JP4734697B2 - Surface treatment equipment - Google Patents

Surface treatment equipment Download PDF

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Publication number
JP4734697B2
JP4734697B2 JP2000269986A JP2000269986A JP4734697B2 JP 4734697 B2 JP4734697 B2 JP 4734697B2 JP 2000269986 A JP2000269986 A JP 2000269986A JP 2000269986 A JP2000269986 A JP 2000269986A JP 4734697 B2 JP4734697 B2 JP 4734697B2
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surface treatment
support member
treatment apparatus
treated
support
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JP2001152388A (en
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吉村  公志
武司 西内
文秋 菊井
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Hitachi Metals Ltd
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Hitachi Metals Ltd
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Description

【0001】
【発明の属する技術分野】
本発明は、円筒形状等の内周面を有する被表面処理部材に、表面処理を施す表面処理装置に関し、特にR−Fe−B系永久磁石、とりわけ、リング状ボンド磁石や円筒状ボンド磁石に対して電気めっきを施す際に有用な表面処理装置に関する。
【0002】
【従来の技術】
Nd−Fe−B系永久磁石に代表されるR−Fe−B系などの希土類系永久磁石は、資源的に豊富で安価な材料が用いられ、かつ、高い磁気特性を有していることから、今日様々な分野で使用されている。しかしながら、希土類系永久磁石は大気中で酸化腐食されやすいRとFeを含むため、何の表面処理をも行わずに使用した場合には、わずかな酸やアルカリや水分などの存在によって表面から腐食が進行して錆が発生し、それに伴って、磁石特性の劣化やばらつきを生じるという問題点を有している。
【0003】
上記の問題点を解消すべく、従来から磁石表面に耐酸化性皮膜として金属めっき皮膜や樹脂塗装を施す方法などが採用されており、例えば、R−Fe−B系永久磁石表面に電気めっきによって耐食性皮膜を形成する方法として、網籠の中に被めっき部材を入れ、該網籠を回転しながらめっきを行う方法(バレル方式)や、被めっき部材を陰電極に接続した導電性支持部材に支持させてめっきを行う方法(ラック方式)などが採用されている。
【0004】
【発明が解決しようとする課題】
上記のバレル方式による電気めっきやラック方式による電気めっきは汎用性にすぐれているものの、前者の方法では、磁石自体の強度が必ずしも高くないボンド磁石に適用した場合、磁石の割れや欠けを生じることがあるという問題点を有している。また、後者の方法では、めっき工程中の磁石の位置が一定なので、位置によって陽極からの距離が違い、膜厚にばらつきが生じる。また、近年、希土類永久磁石が使用される電子業界や家電業界では、部品の小型化、精密化が進んでおり、それに対応して磁石自体もより小型化が要求されている。特にリング状等の内周面を有するボンド磁石の場合、小型リング状磁石の表面処理を高い寸法精度で、更に低コストで効率よく行うことは、従来の技術では非常に困難である。
例えば、特開昭60−190599号公報では、代表的なバレル方式で小型の部材にめっきする方法が提案されている。しかしながら、この方法では、前述の通り磁石に割れや欠けが生じやすいばかりでなく、磁石が小さくて軽いため、めっき工程中、常にすべての磁石に導通を確保することは困難で、めっき効率が悪い。
一方、特開昭61−52367号公報では、板状ワークの孔にシャフトを通して、該シャフトを回転させることによりワーク自体が回転するめっき装置が提案されている。しかしながら、この装置において、ワークを回転させるためには、直径が大きなシャフトを用いなければならないので、ワークとシャフトとの接点近傍へのめっき液のまわり込みが悪くなり、内側表面に対するめっき効率が悪いという問題点を有している。
【0005】
そこで、本発明においては、ボンド磁石のような軽くて強度が必ずしも高くない被表面処理部材に対しても適用でき、接点跡のない均一な表面処理を行うことを目的とする。
【0006】
【課題を解決するための手段】
請求項1記載の本発明の表面処理装置は、支持部材を公転動作させるための回転部材を備え、前記支持部材は、円筒形状等の内周面を有する被表面処理部材を前記内周面側から回動自在に支持し、前記支持部材と前記被表面処理部材との当接位置が前記支持部材の公転にともなって移動することで前記被表面処理部材を回転させ、前記被表面処理部材の前記内周面にも表面処理を施す表面処理装置であって、前記支持部材を導電性部材で構成し、前記支持部材を陰電極と接続し、前記支持部材の軸に対して平行に陽電極を配置することを特徴とする。
請求項2記載の本発明は、請求項1に記載の表面処理装置において、前記支持部材を、該支持部材の軸が略水平となるように配設し、複数の前記被表面処理部材を、前記支持部材に並べて配設することを特徴とする。
請求項3記載の本発明は、請求項1に記載の表面処理装置において、前記支持部材に絶縁スペーサーを設け、前記被表面処理部材を前記絶縁スペーサー間に配置することを特徴とする。
請求項4記載の本発明は、請求項3に記載の表面処理装置において、前記被表面処理部材が等間隔に配置されるように前記絶縁スペーサーを配置することを特徴とする。
請求項5記載の本発明は、請求項2に記載の表面処理装置において、複数の前記支持部材を、該支持部材のそれぞれの軸が平行になるように配置し、それぞれの前記支持部材の回転軸を共通としたことを特徴とする。
請求項6記載の本発明は、請求項5に記載の表面処理装置において、それぞれの前記支持部材は、前記回転軸から等距離に配置していることを特徴とする。
請求項7記載の本発明は、請求項1又は請求項2に記載の表面処理装置において、前記被表面処理部材がボンド磁石であり、前記表面処理が電気めっき処理であることを特徴とする。
請求項8記載の本発明のR−Fe−B系永久磁石は、請求項7に記載の表面処理装置によって電気めっき処理が施され、表面に耐食性皮膜を形成していることを特徴とする。
請求項9記載の本発明の被表面処理部材は、請求項1又は請求項2に記載の表面処理装置によって、表面に皮膜を形成していることを特徴とする。
【0007】
【発明の実施の形態】
