JPS61227198A - Method for plating on circular outside peripheral part of printing wheel for printer or the like and plating device used for said method - Google Patents
Method for plating on circular outside peripheral part of printing wheel for printer or the like and plating device used for said methodInfo
- Publication number
- JPS61227198A JPS61227198A JP6769585A JP6769585A JPS61227198A JP S61227198 A JPS61227198 A JP S61227198A JP 6769585 A JP6769585 A JP 6769585A JP 6769585 A JP6769585 A JP 6769585A JP S61227198 A JPS61227198 A JP S61227198A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- rack
- cathode
- wheels
- plated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、チェックライタ等の印字装置に用いられる印
字軸をプラスチックにメッキコーちイングして形成する
ような場合に有用なメッキ方法と、この方法を実施する
のに有用なメッキ装置に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention provides a plating method useful when forming a printing shaft used in a printing device such as a check writer by plating coating on plastic, and a plating method using this method. The present invention relates to plating apparatus useful for carrying out the method.
従来、印字軸を形成するのに金属の代替としてプラスチ
ックを用いて印字軸本体を形成し、外表面にメッキコー
ティングを施す方法が知られている。BACKGROUND ART Conventionally, a method has been known in which a print shaft body is formed using plastic as an alternative to metal, and the outer surface is coated with plating.
そして、従来、上記メッキ加工を施すためには第6図に
示すような方法がとられている。Conventionally, a method as shown in FIG. 6 has been used to perform the above-mentioned plating process.
すなわち、メッキ槽1にメッキ液2を充填するとともに
、このメッキ槽1内の外周部にはニッケルアノード3を
配設するとともに中央部分にはカソード4をラック40
.として形成し、このラック40より外径方向に突設し
た枝ラック41に被メッキ物である樹脂ダイヤル42を
その中央部に設けた軸取付穴を嵌め込んで係止させ、通
電することにより行っていた。That is, a plating bath 1 is filled with a plating solution 2, a nickel anode 3 is arranged on the outer periphery of the plating bath 1, and a cathode 4 is placed in a rack 40 in the center.
.. This is done by fitting and locking the resin dial 42, which is the object to be plated, into a shaft mounting hole provided in the center of a branch rack 41 that protrudes from the rack 40 in the radial direction, and then energizing it. was.
ところで、上記従来の方法では、各被メンキ物のメッキ
層の厚みにバラ付きが生じ不均一となってしまう欠点が
あった。However, the conventional method described above has a drawback in that the thickness of the plating layer of each object to be polished varies and becomes non-uniform.
これは、主に■メッキ槽内でのニッケルアノードと被メ
ッキ物の距離の違いや、■メッキ槽内の上方部、中央部
、下方部での電流密度の違いや、■ラックに係止させ吊
るす被メッキ物の密集度の違いや、■さらに、導電抵抗
の違い等により生起される問題である。This is mainly due to ■Differences in the distance between the nickel anode and the object to be plated in the plating tank, ■Differences in current density in the upper, middle, and lower parts of the plating tank, and ■Differences in the distance between the nickel anode and the object to be plated in the plating tank, and ■Differences in the current density in the upper, middle, and lower parts of the plating tank. This problem is caused by differences in the density of the suspended objects to be plated, (2) and differences in conductive resistance.
そこで、本発明は、円盤状に形成されたプラスチック本
体の外周縁の先端形状、すなわち外周縁に刻設された活
字の外表面形状等を損なうことなく、厚く、しかも円周
上で不均一となることなく、信頼性の高いメッキコーテ
ィングを実現することを目的とするものである。In view of this, the present invention aims to reduce the thickness and unevenness on the circumference without damaging the tip shape of the outer periphery of the plastic body formed in the shape of a disc, that is, the outer surface shape of the type engraved on the outer periphery. The purpose is to realize highly reliable plating coating without causing any damage.
本発明では、メッキ槽内においてプラスチック製の被メ
ッキ物を自転させるとともに電極のまわりを公転させな
がら通電することにより、上記被メッキ物の外周面上に
、厚く、しかも均一なメッキ層を形成する。In the present invention, a thick and uniform plating layer is formed on the outer peripheral surface of the plastic object to be plated by rotating the object to be plated made of plastic in a plating bath and energizing the object while revolving around an electrode. .
の一実施例を詳細に説明する。An example of this will be described in detail.
1はメッキ槽であり、このメッキ槽1の内部にはメッキ
液2が充填されている。また、上記メッキ槽1の中央部
には陰極軸3が配設されている。1 is a plating tank, and the inside of this plating tank 1 is filled with a plating solution 2. Further, a cathode shaft 3 is disposed in the center of the plating tank 1.
