JP2001181893A - Surface treatment apparatus - Google Patents

Surface treatment apparatus

Info

Publication number
JP2001181893A
JP2001181893A JP2000313524A JP2000313524A JP2001181893A JP 2001181893 A JP2001181893 A JP 2001181893A JP 2000313524 A JP2000313524 A JP 2000313524A JP 2000313524 A JP2000313524 A JP 2000313524A JP 2001181893 A JP2001181893 A JP 2001181893A
Authority
JP
Japan
Prior art keywords
treated
surface treatment
treatment apparatus
members
inner peripheral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000313524A
Other languages
Japanese (ja)
Inventor
Masayuki Yoshimura
吉村  公志
Takeshi Nishiuchi
武司 西内
Fumiaki Kikui
文秋 菊井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Metals Ltd
Original Assignee
Sumitomo Special Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd
Priority to JP2000313524A priority Critical patent/JP2001181893A/en
Publication of JP2001181893A publication Critical patent/JP2001181893A/en
Withdrawn legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a surface treatment apparatus which can be applied to a member to be surface-treated which is light in weight and not necessarily high in strength like a bond magnet, and achieve the uniform plating free from any contact trace. SOLUTION: The surface treatment apparatus to achieve the surface treatment on the member to be surface-treated having an inner circumferential surface of a cylindrical shape or the like comprises a supporting member to support the member to be surface-treated and gives the rotation thereto, and a load applying member to press the member to be surface-treated against the supporting member.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、円筒形状等の内周
面を有する被表面処理部材に、表面処理を施す表面処理
装置に関し、特にR−Fe−B系永久磁石、とりわけ、
リング状ボンド磁石や円柱状ボンド磁石に対して電気め
っきを施す際に有用な表面処理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment apparatus for performing a surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape, and more particularly to an R-Fe-B-based permanent magnet,
The present invention relates to a surface treatment apparatus useful for performing electroplating on a ring-shaped bonded magnet or a cylindrical bonded magnet.

【0002】[0002]

【従来の技術】Nd−Fe−B系永久磁石に代表される
R−Fe−B系永久磁石は、資源的に豊富で安価な材料
が用いられ、かつ、高い磁気特性を有していることか
ら、今日様々な分野で使用されている。しかしながら、
R−Fe−B系永久磁石は大気中で酸化腐食されやすい
RとFeを含むため、何の表面処理をも行わずに使用し
た場合には、わずかな酸やアルカリや水分などの存在に
よって表面から腐食が進行して錆が発生し、それに伴っ
て、磁石特性の劣化やばらつきを生じるという問題点を
有している。
2. Description of the Related Art R-Fe-B-based permanent magnets represented by Nd-Fe-B-based permanent magnets use abundant and inexpensive materials as resources and have high magnetic properties. From today, it is used in various fields. However,
R-Fe-B permanent magnets contain R and Fe, which are susceptible to oxidative corrosion in the atmosphere. Therefore, if used without any surface treatment, the surface will be affected by the presence of a slight amount of acid, alkali or moisture. Therefore, there is a problem that rust is generated due to the progress of corrosion, which causes deterioration and variation in magnet characteristics.

【0003】上記の問題点を解消すべく、従来から磁石
表面に耐酸化性皮膜として金属めっき皮膜や樹脂塗装を
施す方法などが採用されており、例えば、R−Fe−B
系永久磁石表面に電気めっきによって耐食性皮膜を形成
する方法として、網籠の中に被めっき部材を入れ、該網
籠を回転しながらめっきを行う方法(バレル方式)や、
被めっき部材を陰電極に接続した導電性支持部材に支持
させてめっきを行う方法(ラック方式)などが採用され
ている。
[0003] In order to solve the above problems, a method of applying a metal plating film or a resin coating as an oxidation-resistant film on the magnet surface has conventionally been adopted. For example, R-Fe-B
As a method of forming a corrosion-resistant film on the surface of a system-based permanent magnet by electroplating, a method of placing a member to be plated in a mesh basket and performing plating while rotating the mesh basket (barrel method),
A method (rack method) of performing plating by supporting a member to be plated on a conductive support member connected to a negative electrode has been adopted.

【0004】[0004]

【発明が解決しようとする課題】上記のバレル方式によ
る電気めっきやラック方式による電気めっきは汎用性に
すぐれているものの、前者の方法では、磁石自体の強度
が必ずしも高くないボンド磁石に適用した場合、磁石の
割れや欠けを生じることがあるという問題点を有してい
る。また、後者の方法では、磁石の、導電性支持部材と
接触している部分が接点跡として残り、めっき後にその
処理が必要であるという問題点を有している。一方、特
開昭61−52367号公報では、板状ワークの孔にシ
ャフトを通して、該シャフトを回転させることによりワ
ーク自体が回転するめっき装置が提案されている。しか
しながら、この装置においては、割れや欠けの問題や、
接点跡の問題は解決されているものの、ボンド磁石のよ
うな軽い部材をめっきする場合、磁石がその自重でシャ
フトに押し付けられる力が弱いため、シャフトの回転に
ともない、磁石がシャフトから浮き、確実に接点が取れ
ず、めっき効率が悪くなるという問題点を有している。
Although the above-mentioned barrel plating and rack plating are excellent in versatility, the former method is applied to a bonded magnet in which the strength of the magnet itself is not necessarily high. However, there is a problem that the magnet may be cracked or chipped. Further, the latter method has a problem that a portion of the magnet that is in contact with the conductive support member remains as a contact mark, and that the treatment is required after plating. On the other hand, Japanese Patent Application Laid-Open No. 61-52367 proposes a plating apparatus in which a shaft is passed through a hole of a plate-shaped work, and the work itself is rotated by rotating the shaft. However, in this device, the problem of cracking and chipping,
Although the problem of contact marks has been solved, when plating a light member such as a bonded magnet, the magnet is weakly pressed against the shaft due to its own weight. However, there is a problem in that the contact cannot be made and the plating efficiency deteriorates.

【0005】そこで、本発明においては、ボンド磁石の
ような、軽くて強度が必ずしも高くない被表面処理部材
に対しても適用でき、接点跡のない均一なめっきを行え
ることを目的とする。
Accordingly, an object of the present invention is to apply the method to a light-weight and not necessarily high-strength surface-treated member, such as a bonded magnet, and to perform uniform plating without contact marks.

【0006】[0006]