本発明の第1の実施の形態による表面処理装置は、支持部材を導電性部材で構成し、支持部材を陰電極と接続し、支持部材の軸に対して平行に陽電極を配置するものである。本実施の形態によれば、被表面処理部材は、支持部材とともに公転動作を行うことになる。従って、例えば電気めっき処理の場合には、その公転動作によってめっき液を攪拌する効果があるので、常に新鮮なめっき液が被表面処理部材の周辺に供給されることとなり、効率のよいめっきができると共に、被表面処理部材の内周面にもめっき液を回り込ませることができるので、内周面側にも効率よく膜厚が均一な表面処理を行うことができる。また、被表面処理部材は、その内周面側から回動自在に支持されているので、被表面処理部材は支持部材の公転によって回動動作を行い、支持部材との当接位置は移動する。従って、支持部材との接点跡が残らない均一な表面処理を行うことができる。さらに、被表面処理部材は支持部材によって内周面側から1点で支持されているので、処理可能な被表面処理部材の径に制限が少なく、従来の技術では非常に困難であった小型リング状部材に対しても効率よく、膜厚が均一で接点跡が残らない均一な表面処理を行うことができる。また、電気めっき処理を効果的に行うことができる。特に複数の被表面処理部材を、同時にめっき処理する場合にも、すべての被表面処理部材に対して確実に電気を流すことができる。また、複数吊り下げられた被表面処理部材は、いずれも電極からの距離が等しいために、すべての被表面処理部材を膜厚のばらつきなく均一に電気めっき処理を施すことができる。
【0008】
本発明の第2の実施の形態は、第1の実施の形態による表面処理装置において、支持部材を軸が略水平となるように配設し、複数の被表面処理部材を支持部材に並べて配設するものである。本実施の形態によれば、複数の被表面処理部材を、支持部材とともに公転動作させることができる。従って、均一な表面処理を、同時に多くの被表面処理部材に対して行うことができる。
【0009】
本発明の第3の実施の形態は、第1の実施の形態による表面処理装置において、支持部材に絶縁スペーサーを設け、被表面処理部材を絶縁スペーサー間に配置するものである。本実施の形態によれば、絶縁スペーサーによって、被表面処理部材同士の接触を防止することができるので、接触によって電気めっきが不均一に生じることを防止することができる。
【0010】
本発明の第4の実施の形態は、第3の実施の形態による表面処理装置において、被表面処理部材が等間隔に配置されるように絶縁スペーサーを配置するものである。本実施の形態によれば、スペーサーの位置または軸方向の幅寸法を調節し、被表面処理部材同志の間隔を所定寸法で等間隔にすることによって、被表面処理部材のエッジ部分への電気力線の集中を緩和し、さらにめっきの均一性を向上させることができる。各々の間隔は被表面処理部材のエッジ部分への電気力線の集中が緩和され、エッジ部分の膜厚が均一になるような適正値を選定するのが望ましい。また、スペーサーは、あらかじめ所定寸法に間隔が調整され支持部材と一体になったものでもよいし、位置の調節が可能なものでもよい。
【0011】
本発明の第5の実施の形態は、第2の実施の形態による表面処理装置において、複数の支持部材を、この支持部材のそれぞれの軸が平行になるように配置し、それぞれの支持部材の回転軸を共通としたものである。本実施の形態によれば、それぞれの支持部材に吊り下げられた被表面処理部材は、回転軸を中心に公転動作を行うことによって電極との距離が時間とともに変化するが、すべて同じ位置履歴で動くので、位置によって膜厚のばらつきが生じることなく均一に電気めっき処理され、また多くの被表面処理部材を同時に処理することができる。
【0012】
本発明の第6の実施の形態は、第5の実施の形態による表面処理装置において、それぞれの支持部材は、回転軸から等距離に配置したものである。本実施の形態によれば、いずれの支持部材に吊り下げられた被表面処理部材についても、膜厚のばらつきなく均一に電気めっき処理される。
【0013】
本発明の第7の実施の形態は、第1又は第2の実施の形態による表面処理装置において、被表面処理部材がボンド磁石であり、表面処理が電気めっき処理であるものである。本実施の形態によれば、ボンド磁石の内周面にも、膜厚のばらつきなく均一に電気めっきを行うことができる。
【0014】
本発明の第8の実施の形態によるR−Fe−B系永久磁石は、第7の実施の形態による表面処理装置によって電気めっき処理を施したものである。本実施の形態によれば、内周面にも、膜厚のばらつきなく均一に耐食性皮膜を形成したR−Fe−B系永久磁石を得ることができる。
【0015】
本発明の第9の実施の形態による被表面処理部材は、第1又は第2の実施の形態による表面処理装置によって、表面に皮膜を形成したものである。本実施の形態によれば、内周面にも、膜厚のばらつきなく均一に皮膜を形成した被表面処理部材を得ることができる。
【0016】
【実施例】
以下に本発明の一実施例による表面処理装置を図1から図3を用いて説明する。図1は本実施例によるボンド磁石の電気めっき装置の概念構成図、図2は図1の要部拡大斜視図、図3は支持部材とボンド磁石の動きを説明するための構成図である。
図1は、めっき槽の電解めっき液中に配置される陽電極板10と、被表面処理部材としてリング状ボンド磁石20を保持する表面処理用治具30を示している。
表面処理用治具30は、リング状ボンド磁石20を内周面側から回動自在に支持する支持部材40と、この支持部材40を公転動作させるための回転部材50とを備えている。
図1に示すように、陽電極11に接続される2枚の陽電極板10は、対向するように平行に配置され、表面処理用治具30は、支持部材40の軸が陽極電極10と平行になるようにこれら陽極電極10の間に配置される。
表面処理用治具30は、外部に設置されるモータ31の動力を回転部材50に伝達するための歯車32を備えている。
【0017】
特に図2に示すように、支持部材40は、金属製の支持軸41とこの支持軸41に所定間隔あけて配置された樹脂製の絶縁スペーサー42とより構成されている。
回転部材50は、表面処理用治具30に回動自在に設けられた一対の回転板51と、これら一対の回転板51を連結するとともに、歯車32の軸と連結されて回転中心となる回転軸52とより構成されている。なお、回転部材50は、絶縁材料で構成されるか、又は表面を絶縁処理している。
回転板51は、回転軸52から等距離で、かつ等間隔に軸受け部53を備えている。そして、支持部材40は、この軸受け部53によって保持されている。本実施例では、8本の支持部材40を備えている。また、回転板51は、陰電極33に接続される陰電極接合部54を内部に備え、この陰電極接合部54によって支持部材40を陰電極33と接続している。
この陰電極接合部54は、回転軸52の中心部から、それぞれの軸受け部53に向かって放射状に設けられている。なお、この陰電極接合部54は、本実施例のように放射状に設けなくても、円盤状の導電性部材を設けてもよい。
【0018】
次に、本実施例によるボンド磁石の電気めっき装置の使用方法及び動作について説明する。
まず、支持部材40の絶縁スペーサー42の間にリング状ボンド磁石20を配設する。このようにリング状ボンド磁石20を配設した支持部材40を表面処理用治具30に設置する。図1では、一つのリング状ボンド磁石20を配設したものを示しているが、絶縁スペーサー42の間毎にリング状ボンド磁石20を配設することができる。
支持部材40の設置が完了した後に、電気めっきが行われる。陽電極11及び陰電極33を導通するとともに、モータ31が駆動される。モータ31の駆動力は、歯車32を介して回転部材50に伝達され、回転部材50は、回転軸52を中心に回転する。従って、それぞれの支持部材40は、回転軸52を中心に公転動作を行う。
以上においては回転部材50を有する構成において説明したが、必ずしも回転部材は必要でなく、回転部材50を設けずに回転板51の片方もしくは両方にモータ31の動力を伝達して回転板51を回転させる構造であってもよい。その他、実施例に限定されることなく、支持部材40を所定の回転軸を中心に公転可能に配置する構成で本発明の目的は達成される。
【0019】
ここで、図3を用いて支持部材40とリング状ボンド磁石20の動きについて説明する。
