left and right sides (left side in the illustrated example) by the driving force output from the motor 13. Can also be rotated together.

前記支持体3は、左右方向に延設された支持杆27と、該支持杆27の中途部に設けられたワークWを保持するための保持部28と、該支持杆27の両端側に形成された前記取付部23とボルト固定されるボルト固定部31とを備え、左右の回転支持部11(取付部23)側に複数本(図示する例では8つ)が着脱可能に構成されている(図3参照)。   The support 3 is formed on both ends of the support rod 27, a support rod 27 extending in the left-right direction, a holding portion 28 for holding the workpiece W provided in the middle portion of the support rod 27, and the support rod 27. And a plurality of bolts (eight in the illustrated example) are detachable on the left and right rotation support portions 11 (mounting portions 23) side. (See FIG. 3).

該保持部28は、図示する例では、方形板状のワークWの角部をそれぞれ係止する4つの保持片29によって構成されており、支持杆27の長手方向に複数(図示する例では5つ)のワークWが着脱可能に保持できるように複数並べて設けられている。   In the example shown in the figure, the holding part 28 is composed of four holding pieces 29 that respectively lock the corners of the rectangular plate-like workpiece W, and a plurality of holding parts 28 (5 in the example shown in the figure) are arranged in the longitudinal direction of the support rod 27. A plurality of workpieces W are provided side by side so as to be detachably held.

具体的に説明すると、該保持片29は、先端側に方形状のワークWの角部が挿通される輪部30が形成されており、支持杆27の延設方向に並べられて輪部30が対向するように配置された一対の第1保持片と29A,29A、支持杆27の直交方向から突出形成されて輪部30が対向するようにして配置された一対の第2保持片29B,29Bとから構成されている。これにより、方形板状のワークWの四隅を各保持片の輪部30によって中央に向って挟むように保持することができる。   More specifically, the holding piece 29 is formed with a ring portion 30 through which a corner portion of the rectangular workpiece W is inserted at the tip end side, and is arranged in the extending direction of the support rod 27 to form the ring portion 30. A pair of first holding pieces 29A and 29A, which are arranged so as to face each other, and a pair of second holding pieces 29B which are formed so as to protrude from the orthogonal direction of the support rod 27 and so that the ring portion 30 faces each other. 29B. Thereby, it can hold | maintain so that the four corners of the square-shaped workpiece W may be pinched | interposed by the ring part 30 of each holding piece toward the center.

また、該保持部28は、支持杆27が前記取付部23側に取付けられた際に、回転支持部11(回転板22)の回転軸の軸心から放射状に突出する方向に設けられている(図2参照)。このため、回転メッキ装置に取付け可能なワークが、左右一対の回転駆動体11,11と、この間に設けた支持体3(支持杆27)とによって、円柱状に構成された回転体の周面に複数個(図示する例では計40個)配置される。   Further, the holding portion 28 is provided in a direction that protrudes radially from the axis of the rotation shaft of the rotation support portion 11 (rotation plate 22) when the support rod 27 is attached to the attachment portion 23 side. (See FIG. 2). For this reason, the work which can be attached to the rotary plating apparatus is a peripheral surface of a rotary body configured in a columnar shape by a pair of left and right rotary drive bodies 11 and 11 and a support body 3 (support rod 27) provided therebetween. (A total of 40 in the illustrated example) are arranged.

これにより、保持部28によって着脱されるワークWを、よりスペース効率良く配置することができるとともに、該ワークWをメッキ液内において回転支持部11の回転軸を軸心に、より大きく回転移動させることができるため、各ワークWのメッキ処理の条件にムラがなくなり、より均一なメッキ処理をすることができる。   As a result, the work W to be attached / detached by the holding part 28 can be arranged more efficiently in space, and the work W can be rotated and moved more greatly in the plating solution around the rotation axis of the rotation support part 11. Therefore, there is no unevenness in the plating process conditions for each workpiece W, and a more uniform plating process can be performed.