この陰極軸3は、下端3aがメッキ槽底壁1aを貫通し
て下方に突出し、たとえば水銀の如き導電体を充填した
陰極通電ボックス4内に挿入されている。The lower end 3a of the cathode shaft 3 protrudes downward through the bottom wall 1a of the plating tank, and is inserted into a cathode energizing box 4 filled with a conductor such as mercury.
また、上記陰極軸3は、この軸3に嵌着された笠歯車5
により駆動モータ6の駆動力が伝達され、回動されるよ
うになっている。さらに、上記陰極軸3の上端3bには
ハンガ陰極受け7が取り付けられている。このハンガ陰
極受け7からはラック受け8が放射方向に突設され、そ
の先端にはラック用ハンガ9と陰極通電サドル10が上
下二股に配設されている。さらに、上記ラック受け8の
中途部から下方に垂直杆8aが垂下され、その下端には
環状のラック下端受け8bが取り付けられている。Further, the cathode shaft 3 has a cap gear 5 fitted on the shaft 3.
The driving force of the drive motor 6 is transmitted and rotated. Furthermore, a hanger cathode receiver 7 is attached to the upper end 3b of the cathode shaft 3. A rack holder 8 projects in the radial direction from the hanger cathode holder 7, and a rack hanger 9 and a cathode energizing saddle 10 are disposed at the tip thereof in two directions, one above the other. Further, a vertical rod 8a hangs downward from the middle part of the rack support 8, and an annular rack lower end support 8b is attached to the lower end of the vertical rod 8a.
また、1)はラックであり、被メッキ物12がその中心
穴を介して挿入取り付けられるようになっている。そし
て、上記ラック1)は、上端にラック自転ロール13が
取り付けられ、このロール13の首部付近を前記ランク
用ハンガ9と陰極通電サドル10により支持され、下端
が前記ラック下端受け8bにより支持されている。Further, 1) is a rack, into which the object to be plated 12 is inserted and mounted through its center hole. The rack 1) has a rack rotating roll 13 attached to its upper end, the neck region of this roll 13 is supported by the rank hanger 9 and the cathode current-carrying saddle 10, and its lower end is supported by the rack lower end supporter 8b. There is.
なお、前記ハンガ陰極受け7.ラック受け8゜ラック用
ハンガ9.陰極通電サドル10等は、全て導電性の良好
な銅、黄銅あるいはステンレス・スチール等を使用して
形成され、被メッキ物12を陰極にするようになってい
る。Note that the hanger cathode receiver 7. Rack holder 8° Rack hanger 9. The cathode current-carrying saddle 10 and the like are all made of copper, brass, stainless steel, or the like having good conductivity, and are configured to use the object 12 to be plated as a cathode.
なお、ラック1)は第1図中は図示を省略したが、この
例では10本のラックが装着可能となっている。1゜
次に、前記ロール13は、メツ′キ槽1の上方に配設さ
れたラック自転用リング14の転接面14Aに圧接され
ている。なお、上記リング14は、たとえば支柱15の
上端にヒンジ16を介して取り付けられている。Although the rack 1) is not shown in FIG. 1, ten racks can be mounted in this example. 1. Next, the roll 13 is pressed against the rolling contact surface 14A of the rack rotation ring 14 disposed above the plating tank 1. Note that the ring 14 is attached, for example, to the upper end of the support column 15 via a hinge 16.
なお、17はNtアノードでありCuリング18により
吊り下げられている。Note that 17 is an Nt anode, which is suspended by a Cu ring 18.
そこで、上記構成において、駆動モータ6を作動させる
ことにより、陰極軸3は回転し、これにともないこの軸
3と一体のラック受け8の全体も回転される。Therefore, in the above configuration, by operating the drive motor 6, the cathode shaft 3 is rotated, and accordingly, the entire rack receiver 8, which is integrated with this shaft 3, is also rotated.
また、上記ラック受け8にそれぞれ装着されたラック1
)の上方に取り付けられた前記ラック自転ロール13は
ラック自転用リング14の転接面14Aに転接している
ためにラック1)はそれぞれ自転されることにより被メ
ッキ物12も自転される。In addition, the racks 1 each mounted on the rack receiver 8 are
Since the rack rotation roll 13 attached above the rack 1) is in rolling contact with the rolling contact surface 14A of the rack rotation ring 14, the plated object 12 is also rotated as the rack 1) rotates on its own axis.
そこで、上記回転中に電流を流すことにより、陽極Cu
リング18からラック1)に電流は流れ、このラック1
)に一体化されている被メッキ物12にメッキが施され
ることになる。Therefore, by passing a current during the above rotation, the anode Cu
Current flows from the ring 18 to the rack 1), and this rack 1)
) is to be plated.