図3に示すように、支持部材40は、回転軸52を中心にして反時計回りの方向(矢印X)に公転する。すなわち、(a)の位置にある支持部材40は、(b)の位置に移動し、(b)の位置にある支持部材40は、(c)の位置に移動する。ここで、支持部材40は、支持部材40自身で自転はしない。しかし、支持部材40における回転軸52から最外周に位置するポイントAに着目すると、(a)の位置では、最上部に位置するポイントAは、(c)の位置では、反時計回りの方向に90度、(e)の位置では、反時計周りの方向に180度回転している。そして(a)の位置に戻ったときには、360度回転することになる。従って、支持部材40に当接しているリング状ボンド磁石20も反時計回りの方向(矢印Y)に回転する。このとき、支持部材40の公転にともなって、リング状ボンド磁石20は回転することになる。このように、支持部材40とリング状ボンド磁石20との当接位置は、支持部材40の公転にともなって移動するため、リング状ボンド磁石20には、支持部材40との接点跡が残ることなく、均一なめっき処理を行うことができる。
【0020】
本実施例のように、支持部材40をその軸が略水平となるように配設し、複数のリング状ボンド磁石20を支持部材40に並べて配設することで、多くのリング状ボンド磁石20を、支持部材40とともに公転動作させることができる。従って、均一な表面処理を、同時に多くのリング状ボンド磁石20に対して行うことができる。
また本実施例のように、支持部材40の軸が陽極電極10と平行になるようにこれら陽極電極10の間に配置することで、リング状ボンド磁石20は、いずれも陽極電極10からの距離が等しいために、すべてのリング状ボンド磁石20を膜厚のばらつきなく均一に電気めっき処理を施すことができる。
また本実施例のように、複数の支持部材40を、支持部材40のそれぞれの軸が平行になるように配置し、それぞれの支持部材40の回転軸を共通としたことで、それぞれの支持部材40に吊り下げられたリング状ボンド磁石20は、膜厚のばらつきなく均一に電気めっき処理され、また多くのリング状ボンド磁石20を同時に処理することができる。
また本実施例のように、それぞれの支持部材40を回転軸52から等距離に配置することで、いずれの支持部材40に吊り下げられたリング状ボンド磁石20についても、膜厚のばらつきなく均一に電気めっき処理される。
【0021】
図4に他の実施例を示す。図4は、他の実施例による支持部材の斜視図であり、その他の基本構成は図1と同様であるので説明を省略する。
本実施例に示す支持部材40Aは、螺旋状部材で構成されている。このように支持部材40Aを螺旋状部材とすることで、リング状ボンド磁石20を螺旋状部材の下部毎に吊り下げることができ、リング状ボンド磁石20同士の接触を防止することができるので、接触によって表面処理が不均一になることを防止することができる。
なお、上記実施例では、支持部材40に絶縁スペーサー42を設けて説明したが、絶縁スペーサー42を設けなくてもよく、また絶縁スペーサー42を設ける場合であっても、実質的に隣り合うリング状ボンド磁石20同士の接触を防止することができれば、単なる突起であってもよい。また、回転数をあげれば液流ができボンド磁石同士の接触を防げるため、スペーサーを省略することが可能となる。
また、本発明の表面処理装置は、電気めっき処理に限られず、無電解めっき処理、化成処理、エッチング処理などを行う装置に使用することもできる。また、本発明の表面処理装置により効果的に表面処理される被表面処理部材としては、R−Fe−B系リング状ボンド磁石やR−Fe−B系円筒状ボンド磁石である。
また、上記実施例では、8つの支持部材40の場合で説明したが、更に多くても、また少なくてもよい。また、上記実施例では、8つの支持部材40を回転軸52から等距離に配置したが、距離を異ならせることで、被表面処理部材同士を接触させることなく、同時に表面処理できる被表面処理部材の個数を更に増やすことができる。
また、上記実施例の表面処理用治具30をそれぞれの回転部材50が平行になるように複数個配置することによってさらに多くの被表面処理部材を同時に処理することができる。この場合、それぞれの回転軸を、直接ベルトで連結するか、またはそれぞれの歯車を介して連結する等により、1つのモータ31によって全ての表面処理用治具30を同時に動かすことができる。
また、本発明の装置によって表面処理できるボンド磁石としては、液体急冷系等方性Nd−Fe−B磁石粉末(MQI社製 商品名:MQP−B等)を用いたボンド磁石、特開平9−92515号公報に示されるような異方性R−Fe−B系ボンド磁石、特開平8−203714号公報に示されるようなソフト磁性相(たとえばFe3B)とハード磁性相(Nd2−Fe14−B)を有するNd−Fe−B系ナノコンポジット磁石、特公平5−82041号公報に示されるR−Fe−N系ボンド磁石が挙げられる。これらはいずれも、エポキシ樹脂等のバインダーを用い、所定の形状に成形されたあと、表面に導電処理がなされたあとに、めっき処理される。また、本発明の装置では、上記ボンド磁石の他、リング状焼結磁石等にも適用することができる。
【0022】
【発明の効果】
本発明によれば、被表面処理部材は、支持部材とともに公転動作を行うことになる。従って、例えば電気めっき処理の場合には、めっき液を攪拌し、被表面処理部材の内周面にもめっき液を回り込ませることができるので、均一な表面処理を行うことができる。また、被表面処理部材は、その内周面側から回動自在に支持されているので、被表面処理部材は支持部材の公転によって回動動作を行い、支持部材との当接位置は移動する。従って、支持部材との接点跡が残らない均一な表面処理を行うことができる。
【図面の簡単な説明】
【図1】 本発明の一実施例によるボンド磁石の電気めっき装置の概念構成図
【図2】 図1の要部拡大斜視図
【図3】 本発明の一実施例による支持部材とボンド磁石の動きを説明するための構成図
【図4】 本発明の他の実施例による支持部材の要部斜視図
【符号の説明】
20 リング状ボンド磁石
40 支持部材
42 絶縁スペーサー
50 回転部材
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a surface treatment apparatus for performing surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape, and more particularly to an R-Fe-B permanent magnet, particularly a ring-shaped bond magnet and a cylindrical bond magnet. The present invention relates to a surface treatment apparatus useful when electroplating is performed.
[0002]
[Prior art]
Rare-earth permanent magnets such as R-Fe-B typified by Nd-Fe-B permanent magnets are made of resource-rich and inexpensive materials and have high magnetic properties. Is used in various fields today. However, rare earth permanent magnets contain R and Fe that are susceptible to oxidative corrosion in the atmosphere, so when used without any surface treatment, they are corroded from the surface due to the presence of slight acid, alkali, moisture, etc. As the process proceeds, rust is generated, and accordingly, there is a problem in that the magnetic characteristics are deteriorated and varied.
[0003]