また、該保持部28(保持片29)は、若干弾性を有する部材により構成されており、対向する保持片29を広げるように曲げることでワークWの着脱作業を容易にすることができる。   In addition, the holding portion 28 (holding piece 29) is made of a slightly elastic member, and the work W can be easily attached and detached by bending the holding pieces 29 facing each other.

さらに、該保持部28(保持片29)は、ガタを持たせた状態でワークWが保持されるように構成されている。言い換えると、該保持部に28よって保持されたワークWが、保持された状態で、輪部30内を上下前後左右方向に若干動くことが許容されるように構成されている。   Further, the holding portion 28 (holding piece 29) is configured to hold the workpiece W in a state of having a backlash. In other words, the work W held by the holding portion 28 is configured to be allowed to move slightly up and down, front and rear, left and right in the ring portion 30 while being held.

該構成によれば、該保持部28によって保持されたワークWが、前記回転支持部11の軸部24回りに回転駆動されると、該ワークWの四隅と保持片29(輪部30)との接触箇所が回転位置に応じて随時変更されるようになるめ、ワークWの全面にメッキ処理をすることができる。   According to this configuration, when the workpiece W held by the holding portion 28 is rotationally driven around the shaft portion 24 of the rotation support portion 11, the four corners of the workpiece W and the holding pieces 29 (ring portions 30) Since the contact location is changed as needed according to the rotational position, the entire surface of the workpiece W can be plated.

ちなみに、該保持部28は、図示された形状の保持片29によって構成されたものに限られない。例えば、ワークWを1箇所若しくは複数個所で常時挟持する保持クリップ(図示しない)や、かご状の保持籠(図示しない)に入れるものや、ワークに形成された孔や溝に係止する係止片等であっても良く、メッキ処理の対象となるワークWが着脱可能に構成されたものであればよい。   Incidentally, the holding portion 28 is not limited to the one constituted by the holding piece 29 having the illustrated shape. For example, a holding clip (not shown) that always holds the work W at one place or a plurality of places, a cage-like holding hook (not shown), or a lock that locks into a hole or groove formed in the work It may be a piece or the like, as long as the workpiece W to be plated is configured to be detachable.

すなわち、メッキ処理するワークWの形状を変更する場合には、回転支持部11から着脱可能な支持体3のみを、変更後の形状のワークWを保持できる支持体3に変更することによって、対応することができるため、回転メッキ装置全体を変更する必要がなく、より低いコストで様々な形状のワークWにメッキ処理を行うことが可能となる。   That is, when the shape of the workpiece W to be plated is changed, only the support 3 that can be detached from the rotation support portion 11 is changed to the support 3 that can hold the workpiece W having the changed shape. Therefore, it is not necessary to change the entire rotary plating apparatus, and it is possible to perform the plating process on the workpiece W having various shapes at a lower cost.

前記導電機構4は、前記側板6の外面上部側(前記上部支持板の近傍)に配置されて、側板の前後方向に延設された導電性を有する部材(銅板や鉄板等)からなる板状の第1導電部材32,32と、前記側板6に沿った上下方向であって、第1導電部材から前記回転支持部11の軸部24側まで延設された第2導電部材33と、該第2導電部材33に伝導した電圧を、各取付部23側へと配線する配線機構34とを備え、印加装置(図示しない)の陰極側を第1導電部材32側に電気的に接続することにより、支持体3側に支持されたワークWへ電圧を印加することができるように構成されている(図1及び図2参照)。   The conductive mechanism 4 is arranged on the outer surface upper side of the side plate 6 (in the vicinity of the upper support plate), and is formed of a conductive member (a copper plate, an iron plate, etc.) extending in the front-rear direction of the side plate. First conductive members 32, 32, a second conductive member 33 extending in the vertical direction along the side plate 6 from the first conductive member to the shaft portion 24 side of the rotation support portion 11, A wiring mechanism for wiring the voltage conducted to the second conductive member 33 to each attachment portion 23 side, and electrically connecting a cathode side of an application device (not shown) to the first conductive member 32 side; Thus, a voltage can be applied to the workpiece W supported on the support 3 side (see FIGS. 1 and 2).