【課題を解決するための手段】請求項1記載の本発明の
表面処理装置は、円筒形状等の内周面を有する被表面処
理部材に、表面処理を施す表面処理装置であって、前記
被表面処理部材を支持するとともに該被表面処理部材に
回転動作を与える支持部材を設け、前記被表面処理部材
を前記支持部材に押圧する加負荷部材を設けたことを特
徴とする。請求項2記載の本発明は、請求項1に記載の
表面処理装置において、前記加負荷部材を複数備え、そ
れぞれの前記加負荷部材が前記被表面処理部材を外周面
側から押圧することを特徴とする。請求項3記載の本発
明は、請求項1に記載の表面処理装置において、前記支
持部材を複数備え、それぞれの前記支持部材が前記被表
面処理部材を外周面側から支持することを特徴とする。
請求項4記載の本発明は、請求項1に記載の表面処理装
置において、前記加負荷部材及び前記支持部材を、前記
被表面処理部材の外周面側に配置したことを特徴とす
る。請求項5記載の本発明は、請求項1に記載の表面処
理装置において、前記加負荷部材を前記支持部材の上方
に配置し、前記加負荷部材の自重によって前記被表面処
理部材を押圧することを特徴とする。請求項6記載の本
発明は、請求項1に記載の表面処理装置において、前記
加負荷部材を、回転可能に設けていることを特徴とす
る。請求項7記載の本発明は、請求項1に記載の表面処
理装置において、前記加負荷部材が支持部材の全部また
は一部に配置された永久磁石にて構成されることを特徴
とする。請求項8記載の本発明の表面処理装置は、円筒
形状等の内周面を有する被表面処理部材に、表面処理を
施す表面処理装置であって、前記被表面処理部材の内周
面と当接する第1の部材と、前記被表面処理部材の外周
面と当接する第2の部材とを軸方向が同じとなるように
併設し、前記第1の部材又は前記第2の部材によって前
記被表面処理部材を回転駆動させることを特徴とする。
請求項9記載の本発明の表面処理装置は、円筒形状等の
内周面を有する被表面処理部材に、表面処理を施す表面
処理装置であって、前記被表面処理部材の内周面と当接
する第1の部材と、前記第1の部材が当接する内周面と
対向する位置の内周面と当接する第2の部材とを軸方向
が同じとなるように併設し、前記第1の部材又は前記第
2の部材によって前記被表面処理部材を回転駆動させる
ことを特徴とする。請求項10記載の本発明の表面処理
装置は、円筒形状等の内周面を有する被表面処理部材
に、表面処理を施す表面処理装置であって、前記被表面
処理部材の内周面又は外周面と当接する複数の部材を、
それぞれの軸方向が同じとなるように併設し、複数の前
記部材のうち少なくとも一つの部材によって前記被表面
処理部材を回転駆動させることを特徴とする。請求項1
1記載の本発明は、請求項1又は請求項8から請求項1
0のいずれかに記載の表面処理装置において、前記支持
部材を導電性部材で構成し、前記支持部材によって前記
被表面処理部材にめっき電流を流すことを特徴とする。
請求項12記載の本発明は、請求項11に記載の表面処
理装置において、前記支持部材に絶縁スペーサーを設
け、前記被表面処理部材を前記絶縁スペーサー間に配置
することを特徴とする。請求項13記載の本発明は、請
求項12に記載の表面処理装置において、前記被表面処
理部材が等間隔に配置されるように前記絶縁スペーサー
を配置することを特徴とする。請求項14記載の本発明
の表面処理装置は、請求項1から請求項13のいずれか
に記載の表面処理装置を処理槽内に複数個配置して用い
る表面処理装置であって、各々の支持部材が平行になる
ように配置したことを特徴とする。請求項15記載の本
発明のボンド磁石の電気めっき装置は、請求項1から請
求項14のいずれかに記載の表面処理装置を用いて、ボ
ンド磁石に電気めっきを行うことを特徴とする。請求項
16記載の本発明の被表面処理部材の表面処理方法は、
請求項1から請求項14のいずれかに記載の表面処理装
置を用いて表面処理を施すことを特徴とする。請求項1
7記載の本発明のR−Fe−B系永久磁石は、請求項1
5に記載のボンド磁石の電気めっき装置を用いて電気め
っき処理が施され、表面に耐食性皮膜を形成しているこ
とを特徴とする。請求項18記載の本発明の被表面処理
部材は、請求項16に記載の被表面処理部材の表面処理
方法によって、表面に皮膜を形成していることを特徴と
する。
According to a first aspect of the present invention, there is provided a surface treatment apparatus for performing a surface treatment on a surface-treated member having a cylindrical inner peripheral surface. A support member is provided for supporting the surface treatment member and giving a rotating operation to the surface treatment member, and a load member for pressing the surface treatment member against the support member is provided. According to a second aspect of the present invention, in the surface treatment apparatus according to the first aspect, a plurality of the loading members are provided, and each of the loading members presses the surface-treated member from the outer peripheral surface side. And According to a third aspect of the present invention, in the surface treatment apparatus according to the first aspect, a plurality of the support members are provided, and each of the support members supports the surface-treated member from an outer peripheral surface side. .
According to a fourth aspect of the present invention, in the surface treatment apparatus of the first aspect, the load member and the support member are arranged on an outer peripheral surface side of the surface-treated member. According to a fifth aspect of the present invention, in the surface treatment apparatus according to the first aspect, the loading member is disposed above the supporting member, and the surface-treated member is pressed by the weight of the loading member. It is characterized by. According to a sixth aspect of the present invention, in the surface treatment apparatus according to the first aspect, the load member is rotatably provided. According to a seventh aspect of the present invention, in the surface treatment apparatus according to the first aspect, the load member is constituted by a permanent magnet disposed on all or a part of the support member. The surface treatment apparatus according to the present invention is a surface treatment apparatus for performing a surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape. A contacting first member and a second member contacting the outer peripheral surface of the surface-treated member are juxtaposed so that the axial direction is the same, and the first member or the second member forms the surface to be treated. The processing member is driven to rotate.
A surface treatment apparatus according to a ninth aspect of the present invention is a surface treatment apparatus for performing a surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape. A first member that is in contact with the first member and a second member that is in contact with an inner peripheral surface at a position facing the inner peripheral surface with which the first member is in contact with each other so as to have the same axial direction; The surface-treated member is rotationally driven by a member or the second member. The surface treatment apparatus according to the present invention is a surface treatment apparatus for performing a surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape, wherein the inner peripheral surface or the outer periphery of the surface treated member is provided. Multiple members that contact the surface,
A plurality of the members are provided so as to have the same axial direction, and the surface-treated member is rotationally driven by at least one of the plurality of members. Claim 1
The first aspect of the present invention is the first aspect of the present invention.
0, wherein the supporting member is formed of a conductive member, and a plating current is applied to the surface-treated member by the supporting member.
According to a twelfth aspect of the present invention, in the surface treatment apparatus of the eleventh aspect, an insulating spacer is provided on the support member, and the surface-treated member is disposed between the insulating spacers. According to a thirteenth aspect of the present invention, in the surface treatment apparatus of the twelfth aspect, the insulating spacers are arranged such that the members to be surface-treated are arranged at equal intervals. According to a fourteenth aspect of the present invention, there is provided a surface treatment apparatus comprising a plurality of the surface treatment apparatuses according to any one of the first to thirteenth aspects disposed in a treatment tank. It is characterized in that the members are arranged in parallel. According to a fifteenth aspect of the present invention, there is provided a bond magnet electroplating apparatus for performing electroplating on a bond magnet using the surface treatment apparatus according to any one of the first to fourteenth aspects. The surface treatment method for a surface-treated member according to the present invention according to claim 16,
A surface treatment is performed using the surface treatment apparatus according to any one of claims 1 to 14. Claim 1
The R-Fe-B-based permanent magnet according to the present invention as described in claim 7,
An electroplating treatment is performed using the bond magnet electroplating apparatus described in 5, and a corrosion resistant film is formed on the surface. The surface-treated member of the present invention according to claim 18 is characterized in that a film is formed on the surface by the surface treatment method of the surface-treated member according to claim 16.

【0007】[0007]

【発明の実施の形態】本発明の第1の実施の形態による
表面処理装置は、被表面処理部材を支持するとともにこ
の被表面処理部材に回転動作を与える支持部材を設け、
被表面処理部材を支持部材に押圧する加負荷部材を設け
たものである。本実施の形態によれば、例えば被表面処
理部材が軽い場合や、支持部材の軸の外径が小さい場合
など、支持部材と被表面処理部材との間の摩擦抵抗が小
さく、被表面支持部材が充分に回転動作しないときに
も、加負荷部材によって、被表面処理部材を支持部材に
押圧するため、被表面処理部材は確実に回転動作を行う
ことになる。従って、被表面処理部材の支持部材との当
接位置は、確実に移動することとなり、支持部材との接
点跡が残らない均一な表面処理を行うことができる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A surface treatment apparatus according to a first embodiment of the present invention is provided with a support member for supporting a member to be surface-treated and rotating the member to be treated.
A load member is provided for pressing the surface-treated member against the support member. According to the present embodiment, for example, when the surface-treated member is light, or when the outer diameter of the shaft of the support member is small, the frictional resistance between the support member and the surface-treated member is small, Even when is not sufficiently rotated, the surface-treated member is pressed against the support member by the load member, so that the surface-treated member surely rotates. Therefore, the contact position of the surface-treated member with the support member is surely moved, and uniform surface treatment without leaving traces of contact with the support member can be performed.

【0008】本発明の第2の実施の形態は、第1の実施
の形態による表面処理装置において、加負荷部材を複数
備え、それぞれの加負荷部材が被表面処理部材を外周面
側から押圧するものである。本実施の形態によれば、複
数の加負荷部材によって被表面処理部材を押圧するた
め、支持部材に対して被表面処理部材を確実に安定して
押圧することができる。従って、被表面処理部材は確実
に回転動作を行うことになり、支持部材との接点跡が残
らない均一な表面処理をより確実に行うことができる。
According to a second embodiment of the present invention, in the surface treatment apparatus according to the first embodiment, a plurality of loading members are provided, and each of the loading members presses the surface-treated member from the outer peripheral surface side. Things. According to the present embodiment, since the surface-treated member is pressed by the plurality of load members, the surface-treated member can be reliably and stably pressed against the support member. Therefore, the member to be surface-treated will surely perform a rotation operation, and it is possible to more reliably perform a uniform surface treatment without leaving traces of contact with the support member.

【0009】本発明の第3の実施の形態は、第1の実施
の形態による表面処理装置において、支持部材を複数備
え、それぞれの支持部材が被表面処理部材を外周面側か
ら支持するものである。本実施の形態によれば、複数の
支持部材によって被表面処理部材を支持するため、加負
荷部材に対して被表面処理部材を確実に安定して支持す
ることができる。従って、被表面処理部材は確実に回転
動作を行うことになり、支持部材との接点跡が残らない
均一な表面処理をより確実に行うことができる。
A third embodiment of the present invention is directed to a surface treatment apparatus according to the first embodiment, wherein a plurality of support members are provided, and each of the support members supports the surface-treated member from the outer peripheral surface side. is there. According to this embodiment, since the surface-treated member is supported by the plurality of support members, the surface-treated member can be reliably and stably supported with respect to the load member. Therefore, the member to be surface-treated will surely perform a rotation operation, and it is possible to more reliably perform a uniform surface treatment without leaving traces of contact with the support member.