In order to solve the above problems, conventionally, a method of applying a metal plating film or a resin coating as an oxidation-resistant film on the magnet surface has been adopted, for example, by electroplating the surface of an R-Fe-B permanent magnet. As a method of forming a corrosion-resistant film, a member to be plated is put in a mesh cage and plating is performed while rotating the mesh mesh (barrel method), or a conductive support member in which the plated member is connected to a negative electrode. A method of carrying out plating with support (rack method) or the like is employed.
[0004]
[Problems to be solved by the invention]
Although the above-described barrel plating and rack plating are excellent in versatility, the former method may cause cracking or chipping of the magnet when applied to a bonded magnet whose strength is not necessarily high. There is a problem that there is. In the latter method, since the position of the magnet during the plating process is constant, the distance from the anode differs depending on the position, and the film thickness varies. In recent years, in the electronics industry and household electrical appliance industry in which rare earth permanent magnets are used, parts are becoming smaller and more precise, and the magnets themselves are required to be smaller. In particular, in the case of a bonded magnet having an inner peripheral surface such as a ring shape, it is very difficult to perform surface treatment of a small ring-shaped magnet with high dimensional accuracy and at low cost efficiently.
For example, Japanese Patent Application Laid-Open No. 60-190599 proposes a method of plating small members by a typical barrel method. However, in this method, not only is the magnet easily cracked or chipped as described above, but since the magnet is small and light, it is difficult to always ensure continuity for all the magnets during the plating process, and the plating efficiency is poor. .
On the other hand, Japanese Patent Application Laid-Open No. 61-52367 proposes a plating apparatus in which a workpiece is rotated by passing the shaft through a hole in a plate-shaped workpiece and rotating the shaft. However, in this apparatus, in order to rotate the workpiece, a shaft having a large diameter must be used. Therefore, the plating solution wraps around the contact point between the workpiece and the shaft, and the plating efficiency on the inner surface is poor. Has the problem.
[0005]
Therefore, the present invention can be applied to a surface-treated member that is light and does not necessarily have high strength such as a bond magnet, and an object thereof is to perform a uniform surface treatment without a contact mark.
[0006]
[Means for Solving the Problems]
The surface treatment apparatus of the present invention according to claim 1 includes a rotating member for revolving the support member, and the support member includes a surface treatment member having an inner peripheral surface such as a cylindrical shape on the inner peripheral surface side. The surface treatment member is rotated by rotating the contact position of the support member and the surface treatment member along with the revolution of the support member. A surface treatment apparatus for performing a surface treatment on the inner peripheral surface, wherein the support member is composed of a conductive member, the support member is connected to a negative electrode, and a positive electrode is parallel to the axis of the support member characterized that you place a.