該配線機構24を具体的に説明すると、回転支持部11の軸部24側まで延設された第2導電部材33の端部側まで伝導された電圧を、回転支持部11の軸部24内において回転駆動を許容しつつ、軸部24を軸心として放射状に複数(図示する例では8個)配置された各取付部23側へと伝導できるように配線されている。該配線機構34の詳細な構成については後述する。   The wiring mechanism 24 will be specifically described. The voltage conducted to the end portion side of the second conductive member 33 extending to the shaft portion 24 side of the rotation support portion 11 is transferred to the shaft portion 24 of the rotation support portion 11. In FIG. 8, the shafts 24 are wired so as to be able to conduct to a plurality of mounting portions 23 (eight in the illustrated example) arranged radially with the shaft portion 24 as an axis. The detailed configuration of the wiring mechanism 34 will be described later.

また、前記第2導電部材33は、側板6の左右外面側に設けられたカバー体36によりがカバーされており、前記配線機構34は、前記回転支持部11内に密閉されるように構成されているため、メッキ処理中にメッキ液内に配置される第2導電部材33と、配線機構34とがメッキされることを防止できる。該カバー体36は、その下端側に穿設された取付孔36aによって、側板6側にボルト固定される(図4参照)。   The second conductive member 33 is covered by a cover body 36 provided on the left and right outer surfaces of the side plate 6, and the wiring mechanism 34 is configured to be sealed in the rotation support portion 11. Therefore, it is possible to prevent the second conductive member 33 disposed in the plating solution and the wiring mechanism 34 from being plated during the plating process. The cover body 36 is bolted to the side plate 6 side by a mounting hole 36a drilled on the lower end side (see FIG. 4).

ちなみに、前記支持部3は、ボルト固定部31と、支持杆27と、保持部28とが導電性のある部材によって構成されている。このとき、該支持杆27や保持部28の外周面側は、絶縁体からなる絶縁カバーで覆われた構成であっても良い。これにより、メッキ処理されるワークW以外の箇所がメッキ液内でメッキ処理されることより効率的に防止することができる。   Incidentally, as for the said support part 3, the volt | bolt fixing | fixed part 31, the support rod 27, and the holding | maintenance part 28 are comprised by the member with electroconductivity. At this time, the outer peripheral surface side of the support rod 27 and the holding portion 28 may be covered with an insulating cover made of an insulator. Thereby, it can prevent more efficiently than parts other than the workpiece | work W to be plated are plated in a plating solution.

該構成によれば、メッキ処理を行うにあたり、印加装置によりメッキ液の液面よりも上方側で前後方向に延設された第1導電部材32に電圧を印加することによって、第2導電部材33と、配線機構34とを介して、支持体3側に支持されたワークWに電圧を印加することができる。   According to this configuration, in performing the plating process, the second conductive member 33 is applied by applying a voltage to the first conductive member 32 extending in the front-rear direction above the liquid surface of the plating solution by the application device. A voltage can be applied to the workpiece W supported on the support 3 side via the wiring mechanism 34.

次に、図4乃至図6に基づいて、前記配線機構の具体的な構成について説明する。図4は、配線機構の構成を示した要部断面図であり、図5は、配線機構の構成を示した組立図であり、図6は、回転支持部の構成を示した要部側面図である。   Next, a specific configuration of the wiring mechanism will be described with reference to FIGS. 4 is a cross-sectional view of the main part showing the configuration of the wiring mechanism, FIG. 5 is an assembly view showing the configuration of the wiring mechanism, and FIG. 6 is a side view of the main part showing the configuration of the rotation support unit. It is.