【0010】本発明の第4の実施の形態は、第1の実施
の形態による表面処理装置において、加負荷部材及び支
持部材を、被表面処理部材の外周面側に配置したもので
ある。本実施の形態によれば、被表面処理部材の内周径
が極めて小さい場合であっても、支持部材に対して被表
面処理部材を確実に安定して押圧することができる。従
って、被表面処理部材は確実に回転動作を行うことにな
り、支持部材との接点跡が残らない均一な表面処理をよ
り確実に行うことができる。
In a fourth embodiment of the present invention, in the surface treatment apparatus according to the first embodiment, the load member and the support member are arranged on the outer peripheral surface side of the member to be surface treated. According to the present embodiment, even when the inner peripheral diameter of the surface-treated member is extremely small, the surface-treated member can be reliably and stably pressed against the support member. Therefore, the member to be surface-treated will surely perform a rotation operation, and it is possible to more reliably perform a uniform surface treatment without leaving traces of contact with the support member.

【0011】本発明の第5の実施の形態は、第1の実施
の形態による表面処理装置において、加負荷部材を支持
部材の上方に配置し、加負荷部材の自重によって被表面
処理部材を押圧するものである。本実施の形態によれ
ば、被表面処理部材を支持部材に配設した後に、支持部
材の上方から加負荷部材を配置でき、加負荷部材の自重
によって被表面処理部材を押圧するため、取り付けや取
り外しの作業効率がよい。
According to a fifth embodiment of the present invention, in the surface treatment apparatus according to the first embodiment, the load member is disposed above the support member, and the surface member to be pressed is pressed by the weight of the load member. Is what you do. According to this embodiment, after arranging the surface-treated member on the support member, the load member can be arranged from above the support member, and the surface-treated member is pressed by the weight of the load member. Removal work efficiency is good.

【0012】本発明の第6の実施の形態は、第1の実施
の形態による表面処理装置において、加負荷部材を回転
可能に設けたものである。本実施の形態によれば、被表
面処理部材とともに加負荷部材も回転動作を行うため、
支持部材による回転駆動を妨げず、確実に被表面処理部
材を回転させることができる。
According to a sixth embodiment of the present invention, a load member is rotatably provided in the surface treatment apparatus according to the first embodiment. According to the present embodiment, the loading member also performs a rotating operation together with the surface-treated member,
It is possible to reliably rotate the surface-treated member without hindering the rotation drive by the support member.

【0013】本発明の第7の実施の形態による表面処理
装置は、支持部材の全部または一部を永久磁石で構成す
ることにより、被表面処理部材の全部または一部が磁性
材料で形成されている場合、その吸引力を利用して被表
面処理部材を押圧するものである。本実施の形態によれ
ば、例えば被表面処理部材が軽い場合や、支持部材の軸
の外径が小さい場合など、支持部材と被表面処理部材と
の間の摩擦抵抗が小さく、被表面処理部材が充分に回転
動作しないときにも、支持部材を構成している永久磁石
との吸引力によって、支持部材に対して被表面処理部材
を確実に安定して押圧させることができるため、被表面
処理部材は確実に回転動作を行うことになる。従って、
被表面処理部材の支持部材との当接位置は、確実に移動
することになり、接点跡が残らない均一な表面処理を行
うことができる。また、本実施形態の表面処理装置を電
気めっき処理に用いた場合、たとえば被表面処理部材が
磁石に吸引されない、または吸引されにくい材料で形成
されている場合でも、例えばニッケルなどのような強磁
性材料のめっき処理を行った場合、被表面処理部材表面
にめっき被膜が成膜するにつれて、支持部材と被表面処
理部材との間に吸引力が生じ、確実に当接状態を確保で
き、電気接点をとることができるため、ばらつきなく均
一に電気めっき処理を行うことができる。なお、当態様
により、特に別個に加負荷部材を設けなくても支持部材
だけで加負荷部材の役割も果たすことができ、装置の構
造が簡潔になるが、磁石による吸引力が不十分な場合等
は、さらに別に加負荷部材を配置しても良い。
In the surface treatment apparatus according to a seventh embodiment of the present invention, all or a part of the support member is constituted by a permanent magnet, and the whole or a part of the surface treatment member is formed of a magnetic material. In this case, the member to be treated is pressed using the suction force. According to the present embodiment, for example, when the surface-treated member is light, or when the outer diameter of the shaft of the support member is small, the frictional resistance between the support member and the surface-treated member is small, Even when the rotating member does not rotate sufficiently, the attraction force with the permanent magnet constituting the supporting member can reliably and stably press the member to be treated against the supporting member. The member will surely rotate. Therefore,
The contact position of the member to be treated with the support member is surely moved, so that a uniform surface treatment can be performed without leaving traces of contact. In addition, when the surface treatment apparatus of the present embodiment is used for electroplating, for example, even when the surface-treated member is made of a material that is not attracted to the magnet or hardly attracted by the magnet, for example, a ferromagnetic material such as nickel is used. When a plating process is performed on a material, as a plating film is formed on the surface of the surface-treated member, a suction force is generated between the support member and the surface-treated member, and the contact state can be reliably ensured. Therefore, the electroplating process can be performed uniformly without variation. In addition, according to this aspect, the role of the load member can be fulfilled by the support member alone without separately providing the load member, and the structure of the device is simplified, but the attraction force by the magnet is insufficient. For example, a load member may be further disposed.

【0014】本発明の第8の実施の形態による表面処理
装置は、被表面処理部材の内周面と当接する第1の部材
と、被表面処理部材の外周面と当接する第2の部材とを
軸方向が同じとなるように併設し、第1の部材又は第2
の部材によって被表面処理部材を回転駆動させるもので
ある。本実施の形態によれば、例えば被表面処理部材が
軽い場合や支持部材の軸の外径が小さい場合など、支持
部材と被表面処理部材との間の摩擦抵抗が小さく被表面
支持部材が充分に回転動作しないときにも、内周面と当
接する第1の部材と外周面と当接する第2の部材とによ
って、被表面処理部材を確実に挟み込むため、被表面処
理部材は確実に回転動作を行うことになる。従って、被
表面処理部材の支持部材などの当接する部材との当接位
置は、確実に移動することとなり、接点跡が残らない均
一な表面処理を行うことができる。
According to an eighth embodiment of the present invention, there is provided a surface treatment apparatus comprising: a first member contacting an inner peripheral surface of a member to be treated; and a second member contacting an outer peripheral surface of the member to be treated. Are installed together so that the axial direction is the same, and the first member or the second member
The member to be surface-treated is driven to rotate by the above member. According to this embodiment, for example, when the surface-treated member is light or when the outer diameter of the shaft of the support member is small, the frictional resistance between the support member and the surface-treated member is small, and the surface-treated member is sufficient. Even when the surface processing member does not rotate, the surface processing member is reliably sandwiched between the first member abutting on the inner peripheral surface and the second member abutting on the outer peripheral surface. Will be done. Therefore, the contact position of the surface-treated member with the contacting member such as the support member is reliably moved, and uniform surface treatment without contact traces can be performed.

【0015】本発明の第9の実施の形態による表面処理
装置は、被表面処理部材の内周面と当接する第1の部材
と、第1の部材が当接する内周面と対向する位置の内周
面と当接する第2の部材とを軸方向が同じとなるように
併設し、第1の部材又は第2の部材によって被表面処理
部材を回転駆動させるものである。本実施の形態によれ
ば、例えば被表面処理部材が軽い場合や、支持部材の軸
の外径が小さい場合など、支持部材と被表面処理部材と
の間の摩擦抵抗が小さく、被表面支持部材が充分に回転
動作しないときにも、第1の部材と第2の部材とによっ
て、被表面処理部材との当接状態を確実に確保できるた
め、被表面処理部材は確実に回転動作を行うことにな
る。従って、被表面処理部材の支持部材などの当接する
部材との当接位置は、確実に移動することとなり、接点
跡が残らない均一な表面処理を行うことができる。
A surface treatment apparatus according to a ninth embodiment of the present invention comprises a first member contacting an inner peripheral surface of a member to be treated, and a first member contacting an inner peripheral surface contacting the first member. A second member that is in contact with the inner peripheral surface is juxtaposed so that the axial direction is the same, and the surface-treated member is rotated by the first member or the second member. According to the present embodiment, for example, when the surface-treated member is light, or when the outer diameter of the shaft of the support member is small, the frictional resistance between the support member and the surface-treated member is small, When the first member and the second member do not rotate sufficiently, the first member and the second member can surely ensure the contact state with the member to be treated. become. Therefore, the contact position of the surface-treated member with the contacting member such as the support member is reliably moved, and uniform surface treatment without contact traces can be performed.

【0016】本発明の第10の実施の形態による表面処
理装置は、被表面処理部材の内周面又は外周面と当接す
る複数の部材を、それぞれの軸方向が同じとなるように
併設し、複数の前記部材のうち少なくとも一つの部材に
よって被表面処理部材を回転駆動させるものである。本
実施の形態によれば、例えば被表面処理部材が軽い場合
や、支持部材の軸の外径が小さい場合など、支持部材と
被表面処理部材との間の摩擦抵抗が小さく、被表面支持
部材が充分に回転動作しないときにも、複数の部材によ
って、被表面処理部材との当接状態を確実に確保できる
ため、被表面処理部材は確実に回転動作を行うことにな
る。従って、被表面処理部材の支持部材などの当接する
部材との当接位置は、確実に移動することとなり、接点
跡が残らない均一な表面処理を行うことができる。
In a surface treatment apparatus according to a tenth embodiment of the present invention, a plurality of members abutting on an inner peripheral surface or an outer peripheral surface of a surface-treated member are juxtaposed so that their axial directions are the same. The surface-treated member is rotated by at least one of the plurality of members. According to the present embodiment, for example, when the surface-treated member is light, or when the outer diameter of the shaft of the support member is small, the frictional resistance between the support member and the surface-treated member is small, Even when does not rotate sufficiently, the contact state with the surface-treated member can be reliably ensured by the plurality of members, so that the surface-treated member surely performs the rotating operation. Therefore, the contact position of the surface-treated member with the contacting member such as the support member is reliably moved, and uniform surface treatment without contact traces can be performed.