According to a second aspect of the present invention, in the surface treatment apparatus according to the first aspect , the support member is disposed so that an axis of the support member is substantially horizontal, and a plurality of the surface-treated members are provided. It arrange | positions along with the said supporting member, It is characterized by the above-mentioned.
According to a third aspect of the invention, the surface treatment apparatus according to claim 1, the insulating spacer to the support member is provided, and wherein placing the object to be surface treated member between the insulating spacers.
According to a fourth aspect of the present invention, in the surface treatment apparatus according to the third aspect , the insulating spacers are arranged so that the surface treated members are arranged at equal intervals.
The present invention is claimed in claim 5, wherein, in the front surface processing device of the mounting serial to claim 2, a plurality of said support members, each of the axes of the support members are arranged in parallel, each of said support members It is characterized by having a common rotation axis.
According to a sixth aspect of the present invention, in the surface treatment apparatus according to the fifth aspect , each of the support members is arranged at an equal distance from the rotation shaft.
The present invention according to claim 7, Te surface treatment apparatus smell of claim 1 or claim 2, wherein the surface treated member is a bonded magnet, wherein said surface treatment is an electroplating process .
An R—Fe—B permanent magnet according to an eighth aspect of the present invention is characterized in that an electroplating treatment is performed by the surface treatment apparatus according to the seventh aspect to form a corrosion-resistant film on the surface.
The surface-treated member of the present invention according to claim 9 is characterized in that a film is formed on the surface by the surface treatment apparatus according to claim 1 or claim 2.
[0007]
DETAILED DESCRIPTION OF THE INVENTION
Surface treatment apparatus according to the first embodiment of the present invention constitutes a supporting member with conductive members, the support members connected to the negative electrode, shall be placed parallel to the positive electrode to the axis of the support member It is. According to the present embodiment, the surface-treated member performs a revolution operation together with the support member. Therefore, for example, in the case of electroplating treatment, there is an effect of stirring the plating solution by the revolving operation, so that a fresh plating solution is always supplied to the periphery of the surface treatment member, and efficient plating can be performed. At the same time, since the plating solution can be made to wrap around the inner peripheral surface of the surface-treated member, surface treatment with a uniform film thickness can be efficiently performed on the inner peripheral surface side. Further, since the surface-treated member is rotatably supported from the inner peripheral surface side, the surface-treated member rotates by the revolution of the support member, and the contact position with the support member moves. . Therefore, uniform surface treatment can be performed without leaving any trace of contact with the support member. Furthermore, since the surface-treated member is supported by the support member at one point from the inner peripheral surface side, the diameter of the surface-treated member that can be treated is limited, and a small ring that has been very difficult with the prior art The uniform surface treatment can be efficiently performed on the shaped member so that the film thickness is uniform and no contact mark remains. Moreover, the electroplating process can be performed effectively. In particular, even when a plurality of surface-treated members are plated at the same time, electricity can be reliably supplied to all the surface-treated members. Moreover, since all the surface-treated members suspended are equal in distance from the electrodes, all the surface-treated members can be uniformly subjected to electroplating without variation in film thickness.
[0008]
According to a second embodiment of the present invention, in the surface treatment apparatus according to the first embodiment, the support member is disposed such that the shaft is substantially horizontal, and a plurality of surface treatment members are arranged side by side on the support member. It is to be established. According to the present embodiment, a plurality of surface treated members can be revolved together with the support member. Therefore, uniform surface treatment can be performed on many surface treated members at the same time.
[0009]
According to the third embodiment of the present invention, in the surface treatment apparatus according to the first embodiment, an insulating spacer is provided on the support member, and the surface-treated member is disposed between the insulating spacers. According to the present embodiment, since the insulating spacers can prevent contact between the surface-treated members, it is possible to prevent non-uniform electroplating from being caused by the contact.
[0010]
In the fourth embodiment of the present invention, in the surface treatment apparatus according to the third embodiment, insulating spacers are arranged so that the surface treatment members are arranged at equal intervals. According to the present embodiment, the electric force applied to the edge portion of the surface treatment member is adjusted by adjusting the position of the spacer or the width dimension in the axial direction so that the intervals between the surface treatment members are equal to each other with a predetermined size. The concentration of lines can be relaxed and the uniformity of plating can be improved. It is desirable to select an appropriate value for each interval so that the concentration of electric lines of force on the edge portion of the surface treatment member is reduced and the film thickness of the edge portion becomes uniform. In addition, the spacer may be adjusted in advance to have a predetermined distance and integrated with the support member, or may be adjustable in position.
[0011]
Fifth embodiment of the present invention, the front surface processing apparatus that by the second embodiment, a plurality of support members, arranged so that the respective axes of the support member are parallel, each The rotation axis of the support member is common. According to the present embodiment, the surface-treated member suspended on each support member changes its distance from the electrode with time by performing a revolving operation around the rotation axis, but all have the same position history. Since it moves, the electroplating process can be performed uniformly without causing variations in film thickness depending on the position, and many surface treated members can be processed simultaneously.
[0012]
According to a sixth embodiment of the present invention, in the surface treatment apparatus according to the fifth embodiment, each support member is arranged at an equal distance from the rotation axis. According to the present embodiment, the surface-treated member suspended from any supporting member is uniformly electroplated without variation in film thickness.
[0013]
According to a seventh embodiment of the present invention, in the surface treatment apparatus according to the first or second embodiment, the surface treatment member is a bond magnet, and the surface treatment is an electroplating treatment. According to the present embodiment, it is possible to uniformly perform electroplating on the inner peripheral surface of the bonded magnet without variation in film thickness.