前記配線機構34は、前記第2導電部材33の下端側にボルト連結される円筒状の摺動スリーブ41と、該摺動スリーブ41の内周面側に軸回転可能に挿入される連結部材42と、該連結部材42内に挿通されて軸部(側板)側と前記回転体(回転支持部)側の締付具50に連結される連結ボルト43と、連結部材42の端部側と前記取付部23側との間を導電する円板状の接続板44と、該接続板44と前記回転体22とに挟まれるようにして位置決めされる前記取付部23とから構成されている。   The wiring mechanism 34 includes a cylindrical sliding sleeve 41 that is bolt-connected to the lower end side of the second conductive member 33, and a connecting member 42 that is inserted into the inner peripheral surface side of the sliding sleeve 41 so as to be axially rotatable. A connection bolt 43 inserted into the connection member 42 and connected to the shaft (side plate) side and the fastening member 50 on the rotating body (rotation support) side, the end side of the connection member 42 and the It is composed of a disk-shaped connection plate 44 that conducts electricity between the attachment portion 23 side, and the attachment portion 23 that is positioned so as to be sandwiched between the connection plate 44 and the rotating body 22.

また、該配線機構34は、前記回転体22の中心に嵌込まれて一体回転する軸受部材46と、該軸受部材46に嵌込まれる筒状の軸受側スリーブ47と、前記側板6側に取付固定されたカバー体36に一体形成されるとともに、前記軸受部材46が軸回転可能に嵌合される側板側軸部48と、カバー体36を密封するキャップ部49と、前記密閉カバー26とによって、回転支持部11(軸部24及び回転体22)の内側に密閉されるように構成されている。   The wiring mechanism 34 is attached to the center of the rotating body 22 to rotate integrally therewith, a cylindrical bearing-side sleeve 47 fitted to the bearing member 46, and the side plate 6 side. A side plate side shaft portion 48 that is integrally formed with the fixed cover body 36 and that the bearing member 46 is fitted to be axially rotatable, a cap portion 49 that seals the cover body 36, and the sealing cover 26. The rotation support portion 11 (the shaft portion 24 and the rotating body 22) is sealed inside.

前記連結部材42は、側板6側と回転体22側とで外周面の形状が異なるように形成されている。具体的には、該連結部材42の基端側は、断面が円筒状に形成された摺動部42aによって、前記摺動スリーブ41の内周面側に軸回転可能に挿入されるように形成され、該連結部材42の先端側は、断面が直方体状に形成された連結部42bによって、前記接続板44の軸心及び軸受部材46(回転体22)の軸心に穿設された方形状の連結孔44a,46aに挿入可能に形成されている。   The connecting member 42 is formed so that the shape of the outer peripheral surface is different between the side plate 6 side and the rotating body 22 side. Specifically, the base end side of the connecting member 42 is formed so as to be inserted into the inner peripheral surface side of the sliding sleeve 41 so as to be axially rotatable by a sliding portion 42a having a cylindrical cross section. The distal end side of the connecting member 42 has a rectangular shape drilled in the shaft center of the connecting plate 44 and the shaft center of the bearing member 46 (the rotating body 22) by a connecting portion 42b having a rectangular parallelepiped cross section. Are formed so as to be insertable into the connecting holes 44a and 46a.

これにより、該連結部材42は、連結部42b側が、前記ギヤ伝動機構12から伝動された動力によって回転する回転板22と一体回転するように構成されているため、回転駆動部2による回転駆動に応じて軸回転するように構成されている。このとき、該連結部材42が軸回転されると、摺動部42a側は、側板側軸部48に固定された摺動スリーブ41の内周面側を摺動(接した状態で空回り)するように構成されている。   As a result, the connecting member 42 is configured such that the connecting portion 42 b side rotates integrally with the rotating plate 22 that rotates by the power transmitted from the gear transmission mechanism 12. The shaft is configured to rotate accordingly. At this time, when the connecting member 42 is axially rotated, the sliding portion 42a slides on the inner peripheral surface side of the sliding sleeve 41 fixed to the side plate side shaft portion 48 (is idle in a contact state). It is configured as follows.