【0017】本発明の第11の実施の形態は、第1又は
第8から第10の実施の形態による表面処理装置におい
て、支持部材を導電性部材で構成し、支持部材によって
被表面処理部材にめっき電流を流すものである。本実施
の形態によれば、支持部材と被表面処理部材との導通を
確実に確保できるため電気めっき処理を効果的に行うこ
とができる。特に複数の被表面処理部材を、同時にめっ
き処理する場合にも、すべての被表面処理部材に対して
確実に電気を流すことができる。
According to an eleventh embodiment of the present invention, in the surface treatment apparatus according to the first or eighth to tenth embodiments, the support member is formed of a conductive member, and the support member is used for the surface treatment member. A plating current is passed. According to the present embodiment, since the conduction between the support member and the surface-treated member can be reliably ensured, the electroplating process can be performed effectively. In particular, even when a plurality of surface-treated members are subjected to plating at the same time, electricity can be reliably supplied to all the surface-treated members.

【0018】本発明の第12の実施の形態は、第11の
実施の形態による表面処理装置において、支持部材に絶
縁スペーサーを設け、被表面処理部材を絶縁スペーサー
間に配置するものである。本実施の形態によれば、絶縁
スペーサーによって、被表面処理部材同士の接触を防止
することができるので、接触によって電気めっきが不均
一に生じることを防止することができる。
According to a twelfth embodiment of the present invention, in the surface treatment apparatus according to the eleventh embodiment, an insulating spacer is provided on a support member, and a surface-treated member is disposed between the insulating spacers. According to the present embodiment, since the contact between the members to be surface-treated can be prevented by the insulating spacer, it is possible to prevent the nonuniform electroplating due to the contact.

【0019】本発明の第13の実施の形態は、第12の
実施の形態による表面処理装置において、被表面処理部
材が等間隔に配置されるように絶縁スペーサーを配置す
るものである。本実施の形態によれば、スペーサーの位
置または軸方向の幅寸法を調節し、被表面処理部材同志
の間隔を所定寸法で等間隔にすることによって、被表面
処理部材のエッジ部分への電気力線の集中を緩和し、さ
らにめっきの均一性を向上させることができる。各々の
間隔は被表面処理部材のエッジ部分への電気力線の集中
が緩和され、エッジ部分の膜厚が均一になるような適正
値を選定するのが望ましい。また、スペーサーは、あら
かじめ所定寸法に間隔が調整され支持部材と一体になっ
たものでもよいし、位置の調節が可能なものでもよい。
According to a thirteenth embodiment of the present invention, in the surface treating apparatus according to the twelfth embodiment, insulating spacers are arranged so that members to be treated are arranged at equal intervals. According to this embodiment, the position or axial width of the spacer is adjusted, and the distance between the surface-treated members is made equal to each other at a predetermined size, so that the electric force to the edge portion of the surface-treated member is adjusted. The concentration of lines can be reduced, and the uniformity of plating can be further improved. It is desirable to select an appropriate value for each interval such that concentration of lines of electric force on the edge of the surface-treated member is reduced and the film thickness at the edge is uniform. Further, the spacer may be one in which the interval is adjusted to a predetermined dimension in advance and integrated with the support member, or one that can be adjusted in position.

【0020】本発明の第14の実施の形態による表面処
理装置は、第1から第13の実施の形態による表面処理
装置を処理槽内に複数個配置して用いる表面処理装置で
あって、各々の表面処理装置の支持部材が平行になるよ
うに配置したものである。本実施の形態によれば、さら
に多くの被表面処理部材を同時に処理することができ、
本発明の装置が使用される処理槽の大きさに応じて、そ
れらを有効に活用することができる。
A surface treatment apparatus according to a fourteenth embodiment of the present invention is a surface treatment apparatus using a plurality of surface treatment apparatuses according to the first to thirteenth embodiments arranged in a treatment tank. Are arranged so that the support members of the surface treatment device are parallel. According to this embodiment, it is possible to simultaneously process more surface-treated members,
According to the size of the processing tank in which the apparatus of the present invention is used, they can be effectively utilized.

【0021】本発明の第15の実施の形態によるボンド
磁石の電気めっき装置は、第1から第14の実施の形態
による表面処理装置を用いてボンド磁石に電気めっきを
行うものである。本実施の形態によれば、ボンド磁石の
内周面にも、ばらつきなく均一に電気めっきを行うこと
ができる。
An electroplating apparatus for bonded magnets according to a fifteenth embodiment of the present invention performs electroplating on a bonded magnet using the surface treatment apparatus according to the first to fourteenth embodiments. According to the present embodiment, it is possible to uniformly perform electroplating on the inner peripheral surface of the bonded magnet without variation.

【0022】本発明の第16の実施の形態による被表面
処理部材の表面処理方法は、第1から第14の実施の形
態による表面処理装置を用いて表面処理を施すものであ
る。本実施の形態によれば、被表面処理部材の内周面に
も、ばらつきなく均一に表面処理を行うことができる。
The surface treatment method for a member to be surface-treated according to the sixteenth embodiment of the present invention performs the surface treatment using the surface treatment apparatus according to the first to fourteenth embodiments. According to the present embodiment, it is possible to uniformly perform the surface treatment on the inner peripheral surface of the surface-treated member without variation.

【0023】本発明の第17の実施の形態によるR−F
e−B系永久磁石は、第15の実施の形態によるボンド
磁石の電気めっき装置を用いて電気めっき処理を施した
ものである。本実施の形態によれば、内周面にも、ばら
つきなく均一に耐食性皮膜を形成したR−Fe−B系永
久磁石を得ることができる。
RF according to a seventeenth embodiment of the present invention
The eB-based permanent magnet was subjected to electroplating using the bond magnet electroplating apparatus according to the fifteenth embodiment. According to the present embodiment, it is possible to obtain an R-Fe-B-based permanent magnet in which a corrosion-resistant coating is uniformly formed on the inner peripheral surface without variation.

【0024】本発明の第18の実施の形態による被表面
処理部材は、第16の実施の形態による被表面処理部材
の表面処理方法によって、表面に皮膜を形成したもので
ある。本実施の形態によれば、内周面にも、ばらつきな
く均一に皮膜を形成した被表面処理部材を得ることがで
きる。
The member to be surface-treated according to the eighteenth embodiment of the present invention has a film formed on the surface by the surface treatment method for the member to be surface-treated according to the sixteenth embodiment. According to the present embodiment, it is possible to obtain a surface-treated member in which a coating is uniformly formed on the inner peripheral surface without variation.

【0025】[0025]