[0014]
The R—Fe—B permanent magnet according to the eighth embodiment of the present invention is subjected to electroplating treatment by the surface treatment apparatus according to the seventh embodiment. According to the present embodiment, it is possible to obtain an R—Fe—B permanent magnet in which a corrosion-resistant film is uniformly formed on the inner peripheral surface without variation in film thickness.
[0015]
The surface-treated member according to the ninth embodiment of the present invention is obtained by forming a film on the surface by the surface treatment apparatus according to the first or second embodiment. According to the present embodiment, it is possible to obtain a surface-treated member in which a film is uniformly formed on the inner peripheral surface without variation in film thickness.
[0016]
【Example】
A surface treatment apparatus according to an embodiment of the present invention will be described below with reference to FIGS. FIG. 1 is a conceptual configuration diagram of an electroplating apparatus for a bonded magnet according to the present embodiment, FIG. 2 is an enlarged perspective view of a main part of FIG. 1, and FIG. 3 is a configuration diagram for explaining the movement of a support member and a bonded magnet.
FIG. 1 shows a positive electrode plate 10 disposed in an electrolytic plating solution in a plating tank and a surface treatment jig 30 that holds a ring-shaped bonded magnet 20 as a surface treatment member.
The surface treatment jig 30 includes a support member 40 that rotatably supports the ring-shaped bonded magnet 20 from the inner peripheral surface side, and a rotating member 50 that causes the support member 40 to revolve.
As shown in FIG. 1, the two positive electrode plates 10 connected to the positive electrode 11 are arranged in parallel so as to face each other, and the surface treatment jig 30 has the axis of the support member 40 and the anode electrode 10. It arrange | positions between these anode electrodes 10 so that it may become parallel.
The surface treatment jig 30 includes a gear 32 for transmitting the power of a motor 31 installed outside to the rotating member 50.
[0017]
In particular, as shown in FIG. 2, the support member 40 includes a metal support shaft 41 and a resin insulating spacer 42 disposed on the support shaft 41 at a predetermined interval.
The rotating member 50 is connected to a pair of rotating plates 51 rotatably provided on the surface treatment jig 30, and the pair of rotating plates 51, and is connected to the shaft of the gear 32 to be a rotation center. The shaft 52 is constituted. The rotating member 50 is made of an insulating material, or has an insulating surface.
The rotating plate 51 includes bearing portions 53 at equal distances from the rotating shaft 52 and at equal intervals. The support member 40 is held by the bearing portion 53. In this embodiment, eight support members 40 are provided. Further, the rotating plate 51 includes therein a negative electrode joint 54 connected to the negative electrode 33, and the support member 40 is connected to the negative electrode 33 through the negative electrode joint 54.
The negative electrode joint portions 54 are provided radially from the center portion of the rotation shaft 52 toward the respective bearing portions 53. The negative electrode joint 54 may not be provided in a radial manner as in the present embodiment, but may be provided with a disk-shaped conductive member.
[0018]
Next, the usage method and operation | movement of the electroplating apparatus of the bond magnet by a present Example are demonstrated.
First, the ring-shaped bonded magnet 20 is disposed between the insulating spacers 42 of the support member 40. Thus, the support member 40 in which the ring-shaped bonded magnet 20 is disposed is installed on the surface treatment jig 30. Although FIG. 1 shows a structure in which one ring-shaped bonded magnet 20 is disposed, the ring-shaped bonded magnet 20 can be disposed between the insulating spacers 42.
After the installation of the support member 40 is completed, electroplating is performed. The positive electrode 11 and the negative electrode 33 are conducted, and the motor 31 is driven. The driving force of the motor 31 is transmitted to the rotating member 50 through the gear 32, and the rotating member 50 rotates about the rotating shaft 52. Accordingly, each support member 40 performs a revolving operation around the rotation shaft 52.
In the above description, the structure having the rotating member 50 has been described. However, the rotating member is not always necessary, and the rotating plate 51 is rotated by transmitting the power of the motor 31 to one or both of the rotating plates 51 without providing the rotating member 50. The structure to be made may be sufficient. In addition, the object of the present invention is achieved by a configuration in which the support member 40 is arranged to be revolved around a predetermined rotation axis without being limited to the embodiment.
[0019]
Here, the movement of the support member 40 and the ring-shaped bonded magnet 20 will be described with reference to FIG.
As shown in FIG. 3, the support member 40 revolves in the counterclockwise direction (arrow X) about the rotation shaft 52. That is, the support member 40 at the position (a) moves to the position (b), and the support member 40 at the position (b) moves to the position (c). Here, the support member 40 does not rotate by itself. However, paying attention to the point A located on the outermost periphery from the rotation shaft 52 in the support member 40, the point A located at the uppermost position in the position (a) is counterclockwise at the position (c). At the position of 90 degrees and (e), it is rotated 180 degrees in the counterclockwise direction. And when it returns to the position of (a), it will rotate 360 degree | times. Accordingly, the ring-shaped bonded magnet 20 in contact with the support member 40 also rotates counterclockwise (arrow Y). At this time, the ring-shaped bonded magnet 20 rotates with the revolution of the support member 40. As described above, the contact position between the support member 40 and the ring-shaped bond magnet 20 moves with the revolution of the support member 40, so that the contact mark with the support member 40 remains on the ring-shaped bond magnet 20. And uniform plating treatment can be performed.
[0020]
As in the present embodiment, the support member 40 is disposed so that the axis thereof is substantially horizontal, and a plurality of ring-shaped bond magnets 20 are disposed side by side on the support member 40, whereby a large number of ring-shaped bond magnets 20 are disposed. Can be revolved together with the support member 40. Therefore, uniform surface treatment can be performed on many ring-shaped bonded magnets 20 at the same time.