すなわち、該構成の連結部材42(の摺動部42a及び連結部42b)によって、前記第2導電部材33と直接連結されて固定されている摺動スリーブ41の内周面側と、軸部24の回転軸を軸心に回転するとともに各取付部23側に導電可能に接続される接続板44とが、導電可能な状態で連結されている。   That is, the inner peripheral surface side of the sliding sleeve 41 that is directly connected and fixed to the second conductive member 33 by the connecting member 42 (the sliding portion 42 a and the connecting portion 42 b) having the structure, and the shaft portion 24. A connecting plate 44 that rotates about the axis of rotation and is connected to each mounting portion 23 so as to be conductive is connected in a conductive state.

前記接続板44は、図4乃至図6に示されるように、その外周面側に各取付部23が嵌合(位置決め)される溝部44aが形成されるとともに、L字状に屈曲形成された取付部23側にも、接続板44側の該溝部44aと互い違いに嵌め込まれる凹部23bが形成されており、接続板44の円周上に配置される取付部23の取付箇所をスムーズに位置決めできるように構成されている。なお、該溝部44aに凹部23bが嵌込まれることにより、重ね合わせた箇所の厚さが接続板44の厚さと同じになるように構成されている(図4参照)。   As shown in FIGS. 4 to 6, the connecting plate 44 is formed with a groove 44 a into which each mounting portion 23 is fitted (positioned) on the outer peripheral surface side, and is bent in an L shape. Concave portions 23b that are alternately fitted with the groove portions 44a on the connection plate 44 side are also formed on the attachment portion 23 side, so that the attachment location of the attachment portion 23 arranged on the circumference of the connection plate 44 can be positioned smoothly. It is configured as follows. In addition, it is comprised so that the thickness of the overlap | superposed location may become the same as the thickness of the connection board 44 by inserting the recessed part 23b in this groove part 44a (refer FIG. 4).

このとき、接続板44及び取付部23が取付けられる回転体22側には、接続板44側の溝部44と、取付部23側の凹部23とを連結する固定ネジの頭部が収容される凹設部22aが凹設されており、回転体22上のどの位置に取付部23が配置されるかについても容易に位置決めできるように構成されている。   At this time, on the side of the rotating body 22 to which the connection plate 44 and the attachment portion 23 are attached, a recess that accommodates the head portion of the fixing screw that connects the groove portion 44 on the connection plate 44 side and the recess portion 23 on the attachment portion 23 side is accommodated. The installation portion 22a is recessed, and the position on the rotating body 22 where the attachment portion 23 is disposed can be easily positioned.

上記により回転体22側に取付けられた接続板44及び取付部23は、導電性を有する部材によって構成されているため、絶縁体によって形成された前記密閉カバー26を、固定ボルト55と、前記連結ボルト43と共締めされる締付体50とを用いて、接続板44を覆うようにして回転体22側に取付固定するによって導体部分がメッキ液中に露出しないように構成されている。   Since the connection plate 44 and the attachment portion 23 attached to the rotating body 22 side as described above are made of a conductive member, the sealing cover 26 formed of an insulator is connected to the fixing bolt 55 and the connection. By using the fastening body 50 that is fastened together with the bolt 43, the conductor plate is configured not to be exposed in the plating solution by covering and fixing the connection plate 44 to the rotating body 22 side.

また、前記取付部23は、ボルト固定部31が形成されたL字状に屈曲形成された箇所において、前記支持体3が取付られる面と反対側の面に絶縁カバー23cが設けられており、密閉カバー26のみによっては導電部分の露出をカバーできない箇所が覆われている。   In addition, the mounting portion 23 is provided with an insulating cover 23c on the surface opposite to the surface on which the support 3 is mounted at the portion formed in an L shape where the bolt fixing portion 31 is formed. Only the hermetic cover 26 covers a portion that cannot cover the exposure of the conductive portion.