【実施例】以下に本発明の一実施例による表面処理装置
を図1、図2を用いて説明する。図1は本実施例による
ボンド磁石の電気めっき装置の概念構成図、図2は図1
のII−II断面図である。図1は、めっき槽の電解め
っき液中に配置される陽電極板10と、被表面処理部材
としてリング状ボンド磁石20を保持する表面処理用治
具30を示している。表面処理用治具30は、リング状
ボンド磁石20を内周面側から支持するとともにリング
状ボンド磁石20に回転動作を与える支持部材40と、
リング状ボンド磁石20を支持部材40に押圧する加負
荷部材50を備えている。図1に示すように、陽電極1
1に接続される2枚の陽電極板10は、対向するように
平行に配置され、表面処理用治具30は、支持部材40
の軸が陽極電極10と平行になるようにこれら陽極電極
10の間に配置される。表面処理用治具30は、外部に
設置されるモータ31の動力を支持部材40に伝達する
ための歯車32を備えている。また、表面処理用治具3
0は、陰電極33に接続される陰電極接合部34を備
え、この陰電極接合部34によって支持部材40を陰電
極33と接続している。支持部材40は、金属製の支持
軸41とこの支持軸41に所定間隔あけて配置された樹
脂製の絶縁スペーサー42とより構成されている。加負
荷部材50は、回転軸51とこの回転軸51に所定間隔
あけて配置された当接部材52とより構成されている。
なお、当接部材52の幅は、絶縁スペーサー42間の隙
間より小さく、それぞれの当接部材52は、それぞれの
絶縁スペーサー42の間に位置するように配置されてい
る。また、加負荷部材50は、絶縁材料で構成される
か、又は表面を絶縁処理している。この加負荷部材50
の両端は軸受け35で保持される。この軸受け35に設
けられた回転軸受け部35Aは、上部を開放し、上方か
ら加負荷部材50を配設できるようにしている。また回
転軸受け部35Aは、回転軸51を配設したとき、当接
部材52がリング状ボンド磁石20に当接し、加負荷部
材50の自重がリング状ボンド磁石20に加わるような
深さを有している。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A surface treatment apparatus according to one embodiment of the present invention will be described below with reference to FIGS. FIG. 1 is a conceptual configuration diagram of a bond magnet electroplating apparatus according to the present embodiment, and FIG.
FIG. 2 is a sectional view taken along line II-II of FIG. FIG. 1 shows a positive electrode plate 10 arranged in an electrolytic plating solution in a plating tank and a surface treatment jig 30 for holding a ring-shaped bonded magnet 20 as a surface-treated member. The surface treatment jig 30 supports the ring-shaped bonded magnet 20 from the inner peripheral surface side, and provides a rotating operation to the ring-shaped bonded magnet 20;
A load member 50 for pressing the ring-shaped bonded magnet 20 against the support member 40 is provided. As shown in FIG.
The two positive electrode plates 10 connected to 1 are arranged in parallel so as to face each other, and the jig 30 for surface treatment is
Are arranged between the anode electrodes 10 such that the axis of the The surface treatment jig 30 includes a gear 32 for transmitting the power of a motor 31 installed outside to the support member 40. Also, the surface treatment jig 3
Numeral 0 includes a negative electrode joint 34 connected to the negative electrode 33, and the support member 40 is connected to the negative electrode 33 by the negative electrode joint 34. The support member 40 includes a metal support shaft 41 and a resin insulation spacer 42 arranged at a predetermined interval on the support shaft 41. The load member 50 includes a rotating shaft 51 and a contact member 52 arranged at a predetermined interval on the rotating shaft 51.
Note that the width of the contact members 52 is smaller than the gap between the insulating spacers 42, and the respective contact members 52 are arranged so as to be located between the insulating spacers 42. Further, the load member 50 is made of an insulating material or has its surface insulated. This load member 50
Are held by bearings 35 at both ends. The rotating bearing portion 35A provided on the bearing 35 has an open upper portion so that the load member 50 can be disposed from above. When the rotating shaft 51 is disposed, the rotating bearing portion 35A has a depth such that the contact member 52 contacts the ring-shaped bonded magnet 20 and the weight of the load member 50 is applied to the ring-shaped bonded magnet 20. are doing.

【0026】次に、本実施例によるボンド磁石の電気め
っき装置の使用方法及び動作について説明する。まず、
支持部材40の絶縁スペーサー42の間にリング状ボン
ド磁石20を配設する。このようにリング状ボンド磁石
20を配設した支持部材40を表面処理用治具30に設
置する。図1では、一つのリング状ボンド磁石20を配
設したものを示しているが、絶縁スペーサー42の間毎
にリング状ボンド磁石20を配設することができる。支
持部材40を表面処理用治具30に設置した後、軸受け
35を配設し、上方から加負荷部材50の回転軸51両
端を回転軸受け部35Aに配設する。この状態では、図
2にも示すように、加負荷部材50の当接部材52は、
リング状ボンド磁石20の上部外周面に当接する。上記
状態が完了した後に、電気めっきが行われる。陽電極1
1及び陰電極を導通するとともに、モータ31が駆動さ
れる。モータ31の駆動力は、歯車32を介して支持部
材40に伝達され、支持部材40は回転する。
Next, the method of use and operation of the apparatus for electroplating bonded magnets according to the present embodiment will be described. First,
The ring-shaped bonded magnet 20 is disposed between the insulating spacers 42 of the support member 40. The support member 40 on which the ring-shaped bonded magnets 20 are arranged as described above is placed on the surface treatment jig 30. Although FIG. 1 shows an arrangement in which one ring-shaped bonded magnet 20 is provided, the ring-shaped bonded magnet 20 can be provided between the insulating spacers 42. After the support member 40 is installed on the surface treatment jig 30, the bearing 35 is provided, and both ends of the rotating shaft 51 of the load member 50 are provided on the rotating bearing portion 35A from above. In this state, as shown in FIG. 2, the contact member 52 of the load member 50
It contacts the upper outer peripheral surface of the ring-shaped bonded magnet 20. After the above state is completed, electroplating is performed. Positive electrode 1
1 and the negative electrode, and the motor 31 is driven. The driving force of the motor 31 is transmitted to the support member 40 via the gear 32, and the support member 40 rotates.

【0027】図2に示すように、支持部材40の反時計
回りの回転(矢印A)によって、支持軸41に当接して
いるリング状ボンド磁石20も反時計回りに回転(矢印
B)する。このとき、リング状ボンド磁石20は、加負
荷部材50の当接部材52によって、外表面側から支持
部材40に押圧されているため、支持部材40の回転力
を確実に受ける。なお、加負荷部材50は軸受け35に
よって回転可能に設けられているので、リング状ボンド
磁石20の回転にともなって、時計回りに回転(矢印
C)する。このように、リング状ボンド磁石20は、確
実に回転するために、支持部材40や加負荷部材50と
の接点跡が残ることなく、均一なめっき処理を行うこと
ができる。また、リング状ボンド磁石20が確実に回転
することにより、各々の磁石について外表面のそれぞれ
の部分と陽電極板10との距離が平均一定化され、磁石
の部分間で被膜の膜厚のばらつきがないめっき処理を行
うことができる。さらに、リング状ボンド磁石20の回
転動作により、周辺のめっき液が攪拌され、効率の高い
めっき処理を行うことができる。なお、図1において
は、2組の支持部材と加負荷部材を示しているが、1組
でもよいし、3組以上の支持部材と加負荷部材をそれぞ
れが平行になるように配置すればさらに多くの被表面処
理部材を同時に処理することができる。
As shown in FIG. 2, when the support member 40 is rotated counterclockwise (arrow A), the ring-shaped bonded magnet 20 in contact with the support shaft 41 is also rotated counterclockwise (arrow B). At this time, since the ring-shaped bonded magnet 20 is pressed against the support member 40 from the outer surface side by the contact member 52 of the load member 50, the ring-shaped bonded magnet 20 reliably receives the rotational force of the support member 40. Since the load member 50 is rotatably provided by the bearing 35, it rotates clockwise (arrow C) with the rotation of the ring-shaped bonded magnet 20. As described above, since the ring-shaped bonded magnet 20 is reliably rotated, a uniform plating process can be performed without leaving traces of contact with the support member 40 and the load member 50. In addition, since the ring-shaped bonded magnet 20 is reliably rotated, the distance between each part of the outer surface and the positive electrode plate 10 is averaged constant for each magnet, and the film thickness of the coating varies among the magnet parts. No plating process can be performed. Furthermore, the surrounding plating solution is agitated by the rotating operation of the ring-shaped bonded magnet 20, and a highly efficient plating process can be performed. Although FIG. 1 shows two sets of support members and load members, one set may be used, or three or more sets of support members and load members may be arranged so that they are parallel to each other. Many surface-treated members can be processed simultaneously.

【0028】図3に他の実施例を示す。図3は、図2に
相当する要部断面図であり、基本構成は図1と同様であ
るので説明を省略する。なお同一機能を有する部材には
同一符号を付けて説明を省略する。本実施例では、加負
荷部材50Aが図2に示す実施例と異なっている。すな
わち、回転軸51Aと当接部材52Aとは別部材で構成
され、当接部材52Aの内周径は、回転軸51Aの外周
径よりも大きく形成し、当接部材52Aがそれ自身の自
重でリング状ボンド磁石20に当接するように構成され
ている。従って、本実施例の構成では、回転軸51Aは
必ずしも回転可能でなくてもよく、上記実施例で説明し
た回転軸受け部35Aの深さについても回転軸51Aの
自重がリング状ボンド磁石20に加わるような深さを有
している必要もない。本実施例の構成によれば、それぞ
れの当接部材52Aの自重が、それぞれ対応するリング
状ボンド磁石20に加わるため、例えば表面処理用治具
30、支持部材、又は加負荷部材50の水平度が保持さ
れていない場合などでも、それぞれのリング状ボンド磁
石20に、均一に押圧力を加えることができる。従っ
て、すべてのリング状ボンド磁石20は、確実に回転す
るために、支持部材40や加負荷部材50との接点跡が
残ることなく、均一なめっき処理を行うことができる。
FIG. 3 shows another embodiment. FIG. 3 is a cross-sectional view of a main part corresponding to FIG. 2, and the basic configuration is the same as that of FIG. Note that members having the same functions are given the same reference numerals and description thereof will be omitted. In this embodiment, a load member 50A is different from the embodiment shown in FIG. That is, the rotating shaft 51A and the contact member 52A are formed as separate members, the inner peripheral diameter of the contact member 52A is formed larger than the outer peripheral diameter of the rotating shaft 51A, and the contact member 52A has its own weight. It is configured to contact the ring-shaped bonded magnet 20. Therefore, in the configuration of the present embodiment, the rotating shaft 51A does not necessarily have to be rotatable, and the own weight of the rotating shaft 51A also acts on the ring-shaped bonded magnet 20 with respect to the depth of the rotating bearing 35A described in the above embodiment. It is not necessary to have such a depth. According to the configuration of the present embodiment, since the own weight of each contact member 52A is applied to the corresponding ring-shaped bonded magnet 20, for example, the horizontality of the surface treatment jig 30, the support member, or the load member 50 is set. Can be applied uniformly to each of the ring-shaped bonded magnets 20 even when the pressure is not held. Therefore, since all the ring-shaped bonded magnets 20 rotate reliably, a uniform plating process can be performed without leaving traces of contact with the support member 40 and the load member 50.