Further, as in the present embodiment, the ring-shaped bonded magnet 20 is arranged at a distance from the anode electrode 10 by being arranged between the anode electrodes 10 so that the axis of the support member 40 is parallel to the anode electrode 10. Therefore, all ring-shaped bonded magnets 20 can be uniformly electroplated without variation in film thickness.
Further, as in the present embodiment, the plurality of support members 40 are arranged so that the respective axes of the support members 40 are parallel, and the rotation shafts of the respective support members 40 are made common, so that each support member 40 The ring-shaped bonded magnet 20 suspended by 40 is uniformly electroplated without variation in film thickness, and many ring-shaped bonded magnets 20 can be processed simultaneously.
Further, as in the present embodiment, by arranging the respective support members 40 at equal distances from the rotation shaft 52, the ring-shaped bonded magnets 20 suspended from any of the support members 40 are uniform without variations in film thickness. To be electroplated.
[0021]
FIG. 4 shows another embodiment. FIG. 4 is a perspective view of a support member according to another embodiment, and the other basic configuration is the same as that of FIG.
The support member 40A shown in the present embodiment is configured by a spiral member. Since the support member 40A is a spiral member in this way, the ring-shaped bond magnet 20 can be suspended for each lower portion of the spiral member, and contact between the ring-shaped bond magnets 20 can be prevented. It is possible to prevent the surface treatment from becoming uneven due to the contact.
In the above-described embodiment, the insulating spacer 42 is provided on the support member 40. However, the insulating spacer 42 may not be provided. As long as the contact between the bonded magnets 20 can be prevented, a simple protrusion may be used. Further, if the number of rotations is increased, a liquid flow can be generated and contact between the bonded magnets can be prevented, so that the spacer can be omitted.
Moreover, the surface treatment apparatus of this invention is not restricted to an electroplating process, It can also be used for the apparatus which performs an electroless-plating process, a chemical conversion process, an etching process, etc. The surface-treated member that is effectively surface-treated by the surface treatment apparatus of the present invention is an R—Fe—B ring bond magnet or an R—Fe—B cylinder bond magnet.
Further, in the above-described embodiment, the case of the eight support members 40 has been described, but the number may be more or less. Moreover, in the said Example, although the eight support members 40 were arrange | positioned at equal distance from the rotating shaft 52, the surface treatment member which can be surface-treated simultaneously without making surface treatment members contact by varying distance. Can be further increased.
Further, by arranging a plurality of the surface treatment jigs 30 of the above embodiment so that the respective rotation members 50 are parallel to each other, it is possible to treat more surface treated members simultaneously. In this case, all the surface treatment jigs 30 can be moved simultaneously by one motor 31 by connecting the respective rotation shafts directly with a belt or via respective gears.
Further, as a bonded magnet that can be surface-treated by the apparatus of the present invention, a bonded magnet using liquid quenching system isotropic Nd-Fe-B magnet powder (trade name: MQP-B manufactured by MQI), An anisotropic R—Fe—B based bonded magnet as shown in Japanese Patent No. 92515, a soft magnetic phase (eg Fe3B) and a hard magnetic phase (Nd 2 —Fe 14 —B) as shown in Japanese Patent Laid-Open No. 8-203714 Nd—Fe—B-based nanocomposite magnets having an R—Fe—N-based bonded magnet disclosed in Japanese Patent Publication No. 5-82041. All of these are formed into a predetermined shape using a binder such as an epoxy resin, and then subjected to a plating treatment after the surface is subjected to a conductive treatment. Moreover, in the apparatus of this invention, it can apply also to a ring-shaped sintered magnet other than the said bond magnet.
[0022]
【The invention's effect】
According to the present invention, the surface-treated member performs a revolution operation together with the support member. Therefore, for example, in the case of electroplating treatment, the plating solution can be stirred and the plating solution can be made to flow around the inner peripheral surface of the surface-treated member, so that a uniform surface treatment can be performed. Further, since the surface-treated member is rotatably supported from the inner peripheral surface side, the surface-treated member rotates by the revolution of the support member, and the contact position with the support member moves. . Therefore, uniform surface treatment can be performed without leaving any trace of contact with the support member.
[Brief description of the drawings]
FIG. 1 is a conceptual configuration diagram of an electroplating apparatus for a bonded magnet according to an embodiment of the present invention. FIG. 2 is an enlarged perspective view of a main part of FIG. 1. FIG. FIG. 4 is a perspective view of a main part of a support member according to another embodiment of the present invention.