さらに、該取付部23は、図4に示されるように、支持体3がボルト固定された後に、回転体22と、支持部3(支持杆27)の端部側との間に生じる隙間から取付部23の一部が露出する場合には、パテ等の充填部材60で該隙間を埋めることによって取付部23(導電部分)がメッキ液内に露出することをより確実に防止することができる。上記構成により、回転体22側に取付けられる導電部材である接続板44と取付部23とがメッキ液に露出しないように密閉することができる。   Further, as shown in FIG. 4, the mounting portion 23 is formed from a gap generated between the rotating body 22 and the end portion side of the support portion 3 (support rod 27) after the support body 3 is bolted. When a part of the attachment portion 23 is exposed, the attachment portion 23 (conductive portion) can be more reliably prevented from being exposed to the plating solution by filling the gap with a filling member 60 such as a putty. . With the above configuration, the connection plate 44 and the attachment portion 23 that are conductive members attached to the rotating body 22 side can be sealed so as not to be exposed to the plating solution.

前記軸受部材46は、前記回転体22の軸心側に嵌込まれることによって該回転体22と一体回転するように構成されている。また、該軸受部材46の軸心側には、前記連結部材42の連結部42bが嵌合挿通される方形状の連結孔46aと、側板6側で固定された前記摺動スリーブ41の外周面側が摺動可能に収容される内側凹部46bと、該内側凹部46bの外周側に輪状に凹設されて側板6側で固定された前記側板側軸部48が摺動可能に収容される外側凹部46cとが凹設されている。   The bearing member 46 is configured to rotate integrally with the rotating body 22 by being fitted on the axial center side of the rotating body 22. Further, on the shaft center side of the bearing member 46, a rectangular connecting hole 46a into which the connecting portion 42b of the connecting member 42 is fitted and inserted, and an outer peripheral surface of the sliding sleeve 41 fixed on the side plate 6 side. An inner recess 46b that is slidably accommodated on the side, and an outer recess that is slidably accommodated on the outer side of the inner recess 46b in a ring shape and fixed on the side plate 6 side. 46c is recessed.

また、該軸受部材46は、外側凹部46cの内周面側に、側板側軸部48回りの回転駆動をスムーズにする軸受け(ベアリング)45が設けられ、外側凹部46cの外周面側には、筒状の前記軸受側スリーブ47が設けられている。これにより、側板6側から突出された側板側軸部48に対して、回転体22(軸受部材46)をスムーズに回転駆動可能な状態で連結されるように構成されている。   Further, the bearing member 46 is provided with a bearing (bearing) 45 that smoothly rotates around the side plate side shaft portion 48 on the inner peripheral surface side of the outer concave portion 46c, and on the outer peripheral surface side of the outer concave portion 46c, The cylindrical sleeve 47 on the bearing side is provided. Thereby, it is comprised so that the rotary body 22 (bearing member 46) may be connected with the side plate side axial part 48 protruded from the side plate 6 side in the state which can be rotationally driven smoothly.

前記側板側軸部48は、第2導電部材33をカバーする前記カバー体36の下端側に設けられており、前記回転支持体11側に突出される筒状の軸部48aと、前記摺動スリーブ41が軸回転しない状態で挿通固定される挿通孔48bと、該挿通孔48bに位置決めされた摺動スリーブと第2導電部材33の下端部とをボルト固定するための露出部48cと、該露出部48cを開閉するキャップ部49とから構成されている。   The side plate side shaft portion 48 is provided on the lower end side of the cover body 36 that covers the second conductive member 33, and has a cylindrical shaft portion 48 a that protrudes toward the rotation support body 11, and the slide. An insertion hole 48b inserted and fixed in a state where the sleeve 41 does not rotate, an exposed portion 48c for fixing the sliding sleeve positioned in the insertion hole 48b and the lower end portion of the second conductive member 33 with bolts, The cap part 49 is configured to open and close the exposed part 48c.