【0029】図4に更に他の実施例を示す。図4は、図
2に相当する要部断面図であり、基本構成は図1と同様
であるので説明を省略する。なお同一機能を有する部材
には同一符号を付けて説明を省略する。本実施例では、
加負荷部材50Bが図2に示す実施例と異なっている。
すなわち、2つの加負荷部材50Bによって、リング状
ボンド磁石20に当接するように構成されている。従っ
て、本実施例の構成では、加負荷部材50Bは、必ずし
も回転軸よりも大きな径の当接部材を備えている必要は
ない。ただし、図2に示す加負荷部材50や図3に示す
加負荷部材50Aを用いてもよい。なお、加負荷部材5
0Bについては、3つ以上設けてもよく、また本実施例
ではリング状ボンド磁石20の外周面側から押圧する構
成としているが、すべての加負荷部材50B、又は一部
の加負荷部材50Bをリング状ボンド磁石20の内周面
側から押圧する構成としてもよい。本実施例の構成によ
れば、複数の加負荷部材50Bによって、リング状ボン
ド磁石20に加わるため、例えば表面処理用治具30、
支持部材40、又は加負荷部材50の水平度が保持され
ていない場合などでも、それぞれのリング状ボンド磁石
20を押圧するため、支持部材40に対してリング状ボ
ンド磁石20を確実に安定して押圧することができる。
FIG. 4 shows still another embodiment. FIG. 4 is a cross-sectional view of a main part corresponding to FIG. 2, and the basic configuration is the same as that of FIG. Note that members having the same functions are given the same reference numerals and description thereof will be omitted. In this embodiment,
The load member 50B is different from the embodiment shown in FIG.
That is, the two load members 50 </ b> B are configured to contact the ring-shaped bonded magnet 20. Therefore, in the configuration of the present embodiment, the load member 50B does not necessarily need to include a contact member having a diameter larger than the rotation shaft. However, a load member 50 shown in FIG. 2 or a load member 50A shown in FIG. 3 may be used. The load member 5
About 0B, three or more may be provided, and in the present embodiment, the configuration is such that the pressing is performed from the outer peripheral surface side of the ring-shaped bonded magnet 20. However, all the load members 50B or some of the load members 50B are used. The configuration may be such that the ring-shaped bonded magnet 20 is pressed from the inner peripheral surface side. According to the configuration of the present embodiment, since the plurality of loading members 50B are applied to the ring-shaped bonded magnet 20, for example, the surface treatment jig 30,
Even when the horizontality of the supporting member 40 or the load member 50 is not maintained, the respective ring-shaped bonded magnets 20 are pressed, so that the ring-shaped bonded magnet 20 is reliably and stably held against the supporting member 40. Can be pressed.

【0030】図5に更に他の実施例を示す。図5は、図
2に相当する要部断面図であり、基本構成は図1と同様
であるので説明を省略する。なお同一機能を有する部材
には同一符号を付けて説明を省略する。本実施例では、
リング状ボンド磁石20の内周面と当接する第1の部材
40Aと、第1の部材40Aが当接する内周面と対向す
る位置の内周面と当接する第2の部材40Bとを軸方向
が同じとなるように併設したものである。そして、第1
の部材40A、又は第2の部材40Bの少なくとも一方
を、支持部材としてリング状ボンド磁石20を回転駆動
させるものである。また、本実施例では、第1の部材4
0A、又は第2の部材40Bの少なくとも一方が加負荷
部材として機能する。本実施例の構成では、第1の部材
40A、及び第2の部材40Bの双方に絶縁スペーサー
42A、42Bを設けているが、第1の部材40A、又
は第2の部材40Bの少なくとも一方に設けていればよ
い。また、第1の部材40A、又は第2の部材40Bの
いずれかは絶縁材料で構成するか、絶縁処理を表面に施
すことが好ましい。また、第2の部材40Bについて
は、図3に示す加負荷部材50Aのような構成とするこ
ともできる。本実施例の構成によれば、第1の部材40
Aと第2の部材40Bとによって、リング状ボンド磁石
20との当接状態を確実に確保できるため、リング状ボ
ンド磁石20は確実に回転動作を行うことになる。
FIG. 5 shows still another embodiment. FIG. 5 is a cross-sectional view of a main part corresponding to FIG. 2, and the basic configuration is the same as that of FIG. Note that members having the same functions are given the same reference numerals and description thereof will be omitted. In this embodiment,
The first member 40A contacting the inner peripheral surface of the ring-shaped bonded magnet 20 and the second member 40B contacting the inner peripheral surface at a position facing the inner peripheral surface contacting the first member 40A are axially moved. Are attached so that they are the same. And the first
The ring-shaped bonded magnet 20 is rotated by using at least one of the member 40A and the second member 40B as a supporting member. In the present embodiment, the first member 4
0A or at least one of the second members 40B functions as a load member. In the configuration of the present embodiment, the insulating spacers 42A and 42B are provided on both the first member 40A and the second member 40B. However, the insulating spacers are provided on at least one of the first member 40A and the second member 40B. It should just be. It is preferable that either the first member 40A or the second member 40B be made of an insulating material or subjected to an insulating treatment on the surface. Further, the second member 40B may be configured as a load member 50A shown in FIG. According to the configuration of the present embodiment, the first member 40
Since the contact state between the ring-shaped bonded magnet 20 and the ring-shaped bonded magnet 20 can be reliably ensured by A and the second member 40B, the ring-shaped bonded magnet 20 reliably rotates.

【0031】なお、上記実施例では、支持部材40に絶
縁スペーサー42を設けて説明したが、絶縁スペーサー
42を設けなくてもよく、また絶縁スペーサー42を設
ける場合であっても、実質的に隣り合うリング状ボンド
磁石20同士の接触を防止することができれば、単なる
突起であってもよい。
In the above embodiment, the supporting member 40 is provided with the insulating spacer 42. However, the insulating spacer 42 may not be provided, and even when the insulating spacer 42 is provided, the supporting member 40 may be substantially adjacent to the supporting member 40. A simple protrusion may be used as long as the contact between the matching ring-shaped bonded magnets 20 can be prevented.

【0032】図6に更に他の実施例を示す。図6は、図
2に相当する要部断面図であり、基本構成は図1と同様
であるので説明を省略する。なお同一機能を有する部材
には同一符号を付けて説明を省略する。本実施例では、
支持部材40をリング状ボンド磁石20の外周面側に配
置している点で図2に示す実施例と異なっている。すな
わち、2つの支持部材40A、40Bによって、リング
状ボンド磁石20を外周面側の下部から支持している。
従って、本実施例の構成では、リング状ボンド磁石20
の内周径が小さい場合に特に有効である。なお、本実施
例の加負荷部材として、図3に示す加負荷部材50Aや
図4に示す加負荷部材50Bを用いてもよい。また、本
実施例では支持部材として2つの支持部材40A、40
Bを用いた場合を示したが、3つ以上設けてもよく、ま
た、このように複数の支持部材を設ける場合には、リン
グ状ボンド磁石20に対する回転動作は、少なくともい
ずれか一つの支持部材が与えればよい。なお、この場合
には他の支持部材は回動自在に設けることが好ましい。
まためっき電流についてもいずれか一つの支持部材を用
いて流すように構成すればよい。本実施例の構成によれ
ば、支持部材40と加負荷部材50をリング状ボンド磁
石20の外周面側に配置する構成であるため、リング状
ボンド磁石20自体が小さいか、又は内周径が小さい場
合であっても、支持部材40に対してリング状ボンド磁
石20を確実に安定して押圧することができる。
FIG. 6 shows still another embodiment. FIG. 6 is a cross-sectional view of a main part corresponding to FIG. 2, and the basic configuration is the same as that of FIG. Note that members having the same functions are given the same reference numerals and description thereof will be omitted. In this embodiment,
This embodiment differs from the embodiment shown in FIG. 2 in that the support member 40 is arranged on the outer peripheral surface side of the ring-shaped bonded magnet 20. That is, the ring-shaped bonded magnet 20 is supported from the lower portion on the outer peripheral surface side by the two support members 40A and 40B.
Therefore, in the configuration of the present embodiment, the ring-shaped bonded magnet 20
This is particularly effective when the inner peripheral diameter of is small. Note that, as the load member of this embodiment, a load member 50A shown in FIG. 3 or a load member 50B shown in FIG. 4 may be used. In this embodiment, two support members 40A, 40A are used as support members.
B has been described, but three or more may be provided, and when a plurality of support members are provided in this manner, the rotation operation with respect to the ring-shaped bonded magnet 20 is performed by at least one of the support members. Should be given. In this case, it is preferable that the other support member is provided rotatably.
Also, the plating current may be configured to flow using any one of the support members. According to the configuration of the present embodiment, since the support member 40 and the load member 50 are arranged on the outer peripheral surface side of the ring-shaped bonded magnet 20, the ring-shaped bonded magnet 20 itself is small or the inner diameter is smaller. Even if it is small, the ring-shaped bonded magnet 20 can be reliably and stably pressed against the support member 40.