20 Ring-shaped bonded magnet 40 Support member 42 Insulating spacer 50 Rotating member

Claims (9)

支持部材を公転動作させるための回転部材を備え、前記支持部材は、円筒形状等の内周面を有する被表面処理部材を前記内周面側から回動自在に支持し、前記支持部材と前記被表面処理部材との当接位置が前記支持部材の公転にともなって移動することで前記被表面処理部材を回転させ、前記被表面処理部材の前記内周面にも表面処理を施す表面処理装置であって、前記支持部材を導電性部材で構成し、前記支持部材を陰電極と接続し、前記支持部材の軸に対して平行に陽電極を配置することを特徴とする表面処理装置。 A rotation member for revolving the support member, the support member rotatably supporting a surface-treated member having an inner peripheral surface such as a cylindrical shape from the inner peripheral surface side; and A surface treatment apparatus for rotating the surface treatment member by moving a contact position with the surface treatment member along with the revolution of the support member, and performing surface treatment on the inner peripheral surface of the surface treatment member. The surface treatment apparatus is characterized in that the support member is made of a conductive member, the support member is connected to a negative electrode, and a positive electrode is arranged in parallel to the axis of the support member. 前記支持部材を、該支持部材の軸が略水平となるように配設し、複数の前記被表面処理部材を、前記支持部材に並べて配設することを特徴とする請求項1に記載の表面処理装置Said supporting member, arranged so that the axis of the support member is substantially horizontal, surface according to a plurality of the object to be surface treated member, to claim 1, characterized in that arranged side by side to the support member Processing equipment . 前期支持部材に絶縁スペーサーを設け、前記被表面処理部材を前記絶縁スペーサー間に配置することを特徴とする請求項1に記載の表面処理装置。The surface treatment apparatus according to claim 1 , wherein an insulating spacer is provided on the first support member, and the surface-treated member is disposed between the insulating spacers. 前記被表面処理部材が等間隔に配置されるように前記絶縁スペーサーを配置することを特徴とする請求項3に記載の表面処理装置。The surface treatment apparatus according to claim 3 , wherein the insulating spacers are arranged so that the surface treatment members are arranged at equal intervals. 複数の前記支持部材を、該支持部材のそれぞれの軸が平行になるように配置し、それぞれの前記支持部材の回転軸を共通としたことを特徴とする請求項2に記載の表面処理装置。A plurality of said support members, said respective axes of the support member is arranged parallel, surface treatment apparatus of claim 2, characterized in that the axis of rotation of each of the support members and the common. それぞれの前記支持部材は、前記回転軸から等距離に配置していることを特徴とする請求項5に記載の表面処理装置。The surface treatment apparatus according to claim 5 , wherein each of the support members is disposed at an equal distance from the rotation shaft. 前記被表面処理部材がボンド磁石であり、前記表面処理が電気めっき処理であることを特徴とする請求項1又は請求項2に記載の表面処理装置The surface treatment apparatus according to claim 1, wherein the surface treatment member is a bonded magnet, and the surface treatment is an electroplating treatment. 請求項7に記載の表面処理装置によって電気めっき処理が施され、表面に耐食性皮膜を形成していることを特徴とするR−Fe−B系永久磁石。An R-Fe-B permanent magnet, which is electroplated by the surface treatment apparatus according to claim 7 to form a corrosion-resistant film on the surface. 請求項1又は請求項2に記載の表面処理装置によって、前記表面に皮膜を形成していることを特徴とする被表面処理部材。A surface-treated member, wherein the surface treatment apparatus according to claim 1 or 2 forms a film on the surface.
JP2000269986A 1999-09-07 2000-09-06 Surface treatment equipment Expired - Lifetime JP4734697B2 (en)

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Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1919703B1 (en) 2005-08-12 2013-04-24 Modumetal, LLC Compositionally modulated composite materials and methods for making the same
JP5451182B2 (en) * 2009-05-25 2014-03-26 木田精工株式会社 Jig for plating processing of cylindrical bag-shaped workpiece
BR122013014461B1 (en) 2009-06-08 2020-10-20 Modumetal, Inc corrosion resistant multilayer coating on a substrate and electroplating method for producing a multilayer coating
BR112015022235A2 (en) 2013-03-15 2017-07-18 Modumetal Inc nanolaminated coatings
EP2971266A4 (en) 2013-03-15 2017-03-01 Modumetal, Inc. A method and apparatus for continuously applying nanolaminate metal coatings
EA201500949A1 (en) 2013-03-15 2016-02-29 Модьюметл, Инк. METHOD OF FORMING A MULTILAYER COATING, A COATING FORMED BY THE ABOVE METHOD, AND A MULTILAYER COATING
CN104233448A (en) * 2014-08-28 2014-12-24 苏州市康普来表面处理科技有限公司 Plating hanger
CN104233426B (en) * 2014-09-05 2016-08-24 朱玉兵 Aluminum pipe section bar anodizing tank
WO2016044712A1 (en) 2014-09-18 2016-03-24 Modumetal, Inc. Methods of preparing articles by electrodeposition and additive manufacturing processes
CN106795645B (en) 2014-09-18 2020-03-27 莫杜美拓有限公司 Method and apparatus for continuous application of nanolaminate metal coatings
JP6542168B2 (en) * 2016-07-29 2019-07-10 孝志 上市 Rotary plating device
WO2018049062A1 (en) 2016-09-08 2018-03-15 Modumetal, Inc. Processes for providing laminated coatings on workpieces, and articles made therefrom
CN110770372B (en) 2017-04-21 2022-10-11 莫杜美拓有限公司 Tubular article having an electrodeposited coating and system and method for producing same
US11519093B2 (en) 2018-04-27 2022-12-06 Modumetal, Inc. Apparatuses, systems, and methods for producing a plurality of articles with nanolaminated coatings using rotation

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50104730A (en) * 1974-01-28 1975-08-19
JPS63100613A (en) * 1986-10-17 1988-05-02 Fuji Electric Co Ltd Substrate plating jig for magnetic disk
JPS6394963U (en) * 1986-12-04 1988-06-18
JPH0499192A (en) * 1990-08-01 1992-03-31 Nippon Hyomen Kagaku Kk Method for plating resin molded magnet with ni and ni plating bath
JPH0841649A (en) * 1993-03-29 1996-02-13 Nippon Light Metal Co Ltd Surface treating device
JPH10280196A (en) * 1997-04-01 1998-10-20 Nippon Light Metal Co Ltd Frame holding device and surface treating device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6394963A (en) * 1986-10-09 1988-04-26 Res Assoc Petroleum Alternat Dev<Rapad> Continuous production of volatile fermentation product

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50104730A (en) * 1974-01-28 1975-08-19
JPS63100613A (en) * 1986-10-17 1988-05-02 Fuji Electric Co Ltd Substrate plating jig for magnetic disk
JPS6394963U (en) * 1986-12-04 1988-06-18
JPH0499192A (en) * 1990-08-01 1992-03-31 Nippon Hyomen Kagaku Kk Method for plating resin molded magnet with ni and ni plating bath
JPH0841649A (en) * 1993-03-29 1996-02-13 Nippon Light Metal Co Ltd Surface treating device
JPH10280196A (en) * 1997-04-01 1998-10-20 Nippon Light Metal Co Ltd Frame holding device and surface treating device

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