以上より、上述の導電機構4によれば、印加装置→第1導電部材32→第2導電部材→配線機構24(摺動スリーブ41→連結部材42→接続板44→取付部23)→支持部3(支持杆27→保持片29)の順で接続されることにより、保持部28に保持されたワークWに、前記印加装置によって印加された電圧を伝導させることができる。なお、上記部材は導電性を有する部材であれば何で形成されていても良い。   As described above, according to the conductive mechanism 4 described above, the application device → the first conductive member 32 → the second conductive member → the wiring mechanism 24 (sliding sleeve 41 → connecting member 42 → connecting plate 44 → mounting portion 23) → supporting portion. 3 (support rod 27 → holding piece 29), the voltage applied by the application device can be conducted to the workpiece W held by the holding unit 28. The member may be formed of any material as long as it has conductivity.

また、該導電機構4を構成する部材以外は、導電性を有さない樹脂性の部材等を用いて構成されるとともに、該導電機構4を構成する各部材は、上記カバー体36、側板側軸部48、軸受部材46、回転体22、密封カバー26、絶縁カバー23c、締付体50、パテ60等によって、メッキ処理中にメッキ液に浸漬された際に、メッキ液に触れないように導電部分がカバーされることにより、導電機構4がメッキされないように構成されている。   In addition to the members constituting the conductive mechanism 4, it is configured using a resinous member having no electrical conductivity, etc., and each member constituting the conductive mechanism 4 includes the cover body 36, the side plate side The shaft 48, the bearing member 46, the rotating body 22, the sealing cover 26, the insulating cover 23 c, the fastening body 50, the putty 60, etc., do not touch the plating solution when immersed in the plating solution during the plating process. By covering the conductive portion, the conductive mechanism 4 is configured not to be plated.

2 回転駆動装置
4 配線機構(接続回路)
27 支持杆
28 保持部
2 Rotation drive device 4 Wiring mechanism (connection circuit)
27 Support rod 28 Holding part

Claims (9)