【0033】図7に更に他の実施例を示す。図7は、図
2に相当する要部断面図であり、基本構成は図1と同様
であるので説明を省略する。なお同一機能を有する部材
には同一符号を付けて説明を省略する。本実施例では、
図6に示す実施例において、加負荷部材50をリング状
ボンド磁石20の内周面側の下部に配置したものであ
る。すなわち、2つの支持部材40A、40Bによっ
て、リング状ボンド磁石20を外周面側の下部から支持
し、リング状ボンド磁石20の内周面側下部に配置した
加負荷部材50によってリング状ボンド磁石20を押圧
している。なお、本実施例の加負荷部材50として、図
3に示す加負荷部材50Aを用いてもよい。また、本実
施例では支持部材として2つの支持部材40A、40B
を用いた場合を示したが、3つ以上設けてもよく、ま
た、このように複数の支持部材を設ける場合には、リン
グ状ボンド磁石20に対する回転動作は、少なくともい
ずれか一つの支持部材が与えればよい。なお、この場合
には他の支持部材は回動自在に設けることが好ましい。
まためっき電流についてもいずれか一つの支持部材を用
いて流すように構成すればよい。本実施例の構成によれ
ば、加負荷部材50をリング状ボンド磁石20の内周面
側下部、すなわちリング状ボンド磁石20の最低部に配
置する構成であるため、加負荷部材50の負荷を、リン
グ状ボンド磁石20に対して確実に安定して加えること
ができる。
FIG. 7 shows still another embodiment. FIG. 7 is a cross-sectional view of a main part corresponding to FIG. 2 and its basic configuration is the same as that of FIG. Note that members having the same functions are given the same reference numerals and description thereof will be omitted. In this embodiment,
In the embodiment shown in FIG. 6, a load member 50 is arranged at a lower portion on the inner peripheral surface side of the ring-shaped bonded magnet 20. That is, the ring-shaped bonded magnet 20 is supported from the lower part on the outer peripheral surface side by the two support members 40A and 40B, and the ring-shaped bonded magnet 20 is Is pressed. Note that the load member 50A shown in FIG. 3 may be used as the load member 50 of the present embodiment. In this embodiment, two support members 40A and 40B are used as support members.
Although the case where was used was shown, three or more may be provided, and when a plurality of support members are provided as described above, at least one of the support members rotates with respect to the ring-shaped bonded magnet 20. Just give it. In this case, it is preferable that the other support member is provided rotatably.
Also, the plating current may be configured to flow using any one of the support members. According to the configuration of the present embodiment, the load member 50 is disposed at the lower portion on the inner peripheral surface side of the ring-shaped bonded magnet 20, that is, at the lowest portion of the ring-shaped bonded magnet 20, so that the load of the load member 50 is reduced. , Can be reliably and stably added to the ring-shaped bonded magnet 20.

【0034】図8に更に他の実施例を示す。図8は図2
に相当する要部断面図であり、基本構成は図1と同様で
あるので説明を省略する。なお、同一機能を有する部材
には同一符号をつけて説明を省略する。本実施例では、
支持部材40の絶縁スペーサー42の間にリング状ボン
ド磁石20を配設する。支持部材40はパイプ状の金属
製支持軸43に永久磁石の棒44が埋め込まれる構成に
なっている。なお、支持軸43は上記のような構成だけ
でなく、磁石棒のみの構成や、樹脂製パイプの中に磁石
棒が埋め込まれ、パイプ表面に金属箔を張った構成な
ど、一部または全部が磁石で、表面に導通が取れるよう
な構成であればよい。本実施例の構成によれば、磁力に
よって、支持部材40に対してリング状ボンド磁石20
を確実に安定して押圧することができる。従って本実施
例では、支持部材40に埋め込まれた永久磁石の棒44
によって加負荷部材が構成される。
FIG. 8 shows still another embodiment. FIG. 8 shows FIG.
2 is a cross-sectional view of a main part corresponding to. The basic configuration is the same as that of FIG. Note that members having the same functions are given the same reference numerals and description thereof will be omitted. In this embodiment,
The ring-shaped bonded magnet 20 is disposed between the insulating spacers 42 of the support member 40. The support member 40 is configured such that a permanent magnet bar 44 is embedded in a pipe-shaped metal support shaft 43. In addition, the support shaft 43 has not only the above configuration but also a configuration in which only a magnet bar is used, or a configuration in which a magnet bar is embedded in a resin pipe and a metal foil is stretched on the surface of the pipe. Any configuration may be used as long as the magnet can conduct electricity to the surface. According to the configuration of the present embodiment, the ring-shaped bonded magnet 20 is
Can be reliably and stably pressed. Therefore, in this embodiment, the permanent magnet rod 44 embedded in the support member 40 is used.
Thus, a load member is configured.

【0035】図9に更に他の実施例を示す。図9は図2
に相当する要部断面図であり、基本構成は図1と同様で
あるので説明を省略する。なお、同一機能を有する部材
には同一符号をつけて説明を省略する。本実施例では、
2つの支持部材40A、40Bによって、リング状ボン
ド磁石20を外周面の下部から支持している。支持部材
40A、40Bはパイプ状の金属製支持軸43A、43
Bに永久磁石の棒44A、44Bが埋め込まれる構成に
なっている。なお、支持軸43A、43Bは上記のよう
な構成だけでなく、磁石棒のみの構成や、樹脂製パイプ
の中に磁石棒が埋め込まれ、パイプ表面に金属箔を張っ
た構成など、一部または全部が磁石で、表面に導通が取
れるような構成であればよい。本実施例の構成によれ
ば、磁力によって、支持部材40A、40Bに対してリ
ング状ボンド磁石20を確実に安定して押圧することが
できる。従って本実施例では、支持部材40A、40B
に埋め込まれた永久磁石の棒44A、44Bによって加
負荷部材が構成される。
FIG. 9 shows still another embodiment. FIG. 9 shows FIG.
2 is a cross-sectional view of a main part corresponding to. The basic configuration is the same as that of FIG. Note that members having the same functions are given the same reference numerals and description thereof will be omitted. In this embodiment,
The ring-shaped bonded magnet 20 is supported from below the outer peripheral surface by the two support members 40A and 40B. The supporting members 40A and 40B are pipe-shaped metal supporting shafts 43A and 43.
B has a configuration in which rods 44A and 44B of permanent magnets are embedded. Note that the support shafts 43A and 43B have not only the above-described configuration but also a configuration including only a magnet bar, a configuration in which a magnet bar is embedded in a resin pipe, and a metal foil is stretched on the pipe surface. Any structure may be used as long as it is entirely a magnet and can conduct electricity to the surface. According to the configuration of the present embodiment, the ring-shaped bonded magnet 20 can be reliably and stably pressed against the support members 40A and 40B by the magnetic force. Therefore, in this embodiment, the support members 40A, 40B
A load member is constituted by the permanent magnet rods 44A and 44B embedded in the fin.

【0036】なお、本発明の表面処理装置は、電気めっ
き処理に限られず、無電解めっき処理、化成処理、エッ
チング処理などを行う装置に使用することもできる。ま
た、本発明の表面処理装置により効果的に表面処理され
る被表面処理部材としては、R−Fe−B系リング状ボ
ンド磁石やR−Fe−B系円柱状ボンド磁石である。
The surface treatment apparatus of the present invention is not limited to the electroplating treatment, but can be used for an apparatus for performing electroless plating treatment, chemical conversion treatment, etching treatment and the like. The surface-treated member to be subjected to the surface treatment effectively by the surface treatment apparatus of the present invention is an R—Fe—B ring magnet or an R—Fe—B column bond magnet.

【0037】[0037]

【発明の効果】本発明によれば、加負荷部材によって、
被表面処理部材を支持部材に押圧するため、被表面処理
部材は確実に回転動作を行うことになる。従って、被表
面処理部材の支持部材との当接位置は、確実に移動する
こととなり、支持部材との接点跡が残らない均一な表面
処理を行うことができる。
According to the present invention, according to the load member,
Since the surface-treated member is pressed against the support member, the surface-treated member surely rotates. Therefore, the contact position of the surface-treated member with the support member is surely moved, and uniform surface treatment without leaving traces of contact with the support member can be performed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例によるボンド磁石の電気めっ
き装置の概念構成図
FIG. 1 is a conceptual configuration diagram of a bond magnet electroplating apparatus according to an embodiment of the present invention.

【図2】図1のII−II断面図FIG. 2 is a sectional view taken along line II-II of FIG.

【図3】本発明の他の実施例による要部断面図FIG. 3 is a sectional view of a main part according to another embodiment of the present invention.

【図4】本発明の他の実施例による要部断面図FIG. 4 is a sectional view of a main part according to another embodiment of the present invention.