なお、第3図は第2図中の一部拡大図であり、この図か
ら明らかなようにラック1)に対して被メッキ物12は
軸取付穴12aを嵌め合せて積み重ねるように取り付け
られている。そして、上記被メッキ物12の群の上下に
は、ステンレスチール、銅、黄銅などにより円盤状に形
成された補助陰極板21がスペーサ19を介して取り付
けられナツト20により固定されている。FIG. 3 is a partially enlarged view of FIG. 2, and as is clear from this figure, the objects 12 to be plated are mounted on the rack 1) so as to fit the shaft mounting holes 12a and stack them. There is. Above and below the group of objects 12 to be plated, auxiliary cathode plates 21 formed in a disc shape of stainless steel, copper, brass, etc. are attached via spacers 19 and fixed with nuts 20.
この補助陰極板21は前記被メッキ物12群の最上部及
び最下部の電流密度の集中を緩和するように作用する。This auxiliary cathode plate 21 acts to alleviate concentration of current density at the top and bottom of the group of objects 12 to be plated.
なお、前記ラック1)と被メッキ物12とを同電位にす
るための通電方法としては、第4図に示すようにコイル
スプリング22をラック1)の外周に巻き、被メッキ物
12の穴12aに接触させることにより容易に実現でき
る。なお、上記コイルスプリング22はラック1)に巻
き付けた状態で締め付けて縮径しておき、この状態で被
メッキ物12を挿入後、上記スプリング22を解放すれ
ば、このコイルスプリング22は拡径し前記穴12aに
しっかりと圧接することになる。In addition, as a method of applying electricity to bring the rack 1) and the object 12 to the same potential, as shown in FIG. 4, a coil spring 22 is wound around the outer periphery of the rack 1), This can be easily achieved by contacting the Note that the coil spring 22 is wound around the rack 1) and tightened to reduce its diameter, and if the object 12 to be plated is inserted in this state and the spring 22 is released, the coil spring 22 will expand in diameter. It will come into firm pressure contact with the hole 12a.
また、第5図に示すように、平面U字状の通電カップ2
3を被メッキ物12の重ね合されたそれぞれの間に挟み
込み、各メッキ物12の側面にこのカップ23を接触さ
せるようにしてもよい。In addition, as shown in FIG.
3 may be sandwiched between each of the overlapping objects 12 to be plated, and the cup 23 may be brought into contact with the side surface of each object 12 to be plated.
上記構成において、被メッキ物12が重ね合わせラック
1)に挿入されており、ランク1)のスプリング22あ
るいはカップ23を介して被メッキ物12の全体がカソ
ードとなっている。In the above configuration, the object to be plated 12 is inserted into the stacking rack 1), and the entire object to be plated 12 serves as a cathode via the spring 22 or cup 23 of rank 1).
そこで、メッキ槽1内に電流を流すとアノードからカソ
ードに流れ、被メッキ物12の外周面、すなわち印字軸
の活字刻設周面の電流密度は高く、逆に各被メッキ物1
2の図中上下両側面の電流密度は低いため、メッキ被膜
の厚さに差が出、被メッキ物の外周面部分のメッキ層は
厚く、両側面は薄くなる。Therefore, when a current is passed through the plating tank 1, it flows from the anode to the cathode, and the current density is high on the outer circumferential surface of the plated object 12, that is, on the circumferential surface of the printing shaft where the type is engraved.
In Figure 2, the current density on both the upper and lower sides is low, so there is a difference in the thickness of the plating film, and the plating layer is thick on the outer peripheral surface of the object to be plated, and thinner on both sides.
このように、被メッキ物、すなわち活字輪の外周面のメ
ッキ層が厚く、両側面が薄いので、外周面に形成された
刻み活字部は印字時に直接荷重を受ける箇所であり、ま
た、摩擦力も大きく生ずる部分であるが、十分に保護さ
れる。また、両側面や内径部は、たとえば印字そうちコ
ントローラ、ラチェット、ガイド等の他の部品と接触す
る箇所があり、また、内径部はシャフトとのクリアラン
スの関係からメッキ被膜が薄いので管理が楽になる。In this way, the plated layer on the outer circumferential surface of the object to be plated, that is, the type ring, is thick and both sides are thin, so the engraved type portions formed on the outer circumferential surface are directly subjected to load during printing, and frictional force is also Although it is a large area, it is well protected. In addition, there are places on both sides and the inner diameter that come into contact with other parts such as the printing machine controller, ratchet, guide, etc. Also, the inner diameter has a thin plating coating due to the clearance with the shaft, making it easier to manage. Become.