ワークをメッキ液に浸して電気メッキを行う回転メッキ装置であって、
上記ワークを着脱可能に保持させる保持部(28)と、
上記ワークが常時又は周期的にメッキ液に浸される状態で該ワークを回転させる回転駆動装置(2)とを備え、
前記保持部(28)は、上記回転駆動装置(2)による回転軸の軸回りに上記ワークを位置させた状態で該ワークを保持する構造を有する
ことを特徴とする回転メッキ装置。
A rotary plating apparatus that performs electroplating by immersing a workpiece in a plating solution,
A holding part (28) for holding the workpiece detachably;
A rotation drive device (2) for rotating the workpiece in a state where the workpiece is constantly or periodically immersed in the plating solution,
The rotary plating apparatus characterized in that the holding portion (28) has a structure for holding the work in a state where the work is positioned around an axis of a rotation shaft by the rotary drive device (2).
前記回転軸に沿い且つ前記回転駆動装置(2)によって回転軸の軸回りに回転駆動される支持杆(27)を備え、
前記保持部(28)は、上記支持杆(27)に一体的に設けられた
請求項1に記載の回転メッキ装置。
A support rod (27) that is driven to rotate along the rotation axis and about the axis of the rotation axis by the rotation drive device (2);
The rotary plating apparatus according to claim 1, wherein the holding portion (28) is provided integrally with the support rod (27).
前記保持部(28)が上記支持杆(27)から放射状に突出形成された
請求項2に記載の回転メッキ装置。
The rotary plating apparatus according to claim 2, wherein the holding portion (28) is formed to project radially from the support rod (27).
前記支持杆(27)を着脱自在に設けた
請求項2又は3の何れかに記載の回転メッキ装置。
The rotary plating apparatus according to claim 2, wherein the support rod (27) is detachably provided.
前記保持部(28)を上記支持杆(27)の軸方向に複数並べて設けた
請求項2乃至4の何れかに記載の回転メッキ装置。
The rotary plating apparatus according to any one of claims 2 to 4, wherein a plurality of the holding portions (28) are provided side by side in the axial direction of the support rod (27).
前記支持杆(27)を、上記回転軸の軸回りに複数並べて設けた
請求項2乃至5の何れかに記載の回転メッキ装置。
The rotation plating apparatus according to any one of claims 2 to 5, wherein a plurality of the support rods (27) are arranged around the rotation axis.
前記保持部(28)は、上記ワークの回転中、該ワークとの接触部分が少なくとも一部で変更されるように、ガタを有した状態で該ワークを保持する構造を有する
請求項1乃至6の何れかに記載の回転メッキ装置。
The said holding | maintenance part (28) has a structure which hold | maintains this workpiece | work with the backlash so that a contact part with this workpiece | work may be changed at least partially during rotation of the said workpiece | work. The rotary plating apparatus according to any one of the above.
電圧を印加する印加装置と、
該印加装置の陰極と保持部(28)とを電気的に接続する接続回路(4)とを備え、
前記保持部(28)は、上記ワークを前記印加装置の陰極と電気的に接続された状態で保持するように構成された
請求項1乃至7の何れかに記載の回転メッキ装置。
An application device for applying a voltage;
A connection circuit (4) for electrically connecting the cathode of the application device and the holding section (28);
The rotary plating apparatus according to any one of claims 1 to 7, wherein the holding unit (28) is configured to hold the workpiece in a state of being electrically connected to a cathode of the application device.
前記接続回路(4)の少なくとも一部は上記回転軸上に形成された
請求項8に記載の回転メッキ装置。
The rotary plating apparatus according to claim 8, wherein at least a part of the connection circuit (4) is formed on the rotary shaft.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200106344A (en) * 2019-03-04 2020-09-14 주식회사 율산기업 Small plating device using rotating drum

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61227198A (en) * 1985-03-30 1986-10-09 Max Co Ltd Method for plating on circular outside peripheral part of printing wheel for printer or the like and plating device used for said method
JP2001152388A (en) * 1999-09-07 2001-06-05 Sumitomo Special Metals Co Ltd Surface treatment device
JP2005048282A (en) * 2003-07-14 2005-02-24 Seiko Epson Corp Plating tool, plating method, and electroplating apparatus
US20080277286A1 (en) * 2007-05-11 2008-11-13 Richardson Trevor W Method and apparatus for racking articles for surface treatment
JP2009084659A (en) * 2007-10-02 2009-04-23 Kuroda Seisakusho:Kk Method and apparatus for wet surface treatment

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61227198A (en) * 1985-03-30 1986-10-09 Max Co Ltd Method for plating on circular outside peripheral part of printing wheel for printer or the like and plating device used for said method
JP2001152388A (en) * 1999-09-07 2001-06-05 Sumitomo Special Metals Co Ltd Surface treatment device
JP2005048282A (en) * 2003-07-14 2005-02-24 Seiko Epson Corp Plating tool, plating method, and electroplating apparatus
US20080277286A1 (en) * 2007-05-11 2008-11-13 Richardson Trevor W Method and apparatus for racking articles for surface treatment
JP2009084659A (en) * 2007-10-02 2009-04-23 Kuroda Seisakusho:Kk Method and apparatus for wet surface treatment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200106344A (en) * 2019-03-04 2020-09-14 주식회사 율산기업 Small plating device using rotating drum
KR102232522B1 (en) * 2019-03-04 2021-03-26 주식회사 율산기업 Small plating device using rotating drum

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