【図5】本発明の他の実施例による要部断面図FIG. 5 is a sectional view of a main part according to another embodiment of the present invention.

【図6】本発明の他の実施例による要部断面図FIG. 6 is a sectional view of a main part according to another embodiment of the present invention.

【図7】本発明の他の実施例による要部断面図FIG. 7 is a sectional view of a main part according to another embodiment of the present invention.

【図8】本発明の他の実施例による要部断面図FIG. 8 is a sectional view of a main part according to another embodiment of the present invention.

【図9】本発明の他の実施例による要部断面図FIG. 9 is a sectional view of a main part according to another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

20 リング状ボンド磁石 40 支持部材 42 絶縁スペーサー 50 加負荷部材 Reference Signs List 20 ring-shaped bonded magnet 40 support member 42 insulating spacer 50 load member

───────────────────────────────────────────────────── フロントページの続き (72)発明者 菊井 文秋 大阪府三島郡島本町江川2丁目15番17号 住友特殊金属株式会社山崎製作所内 Fターム(参考) 4K024 BA01 BB14 BC06 CB02 CB04 CB21 CB26  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Fumiaki Kikui 2-15-17 Egawa, Shimamoto-cho, Mishima-gun, Osaka Prefecture F-term in Sumitomo Special Metals Co., Ltd. Yamazaki Works 4K024 BA01 BB14 BC06 CB02 CB04 CB21 CB26

Claims (18)

【特許請求の範囲】[Claims] 【請求項1】 円筒形状等の内周面を有する被表面処理
部材に、表面処理を施す表面処理装置であって、前記被
表面処理部材を支持するとともに該被表面処理部材に回
転動作を与える支持部材を設け、前記被表面処理部材を
前記支持部材に押圧する加負荷部材を設けたことを特徴
とする表面処理装置。
1. A surface treatment apparatus for performing a surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape, the surface-treating device supporting the surface-treated member and giving a rotating operation to the surface-treated member. A surface treatment apparatus comprising: a support member; and a load member that presses the surface-treated member against the support member.
【請求項2】 前記加負荷部材を複数備え、それぞれの
前記加負荷部材が前記被表面処理部材を外周面側から押
圧することを特徴とする請求項1に記載の表面処理装
置。
2. The surface treatment apparatus according to claim 1, wherein a plurality of the load members are provided, and each of the load members presses the surface-treated member from an outer peripheral surface side.
【請求項3】 前記支持部材を複数備え、それぞれの前
記支持部材が前記被表面処理部材を外周面側から支持す
ることを特徴とする請求項1に記載の表面処理装置。
3. The surface treatment apparatus according to claim 1, wherein a plurality of the support members are provided, and each of the support members supports the surface-treated member from an outer peripheral surface side.
【請求項4】 前記加負荷部材及び前記支持部材を、前
記被表面処理部材の外周面側に配置したことを特徴とす
る請求項1に記載の表面処理装置。
4. The surface treatment apparatus according to claim 1, wherein the load member and the support member are arranged on an outer peripheral surface side of the surface-treated member.
【請求項5】 前記加負荷部材を前記支持部材の上方に
配置し、前記加負荷部材の自重によって前記被表面処理
部材を押圧することを特徴とする請求項1に記載の表面
処理装置。
5. The surface treatment apparatus according to claim 1, wherein the load member is disposed above the support member, and the surface treatment member is pressed by the weight of the load member.
【請求項6】 前記加負荷部材を、回転可能に設けてい
ることを特徴とする請求項1に記載の表面処理装置。
6. The surface treatment apparatus according to claim 1, wherein the load member is rotatably provided.
【請求項7】 前記加負荷部材が支持部材の全部または
一部に配置された永久磁石にて構成されることを特徴と
する請求項1に記載の表面処理装置。
7. The surface treatment apparatus according to claim 1, wherein the load member is constituted by a permanent magnet disposed on all or a part of the support member.
【請求項8】 円筒形状等の内周面を有する被表面処理
部材に、表面処理を施す表面処理装置であって、前記被
表面処理部材の内周面と当接する第1の部材と、前記被
表面処理部材の外周面と当接する第2の部材とを軸方向
が同じとなるように併設し、前記第1の部材又は前記第
2の部材によって前記被表面処理部材を回転駆動させる
ことを特徴とする表面処理装置。
8. A surface treatment apparatus for performing a surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape, wherein the first member is in contact with an inner peripheral surface of the surface-treated member; A second member that is in contact with the outer peripheral surface of the surface-treated member is provided in parallel so that the axial direction is the same, and the surface-treated member is rotationally driven by the first member or the second member. Characteristic surface treatment equipment.
【請求項9】 円筒形状等の内周面を有する被表面処理
部材に、表面処理を施す表面処理装置であって、前記被
表面処理部材の内周面と当接する第1の部材と、前記第
1の部材が当接する内周面と対向する位置の内周面と当
接する第2の部材とを軸方向が同じとなるように併設
し、前記第1の部材又は前記第2の部材によって前記被
表面処理部材を回転駆動させることを特徴とする表面処
理装置。
9. A surface treatment apparatus for performing a surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape, the first member being in contact with an inner peripheral surface of the surface-treated member; An inner peripheral surface at a position facing the inner peripheral surface with which the first member abuts and a second member that abuts with the inner peripheral surface are juxtaposed so that the axial direction is the same, and the first member or the second member is used. A surface treatment apparatus, wherein the surface treatment member is driven to rotate.
【請求項10】 円筒形状等の内周面を有する被表面処
理部材に、表面処理を施す表面処理装置であって、前記
被表面処理部材の内周面又は外周面と当接する複数の部
材を、それぞれの軸方向が同じとなるように併設し、複
数の前記部材のうち少なくとも一つの部材によって前記
被表面処理部材を回転駆動させることを特徴とする表面
処理装置。
10. A surface treatment apparatus for performing a surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape, wherein a plurality of members abutting on an inner peripheral surface or an outer peripheral surface of the surface treated member are provided. A surface treatment apparatus, wherein a plurality of the members are provided so as to have the same axial direction, and the surface-treated member is rotationally driven by at least one of the plurality of members.
【請求項11】 前記支持部材を導電性部材で構成し、
前記支持部材によって前記被表面処理部材にめっき電流
を流すことを特徴とする請求項1又は請求項8から請求
項10のいずれかに記載の表面処理装置。
11. The support member comprises a conductive member,
The surface treatment apparatus according to claim 1, wherein a plating current is caused to flow through the surface-treated member by the support member.
【請求項12】 前記支持部材に絶縁スペーサーを設
け、前記被表面処理部材を前記絶縁スペーサー間に配置
することを特徴とする請求項11に記載の表面処理装
置。
12. The surface treatment apparatus according to claim 11, wherein an insulating spacer is provided on the support member, and the surface-treated member is disposed between the insulating spacers.
【請求項13】 前記被表面処理部材が等間隔に配置さ
れるように前記絶縁スペーサーを配置することを特徴と
する請求項12に記載の表面処理装置。
13. The surface treatment apparatus according to claim 12, wherein the insulating spacers are arranged such that the members to be surface-treated are arranged at equal intervals.
【請求項14】 請求項1から請求項13のいずれかに
記載の表面処理装置を処理槽内に複数個配置して用いる
表面処理装置であって、各々の支持部材が平行になるよ
うに配置したことを特徴とする表面処理装置。
14. A surface treatment apparatus using a plurality of the surface treatment apparatuses according to claim 1 in a treatment tank, wherein each support member is arranged in parallel. A surface treatment apparatus characterized in that:
【請求項15】 請求項1から請求項14のいずれかに
記載の表面処理装置を用いて、ボンド磁石に電気めっき
を行うことを特徴とするボンド磁石の電気めっき装置。
15. An electroplating apparatus for bonded magnets, wherein electroplating is performed on a bonded magnet using the surface treatment apparatus according to any one of claims 1 to 14.
【請求項16】 請求項1から請求項14のいずれかに
記載の表面処理装置を用いて表面処理を施すことを特徴
とする被表面処理部材の表面処理方法。
16. A surface treatment method for a member to be surface-treated, wherein the surface treatment is performed using the surface treatment apparatus according to claim 1. Description:
【請求項17】 請求項15に記載のボンド磁石の電気
めっき装置を用いて電気めっき処理が施され、表面に耐
食性皮膜を形成していることを特徴とするR−Fe−B
系永久磁石。
17. An R-Fe-B, which has been subjected to an electroplating process using the apparatus for electroplating a bonded magnet according to claim 15 to form a corrosion-resistant film on a surface thereof.
System permanent magnet.
【請求項18】 請求項16に記載の被表面処理部材の
表面処理方法によって、表面に皮膜を形成していること
を特徴とする被表面処理部材。
18. A member to be surface-treated, wherein a film is formed on the surface by the method for surface-treating a member to be surface-treated according to claim 16.
JP2000313524A 1999-10-13 2000-10-13 Surface treatment apparatus Withdrawn JP2001181893A (en)

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Application Number Priority Date Filing Date Title
JP29057199 1999-10-13
JP11-290571 1999-10-13
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Publication Number Publication Date
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