第1図はメッキ槽の概略縦断面図、第2図は同じく平面
図である。第3図はランクと被メッキ物の通電状態を説
明する要部拡大縦断面図、第4図は通電方法の一例を示
す要部拡大縦断面図、第5図は同じ(他の例を示す図で
あり、(A)はカップの平面図、(B)はカップの側面
図、(C)は通電状態を示す要部拡大縦断面図である。
第6図は従来例を示す概略縦断面図である。
1・・・メッキ槽
3・・・陰極軸 ムロ・・・駆動
モータ
1)・・・ラック
12・・・被メッキ物
14・・・ラック自転用リング
17・・・Niカソード
18・・・陽極Cuリング
特許出願人 マックス株式会社
同 マックス電子株式会社FIG. 1 is a schematic vertical sectional view of the plating bath, and FIG. 2 is a plan view thereof. Fig. 3 is an enlarged vertical cross-sectional view of the main part explaining the energization state of the rank and the object to be plated, Fig. 4 is an enlarged longitudinal sectional view of the main part showing an example of the energization method, and Fig. 5 is the same (showing another example). 6A is a plan view of the cup, FIG. 6B is a side view of the cup, and FIG. 6C is an enlarged vertical cross-sectional view of a main part showing an energized state. FIG. 6 is a schematic vertical cross-section showing a conventional example. It is a diagram. 1... Plating tank 3... Cathode shaft Muro... Drive motor 1)... Rack 12... Object to be plated 14... Rack rotation ring 17... Ni cathode 18 ...Anode Cu ring patent applicant Max Co., Ltd. Max Electronics Co., Ltd.
Claims (2)
槽内において自転させるとともに電極のまわりを公転さ
せながら通電することにより上記本体にメッキする方法
。(1) A method of plating a plastic body, such as a printer printing wheel, by rotating the body in a plating bath and energizing it while revolving around an electrode.
周部に陽極を配設し、上記陰極軸のまわりを回転し得る
とともに自転し得る被メッキ物取付け用のラックを上記
陽極の内径方向位置に設けたメッキ装置。(2) A cathode shaft is disposed in the center of the plating tank, and an anode is disposed around the circumference, and a rack for mounting the plated objects that can rotate around the cathode shaft and rotate on its own axis is attached to the anode. A plating device installed in the inner diameter direction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6769585A JPS61227198A (en) | 1985-03-30 | 1985-03-30 | Method for plating on circular outside peripheral part of printing wheel for printer or the like and plating device used for said method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6769585A JPS61227198A (en) | 1985-03-30 | 1985-03-30 | Method for plating on circular outside peripheral part of printing wheel for printer or the like and plating device used for said method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61227198A true JPS61227198A (en) | 1986-10-09 |
JPH0114320B2 JPH0114320B2 (en) | 1989-03-10 |
Family
ID=13352349
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6769585A Granted JPS61227198A (en) | 1985-03-30 | 1985-03-30 | Method for plating on circular outside peripheral part of printing wheel for printer or the like and plating device used for said method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61227198A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4419984A1 (en) * | 1994-06-08 | 1995-12-14 | Mtu Muenchen Gmbh | Electroplating magazine for coating components |
JP2002146582A (en) * | 2000-11-14 | 2002-05-22 | Electro Forging Research:Kk | Core wire holder used for manufacture of metallic ferrule and apparatus for manufacturing ferrule including the same |
JP2017155299A (en) * | 2016-03-03 | 2017-09-07 | 株式会社エンプラス | Electroforming apparatus |
JP2018016870A (en) * | 2016-07-29 | 2018-02-01 | 孝志 上市 | Rotary plating device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58135473U (en) * | 1982-03-04 | 1983-09-12 | コニカ株式会社 | Electrolytic treatment equipment |
JPS59205500A (en) * | 1983-05-06 | 1984-11-21 | Sansen Kikai Kogyo Kk | Surface treating apparatus |
-
1985
- 1985-03-30 JP JP6769585A patent/JPS61227198A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58135473U (en) * | 1982-03-04 | 1983-09-12 | コニカ株式会社 | Electrolytic treatment equipment |
JPS59205500A (en) * | 1983-05-06 | 1984-11-21 | Sansen Kikai Kogyo Kk | Surface treating apparatus |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4419984A1 (en) * | 1994-06-08 | 1995-12-14 | Mtu Muenchen Gmbh | Electroplating magazine for coating components |
US5536377A (en) * | 1994-06-08 | 1996-07-16 | Mtu Motoren- Und Turbinen- Union | Galvanizing magazine for coating work pieces |
JP2002146582A (en) * | 2000-11-14 | 2002-05-22 | Electro Forging Research:Kk | Core wire holder used for manufacture of metallic ferrule and apparatus for manufacturing ferrule including the same |
JP4545915B2 (en) * | 2000-11-14 | 2010-09-15 | Smk株式会社 | Core wire holder used for manufacturing metal ferrule and ferrule manufacturing apparatus including the same |
JP2017155299A (en) * | 2016-03-03 | 2017-09-07 | 株式会社エンプラス | Electroforming apparatus |
JP2018016870A (en) * | 2016-07-29 | 2018-02-01 | 孝志 上市 | Rotary plating device |
Also Published As
Publication number | Publication date |
---|---|
JPH0114320B2 (en) | 1989-03-10 |
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